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Publication numberUSD654882 S1
Publication typeGrant
Application numberUS 29/389,555
Publication dateFeb 28, 2012
Filing dateApr 13, 2011
Priority dateOct 21, 2010
Publication number29389555, 389555, US D654882 S1, US D654882S1, US-S1-D654882, USD654882 S1, USD654882S1
InventorsManabu Honma, Katsuyuki Hishiya
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Gas-separating plate for reactor for manufacturing semiconductor
US D654882 S1
Abstract  available in
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  1. The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.

FIG. 1 is front perspective view of a gas-separating plate for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof; and,

FIG. 8 is a sectional view taken along line 8-8 of FIG. 2.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD787458 *Feb 19, 2016May 23, 2017Asm Ip Holding B.V.Gas supply plate for semiconductor manufacturing apparatus
U.S. ClassificationD13/182