WO2001006270A1 - Wafer-level burn-in - Google Patents

Wafer-level burn-in Download PDF

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Publication number
WO2001006270A1
WO2001006270A1 PCT/US2000/019217 US0019217W WO0106270A1 WO 2001006270 A1 WO2001006270 A1 WO 2001006270A1 US 0019217 W US0019217 W US 0019217W WO 0106270 A1 WO0106270 A1 WO 0106270A1
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WO
WIPO (PCT)
Prior art keywords
recited
circuits
circuit
interconnect sites
subset
Prior art date
Application number
PCT/US2000/019217
Other languages
French (fr)
Inventor
Andrew K. Wiggin
Allan Calamoneri
Martin P. Goetz
John Zsaio
George E. Avery
Sammy K. Brown
Original Assignee
Alpine Microsystems, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alpine Microsystems, Inc. filed Critical Alpine Microsystems, Inc.
Priority to AU63468/00A priority Critical patent/AU6346800A/en
Publication of WO2001006270A1 publication Critical patent/WO2001006270A1/en

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/2856Internal circuit aspects, e.g. built-in test features; Test chips; Measuring material aspects, e.g. electro migration [EM]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2884Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/317Testing of digital circuits
    • G01R31/3181Functional testing
    • G01R31/3185Reconfiguring for testing, e.g. LSSD, partitioning
    • G01R31/318505Test of Modular systems, e.g. Wafers, MCM's
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/317Testing of digital circuits
    • G01R31/3181Functional testing
    • G01R31/3185Reconfiguring for testing, e.g. LSSD, partitioning
    • G01R31/318505Test of Modular systems, e.g. Wafers, MCM's
    • G01R31/318511Wafer Test
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/316Testing of analog circuits
    • G01R31/3163Functional testing

Definitions

  • the present invention relates to functional testing of integrated circuit to determine operational reliability. More particularly, the present invention is directed to a system and method of wafer-level functional testing of integrated circuits
  • Reliability testing is employed to identify integrated circuits with undesirably short operational lives. It is well known that the greatest quantity of operational failures occurs within a few hours of operational testing.
  • test signal patterns are applied to the integrated circuits to repeatedly stimulate all devices and wires in the circuit.
  • the integrated circuits are mounted into single or multiple chip packages and may be mounted to an additional substrate, such as a printed circuit board. This is accomplished by segmenting the wafer in which the circuits are formed into individual chips or dies, i.e., the integrated circuits are diced from the wafer.
  • the test signals are then applied to the integrated circuits via leads in the package or signal traces on the printed circuit board.
  • burn-in testing The elevated temperatures accelerate inchoate failures.
  • burn-in testing has historically been time-consuming, leading to reduced integrated circuit throughput and increased costs of manufacturing reliable integrated circuits.
  • One technique advanced to increase integrated circuit throughput employs printed circuits boards having multiple sockets adapted to receive and electrically couple the circuit to a source of test signals. This allows simultaneously testing a great quality of integrated circuits. With this process, however, the probability of processing bad or unreliable circuits before detecting defects is great.
  • wafer level burn-in Another burn-in technique for improving throughput is referred to as wafer level burn-in.
  • the wafer level bum-in test involves testing whole, or parts of whole, wafers containing integrated circuits before segmenting the integrated circuits from the wafer.
  • the wafer is manufactured with test points and a test apparatus is formed to contact the test points allowing test signals to propagate from a signal source through the test apparatus and onto the integrated circuits.
  • the test points may be formed onto the integrated circuit itself, or disposed remotely with respect thereto to minimize the damage to the integrated circuit by the test apparatus.
  • a drawback with prior art wafer level burn-in concerns mismatch between the coefficients of thermal expansion of the test apparatus and the wafer during burn-in, as well as the adverse effects of a defective test apparatus during burn-in.
  • a method and a system for wafer level bum-in testing of a circuit features a flip-jumper to permit selectively connecting signals to the interconnect sites on the wafer that are in constant electrical communication with a region of the wafer.
  • the method includes forming a plurality of interconnect sites, with a first subset of the interconnect sites are in constant signal communication with the region.
  • the region may comprise of a circuit integrally formed with the wafer or an area of the wafer having bond sites to which a circuit may be mounted, thereby placing the circuit in constant communication with the first subset.
  • a second subset of the interconnect sites are selectively placed in data communication with the circuit by selectively placing the first and second subsets in signal communication.
