WO1996041034A1 - Electrically tunable coatings - Google Patents
Electrically tunable coatings Download PDFInfo
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- WO1996041034A1 WO1996041034A1 PCT/US1996/008820 US9608820W WO9641034A1 WO 1996041034 A1 WO1996041034 A1 WO 1996041034A1 US 9608820 W US9608820 W US 9608820W WO 9641034 A1 WO9641034 A1 WO 9641034A1
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- coating
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- atomic
- silicon
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/448—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications characterised by the additives used
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
- A61L27/28—Materials for coating prostheses
- A61L27/30—Inorganic materials
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
- A61L27/28—Materials for coating prostheses
- A61L27/30—Inorganic materials
- A61L27/303—Carbon
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
- A61L27/28—Materials for coating prostheses
- A61L27/30—Inorganic materials
- A61L27/306—Other specific inorganic materials not covered by A61L27/303 - A61L27/32
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5001—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with carbon or carbonisable materials
- C04B41/5002—Diamond
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45568—Porous nozzles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B12/00—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material
- F42B12/72—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the material
- F42B12/76—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the material of the casing
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
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- A61F—FILTERS IMPLANTABLE INTO BLOOD VESSELS; PROSTHESES; DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF, TUBULAR STRUCTURES OF THE BODY, e.g. STENTS; ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES; FOMENTATION; TREATMENT OR PROTECTION OF EYES OR EARS; BANDAGES, DRESSINGS OR ABSORBENT PADS; FIRST-AID KITS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Definitions
- the present invention relates to electrically tunable coatings for substrates.
- DLCs diamond-like coatings
- DLC coatings available in the field often display superior thermal characteristics, but have been susceptible to ablation, or long-term adherence problems.
- No known DLC material adequately imparts all of the necessary characteristics to substrate materials used as dielectrics; for example, insulators in electronics, and especially devices used in plasma- related devices.
- DLCs often have adherence problems which require depositing additional interlayers between the DLC and the substrate.
- intrinsic stresses limit the allowable deposition thickness of the DLC. While thicker DLCs may be desirable to protect the substrate, delamination of the DLC from the interlayer and the substrate will result if the DLC is deposited onto the substrate to form an overly thick DLC layer.
- the dielectric coating selected must inhibit dielectric "breakdown” whereby current passes through the coating to, or even through, the substrate.
- the material used as the dielectric coating must also inhibit “flashover” whereby some of the charge at one conductive point on the coating surface passes over the surface to another conductive point, eroding the surface between and around the conductive points.
- DLCs may perform well initially as dielectric coatings. However, over time, exposure to high currents leads to the graphitization of the carbon in the DLC network. Upon graphitization, the DLCs becomes more conductive, thereby frustrating the purpose for the coating as a dielectric material and rendering the substrate useless, or at least more conductive than is desired.
- the lack of an adequately coated and insulated electrical component often results in the failure or shorter lifetime of the device served by the component . Further, radiation effects, including ultraviolet radiation and ion-bombardment often accelerate DLC deterioration through erosion or graphitization of the DLC coating.
- the present invention relates to electrically tunable coatings for use as superior dielectric coatings.
- the present invention is directed to a method of inhibiting conductivity on a substrate by applying to said substrate a tunable dielectric coating formed from a diamond-like solid-state material comprising interpenetrating atomic scale networks of a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from groups l-7b and 8 of the periodic table.
- the present invention is directed to a method of selectively modifying the conductivity of a substrate by applying to said substrate a tunable coating made from a diamond-like material having interpenetrating atomic scale networks comprising a first diamond-like carbon network stabilized by hydrogen, a second glass-like silicon network stabilized by oxygen, and optionally at least one network of dopant elements or dopant compounds having elements from groups 1 to 7b and 8 of the periodic table.
- the present invention is directed to a tunable coating formed from a diamond- like solid-state material comprising an interpenetrating diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one network of dopant elements or dopant compounds having elements from groups l-7b and 8 of the periodic table.
