WO2000055388A3 - Method and apparatus for arc deposition - Google Patents
Method and apparatus for arc deposition Download PDFInfo
- Publication number
- WO2000055388A3 WO2000055388A3 PCT/US2000/003028 US0003028W WO0055388A3 WO 2000055388 A3 WO2000055388 A3 WO 2000055388A3 US 0003028 W US0003028 W US 0003028W WO 0055388 A3 WO0055388 A3 WO 0055388A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- reactant
- plasma
- substrate
- depositing
- coating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32422—Arrangement for selecting ions or species in the plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Road Signs Or Road Markings (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000605803A JP4733273B2 (en) | 1999-03-17 | 2000-02-04 | Arc deposition method and apparatus |
AT00907176T ATE256763T1 (en) | 1999-03-17 | 2000-02-04 | METHOD AND DEVICE FOR COATING BY ARC DISCHARGE |
EP00907176A EP1161574B1 (en) | 1999-03-17 | 2000-02-04 | Method and apparatus for arc deposition |
DE60007287T DE60007287T2 (en) | 1999-03-17 | 2000-02-04 | METHOD AND DEVICE FOR COATING BY ARCH DISCHARGE |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/271,655 | 1999-03-17 | ||
US09/271,655 US6365016B1 (en) | 1999-03-17 | 1999-03-17 | Method and apparatus for arc plasma deposition with evaporation of reagents |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2000055388A2 WO2000055388A2 (en) | 2000-09-21 |
WO2000055388A3 true WO2000055388A3 (en) | 2001-06-28 |
Family
ID=23036497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/003028 WO2000055388A2 (en) | 1999-03-17 | 2000-02-04 | Method and apparatus for arc deposition |
Country Status (6)
Country | Link |
---|---|
US (1) | US6365016B1 (en) |
EP (1) | EP1161574B1 (en) |
JP (1) | JP4733273B2 (en) |
AT (1) | ATE256763T1 (en) |
DE (1) | DE60007287T2 (en) |
WO (1) | WO2000055388A2 (en) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6261694B1 (en) | 1999-03-17 | 2001-07-17 | General Electric Company | Infrared reflecting coatings |
US6793775B2 (en) * | 2001-03-13 | 2004-09-21 | Mikhail I. Gouskov | Multiple torch—multiple target method and apparatus for plasma outside chemical vapor deposition |
US7879411B2 (en) * | 2001-04-30 | 2011-02-01 | University Of Virginia Patent Foundation | Method and apparatus for efficient application of substrate coating |
JP4738636B2 (en) * | 2001-05-29 | 2011-08-03 | 株式会社テクノ菱和 | Explosion-proof dustless ionizer |
JP2003011661A (en) * | 2001-06-25 | 2003-01-15 | Exatec Llc | Panel and method for providing automobile fixed glazing |
US6660538B2 (en) * | 2001-10-29 | 2003-12-09 | Energy Photovoltaics | Non-contacting deposition control of chalcopyrite thin films |
DE10153760A1 (en) * | 2001-10-31 | 2003-05-22 | Fraunhofer Ges Forschung | Process for the production of a UV-absorbing transparent abrasion protection layer |
FR2842536B1 (en) * | 2002-07-19 | 2005-06-03 | Commissariat Energie Atomique | ELECTROLYTIC REACTOR |
US6740586B1 (en) * | 2002-11-06 | 2004-05-25 | Advanced Technology Materials, Inc. | Vapor delivery system for solid precursors and method of using same |
US7163749B2 (en) * | 2002-12-20 | 2007-01-16 | General Electric Company | Process for depositing finely dispersed organic-inorganic films and articles made therefrom |
US6890656B2 (en) | 2002-12-20 | 2005-05-10 | General Electric Company | High rate deposition of titanium dioxide |
AU2003211169A1 (en) * | 2003-02-20 | 2004-09-17 | General Electric Company | Apparatus and method for depositing large area coatings on planar surfaces |
