WO2001004590A9 - Sub-lens spatial resolution shack-hartmann wavefront sensing - Google Patents
Sub-lens spatial resolution shack-hartmann wavefront sensingInfo
- Publication number
- WO2001004590A9 WO2001004590A9 PCT/US2000/018581 US0018581W WO0104590A9 WO 2001004590 A9 WO2001004590 A9 WO 2001004590A9 US 0018581 W US0018581 W US 0018581W WO 0104590 A9 WO0104590 A9 WO 0104590A9
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- wavefront
- apertures
- lens
- array
- sensor
- Prior art date
Links
- 238000000034 method Methods 0.000 claims description 22
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- 238000012360 testing method Methods 0.000 description 15
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- 238000006073 displacement reaction Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
Definitions
- the present invention is directed to increasing spatial resolution of Hartmann type wavefront sensors, more particularly to using a hard aperture to limit the wavefront area being sensed.
- Hartmann wavefront sensing began as a technique for optical metrology, but the adoption of the technique by the adaptive optics community changed its primary usage.
- the adaptive optics community developed high photon efficiency high-speed sensors.
- Recently Hartmann sensors have been developed to address the needs of optical metrology again.
- Today most optical metrology is done with interferometry because of the availability of commercial systems and the coupled high dynamic range and high resolution, but improvements to the Hartmann sensor allow it to compete with interferometry for the optical metrology market.
- Shack-Hartmann wavefront sensor systems are being sold today for approximately one quarter the cost of
- One major drawback of the Shack-Hartmann wavefront sensor is the inherently limited resolution due to the size of the lenses in the lens array. To see features smaller than a lens diameter, the wavefront had to be magnified before entering the sensor with a lens or set of lenses. The disadvantage of this technique is that the magnifying lenses then impose their own aberrations and the field of view of the wavefront sensor is reduced. Magnification of the wavefront reduces the sensor's field of view but allows for higher resolution at the cost of the dynamic range.
- the present invention is therefore directed to a wavefront sensor that substantially overcomes one or more of the problems due to the limitations and disadvantages of the related art.
- This combination high spatial resolution and good sensitivity may also enable a variety of other applications such as flat panel
- the basic idea is to move the wavefront across the lens array in steps that are a fraction of a lens diameter.
- the hard edges of the lens aperture like a knife-edge, adjust the section of the wavefront exposed to each lens.
- the tilt seen by each lens can be determined using centroiding for each of the different positions of the wavefront and the features of the wavefront smaller than a lens can be determined.
- the spatial resolution of the sensor is increased by using the hard aperture of the lens to limit the wavefront being sensed.
- Figures 1A-1C illustrate different tilted apertures for knife-edge wavefront sensing
- Figure 2 show the Fourier modeling results for knife-edge wavefront sensing for a wavelength of 633 nm
- Figure 3 is a schematic illustration of a system for testing knife-edge wavefront sensing
- Figure 4 is a plot from the scanning of a diffraction grating using knife-edge wavefront sensing
- Figure 5 is a plot of the signal recorded by an array of lenses as a pair of 600- micron diameter lenses separated by 160 microns was translated across the lens array in ten-micron steps;
- Figure 5 is a schematic diagram of knife-edge wavefront sensing in a metrology application.
- Each lens in a Shack-Hartmann wavefront sensor measures the tilt seen by that lens by determining the position of the spot at the focus of the lens, typically with a centroid algorithm. This procedure works well if there is an average tilt to the wavefront over the lens.
- the wavefront has features smaller than the lens, they cannot be seen with the Hartmann sensor. However, by moving the sensor relative to the test object by a fraction of a lens, the limits over which the average tilt is performed are changed. The small section of the wavefront being viewed after the sensor moves will be dubbed the new region and the section no longer seen by a given lens will be called the old region. This motion of the sensor will result in a shift in the centroid if there is a difference in tilt between the new region and the old region. This allows for wavefront features to be viewed if they are on the order of the sensor displacement and produce a wavefront tilt shift because of the motion.
- the aperture of the lens itself may be used to limit the wavefront being viewed.
