WO1996024839A2 - Method and apparatus for predicting process characteristics of polyurethane pads - Google Patents

Method and apparatus for predicting process characteristics of polyurethane pads Download PDF

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Publication number
WO1996024839A2
WO1996024839A2 PCT/US1996/001027 US9601027W WO9624839A2 WO 1996024839 A2 WO1996024839 A2 WO 1996024839A2 US 9601027 W US9601027 W US 9601027W WO 9624839 A2 WO9624839 A2 WO 9624839A2
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WO
WIPO (PCT)
Prior art keywords
pad
measuring
wafer
mechanical planarization
chemical mechanical
Prior art date
Application number
PCT/US1996/001027
Other languages
French (fr)
Other versions
WO1996024839A3 (en
Inventor
Scott G. Meikle
Guy F. Hudson
Original Assignee
Micron Technology, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology, Inc. filed Critical Micron Technology, Inc.
Priority to DE69635984T priority Critical patent/DE69635984T2/en
Priority to JP52428596A priority patent/JP3203254B2/en
Priority to AU51683/96A priority patent/AU5168396A/en
Priority to EP96908448A priority patent/EP0809798B1/en
Publication of WO1996024839A2 publication Critical patent/WO1996024839A2/en
Publication of WO1996024839A3 publication Critical patent/WO1996024839A3/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for

