WO2001059502A1

WO2001059502A1 - Reflection/refraction optical system

Info

Publication number: WO2001059502A1
Application number: PCT/JP2001/000912
Authority: WO
Inventors: Tomowaki Takahashi; Kiyoshi Mitarai; Satoru Kumagai; Hiroyuki Tsukamoto
Original assignee: Nikon Corporation
Priority date: 2000-02-09
Filing date: 2001-02-09
Publication date: 2001-08-16
Also published as: JP2005233979A; AU2001232257A1

Abstract

A reflection/refraction optical system in which an effective stop installation portion is provided, a long-enough working distance is achieved, and as small a concave mirror as possible which is conventionally liable to be large. The system is characterized in that it includes, in the order from a first plane R toward a second plane W, a first image-forming optical system (G1) having a refracting lens, a second image-forming optical system (G2) having at least one concave lens and two reflecting mirrors, and a third image-forming optical system (G3) having a refracting lens, and in that the first image-forming optical lens (G1) forms a first intermediate image (IM1) of the first plane R, the second image-forming optical system (G2) forms a second intermediate image (IM2) by re-formation of the first intermediate image (IM2), and the third image-forming optical system (G3) re-forming the second intermediate image (IM2) on the second plane W.

Description

Description Catadioptric system Technical field

The present invention relates to a catadioptric system, and more particularly, to a catadioptric system of an exposure apparatus such as a stepper used for manufacturing a semiconductor. More specifically, the present invention relates to a catadioptric reduction optical system of a scanning reduction exposure apparatus of about 1/4 that has a resolution of a submicron unit in an ultraviolet wavelength region.

The present application is based on Japanese Patent Application No. 03112885, the contents of which are incorporated herein. Background art

In recent years, in the manufacture of semiconductors and the manufacture of semiconductor chip mounting substrates, the line and space have been increasingly miniaturized, and an exposure apparatus for printing these patterns has been required to have a higher resolution.

In order to satisfy this requirement, the wavelength of the light source of the exposure apparatus must be shortened and the NA (numerical aperture of the optical system) must be increased. However, as the wavelength decreases, the optical glass that can withstand practical use is limited due to light absorption.

In such a case, if the projection optical system of the exposure apparatus is constituted only by the refraction optical system, chromatic aberration correction becomes impossible at all. Therefore, it is very difficult to construct a projection lens by constructing an optical system using only a refraction system as the projection optical system to achieve the required resolution.

On the other hand, attempts have been made to configure the projection optical system of the exposure apparatus using only the reflection optical system, but in this case, the projection optical system becomes large and the reflection surface needs to be made aspherical. . Using a large number of high-precision reflective aspheric surfaces becomes extremely difficult in terms of manufacturing. Therefore, a reflective optical system and a refractive optical system made of optical glass that can be used for the wavelength used are combined. Various so-called catadioptric optical systems have been proposed.

Among them, various types have been proposed to perform at least one intermediate image formation in the middle of the optical path of the projection optical system, but various types have been proposed so far. For example, Japanese Unexamined Patent Publication No. Hei 5-25170, Japanese Unexamined Patent Publication No. 63-163319, Japanese Unexamined Patent Publication No. 4-234722, and US Pat. No. 4,779,966 may be mentioned.

Among the above prior arts, the one using only one concave mirror is the optical system disclosed in JP-A-4-234722 and USP-4,779,966. In these optical systems, only a negative lens is used in a reciprocating optical system composed of a concave mirror, and a positive power system is not used. As a result, the light beam spreads and enters the concave mirror, so that the diameter of the concave mirror tends to increase.

In particular, the reciprocating optical system disclosed in Japanese Patent Application Laid-Open No. 4-234722 is a completely symmetrical type, and the generation of aberrations in the optical system there is minimized, and the subsequent refractive optical system is responsible for aberration correction. However, since the symmetrical optical system is used, the working distance (WD) on the first surface (reticle or mask) side is reduced. In the optical system disclosed in US Pat. No. 4,779,966, a concave mirror is used in a second imaging optical system behind the intermediate image. Therefore, in order to ensure the required brightness of the optical system, the light beam spreads and enters the concave mirror, making it difficult to reduce the size of the concave mirror.

