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Publication numberUSD592030 S1
Publication typeGrant
Application numberUS 29/295,294
Publication dateMay 12, 2009
Filing dateSep 25, 2007
Priority dateOct 26, 2004
Also published asUSD559066, USD584591, USD592029, USD600989
Publication number29295294, 295294, US D592030 S1, US D592030S1, US-S1-D592030, USD592030 S1, USD592030S1
InventorsHiroyuki Tano, Hiroshi Shiho
Original AssigneeJsr Corporation
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Polishing pad
US D592030 S1
Abstract  available in
Images(5)
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Claims(1)
  1. The ornamental design for a polishing pad, as shown and described.
Description

FIG. 1 is a top plan view of a polishing pad showing our new design;

FIG. 2 is a front elevational view thereof, the rear elevational view, left side and front side elevational views thereof being mirror images of the views shown;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a partially enlarged view of portion 44 in FIG. 1;

FIG. 5 is a partially enlarged sectional view taken substantially along line 55 in FIG. 4;

FIG. 6 is a partially enlarged sectional view taken substantially along line 66 in FIG. 4;

FIG. 7 is a partially enlarged drawing of portion 77 in FIG. 3;

FIG. 8 is a partially enlarged sectional view of portion 8 in FIG. 5; and,

FIG. 9 is a partially enlarged view of section 99 in FIG. 1.

Classifications
U.S. ClassificationD08/70