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Publication numberUSD649126 S1
Publication typeGrant
Application numberUS 29/334,787
Publication dateNov 22, 2011
Filing dateApr 1, 2009
Priority dateOct 20, 2008
Publication number29334787, 334787, US D649126 S1, US D649126S1, US-S1-D649126, USD649126 S1, USD649126S1
InventorsTamami Takahashi
Original AssigneeEbara Corporation
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Vacuum contact pad
US D649126 S1
Abstract  available in
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  1. The ornamental design for a vacuum contact pad, as shown and described.

FIG. 1 is a front elevational view of a vacuum contact pad showing our new design;

FIG. 2 is a back elevation view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is an enlarged sectional view taken along the line 55 in X part of FIG. 1 thereof;

FIG. 6 is a front elevational view in use thereof;

FIG. 7 is an enlarged sectional view taken along the line 77 in X part of FIG. 1 in use thereof; and,

FIG. 8 is a reference perspective view showing the usable state thereof.

The broken lines depict environmental subject matter only and form no part of the claimed design.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD731448 *Apr 28, 2014Jun 9, 2015Ebara CorporationPolishing pad for substrate polishing apparatus
U.S. ClassificationD13/182