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Publication numberUSD640063 S1
Publication typeGrant
Application numberUS 29/331,861
Publication dateJun 21, 2011
Filing dateFeb 3, 2009
Priority dateFeb 19, 2008
Also published asUSD587896
Publication number29331861, 331861, US D640063 S1, US D640063S1, US-S1-D640063, USD640063 S1, USD640063S1
InventorsMoses Aipa
Original AssigneeIncase Designs Corp.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Sheet material with topographic pattern imprint
US D640063 S1
Abstract  available in
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  1. The ornamental design for a sheet material with topographic pattern imprint, as shown and described.

FIG. 1 shows a perspective view for a sheet material with topographic pattern imprint.

FIG. 2 shows a close-up view of the section indicated by circle 2 in FIG. 1.

FIG. 3 shows a top view of the design of FIG. 1; and,

FIG. 4 shows a close-up cross-sectional view taken along line 44 in FIG. 3.

The broken lines depict the boundaries of the claimed design and form no part of the claimed design.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD709508 *Apr 30, 2012Jul 22, 2014Samsung Electronics Co., Ltd.SD memory card
USD710364 *Apr 30, 2012Aug 5, 2014Samsung Electronics Co., Ltd.SD memory card
U.S. ClassificationD05/29