CA2460296C (en) * | 2003-05-23 | 2012-02-14 | Sulzer Metco Ag | A hybrid method for the coating of a substrate by a thermal application of the coating |
US7282244B2 (en) * | 2003-09-05 | 2007-10-16 | General Electric Company | Replaceable plate expanded thermal plasma apparatus and method |
US20110104381A1 (en) * | 2004-01-15 | 2011-05-05 | Stefan Laure | Plasma Treatment of Large-Scale Components |
EP1725699A1 (en) * | 2004-03-09 | 2006-11-29 | Exatec, LLC. | Plasma coating system for non-planar substrates |
DE102004014618B3 (en) * | 2004-03-23 | 2005-11-10 | Eads Space Transportation Gmbh | Electrothermal impulse engine |
US7300617B2 (en) * | 2004-05-13 | 2007-11-27 | David Gerling | Method of making fusion cast articles |
US20090123662A1 (en) * | 2005-04-11 | 2009-05-14 | Stefan Laure | Plasma Coating Device and Method |
JP4122048B2 (en) * | 2005-08-29 | 2008-07-23 | 松下電器産業株式会社 | Vapor deposition head apparatus and vapor deposition coating method |
JP2007191761A (en) * | 2006-01-19 | 2007-08-02 | Idemitsu Kosan Co Ltd | Stacked structure, electrode for electric circuit using the same and method for producing the same |
CN101454478A (en) * | 2006-04-20 | 2009-06-10 | 壳牌可再生能源有限公司 | Thermal evaporation apparatus, use and method of depositing a material |
CA2582312C (en) * | 2006-05-05 | 2014-05-13 | Sulzer Metco Ag | A method for the manufacture of a coating |
US7939181B2 (en) | 2006-10-11 | 2011-05-10 | Oerlikon Trading Ag, Trubbach | Layer system with at least one mixed crystal layer of a multi-oxide |
JP5847381B2 (en) * | 2007-02-26 | 2016-01-20 | ドクトル・ラウレ・プラスマテヒノロギー・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | Apparatus and method for applying plasma-assisted coating and surface treatment to large volume components |
JP2010526986A (en) | 2007-05-11 | 2010-08-05 | エスディーシー マテリアルズ インコーポレイテッド | Heat exchanger, cooling device and cooling method |
US8481449B1 (en) | 2007-10-15 | 2013-07-09 | SDCmaterials, Inc. | Method and system for forming plug and play oxide catalysts |
US8168268B2 (en) * | 2008-12-12 | 2012-05-01 | Ovishinsky Innovation, LLC | Thin film deposition via a spatially-coordinated and time-synchronized process |
DE102009010497A1 (en) * | 2008-12-19 | 2010-08-05 | J-Fiber Gmbh | Multi-nozzle tubular plasma deposition burner for the production of preforms as semi-finished products for optical fibers |
JP5507882B2 (en) * | 2009-05-08 | 2014-05-28 | 国立大学法人茨城大学 | Manufacturing method of zinc oxide transparent conductive film and manufacturing apparatus for carrying out this method |
US8803025B2 (en) | 2009-12-15 | 2014-08-12 | SDCmaterials, Inc. | Non-plugging D.C. plasma gun |
US9126191B2 (en) | 2009-12-15 | 2015-09-08 | SDCmaterials, Inc. | Advanced catalysts for automotive applications |
US8652992B2 (en) | 2009-12-15 | 2014-02-18 | SDCmaterials, Inc. | Pinning and affixing nano-active material |
US8043954B1 (en) | 2010-03-30 | 2011-10-25 | Primestar Solar, Inc. | Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device |
US8525019B2 (en) | 2010-07-01 | 2013-09-03 | Primestar Solar, Inc. | Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules |
US8580353B2 (en) * | 2010-07-08 | 2013-11-12 | Applied Vacuum Coating Technologies Co., Ltd. | Method for treating surface of glass substrate and apparatus for performing same |
US8669202B2 (en) | 2011-02-23 | 2014-03-11 | SDCmaterials, Inc. | Wet chemical and plasma methods of forming stable PtPd catalysts |
US8541069B2 (en) * | 2011-04-11 | 2013-09-24 | United Technologies Corporation | Method of guided non-line of sight coating |
KR101879175B1 (en) * | 2011-10-20 | 2018-08-20 | 삼성전자주식회사 | Chemical Vapor Deposition Apparatus |