In the case of using multiple concave mirrors, there is a possibility that the number of lenses in the refractive optical system can be reduced. However, these types have the following problems.

That is, recently, in order to increase the resolution while increasing the depth of focus, the ratio σ value of the N A of the illumination optical system and the N A of the projection optical system is made variable. In this case, an aperture stop can be installed in the illumination optical system, but if the above-described catadioptric optical system is used in the projection optical system, an effective aperture installation portion cannot be taken anywhere in the projection optical system. It will be.

Further, in a catadioptric optical system of a type employing such a reciprocating optical system on the second surface (wafer or plate) side on the reduction side, the light is reflected by the reflecting mirror due to the reduction magnification. Later, since the distance to the second surface cannot be long, the number of lenses of the projection optical system inserted in this optical path cannot be so large, and the brightness of the obtained optical system must be limited. I didn't get it. Even if an optical system with a high NA can be realized, the distance between the wafer and the end face of the projection optical system, the so-called working distance (WD), cannot be long because many optical members are inserted in a limited length. It was an optical system.

Further, in the above-described conventional catadioptric optical system, it is necessary to decenter the optical axis of the optical path in the middle of the optical path. Adjustment of the eccentric part of this eccentric optical system was difficult, and it was difficult to realize a highly accurate optical system.

In the present invention, in view of the above-mentioned problems, a catadioptric optical system capable of adopting an effective diaphragm installation portion, having a sufficient peaking distance, and being capable of forming a large-sized concave mirror with the smallest possible size. It is intended to provide a system. Disclosure of the invention

In the present invention, in order to achieve the above object, in order from the first surface R to the second surface W side, a first imaging optical system G1 composed of a refractive lens, at least one concave lens and two reflecting mirrors are provided. And a third imaging optical system G3 comprising a refracting lens.The first imaging optical system G1 has a first intermediate image IM of the first surface R. The second imaging optical system G2 forms a second intermediate image IM2 by re-imaging the first intermediate image IM1, and the third imaging optical G3 system. Provides a catadioptric system that re-images the second intermediate image IM2 onto the second surface W.

The present invention also provides a projection exposure apparatus and a projection exposure method using the catadioptric optical system.

Specifically, a light source, an illumination optical system for uniformly irradiating a light beam from the light source onto the first surface R, and a catadioptric optical system for projecting the first surface R to the second surface W Provided is a projection exposure apparatus characterized by including:

The illumination light is emitted from the light source, and the illumination optical system uniformly illuminates the illumination light on the first surface R. And a projection exposure method, wherein the first surface R is projected onto the second surface W using the above-described catadioptric system, and the second surface W is exposed. BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is a principle diagram of a catadioptric optical system according to the present invention.

FIG. 2 is an optical path diagram of the catadioptric optical system of the first embodiment.

FIG. 3 is a coma aberration diagram of the first example.

FIG. 4 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the first example.

FIG. 5 is an optical path diagram of the catadioptric optical system of the second embodiment.

FIG. 6 is a coma aberration diagram of the second example.

FIG. 7 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the second example.

FIG. 8 is an optical path diagram of the catadioptric optical system of the third embodiment.

FIG. 9 is a coma aberration diagram of the third example.

FIG. 10 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the third example.

FIG. 11 is an optical path diagram of the catadioptric optical system of the fourth embodiment.

FIG. 12 is a coma aberration diagram of the fourth example.

FIG. 13 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the fourth example.

FIG. 14 is an optical path diagram of the catadioptric optical system of the fifth embodiment.

FIG. 15 is a coma aberration diagram of the fifth example.

FIG. 16 is a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the fifth example.

