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Publication numberUSD583395 S1
Publication typeGrant
Application numberUS 29/281,073
Publication dateDec 23, 2008
Filing dateJun 14, 2007
Priority dateDec 15, 2006
Publication number281073, 29281073, US D583395 S1, US D583395S1, US-S1-D583395, USD583395 S1, USD583395S1
InventorsAtsushi Ueda
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Cover for a heater stage of a plasma processing apparatus
US D583395 S1
Images(4)
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Claims(1)
  1. The ornamental design for a cover for a heater stage of a plasma processing apparatus, as shown.
Description

FIG. 1 is a front view of a cover for a heater stage of a plasma processing apparatus showing my new design:

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a sectional view taken along line 55 of FIG. 1 thereof;

FIG. 6 is an enlarged view taken along line 66 of FIG. 5 thereof;

FIG. 7 is an enlarged view taken along line 77 of FIG. 5 thereof; and,

FIG. 8 is a perspective view thereof.

Classifications
U.S. ClassificationD15/138, D15/199
Legal Events
DateCodeEventDescription
Sep 5, 2008ASAssignment
Owner name: TOKYO ELECTRON LIMITED, JAPAN
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:YAMASHITA, JUN;REEL/FRAME:021487/0180
Effective date: 20080808