US9511352B2 (en) | 2012-11-21 | 2016-12-06 | SDCmaterials, Inc. | Three-way catalytic converter using nanoparticles |
US9156025B2 (en) | 2012-11-21 | 2015-10-13 | SDCmaterials, Inc. | Three-way catalytic converter using nanoparticles |
US9586179B2 (en) | 2013-07-25 | 2017-03-07 | SDCmaterials, Inc. | Washcoats and coated substrates for catalytic converters and methods of making and using same |
DE102013219199A1 (en) * | 2013-09-24 | 2015-03-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | New weathering procedure for samples |
MX2016004991A (en) | 2013-10-22 | 2016-08-01 | Sdcmaterials Inc | Catalyst design for heavy-duty diesel combustion engines. |
MX2016004759A (en) | 2013-10-22 | 2016-07-26 | Sdcmaterials Inc | Compositions of lean nox trap. |
EP3119500A4 (en) | 2014-03-21 | 2017-12-13 | SDC Materials, Inc. | Compositions for passive nox adsorption (pna) systems |
AT517694B1 (en) * | 2015-11-12 | 2017-04-15 | Inocon Tech Ges M B H | Apparatus and method for applying a coating |
CN114551206A (en) * | 2015-12-04 | 2022-05-27 | 应用材料公司 | Advanced coating method and material for preventing HDP-CVD chamber arcing |
WO2017194098A1 (en) * | 2016-05-10 | 2017-11-16 | Applied Materials, Inc. | Methods of operating a deposition apparatus, and deposition apparatus |
DE102017003042B3 (en) | 2017-03-29 | 2018-08-16 | Rodenstock Gmbh | Gradient hard layer with changing modulus of elasticity |
US10612122B2 (en) * | 2017-08-25 | 2020-04-07 | Vladimir E. Belashchenko | Plasma device and method for delivery of plasma and spray material at extended locations from an anode arc root attachment |
US10707477B2 (en) * | 2017-09-15 | 2020-07-07 | Dyson Technology Limited | High energy density multilayer battery cell with thermally processed components and method for making same |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
DE3014258A1 (en) * | 1980-04-14 | 1981-10-15 | Heinrich Dr. 6236 Eschborn Winter | Metal, metalloid or ceramic coating prodn. by plasma spraying - using cpds. of constituents in gas or vapour form as charge to improve structure |
EP0293229A2 (en) * | 1987-05-29 | 1988-11-30 | Inco Limited | Apparatus and process for coloring objects by plasma coating |
EP0617142A1 (en) * | 1993-03-26 | 1994-09-28 | Shin-Etsu Chemical Co., Ltd. | Preparation of silica thin films |
US5571332A (en) * | 1995-02-10 | 1996-11-05 | Jet Process Corporation | Electron jet vapor deposition system |
EP0887110A1 (en) * | 1997-06-26 | 1998-12-30 | General Electric Company | Nozzle-injector for arc plasma deposition apparatus |
EP0887437A2 (en) * | 1997-06-26 | 1998-12-30 | General Electric Company | Protective coating by high rate arc plasma deposition |
Family Cites Families (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3312659A (en) | 1967-04-04 | Catalytic preparation of polycarbon- ates from bisphenol and a carbonate precursor | ||
US3220973A (en) | 1965-11-30 | Cross-linked polycarbonate resinous compositions | ||
US3161615A (en) | 1957-02-05 | 1964-12-15 | Gen Electric | Resinous copolymeric polycarbonate of a mixture of dihydric phenols |
US3313777A (en) | 1959-12-18 | 1967-04-11 | Eastman Kodak Co | Linear polyesters and polyester-amides from 2, 2, 4, 4-tetraalkyl-1, 3-cyclobutanediols |
US3312660A (en) | 1962-07-03 | 1967-04-04 | Union Carbide Corp | Process for preparing polycarbonates by self-condensation of bisphenol dichloroformate |
US3576656A (en) | 1968-03-11 | 1971-04-27 | Nasa | Stabilized zinc oxide coating compositions |
