WO1998044548A1 - Method of forming a contact opening adjacent to an isolation trench in a semiconductor substrate - Google Patents
Method of forming a contact opening adjacent to an isolation trench in a semiconductor substrate Download PDFInfo
- Publication number
- WO1998044548A1 WO1998044548A1 PCT/US1998/006502 US9806502W WO9844548A1 WO 1998044548 A1 WO1998044548 A1 WO 1998044548A1 US 9806502 W US9806502 W US 9806502W WO 9844548 A1 WO9844548 A1 WO 9844548A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- isolation mass
- etch stop
- sidewall
- forming
- substrate
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76897—Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/05—Etch and refill
Definitions
- This invention relates to a semiconductor structure and semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass.
- Background Art Implementing an integrated circuit involves interconnecting electronic devices which are formed on a substrate with other devices on the substrate or the outside world. Typically, such an interconnection is formed by depositing an insulating layer over the substrate and then conducting a contact etch through the insulating layer to a part of a device component thereunder.
- An example of a part of a device component is a diffusion region which forms a source/drain region in a MOS device.
- insulating material such as nitride sidewall spacers serve to protect certain device components, such as word lines, from a misalignment of the contact etch. This is commonly referred to as a self-aligned contact etch. Problems arise, however, when such a contact etch is to be conducted over a field isolation mass, such as a field oxide. Such problems are discussed directly below in connection with Figs. 1-3.
- Fig. 1 illustrates a semiconductor wafer fragment 10 comprised of a bulk silicon substrate region 12 and a field oxide region 13.
- a gate oxide layer 14 overlies silicon substrate 12.
- a conductive line 15 overlies gate oxide 14, and a conductive line 16 overlies field oxide region 13.
- Both lines 15 and 16 are provided with an etch resistant cap 17 and sidewall spacers 18 of nitride or some other etch resistant material.
- Diffusion regions 19 and 20 are provided on either side of line 15 and define source/drain regions to which electrical connection will be made.
- a planarized oxide insulating material 21 is provided over substrate region 12 and patterned with photomask 22 to define a contact opening 23 to diffusion region 20.
- photomask 22 is misaligned somewhat to the left, the effect of which is to provide the contact opening etch 5 directly over field oxide region 13.
- contact opening 23 has been etched through the oxide insulating material 21, and due to the photomask misalignment, a portion 24 of field oxide region 13 is also undesirably etched away. Etching away a portion of the field oxide region as shown is undesirable because such may cause shorts to the substrate and leakages which render a device inoperative.
- One proposed solution is to provide a thin etch stop layer over the word line and the field oxide region.
- this solution fails when the space through which a contact opening is to be made is very narrow. This is because the thin etch stop layer tends to clog such space and is oftentimes non-uniformly distributed therethrough.
- Fig. 1 is a diagrammatic sectional view of a prior art semiconductor wafer fragment at one prior art processing step, and is discussed in the "Background" section above.
- Fig. 2 is a view of the Fig. 1 prior art wafer fragment at a prior art processing step subsequent to that shown by Fig. 1.
- Fig. 3 is a view of the Fig. 1 prior art wafer fragment at a prior art processing step subsequent to that shown by Fig. 2.
- Fig. 4 is a diagrammatic sectional view of a semiconductor wafer fragment at one processing step in accordance with the invention.
- Fig. 5 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 4.
- Fig. 6 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 5.
- Fig. 7 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 6.
- Fig. 8 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 7.
- Fig. 9 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 8.
- Fig. 10 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 9.
- Fig. 11 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 10.
- Fig. 12 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 11.
- Fig. 13 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 12.
- Fig. 14 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 13.
- Fig. 15 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 14.