  • Signals are transmitted between the circuit and the signal source, with the signals selected from the group consisting of DC or AC signals.
  • the signal source is placed in data communication with one or more bum-in driver connections formed on the wafer to be in constant electrical communication with the second subset.
  • the signal source is placed in electrical communication with the driver connections.
  • the first and second subsets include multiple interconnect sites.
  • the bum-in driver connections may be formed in a region of the wafer so as to bifurcate the same. However, to make efficient use of the surface area of the wafer, the driver connections may be formed on the periphery of the wafer, thereby being disposed radially symmetrically about the circuit.
  • a plurality of circuits are formed on the semiconductor wafer and the interconnect sites are arranged in multiple sets.
  • Each of the multiple sets is associated with one or more of the plurality of circuits and includes the first and second subsets.
  • the circuits associated with one of the multiple sets differ from the circuits associated with the remaining sets of the multiple sets.
  • the flip-jumper includes connection pads configured to connect with the second subsets.
  • the flip-jumper places the signal source in data communication with the circuit by selectively placing the first and second subsets in signal communication.
  • the flip-jumper may be formed from virtually any material suitable for substrate manufacture, including printed circuit board material or semiconductor material.
  • One or more electronic elements are disposed between pairs of the connection pads. The electronic elements are connected in series between one of the interconnects of the first subset and one of the interconnects of the second subset upon the flip-jumper reaching a final seating position with respect to the semiconductor wafer.
  • the electronic elements are selected from the group consisting of a wire, fuse, a resistor, a capacitor and a transistor.
  • the flip-jumper may connect to all of the interconnect sites on the wafer, it is preferred that the flip-jumper connect with segments of the plurality of interconnect sites. In this fashion, multiple flip-jumpers may be employed to connect the plurality of circuits to the signal source. This permits segmenting the wafer into various test areas which increases the operational reliability of the wafer during bum-in testing.
  • FIG. 1 is a top down view of a semiconductor wafer formed in accordance with the present invention
  • Fig. 2 is a detailed view of the semiconductor wafer shown above in Fig.
  • Fig. 3 is a plan view of a flip-jumper in accordance with the present invention
  • Fig. 4 is a cross-sectional view of the flip-jumper, shown above in Fig. 3, attached to the wafer, shown above in Fig. 1 ;
  • Fig. 5 is a plan view of an alternate embodiment of the flip-jumper shown above in Fig. 4;
  • Fig. 6 is a cross-sectional view of an alternate embodiment of the flip- jumper, shown above in Fig. 4;
  • Fig. 7 is a detailed view of the semiconductor wafer shown above in Fig. 2 in accordance with an alternate embodiment
  • Fig. 8 is an exploded perspective view of a multi-chip module that may be formed in accordance with the present invention.
  • Fig. 9 is a block diagram showing the burn-in test method employing the wafer shown above in Fig. 1, in accordance with the present invention.
  • Fig. 10 is a block diagram showing an exemplary embodiment of a test apparatus used to practice the method shown above in Fig. 9.
  • a wafer 10 is shown having a plurality of circuits 12 formed thereon, along with a plurality of bum-in driver connections 14 disposed in region 16 which bifurcates the wafer 10.
  • Each of the signal paths includes one or more signal lines 20, shown more clearly in Fig. 2.
  • the signal lines 20 extend from one or more interconnect sites 22a or 22b and terminate at one or more of the bum-in driver connections 14. Specifically, interconnect sites 22a form a first subset of the interconnect sites and interconnect sites 22b form a second subset of interconnect sites.
  • each of which is associated with one or more of the plurality of circuits 12 and includes the first and second subsets 22a and 22b.
  • the circuits 12 associated with one of the multiple sets 24 differ from the circuits 12 associated with the remaining sets of the multiple sets 24.
  • the first subset of interconnect sites 22a, of a given multiple set 24, are in constant signal communication with the circuit 12 associated therewith.
  • the second subset 22b of the interconnect sites are electrically isolated from the first subset 22a and, therefore, from the circuit 12 associated therewith. As a result, signals applied to the bum-in driver connections are isolated from the circuit 12.
  • the first and second subsets 22a and 22b may be the selectively placed in data communication by a flip-jumper 26.
  • the flip- jumper 26 includes multiple connection pads 28a and 28b configured to connect with the first and second subsets 22a and 22b, respectively.