FIG. 17 is an optical path diagram of the catadioptric optical system of the sixth embodiment.

FIG. 18 is a coma aberration diagram of the sixth example.

FIG. 19 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the sixth example.

FIG. 20 is an optical path diagram of the catadioptric optical system of the seventh embodiment.

FIG. 21 is a coma aberration diagram of the seventh example. '

FIG. 22 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the seventh example.

FIG. 23 is an optical path diagram of the catadioptric optical system of the eighth embodiment. FIG. 24 is a coma aberration diagram of the eighth example.

FIG. 25 is a diagram of spherical aberration, astigmatism, and distortion of the eighth embodiment.

FIG. 26 is a diagram of a projection exposure apparatus according to the present invention.

FIG. 27 is a view showing the procedure of the projection exposure method according to the present invention. BEST MODE FOR CARRYING OUT THE INVENTION

By employing the first imaging optical system G1 to the third imaging optical system G3 as described above, the optical axes of these imaging optical systems can be configured to be a single straight line.

Therefore, according to the catadioptric optical system of the present invention, there is no need to adjust the eccentric portion of the eccentric optical system, which is a problem in the so-called conventional catadioptric system, which is a problem because the optical axis is decentered. Thus, a high-precision optical system can be realized.

Further, by configuring the catadioptric system, color correction, which is a characteristic of the catadioptric system, is performed, so that color correction using a single glass type is possible.

Furthermore, since the refractive optical system portion (the first imaging optical system and the third imaging optical system) includes a positive power, the Petzval sum, which tends to be a positive value, is also reduced by the negative peak of the concave mirror portion. It can be completely canceled out by the Koval value.

Of course, if such a configuration is adopted, the first intermediate image IM1 is converted into a first concave mirror K1 (a concave mirror that is arranged near the first imaging optical system G1 of the two concave mirrors) with an aperture. The second intermediate image is formed near the center opening of the second concave mirror K 2 (a concave mirror disposed near the third imaging optical system G 3 of the two concave mirrors), and the second intermediate image is formed. It is necessary to guide the light ray path backward through the center opening of.

For this reason, the entrance pupil has a central shielding part, but the size of the intermediate image is smaller than the size of the concave mirror, and the image formation position of the intermediate image is far away from the position of the concave mirror. Therefore, the size of the central shielding portion relative to the size of the entrance pupil, that is, the so-called central shielding ratio is small, and does not significantly affect the imaging performance.

In the present invention, when the numerical aperture on the second surface side is NA0 and the effective diameter of at least one concave lens of the second imaging optical system is Φ, it is preferable that the following condition is satisfied. New

3 Χ Φ 1 0 0 0 X NAO

This condition is for reducing the size of the refractive lens and the reflecting mirror used in the catadioptric optical system. If this condition is not met, it becomes difficult to reduce the size of the refractive lens and the reflecting mirror.

In order to obtain a higher-performance catadioptric system, it is preferable that the catadioptric system be composed of 21 or more refractive lenses. Even better results can be obtained if it consists of more than a few refracting lenses.

The catadioptric optical system is preferably composed of 20 or less refractive lenses when the performance of the antireflection coating is difficult to improve or when there is a problem with the transmittance of the glass material. 'Even better results can be obtained if it consists of no more than 18 refractive lenses.

In a more preferred embodiment, in order to have an aperture between the two reflecting mirrors or to satisfactorily correct chromatic aberration, the two reflecting mirrors are arranged so as to face each other with the concave reflecting surfaces facing each other. It is preferably a concave mirror.

In addition, it is preferable that the first imaging optical system G1 includes at least two or more positive lenses, and the third imaging optical system G3 includes at least two or more positive lenses. Further, it is preferable that at least one or more aperture stops are arranged in the first imaging optical system G1 or the third imaging optical system G3. In addition, it is preferable that at least one or more central shielding plates be disposed in the first imaging optical system G1 or the third imaging optical system G3. By doing so, the image quality can be improved.