- an electrically tunable coating having a predetermined resistivity is disclosed, said coating being made from a class of diamond-like solid state materials formed from interpenetrating networks, said networks comprising a first diamond-like carbon network stabilized by hydrogen, a second silicon network stabilized by oxygen and, optionally, at least one network of dopant elements, or compounds having elements from groups l-7b and 8 of the periodic table.
- the present invention is directed to an electrically tunable material with a selectively modified resistivity made from a substrate and a tunable coating on the substrate, said coating made from a class of diamond-like solid state materials formed from interpenetrating networks, said networks comprising a first network of carbon in a diamond-like carbon network stabilized by hydrogen, a second silicon network stabilized by oxygen and, optionally, at least one network of dopant elements, or compounds having elements from groups l-7b and 8 of the periodic table.
- FIG. 1 is a schematic diagram showing the principle microstructure of two-network (A) , intermediate (B) , and three-network (C) nanocomposites.
- FIG. 2 is a schematic diagram showing the dependence of electrical resistivity on concentration for the case of a W-DLN nanocomposite.
- FIG. 3 is a schematic diagram showing the dependence of electrical resistivity on temperature for a W-alloyed film.
- FIG. 4 is a cross section view of the deposition chamber for the deposition of the DLNs.
- FIG. 5 is a cross section view of the deposition chamber for the deposition of DLNs using a reflecting electrode.
- FIG. 6 is a cross section view of a preferred deposition chamber using a plasma source integrally located within the chamber.
- the present invention relates to a method of selectively modifying conductivity on a substrate by applying to said substrate an electrically tunable coating made from a diamond-like solid-state material having interpenetrating atomic scale networks of carbon in a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from groups l-7b and 8 of the periodic table.
- the fundamental structure of the preferred tunable dielectric coatings of the present invention are atomic scale diamond-like nanocomposites (DLNs) .
- DLNs are comprised of two or more self-stabilized random networks. Each network is itself stabilized chemically, while both networks also structurally stabilize each other.
- An example of a material with such a structure is the diamond-like nanocomposite (DLN) which is the subject of U.S. Patent No. 5,352,493 and U.S. Serial No. 08/249,167 filed May 24, 1994.
- DLN diamond-like nanocomposite
- a first random carbon network mainly in the form of "diamond ⁇ like” bonds is chemically stabilized by hydrogen atoms.
- a second glass-like silicon network is chemically stabilized by oxygen atoms, resulting in a purely amorphous structure.
- the tunability of the coating may be achieved by varying the content and concentration of the optional additional networks made from dopant elements or dopant compounds. The tunability desired is also achieved by closely controlling the deposition conditions of the coatings.
- Amorphous refers to a random structure or arrangement of atoms in a solid state that results in no long range regular ordering, and lacks crystallinity or granularity. Such DLNs contain no clusters or ordering greater than about 10 Angstroms. This absence of clusters at the atomic scale is a key characteristic of the DLN coatings of the present invention. Clusters can destroy the amorphous nature of the structure, and can serve as active centers of degradation.
- the atomic structure of the class of diamond ⁇ like nanocomposite (DLN) solid state materials of the present invention is shown in FIG. 1(A) .
- the DLNs may have one or more additional separate disordered networks of dopants, as shown in FIG. 1(B) and 1(C) .
- the dopants may be any one, or a combination of transition metals and non-metals of the groups lb-7b and 8 of the periodic table, with all three types of networks (C-H; Si-0 and the dopant network, Me-Me) are bonded to each other predominantly by weak chemical bonds.
- the network elements other than the C-H network may also be referred to as alloying elements. Silicon and oxygen may also be used in dopant networks with other dopant elements or dopant compounds.
- the dopant netv;ork is interspersed along with the previously mentioned two interpenetrating networks.
- three or more interpenetrating networks will be present in the DLN to form a so-called Me-DLN (metal-diamond-like nanocomposite) network.
- non-metal dopant networks may be incorporated as the optionally present dopant networks interpenetrating the C-H and Si-0 networks.
- non-conductive dopants may be incorporated as the third network. This may include conductive elements which are reacted to yield a non- conductive compound.
