Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.

Patents

  1. Advanced Patent Search
Publication numberUSD584591 S1
Publication typeGrant
Application numberUS 29/295,292
Publication dateJan 13, 2009
Filing dateSep 25, 2007
Priority dateOct 26, 2004
Also published asUSD559066, USD592029, USD592030, USD600989
Publication number29295292, 295292, US D584591 S1, US D584591S1, US-S1-D584591, USD584591 S1, USD584591S1
InventorsHiroyuki Tano, Hiroshi Shiho
Original AssigneeJsr Corporation
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Polishing pad
US D584591 S1
Images(5)
Previous page
Next page
Claims(1)
  1. The ornamental design for a polishing pad, as shown and described.
Description

FIG. 1 is a top plan view of a polishing pad showing our new design;

FIG. 2 is a front elevational view thereof, the rear elevation view, left and right side elevational views being a mirror image of the side shown;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a partial, enlarged view of portion 44 in FIG. 1;

FIG. 5 is a partial, enlarged sectional view taken along line 55 in FIG. 4

FIG. 6 is a partial, enlarged sectional view taken along line 66 in FIG. 4;

FIG. 7 is a partial, greatly enlarged sectional view of portion 7 in FIG. 5; and,

FIG. 8 is a partial, enlarged view of portion 88 in FIG. 1.

Classifications
U.S. ClassificationD08/70
Legal Events
DateCodeEventDescription
Oct 1, 2008ASAssignment
Owner name: LG ELECTRONICS INC., KOREA, REPUBLIC OF
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:AHN, SUNGYONG;REEL/FRAME:021612/0964
Effective date: 20080903