  • the flip-jumper 26 has one or more connection pad pairs 30 with each pair including one of the connection pads 28a and one of the connection pads 28b.
  • an electronic element 32 connected in series between the connection pads 28a and 28b to provide the proper loading of the signal lines 20.
  • the electronic element 32 associated with each connection pad pair 30 is dependent upon the application, but includes, among other things, the circuit 12 undergoing bum-in test and the functional tested desired.
  • Typical examples of electronic element 32 include wires, resistors, capacitors, inductors, transistors and the like.
  • Other electronic elements may include multi-component circuits, such as integrated circuits.
  • the electronic element may include fuses, for example, on signal lines 20 that transmit bias voltages to the circuit
  • the flip-jumper 26 is attached to the wafer 10 via solder balls 34. More particularly, a solder ball 34 is disposed on the interconnect sites 22a and 22b and the connection pads 28a and 28b mate to the solder balls 34. Any number of flip-jumpers 26 may be employed to facilitate bum-in testing of the substrate. For example, a flip-jumper 26 may be employed to contact the requisite interconnect sites 22a and 22b of the multiple sets 24 in a particular row 36 so that all the circuits associated with a row 36 are tested. Alternatively, for example, a flip-jumper 126, shown in Fig. 5, may have a matrix configuration so that it may contact the requisite interconnect sites 22a and 22b of all of the multiple sets 24 associated with the circuits 12 undergoing burn-in testing.
  • each circuit 12 have a flip-jumper 26 uniquely associated therewith.
  • each flip-jumper 26 associated with one of the plurality of circuits 12 differs from the flip-jumpers 26 associated with the remaining circuits of the plurality of circuits 12.
  • the benefits of this structure are manifold. Were one of the plurality of circuits 12 to experience a catastrophic failure, it could be electrically decoupled from the bum-in test by removing the flip-jumper 26 associated with it. This operation also facilitates fault isolation. By interchanging two flip-jumpers 26, one from a properly functioning circuit 12 and one from an improperly functioning circuit 12, discriminating between the flip-jumper 26 and the improperly functioning circuit as the cause of a malfunction is facilitated.
  • subgroups 38a, 38b, 38c, 38d, 38e, 38f, 38g and 38h of the bum-in driver connections 14 with one or more of the plurality of circuits 12, referred to as clusters 40a, 40b, 40c, 40d, 40e, 40f, 40g and 40h. It is preferred that the subgroup of bum-in drivers associated with one of the plurality of clusters differs from the burn-in drivers associated with the remaining clusters. To that end, subgroups 38a, 38b, 38c, 38d, 38e, 38f, 38g and 38h are uniquely associated with as clusters 40a, 40b, 40c, 40d, 40e, 40f, 40g and 40h, respectively.
  • a common problem concerns powering-up the plurality of circuits 12, simultaneously. This results in a power spike being produced which may damage p-n junctions of the circuits and/or the power supply (not shown) used to bias the circuits 12.
  • biasing voltage is supplied separately to each subgroup of bum-in driver connections 14 to bias the cluster associated therewith. The bias voltage is then sequentially applied to each subgroup of bum-in driver connections.
  • the power to the same may be terminated without reducing the reliability of the bum-in test of the remaining clusters of circuits 12.
  • the wafer 10 is thermally compatible with the flip-jumper 26, which may be achieved by forming the same of materials with similar Coefficient of Thermal Expansion (CTE).
  • CTE Coefficient of Thermal Expansion
  • wafer 10 and the flip-jumper 26 are made of the same material. Since wafers are typically manufactured from single crystal silicon, which has a relatively low CTE, silicon is the preferred flip-jumper 26 material.
  • circuit 1 12 may be attached to wafer 1 10.
  • the area of the wafer 1 10 to which the circuit 1 12 is attached is a carrier 1 15 or micro-pallet that is integral with the wafer 1 10.
  • the carrier 1 15 includes one or more bonding sites 1 15a that is in electrical communication with one or more of the interconnect sites 122a via a signal trace 122c.
  • the bonding sites 1 15a are also are in electrical communication with one or more of the bond pads 1 12a of the circuit 1 12 via a solder ball 122. In this manner, the carrier 1 15 places the circuit 1 12 in electrical communication with the interconnect sites 122a, shown in Fig. 7.