- conductive elements and compounds may be used as the dopants in the dopant network.
- the three networks (C-H matrix, Si-0 matrix and a dopant matrix) are bonded to one another mainly by weak chemical attractive forces. Carbide formation can be prevented even at metal concentrations as high as 50% (verified using Auger electron spectroscopy, electron spectroscopy for chemical analysis (ESCA) , extended x-ray absorption fine structure spectroscopy (EXAFS) and Fourier transform infrared spectroscopy (FTIR) can be achieved. Again, the properties of these materials can be varied over wide ranges depending on the dopant and the concentration selected, as well as the deposition technique and parameters. As already mentioned, the structure of these composites can be tailored at the molecular level.
- Preferred dopant elements to be used in the Me- DLN network and which are particularly effective for use as dopants in a tunable dielectric Me-DLN coating are B, Li, Na, Si, Ge, Te, O, Mo, W, Ta, Nb, Pd, Ir, Pt, V, Fe, Co, Mg, Mn, Ni, Ti, Zr, Cr, Re, Hf, Cu, Al, N, Ag and Au; with W, Cr, Zr, Ti and Hf being most preferred.
- Preferred compounds which may be used as dopants include TiN, BN, A1N, ZrN and CrN with TiN, A1N and CrN being most preferred.
- the carbon content in the diamond-like nanocomposite. is greater than about 40 atomic % of the DLN.
- the hydrogen content is preferably at least about 1 atomic % and up to about 40 atomic % of the carbon concentration.
- the sum of the silicon, oxygen and dopant elements and dopant containing compounds is greater than about 2 atomic % of the DLN.
- the ratio of carbon to silicon atoms is from from about 2:1 to about 8:1, hydrogen to carbon atoms is about 0.01:1 to about 0.4:1, silicon to oxygen atoms is about 0.5:1 to about 3:1, and dopant to carbon atoms is about 0:1 to about 1.5:1.
- the conductive properties of these DLN materials can be varied over wide ranges from a dielectric coating to a highly conductive coating, depending on the dopants and concentrations selected, as well as the deposition conditions.
- the structure of these composites can be tailored or “tuned” at the molecular level to combine unique electrical, optical, and other desirable solid state properties with “tunable” mechanical strength, hardness and chemical resistance properties. It is important that the coatings of the present invention be hard, resilient and able to withstand wear and friction normally associated with use as an electrical component.
- ultracapacitors capable of very high capacitance.
- ultracapacitors may be about 10 nm thick and be comprised of 100 or more doped and undoped layers.
- the electrical properties of the DLN structures of this class of materials can be continuously varied over at least 18 orders of magnitude from a purely dielectric material, at about 10 ⁇ 5 Ohm*cm, to a metallic state, at about 10 15 Ohm»cm, while preserving the properties of the DLN state.
- a transition to a superconducting state, with the absence of electrical resistivity, is observed at low temperatures for certain three-network nanocomposite networks.
- the two-network DLN may be used.
- a three- network DLN may be used; but in this instance non- conductive dopants would be used to ensure the superior performance as a dielectric coating.
- the good adherence and superior hardness of the DLNs of the present invention make the DLNs good candidates as coatings for devices such as slip rings or any electrical components which routinely are exposed to harsh chemical or physical conditions such as friction.
- the DLNs greatly reduce wear of the slip rings while maintaining a high amount of constant electrical contact.
- a completely dielectric coating would inhibit surface "breakdown" and offer superior substrate protection.
- the breakdown strength of the DLNs of the present invention ranges from about 10 6 to about 10 9 V/cm depending upon the chemical substituents of the DLN coating applied to the substrate.
- the flexibility of the tunable DLN coatings of the present invention is especially advantageous for this purpose.
- the optional, third dopant network can be tailored to include an appropriate concentration of selected conductive dopant to offer the required amount of conductivity at the surface layer of the DLN coating to avoid "flashover" effects.
- the flashover resistivity of the DLNs of the present invention ranges from about 59,000 V/mm to about 3000 V/mm depending on the chemical substituents present in the DLN coating applied to the substrate.
