WO1998037601A3 - Aerodynamic chamber design for high pulse repetition rate excimer lasers - Google Patents

Aerodynamic chamber design for high pulse repetition rate excimer lasers Download PDF

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Publication number
WO1998037601A3
WO1998037601A3 PCT/US1998/002041 US9802041W WO9837601A3 WO 1998037601 A3 WO1998037601 A3 WO 1998037601A3 US 9802041 W US9802041 W US 9802041W WO 9837601 A3 WO9837601 A3 WO 9837601A3
Authority
WO
WIPO (PCT)
Prior art keywords
flow
repetition rate
pulse repetition
high pulse
excimer lasers
Prior art date
Application number
PCT/US1998/002041
Other languages
French (fr)
Other versions
WO1998037601A2 (en
Inventor
Richard G Morton
Igor V Fomenkov
William N Partlo
Original Assignee
Cymer Inc
Richard G Morton
Igor V Fomenkov
William N Partlo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc, Richard G Morton, Igor V Fomenkov, William N Partlo filed Critical Cymer Inc
Priority to EP98907360A priority Critical patent/EP1008210B1/en
Priority to DE69835093T priority patent/DE69835093T2/en
Priority to AU63189/98A priority patent/AU6318998A/en
Publication of WO1998037601A2 publication Critical patent/WO1998037601A2/en
Publication of WO1998037601A3 publication Critical patent/WO1998037601A3/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

An excimer laser (100) chamber capable of arc-free operation at repetitive pulse rates of 1 kHz or greater is provided. The chamber balances the electrode design criteria required to produce a well-defined discharge channel with the flow design criteria required to achieve high clearing rates at comparatively high blower efficiency. A ceramic insulator (118) located on either side of the cathode (108)/pre-ionizer (130) assembly enhances the flow of gas through the discharge region by reducing the turbulence in the electrode region. A series of specifically designed flow vanes further enhances the gas flow.
PCT/US1998/002041 1997-02-11 1998-02-04 Aerodynamic chamber design for high pulse repetition rate excimer lasers WO1998037601A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP98907360A EP1008210B1 (en) 1997-02-11 1998-02-04 Aerodynamic chamber design for high pulse repetition rate excimer lasers
DE69835093T DE69835093T2 (en) 1997-02-11 1998-02-04 AERODYNAMIC CHAMBER DESIGN FOR EXCIMER LASER HIGH PULSE REBATE
AU63189/98A AU6318998A (en) 1997-02-11 1998-02-04 Aerodynamic chamber design for high pulse repetition rate excimer lasers

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US3789597P 1997-02-11 1997-02-11
US60/037,895 1997-02-11
US08/857,608 1997-05-16
US08/857,608 US5771258A (en) 1997-02-11 1997-05-16 Aerodynamic chamber design for high pulse repetition rate excimer lasers

Publications (2)

Publication Number Publication Date
WO1998037601A2 WO1998037601A2 (en) 1998-08-27
WO1998037601A3 true WO1998037601A3 (en) 1998-11-19

Family

ID=26714600

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/002041 WO1998037601A2 (en) 1997-02-11 1998-02-04 Aerodynamic chamber design for high pulse repetition rate excimer lasers

Country Status (6)

Country Link
US (1) US5771258A (en)
EP (1) EP1008210B1 (en)
JP (1) JP3524367B2 (en)
AU (1) AU6318998A (en)
TW (1) TW367639B (en)
WO (1) WO1998037601A2 (en)

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Also Published As

Publication number Publication date
EP1008210A4 (en) 2001-04-18
AU6318998A (en) 1998-09-09
US5771258A (en) 1998-06-23
JPH10223955A (en) 1998-08-21
EP1008210B1 (en) 2006-06-28
JP3524367B2 (en) 2004-05-10
TW367639B (en) 1999-08-21
EP1008210A2 (en) 2000-06-14
WO1998037601A2 (en) 1998-08-27

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