- the aperture of the lenslet measures a different portion of the wavefront. Since each lenslet measures the average slope over its aperture, variations in this difference lead to a measurement of the wavefront at higher resolution than the lenslet array.
- these moving averages may be integrated to provide a detailed, high -resolution map of the surface. It is only necessary to scan one lenslet diameter in each direction (x and y), since the lenslet array provides multiple sampling at its own resolution. The net result is a series of images of focal spot patterns that may be analyzed to produce the wavefront.
- the sequence allows the lenslet resolution measurements to be filled in with the intervening values.
- the measurements produce wavefront slope information, which may be integrated to produce the wavefront using any number of different wavefront reconstructors.
- wavefront slope information may be integrated to produce the wavefront using any number of different wavefront reconstructors.
- wavefronts that will not produce a change in the average tilt when using the lenslets as hard apertures even when moved by at non-integral steps.
- a wavefront consisting of an integer number of sinusoidal periods e.g., from a diffraction grating, will not produce such a change, since the average tilt induced by this aberration is zero for an averaging window of this size no matter where the start or stop of the averaging is located. Because of this, a break in the spatial frequency of the lenses has to be
- This aperture may be realized by providing a blocking aperture to the
- Ax f sin ⁇ where f is the lens focal length If the lens aperture is designed perfectly for the
- the number of grating periods distributed over the lens aperture is an integer plus one half.
- the amount of light in each order can be approximated by the
- the shift in the centroid is actually double this number because as the lens is scanned, the light will oscillate between the two orders. Therefore, the shift in the centroid is exactly the spot diameter of a square lens.
- ⁇ 2 " d which is equal to the square lens spot diameter.
- centroid motion and the minimum resolvable grating period will be equal to the spot diameter.
- Fourier transform modeling was performed on a variety of lenses and a variety of apertures with respect to spatial wavelength.
- the focal plane of a lens with a known hard aperture was modeled while moving the wavefront in the x direction in steps of one tenth of a period.
- the centroid was performed after pixelating the intensity to a thirty-by-thirty pixel array and digitizing to eight bits. Then the maximum centroid shift was determined as the wavefront was moved.
- Figure 2 shows a result of this modeling with the centroid response plotted against the spatial frequency of the sinusoidal grating.
- the square aperture lens shows the expected spatial frequency resonances, while the lenses with single tilted side or the lenses with double tilted side break the spatial frequency enough to flatten out the peak-to-valley centroid shift.
- the spot diameter of this square lens for 633nm light is about 4.1 microns. This appears to be approximately a factor of three higher than the value predicted by the linear optics theory. The discrepancy can be accounted for by the numerous approximations in the theory. The behavior is well predicted by the linear optics theory. Once the appropriate aperture tilt was applied, the response is effectively constant with respect to the spatial wavelength of the diffraction grating.
- Microlens arrays were fabricated using standard integrated circuit techniques, e.g., reflowing photoresist, using binary masks or using gray scale masks.
- the microlenses may be shaped to create the desired apertures or the apertures may be physically applied to the microlenses, e.g., by doing a lift-off of 200nm of aluminum.
- the apertures in all three embodiments were designed to be squares with sides equal to the diameter times the square root of two such that they fit inside the circular microlenses.
- Apertures were designed with no aperture tilt, aperture tilt on one side, and aperture tilt on both sides. The aperture tilt for each aperture was one-eighth the circular lens diameter.
- lens arrays were fabricated.
- the lens diameters were 150 microns, 200 microns, 250 microns, and 300 microns.
- the sag on all the lenses is approximately the same at 12.5 microns.
- the focal lengths were then calculated to be 0.49 mm, 0.87 mm, 1.36 mm and 1.96 mm respectively.
- FIG. 3 is a schematic illustration of the experimental setup for these measurements.
- a light source 30, e.g., a HeNe laser, is expanded by a magnifying system 32 impinges on a test object 34 under measurement.
- a lens 36 re- images the test object onto the lens array 38.
- the focal plane of the lens array 38 was re-imaged onto a CCD 44 using a magnifying lens 42.