  • the circuit 1 12 and carrier 1 15 are used in a multi-chip module 42 that includes mounting of the carrier 1 15 to a board 48 having a plurality of openings 50, described in U.S. patent application number 09/083,626, which is inco ⁇ orated by reference in its entirety.
  • the board 48 has four openings 50, however, the number of openings 50 changes according to the number of carriers 46 to be connected to board 48.
  • Fig. 9 is a flowchart showing the preferred method of bum-in testing according to the present invention. Referring to Figs.
  • the interconnect sites 22a and 22b and the bum-in driver connections 14 are formed on wafer 10, and a plurality of circuits are in electrical communication therewith.
  • flip- jumpers 26 are connected to the sets of 24 of interconnect sites 22a and 22b associated with the circuits 12 to undergo bum-in test.
  • a signal source 50 is place in data communication with the burn-in driver connections 14 via a connector 52.
  • the wafer 10, connector 52 and flip-jumpers 26 are placed into a temperature controlled environment, such as a bum-in oven 54, and heated to testing temperatures.
  • signals are applied to the circuits 12 and DC and AC signals.
  • the wafer 10, shown above in Fig. 1 may have the bum-in driver connections 14 disposed along the periphery of the wafer 10. Further, the burn-in driver connections may be disposed radially symmetrically about the plurality of circuits 12.
  • the wafer 10, shown above in Fig. 1 may have the bum-in driver connections 14 disposed along the periphery of the wafer 10.
  • the burn-in driver connections may be disposed radially symmetrically about the plurality of circuits 12.
  • Those skilled in the art will recognize other equivalent or alternative methods and configurations of arranging the circuits, interconnect sites 22a and 22b and bum-in driver interconnections 14, as well as other configurations for the flip-jumper 26, shown in Fig. 3.
  • the scope of the invention should, therefore, be determined not with reference to the above description, but should instead be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled.

Abstract

A method and a system for wafer (10) level burn-in testing of a circuit (12) featuring a flip-jumper (26) to permit selectively connecting signals (20) to the interconnect sites (22a and 22b) on the wafer (10) that are in constant electrical communication with the circuit (12).

Description

WAFER-LEVEL BURN-IN
BACKGROUND OF THE INVENTION The present invention relates to functional testing of integrated circuit to determine operational reliability. More particularly, the present invention is directed to a system and method of wafer-level functional testing of integrated circuits
Reliability testing is employed to identify integrated circuits with undesirably short operational lives. It is well known that the greatest quantity of operational failures occurs within a few hours of operational testing. To identify integrated circuits with short operational lives, test signal patterns are applied to the integrated circuits to repeatedly stimulate all devices and wires in the circuit. Traditionally, the integrated circuits are mounted into single or multiple chip packages and may be mounted to an additional substrate, such as a printed circuit board. This is accomplished by segmenting the wafer in which the circuits are formed into individual chips or dies, i.e., the integrated circuits are diced from the wafer. The test signals are then applied to the integrated circuits via leads in the package or signal traces on the printed circuit board. To decrease the time required to test the circuits, testing is performed at elevated operational temperatures, referred to as burn-in testing. The elevated temperatures accelerate inchoate failures.
Nonetheless, burn-in testing has historically been time-consuming, leading to reduced integrated circuit throughput and increased costs of manufacturing reliable integrated circuits. One technique advanced to increase integrated circuit throughput employs printed circuits boards having multiple sockets adapted to receive and electrically couple the circuit to a source of test signals. This allows simultaneously testing a great quality of integrated circuits. With this process, however, the probability of processing bad or unreliable circuits before detecting defects is great.
Another burn-in technique for improving throughput is referred to as wafer level burn-in. The wafer level bum-in test involves testing whole, or parts of whole, wafers containing integrated circuits before segmenting the integrated circuits from the wafer. To that end, the wafer is manufactured with test points and a test apparatus is formed to contact the test points allowing test signals to propagate from a signal source through the test apparatus and onto the integrated circuits. The test points may be formed onto the integrated circuit itself, or disposed remotely with respect thereto to minimize the damage to the integrated circuit by the test apparatus. A drawback with prior art wafer level burn-in concerns mismatch between the coefficients of thermal expansion of the test apparatus and the wafer during burn-in, as well as the adverse effects of a defective test apparatus during burn-in. For example, it is often difficult to determine whether an integrated circuit identified as being defective is a result of a defect in the integrated circuit or a defective test apparatus, resulting in a entire wafer of operational integrated circuits being improperly discarded. In addition, a defective test apparatus can result in catastrophic failure rendering the entire wafer defective.