- DLC coatings often place an intermediate layer between the substrate and the DLC coating.
- this intermediate layer limits the useful thickness of the DLC coatings. If the DLC coatings are too thick, delamination occurs.
- the coating material may be applied more thickly without risking delamination from the substrate.
- the thicker layer of DLN coating in turn is believed to contribute to the superior erosion resistant properties of the tunable DLN cooatings and tunable DLN-coated substrates.
- the presence of the glass-like silicon network, stabilized by oxygen, serves to prevent the growth of graphitic carbon at high temperatures and, to prevent metal cluster formation in metal-containing three-network nanocomposites, as well as reducing the internal stress in the nanocomposite structure, thereby enhancing the DLN adhesion directly to substrates. This appears to lead to superior adherence of the DLNs of the present invention to the substrate material.
- the coatings must have predictable non-conductive or minimal conductive properties which must not vary over time; or in response to extreme conditions, such as heat. Most importantly, the coatings must not degrade into forms of elements which become more conductive. One such element is carbon which, upon transformation through graphitization, becomes more conductive than the original DLC coating.
- the DLN coatings of the present invention have temperature stability far exceeding that of traditional diamond-like (DLC) materials.
- Crystalline diamond is stable to approximately 1100°C, upon which graphitization occurs.
- Quartz has long term thermal stability to 1470°C, and short term thermal stability up to 1700°C.
- the DLN structure used to provide the tunable dielectric coatings of the present invention has long term stability to 1250°C and short term stability to 2000°C; i.e. thermal stability of the DLN exceeds that of crystalline diamond while preserving the amorphous, diamond-like state.
- the density of the C-H and Si-0 two network DLN varies from about 1.8 to about 2.1 g/cm 3 .
- the rest of the space is taken up by a random network of nanopores with diameters varying from about 0.28 to about 0.35 nm.
- the nanopore network does not form clusters or micropores.
- the properties of the two network DLN may then be tailored by adding dopant.
- the dopants fill the nanopore network in a random fashion, eventually resulting, at a certain dopant concentration, in an additional network without clusters or microcrystalline grains, even at concentrations as high as 50 atomic %. At concentrations below about 10 atomic %, the dopants are distributed as separate atoms in the nanopores of the diamond-like matrix.
- the average distance between dopant atoms in this quasi-random structure can be controlled by the concentration of the dopant.
- concentration of the dopant When the relative concentration of the dopant element or compound reaches about 20-25 atomic %, the dopants form the third (Me-Me) network in the DLN structure as shown in FIG. 1(C) , resulting in a material with diamond-like mechanical and chemical properties.
- FIG. 2 shows the resistivity in ohm-cm as a function of the concentration of tungsten (W) for a W- alloyed film.
- Metallic conductivity is reached for a W concentration in the range of from about 15 to about 50 atomic % of the dopant element.
- FIG. 3 shows the dependence of electrical resistivity on temperature for a tungsten doped DLN film (W-DLN) .
- the graph demonstrtaes the transition to a superconducting state.
- Curves 1, 2, and 3 correspond to W-DLN films with room temperature resistivities of 0.01, 0.017 and 0.02 Ohm «cm respectively.
- the dopants form a fragmented, random network, without true network-like connectivity.
- the electronic properties of the fragmented dopant "network" depend strongly on external mechanical loading, pressure and electromagnetic fields.
- the Me-DLNs with dopant concentrations in the range of from about 1- to about 20 atomic % are ideal use as smart materials and sensors.
- Smart materials are understood to be materials that not only sense an external stimulus, but also can react and make appropriate adjustments in response.
- the specific dielectric properties of the DLN coatings can be altered or selectively "tuned” by closely monitoring the amount of metal incorporated as the third-network during layer deposition.
- the three-network coating may also be applied as a layer alternating with two-network DLN coating layers to achieve desired dielectric effects such as capacitance.
- the dopant type and concentration may be selectively varied, as may be the deposition conditions.
- the DLNs of the present invention are their relative hardness and durability.