- An iris 46 was placed at the focus of the lens 36 to limit the spatial frequency impinging on the lens array and to avoid stray scattered light causing crosstalk.
- the test object was placed on a three- axis translation stage with motion parallel to the table and normal to the propagation controlled by a micrometer capable of one-micron accuracy.
- the first test object 34 was a phase-only diffraction grating made using a single photolithographic step and transferred into the glass using a CF 4 and O 2 plasma etch.
- the spatial frequency of the binary grating was measured on a profilometer to be about 28 microns. Adjusting the width of iris 46 at the focus of the lens 36 blocked the diffraction beyond the first orders.
- the grating was then measured with the knife-edge wavefront sensing setup using one-micron steps.
- the change in the position of the centroid of the focal spots was measured using the CLAS-2D software provided by Wavefront Sciences, Inc.
- Figure 4 shows the centroid shift with respect to displacement for two separate lenses and the sinusoidal fits to this data. The sinusoidal fits extracted a spatial wavelength of 27 microns.
- the next test object 34 measured with the knife-edge wavefront sensing technique was a pair of lenses 600 microns in diameter and 2 microns tall with about 160 microns between them.
- Figure 5 shows the displacement of the centroid of the focal spots of six lenses approximately centered on the lens pair as the pair was translated in 10-micron steps across the lens array. Since the wavefront sensor measures the derivative, the expected result of this measurement is a pair of linear changes in the centroid location with respect to displacement. The linear portions of the curve were fit and the results were slopes of -0.0544 and -0.058, and residual squared of 0.97 and 0.99 on the left and right respectively. The sharper features are caused by the edge effects in scanning a circular lens across an almost square aperture.
- FIG. 6 Use of the knife-edge wavefront sensing of the present invention for metrology applications is schematically illustrated in Figure 6.
- light 60 from a light source is provided to a lens 62 that directs the light onto the test object 34.
- Light reflected from the test object 34 is incident on the lenslet array 36.
- This lenslet array is moved relative to the test object by a non-integral number of lenslets.
- the output of the lenslet array is provided to a detector in the same manner disclosed regarding Figure 3.
- knife-edge wavefront sensing in accordance with the present invention allows Shack-Hartmann wavefront sensors to resolve features smaller than the size of an individual lens by moving the sensor in steps across the wavefront that are a non- integral number of apertures.
- linear optics theory the fundamental limits of this technique have been shown to be the diffraction limit of light. This technique allows for more resolution for applications like optical metrology and laser beam characterization.
- a reconstruction method would be applied as in conventional Hartmann wavefront sensing.
- this technique will be particularly useful when combined with other techniques, e.g., the stitching application, to obtain information about an object that is larger than the aperture, but has features smaller than the aperture.
- the technique while only demonstrated here in one dimension, is applicable to a two-dimensional
- non-integral steps used in the examples were all smaller than the aperture, non-integral steps that are larger than the aperture, e.g., 1.25 times the aperture size, may also be used.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Integrated Circuits (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Lens Barrels (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE60002330T DE60002330D1 (en) | 1999-07-09 | 2000-07-07 | SHACK-HARTMANN WAVE FRONT SENSOR WITH A SPATIAL RESOLUTION THAT IS DETERMINED BY THE LENS ARRANGEMENT |
