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Publication numberUSD655258 S1
Publication typeGrant
Application numberUS 29/389,557
Publication dateMar 6, 2012
Filing dateApr 13, 2011
Priority dateOct 21, 2010
Publication number29389557, 389557, US D655258 S1, US D655258S1, US-S1-D655258, USD655258 S1, USD655258S1
InventorsManabu Honma, Katsuyuki Hishiya
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Side wall for reactor for manufacturing semiconductor
US D655258 S1
Abstract  available in
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  1. The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.

FIG. 1 is front perspective view of a side wall for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof; and,

FIG. 7 is a bottom view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD739832 *Dec 26, 2013Sep 29, 2015Hitachi Kokusai Electric Inc.Reaction tube
USD770993 *Feb 25, 2016Nov 8, 2016Hitachi Kokusai Electric Inc.Reaction tube
U.S. ClassificationD13/182