- the DLNs, especially the metal doped DLNs combine high microhardness with high elasticity.
- the microhardness values of the DLNs of the present invention range from about 6 to about 30 GPa.
- the DLNs may be synthesized via co-deposition by clusterless beams of ions, atoms or radicals of the relevant elements, where the mean free path of each particle species exceeds the distance between its source and the growing particle film surface, and each beam contains particles of well-defined energy.
- Carbon- containing particle beams can be produced by plasma discharge in a plasmatron and extracted as charged particles by a high-voltage field in a vacuum chamber and directed onto the substrate.
- FIG. 6 shows one preferred embodiment of the coating chamber used for the DLN coating deposition process.
- a vacuum deposition chamber 1 is provided to coat a substrate sample.
- a precursor inlet system 13 comprises a metal tube and a porous ceramic material 3 through which a liquid precursor, preferably a polysiloxane, is injected.
- the precursor inlet system 13 is shown incorporated into the chamber through the chamber base plate 11.
- the thermocathode 2 comprises a resistively heated thoriated tungsten filament 4.
- Substrates 5 to be coated with DLN film are attached to the substrate holder 6.
- the power supply 8 is used for biasing the substrates (DC or RF) .
- the system is "pumped down” using normal vacuum pump down procedures.
- a gate valve (not shown) located on port 7 is closed and the system is backfilled with dry air, nitrogen or argon until the chamber reaches atmospheric pressure.
- the door of the chamber, 9, is then opened and substrate to be coated 5 are attached to the substrate holder 6 using any of many possible methods (spring clip, screw, clamp, etc.) .
- Special fixtures may be required for substrates of special shapes.
- the substrate holder is designed in a way that it will also hold a cylinder sample (not shown) , which, in operation, rotates both about the axis of the central drive shaft 10, and its own axis which is perpendicular to 10. In this way, the axis of the cylinder would be perpendicular to the axis of 10.
- the door of the chamber is closed, the chamber evacuated and the gate valve opened to bring system pressure down to at least 10 " 5 to 10 "6 Torr, which is the desired range of system base pressure.
- argon gas is introduced into the chamber via a needle valve or mass flow controller, until the chamber pressure reaches approximately 5xl0 ⁇ 5 to lxlO "3 Torr, preferably about l-3xl0 "4 Torr.
- the filament current is the current that passes through the thermocathode (also called the filament or the cathode) .
- the filament bias is the constant floating voltage applied to the filament
- Plasma current is measured as the current between the filament and the base plate or ground. This voltage provides the field that moves electrons emitted by the filament to the base plate 11.
- the electromagnet power supply provides current to the electromagnet, which creates a magnetic field that results in the electron path becoming a spiral, increasing the electron path length and improving the probability of collisions between the electrons and the vapor molecules created due to precursor evaporation.
- the substrate bias power supply is concurrently switched on.
- argon plasma which is used to clean the substrates prior to deposition.
- the precursor supply is opened.
- Precursor flow is controlled via a needle valve and occurs due to the difference in pressure between the chamber and the outside atmosphere.
- the argon gas flow is turned off.
- the ionized precursor vapors form a stable plasma, ions from which are accelerated towards the substrate holder due to the substrate bias.
- deposition of DLN film occurs.
- Co-deposition of a dopant material is carried out as follows. Argon flow to the magnetron is commenced and the magnetron 8 is switched on after the base pressure has been reached. A shutter 12 is used to prevent deposition while the substrate is cleaned via sputtering. When cleaning has been accomplished, the shutter 12 is opened and sputtering is carried out at the desired power level. This may occur prior to commencement of DLN film deposition, during DLN film deposition, after DLN film deposition, or intermittently during DLN film deposition, depending on what kind of film structure and composition are desired. Using DC or RF sputtering, materials of all kinds (metals, ceramics, alloys, etc.) can be used for co-deposition.
- the growth conditions for nanocomposite films are the following, with reference to FIG. 4.