AT00947095T ATE238535T1 (en) | 1999-07-09 | 2000-07-07 | SHACK-HARTMANN WAVE FRONT SENSOR WITH A HIGHER SPATIAL RESOLUTION CAPACITY THAN THAT SPECIFIED BY THE LENS ARRANGEMENT |
EP00947095A EP1194755B1 (en) | 1999-07-09 | 2000-07-07 | Sub-lens spatial resolution shack-hartmann wavefront sensing |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14291899P | 1999-07-09 | 1999-07-09 | |
US60/142,918 | 1999-07-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001004590A1 WO2001004590A1 (en) | 2001-01-18 |
WO2001004590A9 true WO2001004590A9 (en) | 2002-05-02 |
Family
ID=22501809
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/018581 WO2001004590A1 (en) | 1999-07-09 | 2000-07-07 | Sub-lens spatial resolution shack-hartmann wavefront sensing |
PCT/US2000/018665 WO2001004591A1 (en) | 1999-07-09 | 2000-07-07 | Apodized micro-lenses for hartmann wavefront sensing and method for fabricating optical elements with varying transmission |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/018665 WO2001004591A1 (en) | 1999-07-09 | 2000-07-07 | Apodized micro-lenses for hartmann wavefront sensing and method for fabricating optical elements with varying transmission |
Country Status (5)
Country | Link |
---|---|
US (2) | US6656373B1 (en) |
EP (1) | EP1194755B1 (en) |
AT (1) | ATE238535T1 (en) |
DE (1) | DE60002330D1 (en) |
WO (2) | WO2001004590A1 (en) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ATE238535T1 (en) * | 1999-07-09 | 2003-05-15 | Wavefront Sciences Inc | SHACK-HARTMANN WAVE FRONT SENSOR WITH A HIGHER SPATIAL RESOLUTION CAPACITY THAN THAT SPECIFIED BY THE LENS ARRANGEMENT |
DE19938203A1 (en) | 1999-08-11 | 2001-02-15 | Aesculap Meditec Gmbh | Method and device for correcting visual defects in the human eye |
FR2827380B1 (en) * | 2001-07-12 | 2003-11-07 | Imagine Optic | DEVICE FOR ANALYZING A WAVEFRONT WITH IMPROVED RESOLUTION |
US8911086B2 (en) | 2002-12-06 | 2014-12-16 | Amo Manufacturing Usa, Llc | Compound modulation transfer function for laser surgery and other optical applications |
US8596787B2 (en) | 2003-06-20 | 2013-12-03 | Amo Manufacturing Usa, Llc | Systems and methods for prediction of objective visual acuity based on wavefront measurements |
CA2529813C (en) | 2003-06-20 | 2015-11-17 | Visx, Incorporated | Systems and methods for prediction of objective visual acuity based on wavefront measurements |
CN100451577C (en) * | 2003-10-15 | 2009-01-14 | 中国科学院光电技术研究所 | Hartmann wavefront sensor based on micro-prism array for pulse light beam quality detection |
DE102005042496A1 (en) * | 2005-09-05 | 2007-03-08 | Carl Zeiss Sms Gmbh | Method of correcting apodization in microscopic imaging systems |
US8158917B2 (en) | 2005-12-13 | 2012-04-17 | Agency For Science Technology And Research | Optical wavefront sensor and optical wavefront sensing method |
US7681172B2 (en) * | 2007-01-29 | 2010-03-16 | Synopsys, Inc. | Method and apparatus for modeling an apodization effect in an optical lithography system |
US9176069B2 (en) * | 2012-02-10 | 2015-11-03 | Kla-Tencor Corporation | System and method for apodization in a semiconductor device inspection system |
CN102818640B (en) * | 2012-09-20 | 2014-10-29 | 重庆大学 | Method for determining number of Hartmann arrays by image spectrum containing 4f system error |
JP6494205B2 (en) * | 2013-07-31 | 2019-04-03 | キヤノン株式会社 | Wavefront measuring method, shape measuring method, optical element manufacturing method, optical device manufacturing method, program, wavefront measuring apparatus |
CN103887157B (en) * | 2014-03-12 | 2021-08-27 | 京东方科技集团股份有限公司 | Optical mask plate and laser stripping device |