What is needed, therefore, is a bum-in testing technique that facilitates identifying defects attributable to a test apparatus from defects attributable to an integrated circuit, while avoiding the problems associated with catastrophic failures of a test apparatus.
SUMMARY OF THE INVENTION A method and a system for wafer level bum-in testing of a circuit features a flip-jumper to permit selectively connecting signals to the interconnect sites on the wafer that are in constant electrical communication with a region of the wafer. The method includes forming a plurality of interconnect sites, with a first subset of the interconnect sites are in constant signal communication with the region. The region may comprise of a circuit integrally formed with the wafer or an area of the wafer having bond sites to which a circuit may be mounted, thereby placing the circuit in constant communication with the first subset. A second subset of the interconnect sites are selectively placed in data communication with the circuit by selectively placing the first and second subsets in signal communication. Signals are transmitted between the circuit and the signal source, with the signals selected from the group consisting of DC or AC signals. Specifically, the signal source is placed in data communication with one or more bum-in driver connections formed on the wafer to be in constant electrical communication with the second subset. The signal source is placed in electrical communication with the driver connections. Typically, the first and second subsets include multiple interconnect sites. The bum-in driver connections may be formed in a region of the wafer so as to bifurcate the same. However, to make efficient use of the surface area of the wafer, the driver connections may be formed on the periphery of the wafer, thereby being disposed radially symmetrically about the circuit.
Preferably, a plurality of circuits are formed on the semiconductor wafer and the interconnect sites are arranged in multiple sets. Each of the multiple sets is associated with one or more of the plurality of circuits and includes the first and second subsets. Typically, the circuits associated with one of the multiple sets differ from the circuits associated with the remaining sets of the multiple sets.
Selective communication between the first and second subsets is achieved by the flip-jumper. To that end, the flip-jumper includes connection pads configured to connect with the second subsets. In this manner, the flip-jumper places the signal source in data communication with the circuit by selectively placing the first and second subsets in signal communication. The flip-jumper may be formed from virtually any material suitable for substrate manufacture, including printed circuit board material or semiconductor material. One or more electronic elements are disposed between pairs of the connection pads. The electronic elements are connected in series between one of the interconnects of the first subset and one of the interconnects of the second subset upon the flip-jumper reaching a final seating position with respect to the semiconductor wafer. The electronic elements are selected from the group consisting of a wire, fuse, a resistor, a capacitor and a transistor. Although the flip-jumper may connect to all of the interconnect sites on the wafer, it is preferred that the flip-jumper connect with segments of the plurality of interconnect sites. In this fashion, multiple flip-jumpers may be employed to connect the plurality of circuits to the signal source. This permits segmenting the wafer into various test areas which increases the operational reliability of the wafer during bum-in testing.
BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a top down view of a semiconductor wafer formed in accordance with the present invention; Fig. 2 is a detailed view of the semiconductor wafer shown above in Fig.
1 ;
Fig. 3 is a plan view of a flip-jumper in accordance with the present invention; Fig. 4 is a cross-sectional view of the flip-jumper, shown above in Fig. 3, attached to the wafer, shown above in Fig. 1 ;
Fig. 5 is a plan view of an alternate embodiment of the flip-jumper shown above in Fig. 4;
Fig. 6 is a cross-sectional view of an alternate embodiment of the flip- jumper, shown above in Fig. 4;
Fig. 7 is a detailed view of the semiconductor wafer shown above in Fig. 2 in accordance with an alternate embodiment;
Fig. 8 is an exploded perspective view of a multi-chip module that may be formed in accordance with the present invention;
Fig. 9 is a block diagram showing the burn-in test method employing the wafer shown above in Fig. 1, in accordance with the present invention; and
Fig. 10 is a block diagram showing an exemplary embodiment of a test apparatus used to practice the method shown above in Fig. 9.