US3666614A (en) | 1969-06-24 | 1972-05-30 | Union Carbide Corp | Glass-polycarbonate resin laminates |
US3989672A (en) | 1972-10-30 | 1976-11-02 | General Electric Company | Process for preparing aromatic carbonate polymers |
US4224378A (en) | 1978-11-01 | 1980-09-23 | General Electric Company | Abrasion resistant organopolysiloxane coated polycarbonate article |
US4210699A (en) | 1978-11-01 | 1980-07-01 | General Electric Company | Abrasion resistant silicone coated polycarbonate article |
US4200681A (en) | 1978-11-13 | 1980-04-29 | General Electric Company | Glass coated polycarbonate articles |
US4194038A (en) | 1979-01-25 | 1980-03-18 | Allied Chemical Corporation | Poly(ester-carbonates) from dicarboxylic acid chlorides |
US4242381A (en) | 1979-04-18 | 1980-12-30 | General Electric Company | Method of providing a polycarbonate article with a uniform and durable silica filled organopolysiloxane coating |
JPS5691437A (en) * | 1979-12-26 | 1981-07-24 | Nippon Hoso Kyokai <Nhk> | Preparation of metallized element |
US4454275A (en) | 1981-02-20 | 1984-06-12 | General Electric Company | Flame retardant copolyester-carbonate compositions |
US5096558A (en) * | 1984-04-12 | 1992-03-17 | Plasco Dr. Ehrich Plasma - Coating Gmbh | Method and apparatus for evaporating material in vacuum |
JPS61268356A (en) * | 1985-01-09 | 1986-11-27 | Nippon Denso Co Ltd | Method for supporting alumina by catalyst carrier |
US4929322A (en) * | 1985-09-30 | 1990-05-29 | Union Carbide Corporation | Apparatus and process for arc vapor depositing a coating in an evacuated chamber |
US4842941A (en) | 1987-04-06 | 1989-06-27 | General Electric Company | Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby |
JPH0770058B2 (en) * | 1987-04-16 | 1995-07-31 | 富士写真フイルム株式会社 | Method and apparatus for manufacturing magnetic recording medium |
NL8701530A (en) | 1987-06-30 | 1989-01-16 | Stichting Fund Ond Material | METHOD FOR TREATING SURFACES OF SUBSTRATES USING A PLASMA AND REACTOR FOR CARRYING OUT THAT METHOD |
US4927704A (en) | 1987-08-24 | 1990-05-22 | General Electric Company | Abrasion-resistant plastic articles and method for making them |
EP0327639B1 (en) | 1987-08-24 | 1992-01-08 | General Electric Company | Abrasion-resistant plastic articles and method for making them |
US5051308A (en) | 1987-08-24 | 1991-09-24 | General Electric Company | Abrasion-resistant plastic articles |
ATE65265T1 (en) * | 1987-08-26 | 1991-08-15 | Balzers Hochvakuum | PROCESS FOR DEPOSITIONING COATINGS ON SUBSTRATES AND VACUUM COATING EQUIPMENT FOR CARRYING OUT THE PROCESS. |
EP0334204B1 (en) * | 1988-03-23 | 1995-04-19 | Balzers Aktiengesellschaft | Process and apparatus for coating articles |
DE3821131A1 (en) | 1988-06-23 | 1989-12-28 | Bayer Ag | METHOD FOR PRODUCING PLASTIC MOLDED BODIES WITH IMPROVED WEATHER RESISTANCE |
US4948485A (en) | 1988-11-23 | 1990-08-14 | Plasmacarb Inc. | Cascade arc plasma torch and a process for plasma polymerization |
US5152866A (en) * | 1989-01-13 | 1992-10-06 | Hughes Aircraft Company | Plasma/radiation assisted molecular beam epitaxy method |
US5009922A (en) * | 1989-03-02 | 1991-04-23 | Ashahi Glass Company, Ltd. | Method of forming a transparent conductive film |
US5104634A (en) * | 1989-04-20 | 1992-04-14 | Hercules Incorporated | Process for forming diamond coating using a silent discharge plasma jet process |
EP0460206A1 (en) | 1989-12-22 | 1991-12-11 | General Electric Company | Polyestercarbonate composition |
US5126030A (en) * | 1990-12-10 | 1992-06-30 | Kabushiki Kaisha Kobe Seiko Sho | Apparatus and method of cathodic arc deposition |
