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Publication numberUSD641829 S1
Publication typeGrant
Application numberUS 29/378,161
Publication dateJul 19, 2011
Filing dateOct 29, 2010
Priority dateOct 29, 2010
Publication number29378161, 378161, US D641829 S1, US D641829S1, US-S1-D641829, USD641829 S1, USD641829S1
InventorsIvelin A. Angelov, James E. Caron, Ilia Kalinovshi
Original AssigneeNovellus Systems, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Plasma reactor showerhead face plate having concentric ridge pattern
US D641829 S1
Abstract  available in
Images(5)
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Claims(1)
  1. We claim the ornamental design for a plasma reactor showerhead face plate having concentric ridge pattern, as shown and described.
Description

FIG. 1 is a lower front perspective view of a plasma reactor showerhead face plate having concentric ridge pattern showing our new design, wherein dashed lines represent holes and are unclaimed as part of this invention;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a side elevational view thereof, all sides being identical thereto; and,

FIG. 5 is a cross-sectional view thereof, taken generally along line 55 in FIG. 3, showing succinctly the surface contours seen in FIGS. 1 and 3.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US9121097Sep 28, 2012Sep 1, 2015Novellus Systems, Inc.Variable showerhead flow by varying internal baffle conductance
US9315899Jul 3, 2012Apr 19, 2016Novellus Systems, Inc.Contoured showerhead for improved plasma shaping and control
US9598770Mar 18, 2016Mar 21, 2017Novellus Systems, Inc.Contoured showerhead for improved plasma shaping and control
US9728380Jul 17, 2015Aug 8, 2017Novellus Systems, Inc.Dual-plenum showerhead with interleaved plenum sub-volumes
USD738991Nov 26, 2013Sep 15, 2015Durst Corporation, Inc.Showerhead
USD790039 *Apr 8, 2016Jun 20, 2017Applied Materials, Inc.Showerhead for a semiconductor processing chamber
USD793526 *Apr 8, 2016Aug 1, 2017Applied Materials, Inc.Showerhead for a semiconductor processing chamber
USD794753 *Apr 8, 2016Aug 15, 2017Applied Materials, Inc.Showerhead for a semiconductor processing chamber
Classifications
U.S. ClassificationD23/213