- the pressure in the deposition chamber 1 should not exceed 10 "3 torr, with the pressure in the active zone of the plasma generation 2, in the range from about 1.0 x 10 "3 to about 5.0 x 10 "2 torr.
- the temperature of the substrate should not exceed about 200°C with the temperature of the cathode filaments being in the range from about 2100 to about 2950°C.
- the current in the cathode filament is from about 70 to about 130 A, with the voltage across the filament being from about 20 to about 30 V.
- the voltage with respect to the ground is from about 70 to about 130 V with the plasma current being from about 0.5 to about 20.0 A.
- the voltage of the substrate holder is from about 0.1 to about 5.0 Kv, with all the carbon- containing and Si-containing species having kinetic energy in the range of from about 100 to about 1200 eV and from about 25 to about 300 eV respectively.
- the metal beams consist of free atoms or monatomic ions. The kinetic energy of the metal atoms/ions does not exceed from about 25eV. With a precursor flow rate from about 0.5 to about 5.0 cc/hour, the growth rate of the DLN is from about 0.1 to about 2.0 micrometers/hour.
- the preferred range of operation for most applications is a pressure of about l-3xl0 "5 Torr, a plasma current of about 1 amp., a filament current of from about 60 to about 75 amp., a substrate voltage of from about 600 to about 1000 V DC, or forward power of about 100 W in RF mode.
- the preferred frequency for RF mode is from about 90 to about 300 KHz.
- the preferred magnetron power depends on the type of material, composition and structure desired for the DLN coating.
- a preferred method of deposition uses a plasma discharge in a triode plasmatron, as shown schematically in FIG. 4, with the plasma energy density above about 5 Kwh/gram-atom of carbon.
- the charged particles are extracted by a high voltage field in the vacuum chamber and directed onto the substrate.
- the potential of the substrate holder is from about -0.3 to about +5.0 Kv, and most preferably 1.0 +/- 0.2 Kv, and varying with a frequency in the range of from about 0 to about 25 Mhz for DC and from about 90 to about 300 KHz for RF.
- the ratio of the electron emission to the carbon precursor flow in the plasmatron is from about 0.5 to about 1.5 electrons per particle.
- Organosilicon compounds such as siloxane, are preferred precursors for C, H, Si and 0.
- One preferred organosilicon compound is polyphenylmethylsiloxane, containing 1 to 10 Si atoms.
- the high boiling point siloxanes may be introduced directly into the active plasma region through a porous ceramic or metallo-ceramic (3 in FIG. 4 and FIG. 5) which is heated via radiation thermocathodes 4.
- the photon and electron emission of the thermocathodes affect the evaporation, fragmentation and ionization of the precursor molecules on the surface of the ceramic, which thereby functions as an ion source for the plasma generator.
- An alternative method for injection of the siloxane precursors is to use direct injection from a diffusion pump.
- dopant-containing beams may be realized by any one of, or combination of, the following methods: 1) thermal evaporation; 2) ion-sputtering; 3) ion beams.
- the dopant-containing beams are directed onto the growing film surface through the vacuum chamber to exclude interparticle collisions in the deposition chamber itself.
- Substrates are placed in an adjacent chamber on a rotating substrate holder, (for example a drum) which ensures double rotary motion, said adjacent chamber being connected to the plasma generation chamber by an opening for the emission of the atomic or ionic beams, as shown schematically in FIG. 4.
- the plasma generation may be carried out within the chamber containing the substrates (FIG. 6) .
- a DC or a radio frequency potential is generally applied to the substrates during the deposition process. No external substrate heating is required.
- the substrate holder may be designed specifically to hold parts of different shapes such as cylinders, as would be apparent to one skilled in the field.
- Useful variations of the above described methods for deposition of DLN films include, the use of sputtered silicon and oxygen gas as precursors for the Si and 0 2 , the use of sputtered carbon and hydrogen or hydrocarbon gas used as carbon and hydrogen precursors, or any combination thereof.
- the process employs depositions similarly to those shown in FIG.4, except that a reflecting electrode is used to generate a neutral beam. This process eliminates surface damage of the substrate resulting from charged and/or fast particles impinging on the substrate during growth.
