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Publication numberUSD606952 S1
Publication typeGrant
Application numberUS 29/331,022
Publication dateDec 29, 2009
Filing dateJan 16, 2009
Priority dateJan 16, 2009
Publication number29331022, 331022, US D606952 S1, US D606952S1, US-S1-D606952, USD606952 S1, USD606952S1
InventorsJeong Ho Lee, Sang Jin Jeong, Woo Chan Kim
Original AssigneeAsm Genitech Korea Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Plasma inducing plate for semiconductor deposition apparatus
US D606952 S1
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  1. The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.

FIG. 1 is a perspective view of a plasma inducing plate that may be positioned in a reaction space of a chamber in a semiconductor deposition apparatus, showing our new design with a partial enlarged view of an edge portion of the plate and a partial cross-sectional view of another edge portion of the plate;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left-side view thereof;

FIG. 5 is a right-side view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof according to our new design.

The plasma inducing plate may be made of a metal. The four holes on the top surface of the plate are screw holes that do not penetrate the plate.

The ornamental design which is claimed is shown in solid lines in the drawings.

U.S. ClassificationD13/182