The catadioptric system preferably includes at least five or more aspheric surfaces. By using an aspherical surface, it is possible to achieve higher performance of the projection optical system and a reduction in the number of lenses. Further, it is preferable that all the refractive lenses of the catadioptric system are made of the same glass material, particularly fluorite. As the glass material, besides fluorite, quartz glass to which fluorine is added or crystals of a fluorine compound can be considered.

In addition, of the two concave mirrors, the one arranged closer to the first surface side R is referred to as the first 113 The surface mirror Kl, the one located closer to the second surface W side is the second concave mirror K2, and the distance from the position of the first intermediate image I Ml to the position of the first concave mirror 1 is d1, When the distance from the position of the second intermediate image IM2 to the position of the second concave mirror K2 is d2, and the diameter of the exposure area on the second surface W is, the following conditions are preferably satisfied.

I d l I

I d 2 I

The condition relating to d1 defines an appropriate refractive power distribution of the first imaging optical system G1 and the second imaging optical system G2, and the condition relating to d2 corresponds to the second imaging optical system G1. G2 and third imaging optical system G3 define an appropriate refractive power distribution. If these conditions are deviated, the refractive power of one of the imaging optical systems becomes tight, and it becomes difficult to satisfactorily correct aberrations, and at the same time, it becomes difficult to reduce the size of the concave mirror.

The catadioptric optical system is preferably a telecentric optical system on the first surface R side or the second surface W side.

The catadioptric optical system according to the present invention basically includes, as shown in FIG. 1, a first imaging optical system Gl and a second imaging optical system G2 in order from the first surface to the second surface W side. And a third imaging optical system G3. Here, the first imaging optical system G1 forms a first intermediate image I Ml of the first surface R near the second imaging optical system G2. Further, the second imaging optical system G2 forms a second intermediate image IM2, which is a re-imaged image of the first intermediate image IM1, in the vicinity of the third imaging optical system G3. The optical system G3 forms the second intermediate image IM2 on the second surface W. In FIG. 1, the directions of the object and the image based on the imaging relationship among the first surface R, the first intermediate image IM1, the second intermediate image IM2, and the second surface W are indicated by arrows. FIG. 1 also shows scanning directions on the first surface R and the second surface W when the catadioptric optical system according to the present invention is applied to a scanning projection exposure apparatus. The running directions on the first surface R and the second surface W are opposite to each other. The illumination area and the exposure area have a rectangular shape centered on the optical axis. Note that an aperture stop ST0 is disposed in the third imaging optical system G3.

In each of the embodiments described below, an aspherical surface is used. Is as follows ₍ y: Height from optical axis

z: Distance in the optical axis direction from the tangent plane to the aspheric surface

r: radius of curvature at the vertex

κ: Cone coefficient

A, B, C, D: Aspheric coefficient

Further, the projection optical systems of the following embodiments are all made of fluorite. Fluorite has a refractive index of 1.5600 at a wavelength of 157 nm.

Below, each Example by this invention is shown. In the table below, CaF2 indicates fluorite, REF indicates a reflector, and ST0 indicates an aperture stop.

(First embodiment)

As shown in FIG. 2, the catadioptric optical system according to the first embodiment includes, in order from the first surface R to the second surface W side, a first imaging optical system Gl, a second imaging optical system G2, and a second imaging optical system G2. It consists of three imaging optics G3. The first imaging optical system G1 is provided with three positive meniscus lenses, three negative meniscus lenses, two positive lenses, and three positive meniscus lenses in order from the first surface R side. The two imaging optics G 2 is trained by one concave mirror, two negative meniscus lenses and one concave mirror. In addition, the third imaging optical system G 3 includes one positive meniscus lens, one negative lens, two positive meniscus lenses, one negative lens, four positive meniscus lenses, and one negative meniscus lens. The course is taught by a lens and one positive meniscus lens.