- Fig. 16 is a view of the Fig. 4 wafer fragment at a processing step subsequent to that shown by Fig. 15. Best Modes for Carrying Out the Invention and Disclosure of Invention
- a semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass comprises the following steps: forming a field isolation mass within a semiconductor substrate by a trench and refill technique, and a masking layer over the substrate adjacent the field isolation mass, the field isolation mass being capped with an etch stop cap, the field isolation mass having a sidewall covered by the masking layer; removing the substrate masking layer away from the isolation mass to expose at least a portion of the isolation mass sidewall; forming an etch stop cover over the exposed isolation mass sidewall; forming an insulating layer over the isolation mass and substrate area adjacent the isolation mass; and etching a contact opening through the insulating layer to adjacent the isolation mass selectively relative to the isolation mass etch stop cap and cover.
- a semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass comprises the following steps: forming a field isolation mass within a semiconductor substrate by a trench and refill technique, and an electrically conductive masking layer over the substrate adjacent the field isolation mass, the field isolation mass having a sidewall covered by the masking layer, the field isolation mass and masking layer defining a generally planar outer surface; removing an amount of the field isolation mass sufficient to define a field isolation mass surface spaced inwardly from the masking layer planar outer surface; forming an etch stop cap atop the field isolation mass surface; patterning the substrate masking layer away from the isolation mass to form at least a portion of a device component spaced from the isolation mass and to expose the isolation mass sidewall; forming an etch stop cover over the exposed isolation mass sidewall; forming an insulating layer over the isolation mass and device component; and etching a contact opening through the insulating layer to ( between the isolation mass sidewall and device component selectively relative
- a semiconductor structure comprises: a semiconductor substrate having a substrate surface; a field isolation mass projecting outwardly from the substrate surface including a substantially vertical sidewall at least a portion of which extends above the substrate surface, the isolation mass including a top having a cap of a first etch stop material; and a cover of a second etch stop material covering the field isolation mass sidewall.
- a semiconductor wafer fragment is indicated generally with reference numeral 25.
- Such comprises a bulk semiconductor substrate 26 (preferably monocrystalline silicon) having a gate oxide layer 28 and a conductive polysilicon layer 30 thereover.
- An overlying layer 32 may optionally be provided or formed atop polysilicon layer 30. If so provided or formed, layer 32 may or may not be electrically conductive.
- Layer 32 serves as an etch stop layer which provides greater selectivity than polysilicon layer 30 for a subsequent planarizing step described below.
- layer 32 is conductive and comprises a tungsten suicide (WSi x ), although other materials such as various nitrides, or other ceramic materials or refractory- containing materials may be used.
- WSi x tungsten suicide
- materials such as TiSi x , W,
- layers 30, 32 comprise an electrically conductive composite masking layer 33 wherein layer 32 defines an etch stop top layer.
- an active area definition step is undergone in which masking layer 33 is patterned and the masking layer and gate oxide 28 are etched to expose a portion 34 of substrate 26 within which a field isolation mass will be formed, essentially preferably by a trench and refill technique to be described below.
- the patterning and etching defines active areas 36 on either side of the exposed substrate portion 34.
- a recess 38 is formed into substrate 26 by either a wet or dry etch, and preferably a dry etch, to a depth of around 2500 Angstroms.
- a field implant step can be conducted to improve subsequent isolation within bulk substrate 26. Additionally, at this point a slight thermal oxidation can be conducted to create a thin oxide layer at the base of recess 38 having a thickness of about 50-200 Angstroms. Such thermal oxide layer provides better adherence of a subsequently deposited oxide layer.
- a layer 40 of insulating material preferably Si0 2 , is deposited by chemical vapor deposition and completely fills recess 38.
- layer 40 is planarized, preferably by a chemical- mechanical polish (CMP), at least down to overlying etch stop top layer 32.
- CMP chemical- mechanical polish
- WSi x for etch stop top layer 32 is desirable because such provides a polish/etch selectivity of around 50:1.
- Other materials could be utilized.
- nitride has a good selectivity of around 10:1.
- polysilicon layer 30 could, by itself, also be used as an etch stop layer, although the selectivity may be much lower than those materials discussed above .