Definitions

  • This invention relates to the use of chemical mechanical planarization (CMP) in the manufacture of semiconductor integrated circuits and more particularly to prediction of performance characteristics of polyurethane pads used for CMP of semiconductor wafers.
  • CMP chemical mechanical planarization
  • CMP chemical mechanical planarization
  • the polishing pad is typically formed of a polyurethane material.
  • Downward pressure on the wafer against the pad, rotational speed of the wafer and the pad, slurry content and pad characteristics determine the rate at which material is removed from the surface of the wafer, and the uniformity of the resulting wafer surface.
  • the conditioning process comprises a controlled abrasion of the polishing pad surface for the purpose of returning the pad to a state where it can sustain polishing.
  • the ability of the conditioning process to return the pad to a state where it can efficiently planarize an additional wafer is dependent upon the pad itself and the conditioning parameters. After planarizing several hundred wafers, the pad may no longer be useful for planarizing wafers despite the conditioning process.
  • a measurement of chemical bonding of polymer chains within a polyurethane pad manufactured for chemical mechanical planarization (CMP) of semiconductor wafers is used to predict performance characteristics of the pad, and to adjust process parameters for the subsequent manufacture of additional polyurethane pads.
  • CMP chemical mechanical planarization
  • one pad or a portion of a pad from the manufacturing lot is soaked in an organic solvent which causes the pad material to swell. It is believed that the relative increase in size is indicative of chemical bonding of polymer chains within the pad. The increase in pad size is indicative of the performance characteristics of the pad.
  • Statistical Process Control methods are used to optimize the pad manufacturing process.
  • a manufacturing lot may consist of any number of pads which are deemed to have been manufactured under conditions which tend to cause all pads within the lot to have very similar performance characteristics. Measurements of pad performance predictors allow predicted pad characteristics to be available for each pad. The predicted performance characteristics may be used as a measure of quality of the pad, and may also be provided to pad end users.
  • Pad characteristic measurements may be taken before any wafers are planarized. Measurements may also be taken after each wafer is planarized or at intervals throughout the life of the pad. Repeated use of the pad impacts the polishing/planarizing ability of the pad.
  • polyurethane pads are often exposed to high pH (9.0 to 13.0) and high temperature (0 to 90C) environments. A correlation between fluorescence characteristics and pad performance has been noted in pads that have been exposed to such conditions.
  • in-situ fluorescence measurements of the pad are performed. The fluorescence characteristics of the pad are also believed to be indicative of the chemical bonding of polymer chains within the pad, and are used to predict the effect conditioning will have on the pad. The predicted effect of conditioning is then used to predict performance characteristics of the pad.
  • the measurement of pad fluorescence characteristics also allows for worn or substandard pads to be replaced prior to wafer processing.
  • FIG. 1 is a plot of fluorescence wavelength versus intensity for a CMP pad
  • FIG. 2 is a plot of fluorescence wavelength peak divided by 436 nanometers versus wafer material removal rate of a CMP pad
  • FIG. 3 is a plot of pad swelling versus wafer material removal rate
  • FIG. 4 is a diagram of an apparatus for in-situ measurement of the fluorescence characteristics of a CMP pad.
  • FIG. 1 shows the fluorescence properties of a typical polyurethane CMP pad before (PRE) and after (POST) a five hour exposure to a pH 10.5 solution at a temperature of 60C. After exposure, there is a shift in the spectra to shorter wavelengths. The amount of shift varies from pad to pad. Two characteristic intensity peaks are noted in the spectra. One at approximately 436 nanometers and a second maximum peak at a wavelength which varies from pad to pad.
  • a pad is exposed to the high pH and high temperature environment prior to making the fluorescence measurement so that the measurement is made after the characteristic shift in wavelengths.
  • FIG. 2 shows a plot of maximum fluorescence intensity divided by the intensity at 436 nanometers versus the planarization rate of a semiconductor device wafer.
  • This plot shows a relationship between the fluorescence characteristics of the CMP pad and the pad's ability to planarize a semiconductor wafer.
  • the planarizing rate is also related to the process stability, defect density and uniformity of the processed wafer. Knowledge of the performance characteristics of the pad allows for substandard pads to be rejected prior to use, this in turn reduces the amount of wafer material needed to be scrapped.
  • FIG. 3 is a plot of the swelling of a portion of a CMP pad soaked in N- Methyl-2-pyrrolidone (NMP) for twenty-four hours versus the rate of planarization of a semiconductor device wafer which is planarized by the pad. Increases in swelling beyond twenty-four hours are not very large; however, longer or shorter periods of time may be used.
  • the swelling measurement shown is a measurement of increase in pad area. The increase in pad volume, or simply the increase in length of a strip of pad material may also be used. Greater swelling indicates that the planarization rate will be lower. It is believed that other organic solvents such as MEK, MIBK, THF, Xylene and MeC12 may be used with similar results.
  • the plots of FIGs. 1, 2 and 3 show that measurements of polyurethane pad characteristics can be used to predict the planarization characteristics of the pad.
  • the predicted planarization characteristics allow for a determination of planarization time in a CMP process.
  • Predicted planarization characteristics of a CMP pad can also be used for process control and quality control in the manufacture of CMP pads. This data may be sent with the pads to CMP pad customers in the form of predicted planarization characteristics for particular CMP processes.
  • the inventive method of measuring pad characteristics may be used to perform incoming inspection on the pads. Substandard pads can be rejected before they are ever used.
  • FIG. 4 shows an in-situ method of measuring fluorescence characteristics of CMP pads in a CMP apparatus.
  • a pad 10 is secured to a platen 20 which is rotateable.
  • a radiation source 30 is secured above the pad surface.
  • the radiation source may be a source of ultraviolet light which is directed at the pad.
  • the wavelength of the source is preferably below 350 nanometers.
  • An electromagnetic radiation detection device, or photodetector, 40 is mounted above the pad surface. Emission from the pad is typically in the range of 200 nanometers to 800 nanometers.
  • a measure of intensity versus wavelength of electromagnetic radiation is used to determine when the pad should be replaced, and how the pad will perform when processing wafers. This prediction of pad performance is used to adjust the CMP process variables in order to achieve consistent CMP results with fewer end point detection measurement requirements.

Abstract

A measurement of polyurethane pad characteristics is used to predict performance characteristics of polyurethane pads used for chemical mechanical planarization (CMP) of semiconductor wafers, and to adjust process parameters for manufacturing polyurethane pads. In-situ fluorescence measurements of a pad that has been exposed to a high pH and high temperature environment are performed. The fluorescence characteristics of the pad are used to predict the rate of planarization of a wafer. A portion of one pad from a manufacturing lot is soaked in an organic solvent which causes the portion to swell. The relative increase in size is indicative of the performance characteristics of pads within the manufacturing lot. Statistical Process Control methods are used to optimize the CMP pad manufacturing process. Predicted pad characteristics are available for each pad.

