|Publication number||USD649126 S1|
|Application number||US 29/334,787|
|Publication date||Nov 22, 2011|
|Filing date||Apr 1, 2009|
|Priority date||Oct 20, 2008|
|Publication number||29334787, 334787, US D649126 S1, US D649126S1, US-S1-D649126, USD649126 S1, USD649126S1|
|Original Assignee||Ebara Corporation|
|Export Citation||BiBTeX, EndNote, RefMan|
|Referenced by (1), Classifications (1) |
|External Links: USPTO, USPTO Assignment, Espacenet|
Vacuum contact pad
US D649126 S1
The ornamental design for a vacuum contact pad, as shown and described.
FIG. 1 is a front elevational view of a vacuum contact pad showing our new design;
FIG. 2 is a back elevation view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is an enlarged sectional view taken along the line 5—5 in X part of FIG. 1 thereof;
FIG. 6 is a front elevational view in use thereof;
FIG. 7 is an enlarged sectional view taken along the line 7—7 in X part of FIG. 1 in use thereof; and,
FIG. 8 is a reference perspective view showing the usable state thereof.
The broken lines depict environmental subject matter only and form no part of the claimed design.
|Citing Patent||Filing date||Publication date||Applicant||Title|
|USD731448 *||Apr 28, 2014||Jun 9, 2015||Ebara Corporation||Polishing pad for substrate polishing apparatus|