DESCRIPTION OF THE SPECIFIC EMBODIMENTS Referring to Fig. 1 , a wafer 10 is shown having a plurality of circuits 12 formed thereon, along with a plurality of bum-in driver connections 14 disposed in region 16 which bifurcates the wafer 10. In electrical communication with both the burn-in driver connections 14 and circuits 12 are multiple signal paths 18. Each of the signal paths includes one or more signal lines 20, shown more clearly in Fig. 2. The signal lines 20 extend from one or more interconnect sites 22a or 22b and terminate at one or more of the bum-in driver connections 14. Specifically, interconnect sites 22a form a first subset of the interconnect sites and interconnect sites 22b form a second subset of interconnect sites.
Referring to both Figs. 1 .and 2, preferably, there are multiple sets 24 of interconnect sites, each of which is associated with one or more of the plurality of circuits 12 and includes the first and second subsets 22a and 22b. Typically, the circuits 12 associated with one of the multiple sets 24 differ from the circuits 12 associated with the remaining sets of the multiple sets 24. The first subset of interconnect sites 22a, of a given multiple set 24, are in constant signal communication with the circuit 12 associated therewith. The second subset 22b of the interconnect sites are electrically isolated from the first subset 22a and, therefore, from the circuit 12 associated therewith. As a result, signals applied to the bum-in driver connections are isolated from the circuit 12.
Referring to Figs. 2 and 3, the first and second subsets 22a and 22b may be the selectively placed in data communication by a flip-jumper 26. To that end, the flip- jumper 26 includes multiple connection pads 28a and 28b configured to connect with the first and second subsets 22a and 22b, respectively. Specifically, the flip-jumper 26 has one or more connection pad pairs 30 with each pair including one of the connection pads 28a and one of the connection pads 28b. Associated with one or more of the connection pad pairs 30 is an electronic element 32 connected in series between the connection pads 28a and 28b to provide the proper loading of the signal lines 20. To that end, the electronic element 32 associated with each connection pad pair 30 is dependent upon the application, but includes, among other things, the circuit 12 undergoing bum-in test and the functional tested desired. Typical examples of electronic element 32 include wires, resistors, capacitors, inductors, transistors and the like. Other electronic elements may include multi-component circuits, such as integrated circuits. In addition, the electronic element may include fuses, for example, on signal lines 20 that transmit bias voltages to the circuit
Referring to Figs. 1, 3 and 4, the flip-jumper 26 is attached to the wafer 10 via solder balls 34. More particularly, a solder ball 34 is disposed on the interconnect sites 22a and 22b and the connection pads 28a and 28b mate to the solder balls 34. Any number of flip-jumpers 26 may be employed to facilitate bum-in testing of the substrate. For example, a flip-jumper 26 may be employed to contact the requisite interconnect sites 22a and 22b of the multiple sets 24 in a particular row 36 so that all the circuits associated with a row 36 are tested. Alternatively, for example, a flip-jumper 126, shown in Fig. 5, may have a matrix configuration so that it may contact the requisite interconnect sites 22a and 22b of all of the multiple sets 24 associated with the circuits 12 undergoing burn-in testing.
It is preferred, however, that each circuit 12 have a flip-jumper 26 uniquely associated therewith. In this manner, each flip-jumper 26 associated with one of the plurality of circuits 12 differs from the flip-jumpers 26 associated with the remaining circuits of the plurality of circuits 12. The benefits of this structure are manifold. Were one of the plurality of circuits 12 to experience a catastrophic failure, it could be electrically decoupled from the bum-in test by removing the flip-jumper 26 associated with it. This operation also facilitates fault isolation. By interchanging two flip-jumpers 26, one from a properly functioning circuit 12 and one from an improperly functioning circuit 12, discriminating between the flip-jumper 26 and the improperly functioning circuit as the cause of a malfunction is facilitated. Additional benefits are derived from the present invention by associating subgroups 38a, 38b, 38c, 38d, 38e, 38f, 38g and 38h of the bum-in driver connections 14 with one or more of the plurality of circuits 12, referred to as clusters 40a, 40b, 40c, 40d, 40e, 40f, 40g and 40h. It is preferred that the subgroup of bum-in drivers associated with one of the plurality of clusters differs from the burn-in drivers associated with the remaining clusters. To that end, subgroups 38a, 38b, 38c, 38d, 38e, 38f, 38g and 38h are uniquely associated with as clusters 40a, 40b, 40c, 40d, 40e, 40f, 40g and 40h, respectively. In this fashion, various operational difficulties may be avoided. For example, a common problem concerns powering-up the plurality of circuits 12, simultaneously. This results in a power spike being produced which may damage p-n junctions of the circuits and/or the power supply (not shown) used to bias the circuits 12. To avoid power spikes, biasing voltage is supplied separately to each subgroup of bum-in driver connections 14 to bias the cluster associated therewith. The bias voltage is then sequentially applied to each subgroup of bum-in driver connections. In addition, if an entire cluster of circuits is defective, the power to the same may be terminated without reducing the reliability of the bum-in test of the remaining clusters of circuits 12.
