WO1990004857A1

WO1990004857A1 - EPITAXIAL Ba-Y-Cu-O SUPERCONDUCTOR FILM

Info

Publication number: WO1990004857A1
Application number: PCT/US1989/004226
Authority: WO
Inventors: Bruce Huai-Tzu Chai
Original assignee: Allied-Signal Inc.
Priority date: 1988-10-17
Filing date: 1989-09-27
Publication date: 1990-05-03
Also published as: DE68915288D1; JPH04501251A; CA1315649C; EP0438528A1; DE68915288T2; EP0438528B1; US4996187A

Abstract

Superconducting structures are composed of thin film of Ba-Y-Cu-O superconductor epitaxially deposited on a crystal substrate of SrLaA1O, SrLaGaO4, SrPrGaO4, SrNdGaO4, SrSmGaO4, SrEuGaO4, CaLaGaO4, CaPrGaO4, or CaNdGaO4.

Description

EPITAXIAL Ba-Y-Cu-O SUPERCONDUCTOR FILM

Background of the Invention and the Prior Art

Suggested applications of the recently discovered superconducting compounds, including superconducting ceramics composed of Ba-Y-Cu-O, include

microelectronics. In such applications, thin films of the superconductor would provide electronic circuits. Prior efforts to provide a Ba-Y-Cu-O thin film

superconductor include deposition thereof, by various means, onto crystalline substrates such as Si, GaAs, MgO, Al₂O₃, BaTiO₃, (BaSr)TiO₃, SrTiO₃, ZrO₂, glass and others. Although these deposited thin films were in some cases superconducting at liquid nitrogen

temperature, none were truly epitaxial; all were

polycrystalline. Depending on the method of

preparation, the grain size in these polycrystalline films may vary from a few hundredth of a micron to several micron. The reason for polycrystalline film formation on these substrates is found in lattice mismatch between substrate and film. Among the

substrates reported so far, SrTiO₃ has the closest lattice match (a = b = 3.905 Å) to Ba₂YCu3O_7-x (a = 3.824 Å, b = 3.884 Å). Indeed, film grown on SrTiO₃ had the best orientation and showed the highest critical current density of 10⁵ A/cm² at 77K, and 10° A/cm² at 4.2K (Oh et al., Appl. Phys. Lett. 51 , 852 (1987)).

Grain boundries in thin film superconductors are undesirable because they limit the performance of the material and introduce processing difficulties of making fine circuit patterns.

It is an object of the present invention to provide crystal substrates for epitaxial deposition of thin film Ba-Y-Cu-O type superconductors which provide

sufficiently close lattice match between substrate and film.

Summary of the Invention

I have found that certain K₂NiF₄-type structure compounds of the formulas SrLnAlO₄, SrLnGaO₄ and

CaLnGaO₄, wherein Ln represents certain rare earth elements specific to each of these compounds, provide reasonably close lattice match with the Ba-Y-Cu-O type superconductors, sufficient to permit epitaxial

deposition. In accordance with the present invention, there is provided a superconducting structure

comprising, in combination, a crystal substrate having a superconducting film epitaxially deposited thereon, wherein the substrate is a crystal selected from the group consisting of SrLaAlO₄, SrLaGaO₄, SrPrGaO₄,

SrNdGaO₄, SrSmGaO₄, SrEuGaO₄, CaLaGaO₄, CaPrGaO₄ and CaNdGaO₄, and wherein the superconducting film is a Ba- Y-Cu-O type superconductor, typically Ba₂YCu₃O_7-x where x is from about 0.1 to about 0.5.

Brief Description of the Drawings In the attached drawings, Fig. 1 is an x-ray diffraction pattern of a Ba-Y-Cu-O thin film on a cleaved (001) LaSrAlO₄ substrate, (diffraction aligned);

Fig. 2 is another x-ray diffraction pattern of a Ba-Y-Cu-O thin film on a cleaved (001) LaSrAlO₄

substrate (diffraction intentionally slightly misaligned to show the diffraction of the thin film);

Fig. 3 is a photomicrograph of annealed Ba-Y-Cu-O thin film on an LaSrAlO₄ substrate.