Description

METHOD AND APPARATUS FOR PREDICTING PROCESS
CHARACTERISTICS OF POLYURETHANE PADS
This invention relates to the use of chemical mechanical planarization (CMP) in the manufacture of semiconductor integrated circuits and more particularly to prediction of performance characteristics of polyurethane pads used for CMP of semiconductor wafers.
During fabrication of integrated circuits, it is often desirable to planarize and/or polish the surface of a semiconductor wafer. One method of performing these tasks is referred to as chemical mechanical planarization (CMP). In general, the CMP process involves rotation or random movement of a wafer on a polishing pad in the presence of a polishing slurry. The polishing pad is typically formed of a polyurethane material.
Downward pressure on the wafer against the pad, rotational speed of the wafer and the pad, slurry content and pad characteristics determine the rate at which material is removed from the surface of the wafer, and the uniformity of the resulting wafer surface.
Determination of how long a wafer should be planarized or polished has proven to be a difficult task. An apparatus and method for in-situ measurement of the thickness of a material to be planarized for CMP end point determination is described in U.S. Patent No. Re. 34,425 to Schultz. Methods of controlling the pressure exerted on the wafer against the pad, rotational speed or random movement of the wafer on the pad and slurry composition are well known in the art. Condition and performance characteristics of the polyurethane pad are more difficult to determine. The ability of a pad to planarize the surface of a wafer varies substantially from pad to pad and over the life of an individual pad.
After a wafer has been through the CMP process the pad will be conditioned to prepare it for another wafer. The conditioning process comprises a controlled abrasion of the polishing pad surface for the purpose of returning the pad to a state where it can sustain polishing. The ability of the conditioning process to return the pad to a state where it can efficiently planarize an additional wafer is dependent upon the pad itself and the conditioning parameters. After planarizing several hundred wafers, the pad may no longer be useful for planarizing wafers despite the conditioning process.
The ability to predict performance characteristics of new and used polyurethane pads would be a great benefit to users and manufacturers of such pads.
A measurement of chemical bonding of polymer chains within a polyurethane pad manufactured for chemical mechanical planarization (CMP) of semiconductor wafers is used to predict performance characteristics of the pad, and to adjust process parameters for the subsequent manufacture of additional polyurethane pads.
After manufacturing a lot, one pad or a portion of a pad from the manufacturing lot is soaked in an organic solvent which causes the pad material to swell. It is believed that the relative increase in size is indicative of chemical bonding of polymer chains within the pad. The increase in pad size is indicative of the performance characteristics of the pad. Statistical Process Control methods are used to optimize the pad manufacturing process. A manufacturing lot may consist of any number of pads which are deemed to have been manufactured under conditions which tend to cause all pads within the lot to have very similar performance characteristics. Measurements of pad performance predictors allow predicted pad characteristics to be available for each pad. The predicted performance characteristics may be used as a measure of quality of the pad, and may also be provided to pad end users.
Pad characteristic measurements may be taken before any wafers are planarized. Measurements may also be taken after each wafer is planarized or at intervals throughout the life of the pad. Repeated use of the pad impacts the polishing/planarizing ability of the pad. During the CMP process, polyurethane pads are often exposed to high pH (9.0 to 13.0) and high temperature (0 to 90C) environments. A correlation between fluorescence characteristics and pad performance has been noted in pads that have been exposed to such conditions. In order to predict future performance of a used pad, in-situ fluorescence measurements of the pad are performed. The fluorescence characteristics of the pad are also believed to be indicative of the chemical bonding of polymer chains within the pad, and are used to predict the effect conditioning will have on the pad. The predicted effect of conditioning is then used to predict performance characteristics of the pad. The measurement of pad fluorescence characteristics also allows for worn or substandard pads to be replaced prior to wafer processing.