The wafer 10 is thermally compatible with the flip-jumper 26, which may be achieved by forming the same of materials with similar Coefficient of Thermal Expansion (CTE). In a preferred embodiment, wafer 10 and the flip-jumper 26 are made of the same material. Since wafers are typically manufactured from single crystal silicon, which has a relatively low CTE, silicon is the preferred flip-jumper 26 material.
However, gallium arsenide or other materials with comparable CTE may also be utilized. The foregoing has been discussed with respect to circuit 12 being integral with the wafer 10, i.e., circuit 12 is formed on the wafer 12. However, as shown in Fig. 6, circuit 1 12 may be attached to wafer 1 10. The area of the wafer 1 10 to which the circuit 1 12 is attached is a carrier 1 15 or micro-pallet that is integral with the wafer 1 10. The carrier 1 15 includes one or more bonding sites 1 15a that is in electrical communication with one or more of the interconnect sites 122a via a signal trace 122c. The bonding sites 1 15a are also are in electrical communication with one or more of the bond pads 1 12a of the circuit 1 12 via a solder ball 122. In this manner, the carrier 1 15 places the circuit 1 12 in electrical communication with the interconnect sites 122a, shown in Fig. 7.
Referring to Fig. 8, in an exemplary embodiment, the circuit 1 12 and carrier 1 15 are used in a multi-chip module 42 that includes mounting of the carrier 1 15 to a board 48 having a plurality of openings 50, described in U.S. patent application number 09/083,626, which is incoφorated by reference in its entirety. As described in the patent application, the board 48 has four openings 50, however, the number of openings 50 changes according to the number of carriers 46 to be connected to board 48. Fig. 9 is a flowchart showing the preferred method of bum-in testing according to the present invention. Referring to Figs. 1, 9 and 10, at step 200, the interconnect sites 22a and 22b and the bum-in driver connections 14 are formed on wafer 10, and a plurality of circuits are in electrical communication therewith. At step 202, flip- jumpers 26 are connected to the sets of 24 of interconnect sites 22a and 22b associated with the circuits 12 to undergo bum-in test. At step 204, a signal source 50 is place in data communication with the burn-in driver connections 14 via a connector 52. At step 206, the wafer 10, connector 52 and flip-jumpers 26 are placed into a temperature controlled environment, such as a bum-in oven 54, and heated to testing temperatures. At step 208, signals are applied to the circuits 12 and DC and AC signals.
It is to be understood that the above description is intended to be illustrative and not restrictive. Many embodiments will be apparent to those of skill in the art upon reviewing the above description. By way of example, the wafer 10, shown above in Fig. 1 may have the bum-in driver connections 14 disposed along the periphery of the wafer 10. Further, the burn-in driver connections may be disposed radially symmetrically about the plurality of circuits 12. Those skilled in the art will recognize other equivalent or alternative methods and configurations of arranging the circuits, interconnect sites 22a and 22b and bum-in driver interconnections 14, as well as other configurations for the flip-jumper 26, shown in Fig. 3. The scope of the invention should, therefore, be determined not with reference to the above description, but should instead be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled.

Claims

WHAT IS CLAIMED IS:
1. A method comprising: forming a plurality of interconnect sites on a semiconductor wafer, placing a circuit in constant signal communication with a first subset of said interconnect sites, with a second subset of said interconnect sites being electrically isolated with respect to both said first subset and said circuit; and placing a signal source in data communication with said circuit by selectively placing said first and second subsets in signal communication.
2. The method as recited in claim 1 wherein each of said first and second subsets include multiple interconnect sites.
3. The method as recited in claim 1 further including a step of transmitting between said signal source and said circuit signals, from said signal source, selected from the group consisting of DC or AC signals.
4. The method as recited in claim 1 further including forming a bum- in driver connection on said semiconductor wafer.
5. The method as recited in claim 1 further including forming a plurality of bum-in driver connections in a region so as to bifurcate said semiconductor wafer.
