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Publication numberUSD655261 S1
Publication typeGrant
Application numberUS 29/389,566
Publication dateMar 6, 2012
Filing dateApr 13, 2011
Priority dateOct 21, 2010
Publication number29389566, 389566, US D655261 S1, US D655261S1, US-S1-D655261, USD655261 S1, USD655261S1
InventorsManabu Honma, Katsuyuki Hishiya
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Gas-separating plate for reactor for manufacturing semiconductor
US D655261 S1
Abstract  available in
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  1. The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.

FIG. 1 is front perspective view of a gas-separating plate for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof; and,

FIG. 8 is a sectional view taken along line 8-8 of FIG. 2.

The broken lines are shown for illustrative purposes only and form no part of the claimed design.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US20150329964 *May 8, 2015Nov 19, 2015Tokyo Electron LimitedFilm Forming Apparatus
USD787458 *Feb 19, 2016May 23, 2017Asm Ip Holding B.V.Gas supply plate for semiconductor manufacturing apparatus
USD796458 *Mar 22, 2016Sep 5, 2017Asm Ip Holding B.V.Gas flow control plate for semiconductor manufacturing apparatus
U.S. ClassificationD13/182