- a preferred method for depositing ultra-thin dielectric DLN films comprises ion bombardment (e.g. Ar + or K + with energy in the range of from about 30 to about 150 eV) through a vacuum chamber which has been backfilled by siloxane vapor (about 3 x 10 "4 torr) .
- ion bombardment e.g. Ar + or K + with energy in the range of from about 30 to about 150 eV
- siloxane vapor about 3 x 10 "4 torr
- ultra-thin dielectric films may be deposited according to the present invention.
- the thickness of the deposited DLN coating has no theoretical upper or lower limit.
- Existing technology and available equipment have allowed atomic-scale composite films and coating thicknesses typically in the range from about l ⁇ m to about lO ⁇ m.
- a film thickness in the range from about 6 to about 8nm may be deposited, with a preferred deposited film thickness of from about 3 to about 5nm.
- the above-described flexible coatings of the present invention may be deposited on the selected substrate in thicknesses ranging from a few nanometers to a few microns, preferably from about 20nm to about 12 microns, depending only on the desired application of the coated substrate.
- the deposition may be tailored to meet the properties required for a particular application.
- the random interpenetrating of the two- or three-network DLNs guarantee uniform strength of the structures in all directions.
- the structures are free of micropores even at thicknesses of 80 Angstroms (8 nm) .
- the DLNs are therefore extremely stable and possess unique combinations of chemical, mechanical, electronic, and superconducting properties.
- DLC, DLN and Me-DLN coatings were prepared and deposited to compare the performance of the following thin films relative to the protection of plasma devices. Films were prepared on silicon substrates for preliminary property evaluations.
- the aluminum nitride targets used to prepare AlN-DLN coatings were prepared by hot pressing aluminum nitride powder A-100 produced.by ART (Buffalo, NY) . Hot pressed boron nitride target plates were obtained from Advanced Ceramics Corp. (Ohio) . Both targets were polished on one side. A polished beryllium target was procured from DFD Solid State Labs (NY) . Magnetron sputtering of these targets was used to create the dopant-containing beams for Me-DLN films.
- DLN films were deposited using three different methods for performance comparisons with DLN and Me-DLN coatings. The different methods were used to ensure that results were not biased by the DLC deposition method. Seventeen samples of DLC coatings, and 27 samples of DLN, tungsten (W) -DLN, and beryllium (Be) -DLN were prepared and tested for ablation resistance under several conditions, including etching by atomic hydrogen containing arc- discharge, DC Ar + plasma, and laser ablation. EXAMPLES 2 -3
- Flashover characteristics are an important consideration for coated insulators. It was determined during testing that dielectric breakdown strength was not necessarily a direct indicator of flashover behavior. Therefore, flashover measurements were carried out using two different methods on DLN deposited on sitall and HDPE (high density polyethylene) substrates. The effect of pressure was also considered. Overall, high flashover hold-off strengths were observed.
- Flashover measurements were carried out on HDPE substrates using the apparatus shown above. Since the available equipment was limited to a voltage of 1000V, the thickness of the spacers between the electrodes was reduced from 90 ⁇ to 17 +/- 0.5 ⁇ .
- Capacitor paper was used as the spacer. The DLN film was approximately 0.3 ⁇ thick. The length of the electrodes was 5 cm. The test was carried out in open air, with no extraordinary precautions taken to clean the surface. Then electrodes were pressed together firmly with the capacitor paper therebetween. Only the thickness of the capacitor paper was known. The exact distance between the electrodes was not directly measured. Voltage was increased in a controlled manner, and the current was measured across the electrodes. The current measurement device could measure to 0.1 microAmps.
- Silver paste (Contact area 10-20 mm 2 ] ("Silver bond type 50", Transenc Co., Inc. , NJ) 3) Pt films deposited on DLN by ion sputtering in the DLN deposition vacuum chamber, using masks.
- the Pt contacts had a round shape with a diameter of 0.15 inches. Insulation between Pt contact spots was checked, and no current was observed up to 1 kV. Thee distance between these contacts was 1 mm. Thus no flashover was observed at a stress of 10 4 V/cm.
