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Publication numberUST105402 I4
Publication typeGrant
Application numberUS 06/603,263
Publication dateMay 7, 1985
Filing dateApr 23, 1984
Priority dateMar 10, 1983
Publication number06603263, 603263, US T105402 I4, US T105402I4, US-I4-T105402, UST105402 I4, UST105402I4
InventorsJagtar S. Basi, Eric Mendel
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Method for polishing amorphous aluminum oxide
US T105402 I4
A method for the chemical-mechanical polishing of amorphous aluminum oxide surfaces to a high degree of perfection is described. The aluminum oxide surfaces are continuously wetted with a water-citric acid slurry containing a soft abrasive material. The continuously wiping of the aluminum oxide surface is accomplished with a firm surface using pressure while maintaining a relative movement between the aluminum oxide surface and the firm surface to remove the water reacted aluminum oxide product from the high points of the aluminum oxide surface. This method is continued until a high degree of perfection of the surface is accomplished. The slurry is typically composed of colloidal silicon dioxide dispersed in water containing citric acid.
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Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US5391258 *May 26, 1993Feb 21, 1995Rodel, Inc.Compositions and methods for polishing
US5476606 *Jun 27, 1994Dec 19, 1995Rodel, Inc.Compositions and methods for polishing
US5700383 *Dec 21, 1995Dec 23, 1997Intel CorporationSlurries and methods for chemical mechanical polish of aluminum and titanium aluminide
US5858813 *May 10, 1996Jan 12, 1999Cabot CorporationChemical mechanical polishing a thin layer of metal or alloy with a slurry containing an abrasive, an oxidizing agent, and succinic acid
US6117783 *Jul 21, 1997Sep 12, 2000Ekc Technology, Inc.The chemical and mechanical polishing solution comprises a hydroxylamine compound and octyphenyl polyethylene
US6313039Jan 11, 2000Nov 6, 2001Ekc Technology, Inc.Chemical mechanical polishing composition and process
US6635186Jan 7, 1999Oct 21, 2003Ekc Technology, Inc.Chemical mechanical polishing composition and process
US7314823Aug 2, 2005Jan 1, 2008Dupont Airproducts Nanomaterials LlcChemical mechanical polishing composition and process
WO1994028194A1 *May 25, 1994Dec 8, 1994Rodel IncImproved compositions and methods for polishing
WO1998004646A1 *Jul 21, 1997Feb 5, 1998Ekc Technology IncChemical mechanical polishing composition and process
U.S. Classification252/79.1
International ClassificationB24B37/04
Cooperative ClassificationB24B37/04
European ClassificationB24B37/04