|Publication number||USD570310 S1|
|Application number||US 29/276,679|
|Publication date||Jun 3, 2008|
|Filing date||Feb 1, 2007|
|Priority date||Aug 1, 2006|
|Publication number||276679, 29276679, US D570310 S1, US D570310S1, US-S1-D570310, USD570310 S1, USD570310S1|
|Original Assignee||Tokyo Electron Limited|
|Export Citation||BiBTeX, EndNote, RefMan|
|Classifications (1) |
|External Links: USPTO, USPTO Assignment, Espacenet|
Attracting plate of an electrostatic chuck for semiconductor manufacturing
US D570310 S1
The ornamental design for an attracting plate of an electrostatic chuck for semiconductor manufacturing, as shown and described.
FIG. 1 is a front elevational view of an attracting plate of an electrostatic chuck for semiconductor manufacturing, or the like, showing my new design;
FIG. 2 is a rear elevational view thereof;
FIG. 3 is a top plan view thereof, the bottom plan view being a mirror image of the plan view shown;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof; and,
FIG. 6 is a bottom, rear and lower perspective view thereof.
The broken line showing in the figures is for illustrative purposes only and forms no part of the claimed design.