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Publication numberUSD658693 S1
Publication typeGrant
Application numberUS 29/401,106
Publication dateMay 1, 2012
Filing dateSep 7, 2011
Priority dateMar 30, 2011
Publication number29401106, 401106, US D658693 S1, US D658693S1, US-S1-D658693, USD658693 S1, USD658693S1
InventorsKouki Suzuki, Jun Yamashita, Masakazu Ban, Atsushi Ueda
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Liner for plasma processing apparatus
US D658693 S1
Abstract  available in
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  1. The ornamental design for a liner for plasma processing apparatus, as shown and described.

FIG. 1 is a front view of a liner for plasma processing apparatus showing our new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a sectional view taken along line 5-5 of FIG. 2 thereof; and,

FIG. 6 is a perspective view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD796562 *Apr 11, 2016Sep 5, 2017Applied Materials, Inc.Plasma outlet liner
U.S. ClassificationD15/138