|Publication number||USD655261 S1|
|Application number||US 29/389,566|
|Publication date||Mar 6, 2012|
|Filing date||Apr 13, 2011|
|Priority date||Oct 21, 2010|
|Publication number||29389566, 389566, US D655261 S1, US D655261S1, US-S1-D655261, USD655261 S1, USD655261S1|
|Inventors||Manabu Honma, Katsuyuki Hishiya|
|Original Assignee||Tokyo Electron Limited|
|Export Citation||BiBTeX, EndNote, RefMan|
|Classifications (1) |
|External Links: USPTO, USPTO Assignment, Espacenet|
Gas-separating plate for reactor for manufacturing semiconductor
US D655261 S1
The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.
FIG. 1 is front perspective view of a gas-separating plate for reactor for manufacturing semiconductor illustrating our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top view thereof;
FIG. 7 is a bottom view thereof; and,
FIG. 8 is a sectional view taken along line 8-8 of FIG. 2.
The broken lines are shown for illustrative purposes only and form no part of the claimed design.