Detailed Description of the Invention, of the Preferred Embodiments, and of the Best Mode Presently

Contemplated for its Practice

In order to obtain epitaxial film growth on

crystalline substrates, reasonably close match of lattice dimensions between film and substrate is required. Thicker films (>1 μm) especially require better match than thinner films. Typically, lattice mismatch should not be more than about 0.5 percent;

preferably it is less than about 0.1 percent. Since the epitaxially deposited thin film is normally much thinner than the substrate, the tolerance under compression (substrate lattice smaller than the film lattice) is about twice that under tension. As can be seen from the data above, in the case of Ba-Y-Cu-O on SrTiO₃, the Ba- Y-Cu-O film is under tension in both the a and b

direction. The mismatch is -0.081 Å (or -2.12 percent) in the "a" direction, and -0.021 Å (or -0.54 percent) in the "b" direction. This mismatch results in

excessive tension which tends to break up the film into isolated islands.

Furthermore, the substrate material should not contain magnetic ions, such as Cr, Mn, Fe, Co or Ni, nor magnetic rare earth ions because these can have an adverse effect on the superconducting properties of the thin film (reduction of To due to splitting of Cooper pairs.

The substrate crystals employed in the

superconducting structures of the present invention have the K₂NiF₄ modified perovskite structure, which matches the structure of the superconductor film to be

epitaxially deposited thereon. The K₂NiF₄-type

structure has tetragonal symmetry. The atomic

arrangement on the (001) plane is identical to

perovskite, only the stacking arrangement along the C- axis is different. This matters not, since for

epitaxial growth of Ba-Y-Cu-O superconductor compounds the only concern for lattice match is in the (001) plane. The oxide analogs of K₂NiF₄ structure can be generalized as A²⁺B³⁺C³⁺O₄ wherein A is an alkaline earth metal, B is a rare earth ion, and C is Al or Ga. Obviously, many combinations are possible. The

substrate compounds of the present invention and their lattice dimensions and magnetic susceptibility are listed in the table below:

Of these, SrLaGaO₄, SrSmGaO₄ and CaLaGaO₄ are preferred, with SrLaGaO₄ and CaLaGaO₄ being more

preferred, and CaLaGaO₄ being the most preferred

compound.

The substrate crystals are prepared in conventional manner by mixing the oxide components in stoichiometric ratio, and heating the mixture in an appropriate furnace - e.g. a furnace equipped with R.F. heating coils - at temperature and for time sufficient to melt the charge, followed by slow cooling to form the crystal phase.

The oxide component raw materials should be of high purity, desirably at least about 99.99% purity. Their particle size is not critical, although fine powder form will aid in intimate mixing of the components, and facilitate initiation of the reaction. Once melting occurs, the reaction is reasonably fast, regardless of the particle size. No agitation is needed, and the heating rate is not a critical parameter. Melting of the oxides is desirably conducted in iridium vessels, in a low oxygen environment (less than about 1 vol. percent 02). These substrate compounds have melting points in the order of between about 1420° C to 1650° C . Once the melt is formed, it is held for a while at a temperature above melt temperature to permit completion of the reaction and to homogenize the melt

composition. Thereafter the melt is permitted to cool at a rate in the order of about 1 to 2°C/min. Cooling may take place in the melt crucible, in which case the melt freezes to form large grains, which then can be removed from the crucible and separated into single crystals. These crystals are then oriented in the desired plane, sliced and polished to provide substrates of the proper orientation.

To obtain larger substrates as are required for superconducting devices, it will ordinarily be desirable to conduct the crystal growth by the well known

Czochralski process, which produces single crystal boules, which are then oriented in the usual manner, sliced and polished to provide substrate surfaces for deposition of the superconducting thin film.