- field oxide layer 40 sets forth a preferred, so-called trench and refill technique by which a field isolation mass is provided or formed within a semiconductor substrate.
- the field isolation mass is referred to with reference numeral 40, and includes two substantially vertical sidewalls 42, 44.
- conductive layer 30 and optional overlying layer 32 define a composite masking layer 33 which, after formation of field isolation mass 40, covers sidewalls 42, 44 of the field isolation mass.
- field isolation mass 40 and masking layer 33 define a generally planar outer first surface 35.
- an etch stop cap is formed on top of field isolation mass 40. Such is formed by first conducting a wet or dry etch (and preferably a dry etch) of field isolation mass 40 to remove an amount sufficient to define a field isolation mass surface or second surface 46.
- Surface 46 is spaced inwardly from that portion of planar outer first surface 35 defined by masking layer 33.
- second surface 46 is spaced below first surface 35, and preferably below layer 32.
- a layer of etch stop material 48 is deposited atop the field isolation mass surface and the masking layer planar outer surface.
- the formed layer of etch stop material 48 preferably covers the first and second surfaces 35, 46 respectively, and completely fills in the recess over field isolation mass 40.
- a preferred etch stop material is Si 3 N 4 , although other materials such as A1 2 0 3 , Ta 2 0 5 , Ti0 2 , and other insulating materials may be used.
- etch stop material 48 is planarized as by chemical- mechanical polishing, to at least first surface 35 thereby defining an etch stop cap 50 atop the field isolation mass 40.
- Other techniques could, of course, also be used.
- a conductive layer 52 such as polysilicon, Ti, TiN/W, WSi x , TiSi ⁇ , (and preferably TiSi x ) is provided or formed over the first surface 35 and interconnects subsequently formed polysilicon blocks defining continuously running word lines. If a non-conductive material was previously used for etch stop top layer 32, such is removed prior to provision of layer 52. Additionally, an etch stop layer 54 is provided or formed atop conductive layer 52 to insulate the conductive layer during subsequent gate definition and etching procedures. Preferably etch stop layer 54 is formed from the same material which forms etch stop cap 50, such material preferably being nitride.
- conductive layer 52 and substrate masking layer 33 are patterned and etched away from isolation mass 40 to form at least a portion of a device component 56.
- component 56 is in the form of a conductive transistor line running into and out of the plane of the page upon which Fig. 13 lies.
- the patterning and etching step defines a plurality of device components, such as lines 56, 57a, 57b, and 57c.
- the rightmost device component 56 will be described, it being understood that the achieved advantages apply to other such similar device components.
- Component 56 is spaced laterally from isolation mass 40.
- the patterned etch which produces component 56 exposes at least a substantially vertical portion of isolation mass sidewall 44, and defines a device component sidewall 58 which faces isolation mass sidewall 44.
- conductivity enhancing impurity may be provided to a first concentration into the substrate between isolation mass sidewall 44 and device component portion 56 to define lightly doped drain structures 60.
- a second etch stop material is deposited over the substrate and preferably over the exposed isolation mass sidewall 44 and device component sidewall 58.
- the deposited etch stop material is referred to as a "second" etch stop material in the sense that a first etch stop material, i.e. the material defining etch stop cap 50, has already been deposited.
- a subsequent anisotropic etch of the second etch stop material is conducted to a degree sufficient to leave a sidewall spacer 62 over the exposed isolation mass sidewall 44, and a sidewall spacer 64 over device component sidewall 58.
- Sidewall spacer 62 need not necessarily be provided or formed over sidewall 44. Sidewall spacers are also formed on other device components as shown.
- etch stop cap 50 and sidewall spacers 62, 64 form an etch stop cover over the respective sidewalls to which such are adjoined.
- etch stop cap 50 and sidewall spacers 62, 64 are comprised of the same material, such as Si 3 N 4 , although other materials may be used.
- a conductivity enhancing impurity is provided into the substrate to a second concentration between isolation mass 40 and device component portion 56.