The features of the invention as well as objects and advantages will be best understood by reference to the appended claims, detailed description of particular embodiments and accompanying drawings where:
FIG. 1 is a plot of fluorescence wavelength versus intensity for a CMP pad; FIG. 2 is a plot of fluorescence wavelength peak divided by 436 nanometers versus wafer material removal rate of a CMP pad;
FIG. 3 is a plot of pad swelling versus wafer material removal rate; and
FIG. 4 is a diagram of an apparatus for in-situ measurement of the fluorescence characteristics of a CMP pad.
FIG. 1 shows the fluorescence properties of a typical polyurethane CMP pad before (PRE) and after (POST) a five hour exposure to a pH 10.5 solution at a temperature of 60C. After exposure, there is a shift in the spectra to shorter wavelengths. The amount of shift varies from pad to pad. Two characteristic intensity peaks are noted in the spectra. One at approximately 436 nanometers and a second maximum peak at a wavelength which varies from pad to pad. In a preferred embodiment of the invention, a pad is exposed to the high pH and high temperature environment prior to making the fluorescence measurement so that the measurement is made after the characteristic shift in wavelengths.
FIG. 2 shows a plot of maximum fluorescence intensity divided by the intensity at 436 nanometers versus the planarization rate of a semiconductor device wafer. This plot shows a relationship between the fluorescence characteristics of the CMP pad and the pad's ability to planarize a semiconductor wafer. The planarizing rate is also related to the process stability, defect density and uniformity of the processed wafer. Knowledge of the performance characteristics of the pad allows for substandard pads to be rejected prior to use, this in turn reduces the amount of wafer material needed to be scrapped.
FIG. 3 is a plot of the swelling of a portion of a CMP pad soaked in N- Methyl-2-pyrrolidone (NMP) for twenty-four hours versus the rate of planarization of a semiconductor device wafer which is planarized by the pad. Increases in swelling beyond twenty-four hours are not very large; however, longer or shorter periods of time may be used. The swelling measurement shown is a measurement of increase in pad area. The increase in pad volume, or simply the increase in length of a strip of pad material may also be used. Greater swelling indicates that the planarization rate will be lower. It is believed that other organic solvents such as MEK, MIBK, THF, Xylene and MeC12 may be used with similar results.
The plots of FIGs. 1, 2 and 3 show that measurements of polyurethane pad characteristics can be used to predict the planarization characteristics of the pad. The predicted planarization characteristics allow for a determination of planarization time in a CMP process. Predicted planarization characteristics of a CMP pad can also be used for process control and quality control in the manufacture of CMP pads. This data may be sent with the pads to CMP pad customers in the form of predicted planarization characteristics for particular CMP processes. The inventive method of measuring pad characteristics may be used to perform incoming inspection on the pads. Substandard pads can be rejected before they are ever used.
FIG. 4 shows an in-situ method of measuring fluorescence characteristics of CMP pads in a CMP apparatus. A pad 10 is secured to a platen 20 which is rotateable. A radiation source 30 is secured above the pad surface. The radiation source may be a source of ultraviolet light which is directed at the pad. The wavelength of the source is preferably below 350 nanometers. Prior to and/or after conditioning, the radiation source is used to cause the pad to fluoresce. An electromagnetic radiation detection device, or photodetector, 40 is mounted above the pad surface. Emission from the pad is typically in the range of 200 nanometers to 800 nanometers.
A measure of intensity versus wavelength of electromagnetic radiation is used to determine when the pad should be replaced, and how the pad will perform when processing wafers. This prediction of pad performance is used to adjust the CMP process variables in order to achieve consistent CMP results with fewer end point detection measurement requirements.
While the present invention has been described with reference to specific preferred embodiments, alternate embodiments and modifications may be employed by persons skilled in the art without departing from the scope of the invention as defined by the following claims.

