Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.

Patents

  1. Advanced Patent Search
Publication numberUSD655258 S1
Publication typeGrant
Application numberUS 29/389,557
Publication dateMar 6, 2012
Filing dateApr 13, 2011
Priority dateOct 21, 2010
Publication number29389557, 389557, US D655258 S1, US D655258S1, US-S1-D655258, USD655258 S1, USD655258S1
InventorsManabu Honma, Katsuyuki Hishiya
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Side wall for reactor for manufacturing semiconductor
US D655258 S1
Abstract  available in
Images(6)
Previous page
Next page
Claims(1)
    CLAIM
  1. The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.
Description

FIG. 1 is front perspective view of a side wall for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof; and,

FIG. 7 is a bottom view thereof.

Classifications
U.S. ClassificationD13/182