|Publication number||USD606952 S1|
|Application number||US 29/331,022|
|Publication date||Dec 29, 2009|
|Filing date||Jan 16, 2009|
|Priority date||Jan 16, 2009|
|Publication number||29331022, 331022, US D606952 S1, US D606952S1, US-S1-D606952, USD606952 S1, USD606952S1|
|Inventors||Jeong Ho Lee, Sang Jin Jeong, Woo Chan Kim|
|Original Assignee||Asm Genitech Korea Ltd.|
|Export Citation||BiBTeX, EndNote, RefMan|
|Classifications (1) |
|External Links: USPTO, USPTO Assignment, Espacenet|
Plasma inducing plate for semiconductor deposition apparatus
US D606952 S1
The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.
FIG. 1 is a perspective view of a plasma inducing plate that may be positioned in a reaction space of a chamber in a semiconductor deposition apparatus, showing our new design with a partial enlarged view of an edge portion of the plate and a partial cross-sectional view of another edge portion of the plate;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left-side view thereof;
FIG. 5 is a right-side view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof according to our new design.
The plasma inducing plate may be made of a metal. The four holes on the top surface of the plate are screw holes that do not penetrate the plate.
The ornamental design which is claimed is shown in solid lines in the drawings.