The catadioptric optical system of this example has a reduction ratio of 1/4, a numerical aperture (NA) of the second surface W side of 0.75, and a maximum object height of the first surface R side of 37.44 mm. The maximum image height on the second side W side is 9.36 ram, and the exposure size on the second side W is a 17.5 x 6.6 mm rectangular aperture. You. By performing scanning and exposure, the overall exposure area is 17.2 X 25 mm. The WD is 50.912830 on the first surface R side and 13.234625 on the second surface W side.

The diameter of the concave mirror used is 260.2 mm or less, the effective diameter of the two largest lenses of the lenses used is 246.9 ram or less, and the effective diameter of most other lenses is 183. It is 5 watts or less, which is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.

The shielding ratio of the shielding part of the concave mirror to the light beam is 19.5% in NA ratio, and has little effect on the imaging performance, and sufficient high performance can be obtained.

The refractive lens part is made of fluorite, and chromatic aberration correction with a half-value width of 1 pm at a wavelength of 157 nm of an ultraviolet F2 excimer laser is performed.

In addition, as shown in FIGS. 3 and 4, spherical aberration, coma, astigmatism, and distortion are all well corrected to a state close to almost no aberration, thereby providing an optical system with excellent performance. table 1

Radius of curvature Surface spacing

-3000.00000 20.777380 CaF2 G

K: 0.000000

A:-. 414199E-07, B: 0.1101382E-11

C:-. 507220E-17 D: 0.410909E-20

2 -187.15560 92.403460

3 -558. 99669 25. 971725 CaF2

4 -210.93675 15.861605

5 263. 61227 25. 971725 CaF2

6 1257.90730 13.379506

K: 0.000000 A:-. 355346E-7 B: 0.293775E-11

C: 0.5514678E--17 D: 0.170581E-19

150.00000 29.526565 CaF2

94.28503 30.499818

420.59234 20D C. 800000 CaF2

141.55197 13.16 o900057

K: 0.000000 0 0

A:-. 137576E--06 B:-. 430519E-10

C: 0.9994337E- -14 D:-. 468002E-17

522.48173 20.722934 CaF2

155. 53167

1055.46476 17.359120 CaF2

-130.14083 22.492621

671.87155 21.568896 CaF2

-160.00000 37.130352

-225.56184 20.677950 CaF2

: 0.000000

A:-. 144554E- -06 B: 0.10603E-10

C:-. 946352E--15 D: 0.959437E-20

-101. 07298 14. 929386

156. 60829 20. 000000 CaF2

241.099685 3.949536

191.75976 20.777380 CaF2

480.17990 3.469721

127.28576 33.411885 CaF2

-1587.54253 29.129562

K: 0.000000 Two

9. S a 31. K: 0.000000

A:-. 161976E- 07 B:-. 584652E-12

C:-. 193271E-16 D:-. 650552E-21

-194.22167 25.609160 CaF2

K: 0.000000

A: 0.132322E- 07 B: 0.673254E-12

C: 0.2256289E-16 D: 0.413237E-21

1120.36909 31.786896

-246. 29797 31. 010448 Virtual surface

3000.00000 43.702739 CaF2G3: 0.000000

:-. 241471E-06 B:-. 189700E-10: 0.150133E-14 D:-. 600549E-18

-126. 02993 5. 832116

-506.82326 18.699642 CaF2

619.13207 26.763769

.1377. 00220 44.048046 CaF2: 0.000000

:-. 502983E- 07 B: 0.363010E-11:-. 133698E-16 D:-. 278297E-20

-126.12121 5.581581

■ 3000.00000 31.166070 CaF2

-211. 50805 101. 102525

-404.56272 18.699642 CaF2

3000.00000 18.000000

321.09183 25.000000 CaF2

3000.00000 31.200000 K 0.000000

A 0.262291E— 07 B: 0.174496E— 11

C 0. 726166E-16 D:-. 125632E-20

53 oo 32. 963838 STO

54 179.49045 30.535668 CaF2

55 3000. 00000 42. 026705

56 228.90738 20.198128 CaF2

57 3000.00000 1.123733

K 0.000000

A 0. 118587E-07 B: 1.