JPH06509321A (en) | 1991-02-05 | 1994-10-20 | サンスマート インコーポレイテッド | Visually transparent ultraviolet solar screening agent and method of making the same |
US5156882A (en) | 1991-12-30 | 1992-10-20 | General Electric Company | Method of preparing UV absorbant and abrasion-resistant transparent plastic articles |
CH687111A5 (en) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method. |
US5480722A (en) | 1992-07-03 | 1996-01-02 | Asahi Glass Company Ltd. | Ultraviolet ray absorbent glass and method for preparing the same |
US5302271A (en) * | 1992-08-25 | 1994-04-12 | Northeastern University | Anodic vacuum arc deposition system |
US5441624A (en) * | 1992-08-25 | 1995-08-15 | Northeastern University | Triggered vacuum anodic arc |
DE4235199C1 (en) | 1992-10-19 | 1993-04-22 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
DE4236264C1 (en) | 1992-10-27 | 1993-09-02 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 80636 Muenchen, De | |
US5298587A (en) | 1992-12-21 | 1994-03-29 | The Dow Chemical Company | Protective film for articles and method |
ATE181938T1 (en) | 1993-04-27 | 1999-07-15 | Teijin Chemicals Ltd | MODIFIED AROMATIC POLYCARBONATE RESIN AND MODIFIED PHENOL FOR ITS PRODUCTION |
US5433786A (en) | 1993-08-27 | 1995-07-18 | The Dow Chemical Company | Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein |
US5691010A (en) * | 1993-10-19 | 1997-11-25 | Sanyo Electric Co., Ltd. | Arc discharge plasma CVD method for forming diamond-like carbon films |
US5480527A (en) * | 1994-04-25 | 1996-01-02 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
US5718967A (en) | 1995-10-13 | 1998-02-17 | The Dow Chemical Company | Coated plastic substrate |
US5827580A (en) * | 1996-03-27 | 1998-10-27 | Regents Of The University Of California | Low temperature formation of electrode having electrically conductive metal oxide surface |
US5952061A (en) * | 1996-12-27 | 1999-09-14 | Stanley Electric Co., Ltd. | Fabrication and method of producing silicon films |
US5976636A (en) * | 1998-03-19 | 1999-11-02 | Industrial Technology Research Institute | Magnetic apparatus for arc ion plating |
-
1999
- 1999-03-17 US US09/271,655 patent/US6365016B1/en not_active Expired - Lifetime
-
2000
- 2000-02-04 AT AT00907176T patent/ATE256763T1/en not_active IP Right Cessation
- 2000-02-04 JP JP2000605803A patent/JP4733273B2/en not_active Expired - Fee Related
- 2000-02-04 WO PCT/US2000/003028 patent/WO2000055388A2/en active IP Right Grant
- 2000-02-04 EP EP00907176A patent/EP1161574B1/en not_active Expired - Lifetime
- 2000-02-04 DE DE60007287T patent/DE60007287T2/en not_active Expired - Lifetime
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
DE3014258A1 (en) * | 1980-04-14 | 1981-10-15 | Heinrich Dr. 6236 Eschborn Winter | Metal, metalloid or ceramic coating prodn. by plasma spraying - using cpds. of constituents in gas or vapour form as charge to improve structure |
EP0293229A2 (en) * | 1987-05-29 | 1988-11-30 | Inco Limited | Apparatus and process for coloring objects by plasma coating |
EP0617142A1 (en) * | 1993-03-26 | 1994-09-28 | Shin-Etsu Chemical Co., Ltd. | Preparation of silica thin films |
US5571332A (en) * | 1995-02-10 | 1996-11-05 | Jet Process Corporation | Electron jet vapor deposition system |
EP0887110A1 (en) * | 1997-06-26 | 1998-12-30 | General Electric Company | Nozzle-injector for arc plasma deposition apparatus |
EP0887437A2 (en) * | 1997-06-26 | 1998-12-30 | General Electric Company | Protective coating by high rate arc plasma deposition |
Non-Patent Citations (1)
Title |
---|