Another method for growing the substrates for the superconductor structures of the present invention is the method which has become known as the "Tyco" method (LaBelle et al., "Growth of Controlled Profice Crystal from the Melt: Part I Sapphire Filaments", Mat. Res. Bull. 6 (1971) 571-580). That method employs a shaped capillary orifice, e.g. a tubular, annular, or ribbon- shaped capillary orifice to maintain the liquid level constant during crystal growth and to determine the shape of the growing crystal. In that process, in essence, the melt is "pulled" from the outlet of the shaped orifice into which it is raised through capillary action, to solidify into a single crystal of

predetermined shape. The product crystal cross-section is determined by the shape of the orifice. The

resultant product being a single crystal, it is

eminently suited for deposition thereon of the Ba-Y-Cu-O superconductor to obtain a superconducting structure of the present invention. The Ba-Y-Cu-O type superconductors are known, as is their preparation. They have first been reported by Wu et al. (Phys. Rev. Lett. 58, 908 (1987)).

Ba-Y-Cu-O superconductors have been applied by various methods as thin films onto a number of different substrates, including Si, GaAs, MgO, Al₂O₃, ZrO₂,

BaTiO₃, (BaSr)Ti₃, SrTiO₃ and glass. These methods involved different deposition techniques for coating an oxidizable Ba, Y and Cu containing layer onto the surface of the substrate, generally followed by an oxidizing anneal. Any of these known methods may be used to deposit the Ba-Y-Cu-O type ceramic onto the substrates contemplated by the present invention to obtain the new epitaxial superconducting structures.

These methods include: application of metal

trifluoroacetate spin-on precursors (Appl. Phys. Lett. 52, 2077 (1988); electron beam co-evaporation of the metals (Appl. Phys. Lett. 52, 2072(1988); multi-layer evaporation process (Appl. Phys. Lett. 52, 2068 (1988); dc magnetron sputtering (Appl. Phys. Lett. 52, 1992

(1988); painting finely ground superconducting pellets suspended in binder on the substrate, followed by annealing in oxygen (Appl. Phys. Lett. 52, 1987 (1988)); triode sputtering (Appl. Phys. Lett. 52, 1904 (1988); application of nitrate solutions of the metals, followed by drying and oxidizing sintering (J. Cryst. Growth 85, 615 (1987)); reactive magnetron sputtering (J. Cryst. Growth 85, 619 (1987)); eximer laser evaporation and deposition (Appl. Phys. Lett. 51, 861 (1987), and Appl. Phys. Lett. 52 , 1834 (1988)).

Another method for applying the Ba-Y-Cu-O type superconductor onto the specific perovskite substrates to obtain the superconducting structures of the present invention involves organo-metallic chemical vapor deposition. An appropriate procedure thereof is described and claimed in commonly assigned copending U.S. Appl. Ser. No. 258,921 by K. Beeson, G. West and I. Golecki for "Chemical Vapor Deposition of

Superconducting Thin Films", filed of even date herewith (Attorney's Docket No. P.D. File 82-2671). Preparation of ceramic superconductor films by organo-metallic vapor deposition is also described in Extended Abstracts, Materials Research Society, Reno, Nevada, April 5-9, 1988, "High Temperature Superconductors II", p.141. See also Appl. Phys. Lett. 52 , 1743 (1988); Jap. J. Appl. Phys. 27 , L1265 (1988); Jap. J. Appl. Phys. 27, L1275 (1988).

The organo-metallic chemical vapor deposition procedure briefly involves passing a gas stream

containing the metal components (Ba, Y and Cu) in form of a thermally decomposable precursor compound

(typically a metal-organic compound or a metal-oxygen- organic compound) over the substrate, and thermally decomposing the compounds to deposit the metals (or metal oxides) onto the substrate. The gas stream contains the metal components in proper stoichiometric ratios so that the thin film of the ceramic

superconductor which is deposited on the substrate, after all appropriate treatment, contains the metal components in the desired ratio. Typical thermally decomposable compounds for this process include the metal beta-diketonates, metal organic ethers as well as certain metal salts of carboxylic acids. For copper, these include the copper acetylacetonate and the 2,4- pentanedionate as well as the hexafluoracetylacetonate or the 1,1,1,6,6,6-hexafluoro-2,4-pentanedionate; and for yttrium and barium these include the

acetylacetonates. All of these are commercially

available compounds.