Claims

CLAIMS:
1. A method for predicting performance characteristics of a pad for use in chemical mechanical planarization, the method comprising steps of:
measuring chemical bonding of polymer chains within the pad to obtain a measured value; and
predicting performance characteristics of the pad based on the measured value.
2. The method of claim 1, wherein said step of measuring comprises measuring a fluorescence characteristic of the pad.
3. The method of claim 2, wherein said step of measuring a fluorescence characteristic is performed while the pad is attached to an apparatus for chemical mechanical planarization.
4. The method of claim 1, wherein said step of measuring comprises the steps of:
soaking the pad in an organic solvent; and
measuring a change in size of the polyurethane pad.
5. A method for predicting performance characteristics of a pad for use in chemical mechanical planarization, the method comprising steps of:
irradiating a pad with an ultraviolet light source;
measuring radiation intensity versus wavelength from the pad to obtain a measured value; and
predicting performance characteristics of the pad based on the measured value.
6. A method of adjusting process parameters in a chemical mechanical planarization pad manufacturing process, comprising steps of:
measuring a characteristic of the pad which is indicative of chemical bonding within the pad; and
adjusting the process parameters to achieve a desired measure of the characteristic in subsequently manufactured pads.
7. The method of claim 6, wherein said step of measuring comprises:
soaking the pad in an organic solvent.
8. The method of claim 6, wherein said step of measuring comprises:
measuring a fluorescence characteristic of the pad.
9. A method for polishing a wafer, comprising steps of:
measuring a parameter indicative of chemical bonding within a pad to obtain a measured value; and
polishing a wafer with the pad for a period of time which is dependent upon the measured value.
10. The method of claim 9, wherein said step of measuring comprises measuring a fluorescence characteristic of the pad.
11. The method of claim 9, further comprising:
exposing the pad to a solution having a pH of between 9.0 and 13.0 prior to said step of measuring.
12. The method of claim 9, further comprising:
exposing the pad to a temperature of between 0C and 90C prior to said step of measuring.
13. The method of claim 9, further comprising:
exposing the pad to a solution having a pH of between 9.0 and 13.0 and to a temperature of between 0C and 90C prior to said step of measuring.
14. The method of claim 9, further comprising:
conditioning the pad after polishing the wafer.
15. A method for manufacturing an integrated circuit, comprising:
forming a layer of material on a wafer substrate; and
polishing the wafer in a chemical mechanical planarization apparatus for a period of time dependent upon a measurement of chemical bonding of polymer chains within a pad attached to the chemical mechanical planarization apparatus.
16. An apparatus for chemical mechanical planarization of a wafer, comprising:
a polishing platen for securing a pad; and
a measuring apparatus to measure chemical bonding of polymer chains within the pad while the pad is secured to said polishing platen.
17. The apparatus according to claim 16, wherein;
said measuring apparatus comprises a means for measuring a fluorescence characteristic of the pad.
18. The apparatus according to claim 17, wherein;
said measuring apparatus further comprises an ultraviolet light source.
19. An apparatus for predicting performance characteristics of a pad, comprising:
a radiation source for irradiating a pad; and
an electromagnetic radiation detection device for measuring radiation from the pad.
20. The apparatus according to claim 19, wherein said radiation source is an ultraviolet light source.
21. The apparatus according to claim 19, wherein electromagnetic radiation detection device is a photodetector.
PCT/US1996/001027 1995-02-09 1996-01-30 Method and apparatus for predicting process characteristics of polyurethane pads WO1996024839A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE69635984T DE69635984T2 (en) 1995-02-09 1996-01-30 METHOD FOR POLISHING A WATER AND METHOD FOR PRODUCING AN INTEGRATED CIRCUIT
JP52428596A JP3203254B2 (en) 1995-02-09 1996-01-30 Method and apparatus for predicting process characteristic values of polyurethane pad
AU51683/96A AU5168396A (en) 1995-02-09 1996-01-30 Method and apparatus for predicting process characteristics of polyurethane pads
EP96908448A EP0809798B1 (en) 1995-02-09 1996-01-30 Method for polishing a wafer and method for manufacturing an integrated circuit

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/386,023 1995-02-09
US08/386,023 US5698455A (en) 1995-02-09 1995-02-09 Method for predicting process characteristics of polyurethane pads

Publications (2)

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WO1996024839A2 true WO1996024839A2 (en) 1996-08-15
WO1996024839A3 WO1996024839A3 (en) 1996-09-26

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EP (1) EP0809798B1 (en)
JP (1) JP3203254B2 (en)
KR (1) KR100236499B1 (en)
AT (1) ATE321627T1 (en)
AU (1) AU5168396A (en)
DE (1) DE69635984T2 (en)
WO (1) WO1996024839A2 (en)

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MAT.REX.SOC.SYMP.PROC., vol. 337, 4 April 1994, PITTSBURGH, PA, USA, pages 121-131, XP000563165 R. JAIRATH ET AL.: "consumables for the chemical mechanical polishing (CMP) of dielectrics and conductors" *
MATER. RES. SOC. SYMP. PROC., vol. 260, 27 April 1992, PITTSBURGH, PA, USA, pages 53-64, XP000577620 S. SIVARAM ET AL.: "chemical mechanical polishing of interlevel dielectrics: models for emoval rate and planarity" *
See also references of EP0809798A2 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7413986B2 (en) 2001-06-19 2008-08-19 Applied Materials, Inc. Feedforward and feedback control for conditioning of chemical mechanical polishing pad
SG153668A1 (en) * 2003-03-25 2009-07-29 Neopad Technologies Corp Customized polish pads for chemical mechanical planarization

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DE69635984D1 (en) 2006-05-18
ATE321627T1 (en) 2006-04-15
US6114706A (en) 2000-09-05
JP3203254B2 (en) 2001-08-27
WO1996024839A3 (en) 1996-09-26
JPH10508799A (en) 1998-09-02
AU5168396A (en) 1996-08-27
US6440319B1 (en) 2002-08-27
EP0809798A2 (en) 1997-12-03
KR19980702034A (en) 1998-07-15
US5698455A (en) 1997-12-16
EP0809798B1 (en) 2006-03-29
DE69635984T2 (en) 2007-01-11
KR100236499B1 (en) 2000-01-15

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