CN105842761B (en) * | 2016-06-08 | 2018-02-27 | 重庆邮电大学 | Well word stacked THz wave optical focusing lens |
DE102016119880A1 (en) * | 2016-10-19 | 2018-04-19 | HELLA GmbH & Co. KGaA | Lighting device for vehicles |
CN106324727B (en) * | 2016-11-03 | 2017-12-12 | 山东师范大学 | The manufacturing system and preparation method of self-focusing microlens array |
GB201712739D0 (en) * | 2017-08-09 | 2017-09-20 | Renishaw Plc | Laser processing |
CN108415108A (en) * | 2018-01-30 | 2018-08-17 | 北京理工大学 | A kind of tablet super lens based on nano-pore and surface groove structures |
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US3808035A (en) * | 1970-12-09 | 1974-04-30 | M Stelter | Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like |
DE2449123C3 (en) * | 1974-10-16 | 1978-08-10 | Messerschmitt-Boelkow-Blohm Gmbh, 8000 Muenchen | Outcoupling mirror for astable laser resonators |
FR2665955B1 (en) * | 1985-11-20 | 1993-04-23 | Onera (Off Nat Aerospatiale) | OPTO ELECTRONIC ANALYZER OF MICRO-LENS MOSAUIC WAVE SURFACES. |
US5186975A (en) * | 1987-10-14 | 1993-02-16 | Enichem S.P.A. | Process and machinery for step-and-repeat vacuum-deposition of large-area thin-film-electronics matrix-circuits on monolithic glass panes through small perforated metal masks |
US5367588A (en) * | 1992-10-29 | 1994-11-22 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications | Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same |
US5460908A (en) * | 1991-08-02 | 1995-10-24 | Micron Technology, Inc. | Phase shifting retical fabrication method |
US5233174A (en) * | 1992-03-11 | 1993-08-03 | Hughes Danbury Optical Systems, Inc. | Wavefront sensor having a lenslet array as a null corrector |
US5563709A (en) * | 1994-09-13 | 1996-10-08 | Integrated Process Equipment Corp. | Apparatus for measuring, thinning and flattening silicon structures |
US5534312A (en) * | 1994-11-14 | 1996-07-09 | Simon Fraser University | Method for directly depositing metal containing patterned films |
US5509556A (en) * | 1994-11-17 | 1996-04-23 | International Business Machines Corporation | Process for forming apertures in a metallic sheet |
US5814803A (en) * | 1994-12-23 | 1998-09-29 | Spectra-Physics Scanning Systems, Inc. | Image reader with multi-focus lens |
US5605783A (en) * | 1995-01-06 | 1997-02-25 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers |
US5864381A (en) * | 1996-07-10 | 1999-01-26 | Sandia Corporation | Automated pupil remapping with binary optics |
JPH10260523A (en) * | 1997-03-18 | 1998-09-29 | Nikon Corp | Production of silicon stencil mask |
US5853960A (en) | 1998-03-18 | 1998-12-29 | Trw Inc. | Method for producing a micro optical semiconductor lens |
ATE238535T1 (en) * | 1999-07-09 | 2003-05-15 | Wavefront Sciences Inc | SHACK-HARTMANN WAVE FRONT SENSOR WITH A HIGHER SPATIAL RESOLUTION CAPACITY THAN THAT SPECIFIED BY THE LENS ARRANGEMENT |
-
2000
- 2000-07-07 AT AT00947095T patent/ATE238535T1/en not_active IP Right Cessation
- 2000-07-07 WO PCT/US2000/018581 patent/WO2001004590A1/en active IP Right Grant
- 2000-07-07 EP EP00947095A patent/EP1194755B1/en not_active Expired - Lifetime
- 2000-07-07 DE DE60002330T patent/DE60002330D1/en not_active Expired - Lifetime
- 2000-07-07 US US09/612,223 patent/US6656373B1/en not_active Expired - Lifetime
- 2000-07-07 WO PCT/US2000/018665 patent/WO2001004591A1/en active Application Filing
-
2003
- 2003-09-30 US US10/673,569 patent/US6864043B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1194755A1 (en) | 2002-04-10 |
EP1194755B1 (en) | 2003-04-23 |
DE60002330D1 (en) | 2003-05-28 |
US6864043B2 (en) | 2005-03-08 |
ATE238535T1 (en) | 2003-05-15 |
US20040060903A1 (en) | 2004-04-01 |
US6656373B1 (en) | 2003-12-02 |
WO2001004590A1 (en) | 2001-01-18 |
WO2001004591A1 (en) | 2001-01-18 |
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