The actual deposition occurs inside a chamber which may be partially evacuated or at atmospheric pressure. The chamber is provided with means for heating the substrate to effect thermal decomposition of the

precursor compound and deposition of the mixed metal and/or metal oxide film on the substrate. Most of the pecursors are solids at room temperature and must be heated to provide sufficient vapor pressure. Typically, the precursors are heated in separate reservoirs which are individually temperature controlled. An inert gas such as argon is flowed through the reservoirs, at rates determined to provide the metals in proper

stoichiometric proportions to act as carrier to

transport the vaporized precursor compounds to the decomposition chamber. Thereafter, the film so

deposited is typically annealed at temperatures in the order of about 900°C in an oxygen-containing atmosphere .

Example 1

Preparation of SrLaAlO₄ substrate The starting materials are equal molar amount of SrCO₃, La₂O₃ and Al₂O₃ powders of 99.99% purity. A total of 147.6 grams of SrCO₃, 325.8 grams of La₂O₃ and 102.0 grams of Al₂O₃ are mixed and placed in an 7.5cm diameter iridium crucible inside an nitrogen purged chamber to prevent oxidation of Ir crucible, and are heated by an RF heating coil. The SrLaAlO₄ melts at 1755°C. The melt is left to soak at temperature

slightly higher than melting temperature for a couple of hours to facilitate the reaction and to homogenize the melt composition. SrLaAlO₄ seed is dipped into the melt and the SrLaAlO₄ crystal is grown by the Czochralski pulling technique. Typical pulling rate is about 1 to 3 mm per hour and seed rotation rate is about 15 rpm. As the growth is completed the crystal is separated from the melt and cooled slowly to prevent cracking. The as grown crystal is then oriented by Laue x-ray photograph technique on an goniometer head. The substrate

orientation is (001). The crystal boule is then sliced and polished to produce substrate wafers. Example 2

Deposition of thin film epitaxial Ba-Y-Cu-O onto an

SrLaAlO₄ substrate by CVP

The metalorganic precursors are yttrium 2,2,6,6- tetramethyl-3,5-heptanedionate [Y(thd)₃], barium

2,2,6,6-tetramethyl-3,5-heptanedionate [Ba(thd)₂] and copper 2,2,6,6-tetramethy1-3,5-heptanedionate

[Cu(thd)₂]. The Y(thd)₃, Ba(thd)₂ and Cu(thd)₂ are kept in separate heated reserviors at temperatures of 121°C, 205°C and 122°C, respectively. Argon gas flows through each reservior at a rate of 10 seem (standard cubic centimeters per minute) to act as a carrier. The three gas streams are combined and mixed with 90 seem of oxygen before entering the deposition chamber. The deposition chamber is a 2 inch diameter fused silica tube positioned inside a tube furnace and heated to 450°C. The total pressure inside the chamber is

maintained at 0.5 Torr by a vacuum pump and throttling valve. Sample substrates, in this case SrLaAlO₄ are placed inside the chamber and deposition is allowed to proceed for 1 hour resulting a film approximately 0.5 micron thick. After 1 hour the metaorganic precursor flows are stopped, the chamber pressure is increased to 1 atmosphere, and the samples are in situ annealed for 1 hour in a flow of 300 seem oxygen. A subsequent second anneal at 900°C for 30 minutes in flowing oxygen (300 seem) followed by slow cooling to room temperature results in the formation of the Y-Ba-Cu-0 1-2-3 crystal phase.