- the second concentration is preferably greater than the first concentration and together therewith defines respective source/drain regions 66.
- a semiconductor structure is provided having a field isolation mass 40 which projects outwardly from the substrate surface.
- the field isolation mass includes substantially vertical sidewall 44, at least of portion of which extends above the substrate surface.
- Field isolation mass 40 includes a top having an etch stop cap 50 and at least one cover or sidewall spacer, a representative one of which is indicated with numeral 62 covering sidewall 44. Referring to Fig. 15, an insulating layer 68 is formed over isolation mass 40 and active area 36 adjacent thereto, effectively over device component 56.
- a contact opening 70 is patterned and etched through the insulating layer 68 to between the isolation mass sidewall 44 and device component 56.
- Contact opening 70 is shown as being misaligned due to a misalignment of the photomask defining the contact opening. More specifically, referring to isolation mass 40, insulating material 68 may be seen to overlie a major portion of etch stop cap 50, leaving exposed a small portion of the etch stop cap and sidewall spacer 62 on the right-hand side of the isolation mass as viewed in Fig. 16. Notwithstanding such misalignment, field isolation mass 40 is protected during a subsequent contact etch due to etch stop cap 50 and sidewall spacer 62 which effectively seals the field isolation mass.
- the above described preferred semiconductor processing method and structure allow for contact openings to be formed in a region adjacent a field isolation mass without the risk that an over etch of the contact opening will etch away field isolation mass material. Additionally, advantages in scalability are achieved because smaller structures may be fabricated without the problems stemming from the use of thin film etch stop layers described above. Furthermore, because the preferred field isolation mass is deposited rather than grown, the problems associated with the characteristic bird's beak structure of grown field oxides is virtually eliminated.
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU69465/98A AU6946598A (en) | 1997-04-03 | 1998-03-31 | Method of forming a contact opening adjacent to an isolation trench in a semiconductor substrate |
JP54198798A JP2001517374A (en) | 1997-04-03 | 1998-03-31 | Method of forming contact opening adjacent to isolation groove in semiconductor substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/825,644 | 1997-04-03 | ||
US08/825,644 US5866465A (en) | 1997-04-03 | 1997-04-03 | Semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1998044548A1 true WO1998044548A1 (en) | 1998-10-08 |
Family
ID=25244565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1998/006502 WO1998044548A1 (en) | 1997-04-03 | 1998-03-31 | Method of forming a contact opening adjacent to an isolation trench in a semiconductor substrate |
Country Status (5)
Country | Link |
---|---|
US (3) | US5866465A (en) |
JP (2) | JP2001517374A (en) |
KR (1) | KR100439242B1 (en) |
AU (1) | AU6946598A (en) |
WO (1) | WO1998044548A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000340648A (en) * | 1999-05-13 | 2000-12-08 | Stmicroelectronics Inc | Improved integrated circuit isolating structure and manufacture thereof |
JP2003508916A (en) * | 1999-08-30 | 2003-03-04 | アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド | Nonvolatile memory with high gate coupling capacitance |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5866465A (en) * | 1997-04-03 | 1999-02-02 | Micron Technology, Inc. | Semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass |
US5963818A (en) * | 1997-09-17 | 1999-10-05 | Motorola, Inc | Combined trench isolation and inlaid process for integrated circuit formation |
US6309947B1 (en) * | 1997-10-06 | 2001-10-30 | Advanced Micro Devices, Inc. | Method of manufacturing a semiconductor device with improved isolation region to active region topography |