- DLC films were deposited using three different methods for performance comparisons with DLN and Me-DLN coatings. Three different methods were used to ensure that results were not biased by the DLC deposition method. Seventeen samples of DLC coatings and 27 samples of DLN, W-DLN (tungsten) and Be-DLN (beryllium) were prepared and tested for ablation under several conditions, including etching by atomic hydrogen containing arc discharge, DC Ar + plasma, and laser ablation. Samples were exposed to an arc-discharge plasma from a mixture of methane and hydrogen. The gas pressure was 100 torr. The flow rate of hydrogen was 83 seem 10 and the CH 4 content was 2.5-4 vol%. The substrate temperature measured by an optical pyrometer was 1000°C.
- the cathode was made from TaC.
- the arc-discharge current was 1.5 Angstroms and the discharge area on the sample was 1 cm 2 .
- a KrF excimer laser was used to deliver 20 pulses of nanoosecond duration at a wavelength of 248nm and a fluence of approximately 900 mJ/cm 2 .
- the light-induced changes in the optical properties of the films were monitored by measuring the reflectivity and transmittance of the modifying KrF laser radiation through the films and of He-Ne and He-Cd probe lasers.
- the probe light was detected and fed to amplifier and storage oscilloscope.
- the sample was mounted on a translation stage and moved perpendicular to the probe laser so that the reflectance was measured over the entire damage area.
- all three kinds of DLC were destroyed within 5 minutes, whereas the DLN coatings survived for over 1 hour with no changes in film structure.
- Example 8 The temperature stability of DLN coatings was deposited in a manner similar to that described in Example 1 was characterized by exposing sample substrates to elevated temperatures, followed by FTIR spectroscopy to evaluate any structural changes. No visible degradation was observed after exposure to elevated temperature for extended periods of time. No structural changes were observed as indicated by FTIR. EXAMPLE 8
- Auger spectra of natural diamond, DLC, graphite and flame-synthesized diamond were collected for comparison with the evolution of Auger features for DLN irradiated with ion and electron beams. Auger spectra for DLN during continuous ion beam exposure were compared with the typical features for diamond, DLC, and graphite as described below. DLN and Me-DLN were stable under ion-beam irradiation.
Abstract
Description
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US7402350B2 (en) | 1996-05-31 | 2008-07-22 | Stormedia Texas, Llc | Highly tetrahedral amorphous carbon coatings and systems and methods for their production |
US7513215B2 (en) | 1996-05-31 | 2009-04-07 | Stormedia Texas, Llc | Systems and methods for the production of highly tetrahedral amorphous carbon coatings |
US7544397B2 (en) | 1996-05-31 | 2009-06-09 | Stormedia Texas, Llc | Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production |
US7604881B2 (en) | 1996-05-31 | 2009-10-20 | Stormedia Texas, Llc | Highly tetrahedral amorphous carbon coatings and systems and methods for their production |
US7931748B2 (en) | 1996-05-31 | 2011-04-26 | Stormedia Texas, Llc | Systems and methods for the production of highly tetrahedral amorphous carbon coatings |
WO2006135140A1 (en) * | 2005-06-13 | 2006-12-21 | Korea Institute Of Science And Technology | Tungsten-including diamond-like carbon film and manufacturing method thereof, and dental device manufactured by the method |
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CN115612989A (en) * | 2022-09-27 | 2023-01-17 | 苏州辉钻纳米新材料有限公司 | Novel high-order static dissipation film composite material containing silicon and oxygen and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
AU6151496A (en) | 1996-12-30 |
CN1192787A (en) | 1998-09-09 |
CA2224068A1 (en) | 1996-12-19 |
EP0832310A4 (en) | 2001-04-11 |
EP0832310A1 (en) | 1998-04-01 |
MX9709649A (en) | 1998-10-31 |
KR19990022472A (en) | 1999-03-25 |
US5786068A (en) | 1998-07-28 |
JPH11508963A (en) | 1999-08-03 |
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