WO2000003169A3 - Manifold system of removable components for distribution of fluids - Google Patents

Manifold system of removable components for distribution of fluids Download PDF

Info

Publication number
WO2000003169A3
WO2000003169A3 PCT/US1999/015272 US9915272W WO0003169A3 WO 2000003169 A3 WO2000003169 A3 WO 2000003169A3 US 9915272 W US9915272 W US 9915272W WO 0003169 A3 WO0003169 A3 WO 0003169A3
Authority
WO
WIPO (PCT)
Prior art keywords
distribution
manifold
fluids
port
manifold system
Prior art date
Application number
PCT/US1999/015272
Other languages
French (fr)
Other versions
WO2000003169A2 (en
Inventor
Kim N Vu
Eric J Redemann
David P Sheriff
Original Assignee
United States Filter Corp
Kim N Vu
Eric J Redemann
David P Sheriff
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26809455&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2000003169(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US09/111,999 external-priority patent/US6374859B1/en
Application filed by United States Filter Corp, Kim N Vu, Eric J Redemann, David P Sheriff filed Critical United States Filter Corp
Priority to JP2000559369A priority Critical patent/JP3972172B2/en
Priority to DE1999617064 priority patent/DE69917064T2/en
Priority to EP99933722A priority patent/EP1133652B1/en
Priority to AT99933722T priority patent/ATE266166T1/en
Publication of WO2000003169A2 publication Critical patent/WO2000003169A2/en
Publication of WO2000003169A3 publication Critical patent/WO2000003169A3/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561Gas plumbing upstream of the reaction chamber
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/10Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit
    • F16K11/20Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit operated by separate actuating members
    • F16K11/22Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit operated by separate actuating members with an actuating member for each valve, e.g. interconnected to form multiple-way valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00Construction of housing; Use of materials therefor
    • F16K27/003Housing formed from a plurality of the same valve elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/8593Systems
    • Y10T137/87249Multiple inlet with multiple outlet
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/8593Systems
    • Y10T137/877With flow control means for branched passages
    • Y10T137/87885Sectional block structure

Abstract

A manifold system for enabling a distribution of fluids includes a plurality of individual manifold blocks (4) that can be joined together to form a gas stick. Each manifold block will have a fluid passage way with an entrance port (6) and exit port (8) accessing a common surface (38). An active component can be mounted to one manifold block, while extending across a port of an adjacent manifold block. An alignment system can be provided to ensure that the entrance and exit ports are positioned in a plane containing the common surface to facilitate sealing.
PCT/US1999/015272 1998-07-08 1999-07-07 Manifold system of removable components for distribution of fluids WO2000003169A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000559369A JP3972172B2 (en) 1998-07-08 1999-07-07 Removable part manifold device for dispensing fluid
DE1999617064 DE69917064T2 (en) 1998-07-08 1999-07-07 distribution system
EP99933722A EP1133652B1 (en) 1998-07-08 1999-07-07 Manifold system of removable components for distribution of fluids
AT99933722T ATE266166T1 (en) 1998-07-08 1999-07-07 MODULAR CHANNEL SYSTEM FOR DISTRIBUTING MEDIA

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/111,999 US6374859B1 (en) 1996-10-30 1998-07-08 Manifold system for enabling a distribution of fluids
US09/111,999 1998-07-08
US09/229,722 1999-01-13
US09/229,722 US6394138B1 (en) 1996-10-30 1999-01-13 Manifold system of removable components for distribution of fluids

Publications (2)

Publication Number Publication Date
WO2000003169A2 WO2000003169A2 (en) 2000-01-20
WO2000003169A3 true WO2000003169A3 (en) 2001-07-05

Family

ID=26809455

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/015272 WO2000003169A2 (en) 1998-07-08 1999-07-07 Manifold system of removable components for distribution of fluids

Country Status (6)

Country Link
US (1) US6394138B1 (en)
EP (1) EP1133652B1 (en)
JP (1) JP3972172B2 (en)
AT (1) ATE266166T1 (en)
DE (1) DE69917064T2 (en)
WO (1) WO2000003169A2 (en)

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Also Published As

Publication number Publication date
US6394138B1 (en) 2002-05-28
EP1133652A2 (en) 2001-09-19
ATE266166T1 (en) 2004-05-15
JP3972172B2 (en) 2007-09-05
DE69917064T2 (en) 2005-01-20
WO2000003169A2 (en) 2000-01-20
EP1133652B1 (en) 2004-05-06
DE69917064D1 (en) 2004-06-09
JP2002520554A (en) 2002-07-09

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