Example 3

Preparation of CaLaGaO₄ substrate Following the procedure of Example 1 the CaLaGaO₄ substrate is prepared employing equal number amounts of

CaO, La₂O₃ and Ga₂O₃. Example 4

Deposition of thin film Ba-Y-Cu-O onto an CaLaGaO₄ substrate by DC magnetron sputtering A stoichiometric YBa₂Cu₃O_7-x disk prepared by a standard sintering process (sintered at 900°C followed by slow cooling in oxygen atmosphere) is used as

target. A cleaned CaLaGaO₄ substrate, obtained as described in Example 3. above, is used for deposition. The sputtering chamber is pre-pumped to

10^-6 Pa and 1 Pa oxygen is introduced in the chamber mixed with argon with a total 5 Pa pressure. Sputtering is achieved with voltage of 200V and current of 0.4A. The deposited film is subsequently annealed for 1 min at 900°C in oxygen.

Example 5

Deposition of thin film Ba-Y-Cu-O onto a SrLaGaO₄ substrate by sol-gel deposition procedure The SrLaGaO₄ substrate is prepared from equimolar amounts of 99.99% + purity of the oxides of Sr,La and Ga, following the procedure of Example 1.

The YBa₂Cu₃O_7-x thin film is deposited onto the substrate thus obtained by spin casting the partially hydrolyzed stock solution onto a single crystal

substrate of LaA10₃. The stock solution is a mixture of copper (II) ethoxide/toulene suspension with Ba- methoxyethoxide and Y-methoxythoxide in the Y:1, Ba:2, Cu:3 molar ratio. The resulting film (about 1000 Åin thickness) is then dried in an oven and fired in a flow of oxygen at 850°C for about 30 minutes. It then cools slowly (100°C/hr) to room temperature. Ref : S.A. Kramer et al., Apply. Phys. Lett. 53, 156 (1988).

Lattice matching can be greatly improved by cutting the substrate in the form of a wafer tilted relative to the (001) plane. The Ba-Y-Cu-O superconductor compound is orthorhombic in symmetry with a = 3.824 A and b = 3.884 A. Tilting therefor is only applicable to substrates having dimensions smaller than 3.884 Å. Moreover, for practical purposes, a single tilt is recommended for ease of orientation, and because double tilting will generate undesirable twisting

deformation. The expedient of using tilted cuts to accommodate lattice mismatch has previously been resorted to for growing GaAs epitaxial layers on Si substrates (Fisher et al., J. Appl. Phys. 60, 1640 (1986). The optimum tilt angles relative to the (001) plane in the b direction for the substrates used for making the superconducting structures of the present invention are listed in Table 2 below:

Since various changes and modifications may be made in the invention without departing from its spirit and essential characteristics, it is intended that all matter contained in the description shall be interpreted as illustrative only and not in a limiting sense, the scope of the invention being defined by the appended claims.

Claims

I Claim :

1. A superconducting structure comprising, in combination, a crystal substrate having a

superconducting film epitaxially deposited thereon, wherein wherein the substrate is a crystal selected from the group consisting of SrLaAlO₄, SrLaGaO₄, SrPrGaO₄, SrNdGaO₄, SrSmGaO₄, SrEuGaO₄, CaLaGaO₄, CaPrGaO₄ and CaNdGaO₄, and wherein the superconducting film is a Ba- Y-Cu-O type superconductor.

2. The structure of claim 1 wherein the substrate is a crystal of SrLaGaO₄, SrSmGaO₄, or CaLaGaO₄.

3. The structure of claim 1 wherein the substrate is a crystal of SrSmGaO₄.

4. The structure of claim 1 wherein the substrate is a crystal of CaLaGaO₄.

5. The structure of claim 1 wherein the Ba-Y-Cu-D type superconductor has the formula Ba₂YCu₃O_7-x wherein x is from about 0.1 to about 0.5.

6. The structure of claim 5 wherein the substrate is a crystal of SrLaGaO₄, SrSmGaO₄, or CaLaGaO₄.

7. The structure of claim 5 wherein the substrate is a crystal of SrSmGaO₄.

8. The structure of claim 5 wherein the substrate is a crystal of CaLaGaO₄.

9. The structure of claim 5 wherein the substrate crystal is oriented in the (001) direction.

10. The structure of claim 5 wherein the substrate crystal has been obtained by the Czochralski process.