US6107157A (en) | 1998-02-27 | 2000-08-22 | Micron Technology, Inc. | Method and apparatus for trench isolation process with pad gate and trench edge spacer elimination |
US6165843A (en) * | 1998-03-20 | 2000-12-26 | Mosel Vitelic, Inc. | Covered slit isolation between integrated circuit devices |
US5880006A (en) * | 1998-05-22 | 1999-03-09 | Vlsi Technology, Inc. | Method for fabrication of a semiconductor device |
US6248636B1 (en) * | 1998-05-28 | 2001-06-19 | Samsung Electronics Co., Ltd. | Method for forming contact holes of semiconductor memory device |
US6323540B1 (en) | 1998-06-10 | 2001-11-27 | Micron Technology, Inc. | Semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass, and a semiconductor structure |
KR100292616B1 (en) * | 1998-10-09 | 2001-07-12 | 윤종용 | Manufacturing method of trench isolation |
US6323103B1 (en) * | 1998-10-20 | 2001-11-27 | Siemens Aktiengesellschaft | Method for fabricating transistors |
KR100355034B1 (en) | 1999-07-15 | 2002-10-05 | 삼성전자 주식회사 | Semiconductor device with SEG layer and Method for isolating thereof |
KR100338767B1 (en) | 1999-10-12 | 2002-05-30 | 윤종용 | Trench Isolation structure and semiconductor device having the same, trench isolation method |
US20020052093A1 (en) * | 2000-09-27 | 2002-05-02 | Horng-Huei Tseng | Method of forming insulative trench |
US6586814B1 (en) * | 2000-12-11 | 2003-07-01 | Lsi Logic Corporation | Etch resistant shallow trench isolation in a semiconductor wafer |
US6498383B2 (en) * | 2001-05-23 | 2002-12-24 | International Business Machines Corporation | Oxynitride shallow trench isolation and method of formation |
CN1220259C (en) * | 2001-12-27 | 2005-09-21 | 松下电器产业株式会社 | Forming method for wiring structure |
CN1198331C (en) * | 2001-12-27 | 2005-04-20 | 松下电器产业株式会社 | Forming method for wiring structure |
US6773975B1 (en) * | 2002-12-20 | 2004-08-10 | Cypress Semiconductor Corporation | Formation of a shallow trench isolation structure in integrated circuits |
US7981800B1 (en) | 2006-08-25 | 2011-07-19 | Cypress Semiconductor Corporation | Shallow trench isolation structures and methods for forming the same |
JP4968014B2 (en) | 2007-11-22 | 2012-07-04 | ソニー株式会社 | Backlight device and liquid crystal display device |
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JP3316103B2 (en) * | 1995-05-31 | 2002-08-19 | 株式会社東芝 | Semiconductor integrated circuit and manufacturing method thereof |
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US5866465A (en) * | 1997-04-03 | 1999-02-02 | Micron Technology, Inc. | Semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass |
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1997
- 1997-04-03 US US08/825,644 patent/US5866465A/en not_active Expired - Lifetime
-
1998
- 1998-03-31 KR KR10-1999-7008148A patent/KR100439242B1/en not_active IP Right Cessation
- 1998-03-31 JP JP54198798A patent/JP2001517374A/en active Pending
- 1998-03-31 WO PCT/US1998/006502 patent/WO1998044548A1/en active IP Right Grant
- 1998-03-31 AU AU69465/98A patent/AU6946598A/en not_active Abandoned
- 1998-06-10 US US09/095,773 patent/US6084289A/en not_active Expired - Lifetime
-
1999
- 1999-02-01 US US09/243,220 patent/US6184127B1/en not_active Expired - Lifetime
-
2005
- 2005-10-05 JP JP2005292683A patent/JP2006054486A/en not_active Withdrawn
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JP2000340648A (en) * | 1999-05-13 | 2000-12-08 | Stmicroelectronics Inc | Improved integrated circuit isolating structure and manufacture thereof |
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Also Published As
Publication number | Publication date |
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JP2001517374A (en) | 2001-10-02 |
AU6946598A (en) | 1998-10-22 |
KR100439242B1 (en) | 2004-07-05 |
US6084289A (en) | 2000-07-04 |
JP2006054486A (en) | 2006-02-23 |
US5866465A (en) | 1999-02-02 |
KR20000076060A (en) | 2000-12-26 |
US6184127B1 (en) | 2001-02-06 |
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