RAO N ET AL: "NANOPARTICLE FORMATION USING A PLASMA EXPANSION PROCESS", PLASMA CHEMISTRY AND PLASMA PROCESSING,US,PLENUM PRESS. NEW YORK, vol. 15, no. 4, 1 December 1995 (1995-12-01), pages 581 - 606, XP000539562, ISSN: 0272-4324 * |
Also Published As
Publication number | Publication date |
---|---|
WO2000055388A2 (en) | 2000-09-21 |
DE60007287D1 (en) | 2004-01-29 |
ATE256763T1 (en) | 2004-01-15 |
JP4733273B2 (en) | 2011-07-27 |
EP1161574A1 (en) | 2001-12-12 |
US6365016B1 (en) | 2002-04-02 |
DE60007287T2 (en) | 2004-10-21 |
JP2003518553A (en) | 2003-06-10 |
EP1161574B1 (en) | 2003-12-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2000055388A3 (en) | Method and apparatus for arc deposition | |
US4863756A (en) | Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plasma | |
EP1509332B2 (en) | Application of a coating forming material onto at least one substrate | |
US4988422A (en) | Process and apparatus for depositing coatings of high electrical resistance by cathode sputtering | |
CA2119561A1 (en) | Apparatus for rapid plasma treatments and method | |
CA2107242A1 (en) | An Evaporation System for Gas Jet Deposition on Thin Film Materials | |
US6171454B1 (en) | Method for coating surfaces using a facility having sputter electrodes | |
MX9701062A (en) | Jet plasma deposition process and apparatus. | |
EP0931853A3 (en) | Method of depositing barrier coatings by plasma assisted chemical vapour deposition | |
TW358963B (en) | Method and apparatus for depositing deep UV photoresist films | |
CN1993490A (en) | Apparatus for directing plasma flow to coat internal passageways | |
CA2303260A1 (en) | Plasma enhanced chemical deposition with low vapor pressure compounds | |
TW200605194A (en) | Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process | |
CA2207235A1 (en) | Large-scale, low pressure plasma-ion deposition of diamondlike carbon films | |
US6171659B1 (en) | Process for the formation of a coating on a substrate and device for the use this process | |
Mattox | Physical vapor deposition (PVD) processes | |
EP1424405A3 (en) | Method and apparatus for fabricating coated substrates | |
AU2003232015A1 (en) | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition | |
TW200514145A (en) | Method and apparatus for depositing materials with tunable optical properties and etching characteristics | |
JPH03183781A (en) | Method and device for forming thin membrane | |
US6730365B2 (en) | Method of thin film deposition under reactive conditions with RF or pulsed DC plasma at the substrate holder | |
US5888305A (en) | Vacuum coating apparatus with a crucible in the vacuum chamber to hold material to be evaporated | |
KR100295618B1 (en) | High vacuum magnetron sputtering method using ion beam | |
KR920002169B1 (en) | Plasma discharge deposition process and a suitable apparatus therefor | |
RU93018049A (en) | METHOD OF DRAWING VACUUM METALLIZED COATINGS ON DIELECTRIC SURFACES |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): BR CA CN JP KR MX SG |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
AK | Designated states |
Kind code of ref document: A3 Designated state(s): BR CA CN JP KR MX SG |
|
AL | Designated countries for regional patents |
Kind code of ref document: A3 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2000907176 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref country code: JP Ref document number: 2000 605803 Kind code of ref document: A Format of ref document f/p: F |
|
WWP | Wipo information: published in national office |
Ref document number: 2000907176 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 2000907176 Country of ref document: EP |