6. The method as recited in claim 1 further including forming a plurality of bum-in driver connections wherein said plurality of interconnect sites are formed to be disposed radially symmetrically about said circuit.
7. The method as recited in claim 1 wherein forming said circuit includes forming a plurality of circuits on said semiconductor wafer and forming said plurality of interconnect sites includes forming multiple sets of said interconnect sites each of which is associated with one of said plurality of circuits and includes said first and second subsets.
8. The method as recited in claim 7 wherein each of said multiple sets are associated with a subgroup of said plurality of circuits.
1 9. The method as recited in claim 7 wherein each of said multiple sets
2 are associated with a subgroup of said plurality of circuits, with the circuits associated
3 with one of said multiple sets differing from the circuits associated with the remaining
4 sets of said multiple sets.
1 10. The method as recited in claim 7 wherein each of said multiple sets
2 are disposed proximate to one of said plurality of circuits associated therewith.
1 1. A method comprising: i forming multiple sets of interconnect sites on a semiconductor wafer,
3 placing a plurality of circuits in signal communication with said multiple
4 sets of interconnect sites, with each of said multiples sets being associated with a
5 subgroup of said plurality of circuits and including first and second subsets of
6 interconnect sites, with the first subset being in constant signal communication with said
7 subgroup of said plurality of circuits; and
8 placing a signal source in data communication with a sub-portion of said .
9 subgroup by selectively placing said first and second subsets in signal communication.
1 12. The method as recited in claim 1 1 further including a step of
2 transmitting signals, from said signal source, between said signal source and said one of
3 said plurality of circuits, with said signals being selected from the group consisting of DC
4 or AC signals.
1 13. The method as recited in claim 1 1 further including forming a
2 plurality of bum-in driver connections in a region so as to bifurcate said semiconductor
3 wafer.
1 14. The method as recited in claim 1 1 further including forming a
2 plurality of bum-in driver connections wherein said plurality of interconnect sites are
3 formed to be disposed radially symmetrically about said plurality of circuits.
1 15. The method as recited in claim 1 1 wherein said subgroup includes one of said plurality of circuits.
1 16. The method as recited in claim 1 1 wherein said subgroup includes
2 two of said plurality of circuits.
17. A system for testing a circuit, said system comprising: a semiconductor wafer having integrally formed thereon, a region in electrical communication with said circuit, a plurality of interconnect sites, arranged in first and second subsets, with said first subset being in constant signal communication with said region; and a flip-jumper having connection pads thereon configured to connect with said first and second subsets, placing a signal source in data communication with said region by selectively placing said first and second subsets in signal communication, thereby placing said signal source in data communication with said circuit.
18. The system as recited in claim 17 wherein said flip-jumper includes one or more electronic elements disposed between pairs of said connection pads which is connected in series between one of said interconnects of said first subset and one of said interconnects of said second subset upon said flip-jumper reaching a final seating position with respect to said semiconductor wafer.
19. The system as recited in claim 17 wherein said flip-jumper includes an electronic element disposed between pairs of said connection pads which is connected in series between one of said interconnects of said first subset and one of said interconnects of said second subset upon said flip-jumper reaching a final seating position with respect to said semiconductor wafer.
20. The system as recited in claim 17 wherein said semiconductor wafer includes a plurality of circuits formed and said plurality of said interconnect sites arranged in multiple sets, each of which is associated with one of said plurality of circuits being and includes said first and second subsets.
21. The system as recited in claim 20 wherein each of said multiple sets are associated with a subgroup of said plurality of circuits.
22. The system as recited in claim 20 wherein each of said multiple sets are associated with a subgroup of said plurality of circuits, with the circuits associated with one of said multiple sets differing from the circuits associated with the remaining sets of said multiple sets.
23. The system as recited in claim as recited in claim 17 wherein each of said first and second subsets include multiple interconnect sites.
24. The system as recited in claim 17 wherein said semiconductor wafer includes a plurality of bum-in driver connections in constant electrical communication with said first subset.
25. The system as recited in method as recited in claim 24 wherein said plurality of bum-in driver connections are arranged in a region bifurcating said semiconductor wafer.
26. The system as recited in claim 24 wherein said plurality of burn-in driver connections are disposed radially symmetrically about said circuit.
PCT/US2000/019217 1999-07-19 2000-07-14 Wafer-level burn-in WO2001006270A1 (en)

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