C 0. 904169E-16 D:-. 814939E-20

58 100. 73952 33. 183232 CaF2

59 1100.00000 6.964116

60 2754.43020 15.000000 CaF2

K: 0.000000

：:-. 182017E-07 B:-. 884609E-11

C: 0.715263E-15 D:-. 161609E-19

61 493. 21390 6. 009195

62 164. 38322 40. 068312 CaF2

63 2793.72651 13.234625

(Second embodiment)

As shown in FIG. 5, the projection optical system according to the second embodiment includes, in order from the first surface R to the second surface W side, a first imaging optical system Gl, a second imaging optical system G2, and a third imaging optical system G2. It consists of an imaging optical system G3. The first imaging optical system G 1 includes, in order from the first surface R side, three positive meniscus lenses, three negative meniscus lenses, two positive lenses, one negative meniscus lens, and two positive meniscus lenses. The second imaging optical system G2 is provided by one concave mirror, two negative meniscus lenses, and one concave mirror. Third imaging light G3 has one positive meniscus lens, one negative lens, two positive meniscus lenses, one negative lens, four positive meniscus lenses, one negative lens, and one positive meniscus It is taught by lens.

The catadioptric optical system according to the present embodiment has a reduction ratio of 1/4, a numerical aperture (NA) force S 0.75 on the second surface W side, and a maximum object height 37.44 on the first surface R side. mm, the maximum image height on the second surface W side is 9.36 images, and the exposure size on the second surface W is a 17.5 x 6.6 cubic rectangular aperture. Thus, scanning and exposure are performed, and the overall exposure area is 17.2 X 25 mm. The WD is 50.000 000 on the first surface R side and 12.333503 on the second surface W side.

The diameter of the concave mirror used is less than 251.2 cm, the effective diameter of the two largest lenses among the lenses used is less than 238.4 mm, and the effective diameter of most other lenses is 187 mm This is much smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.

The refractive lens part is made of fluorite, and has a chromatic aberration correction with a half-value width of 1.0 pm at a wavelength of 157 nm of an ultraviolet excimer laser.

In addition, as shown in FIGS. 6 and 7, spherical aberration, coma, astigmatism, and distortion are all well corrected to almost no aberration, thereby providing an optical system with excellent performance. Table 2

Surface number Curvature radius Surface spacing

1 -3000.00000 22.000000 CaF2 G 1

K: 0.000000

A:-. 375155E-07 B: 0.129267E-11

C:-. 129447E-16 D: 0.274885E-20

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49 -298. 04283 26. 000000 CaF2

50 900.114 inch 29 18.000

51 26. 986309 CaF2

52 1840.88546 29.082204

K: 0.000000

A: 0.305762E- -07 B: 0.3506662E-11

C:-. 150807E- -16 D: 0.10764E--20

53 INFINITY 32. 814087 STO

54 183. 92572 27. 075959 CaF2

55 2999. 93355 40. 709071

56 199.36289 21.746889 CaF2

57 3000.00000 1.000299

K: 0.000000

A: 0.3334340E-08 B:-. 123754E-11

C: 0.2220160E-15 D:-. 245539E-19

58 107.10593 31.458160 CaF2

59 1100.00000 5.646428

60 -23185.44979 15.000165 CaF2

K: 0.000000

A: 0.165825E-07 B: ―. 600208E-II

C: ―. 104560E-14 D: 0.9976604E-19

61 678.36633 3.108222

62 172. 06068 38. 667335 CaF2

63 2689. 20000 12. 335033

(Third embodiment)

In the catadioptric optical system according to the third embodiment, as shown in FIG. In order to the side, it is composed of a first imaging optical system Gl, a second imaging optical system G2, and a third imaging optical system G3. The first imaging optical system G 1 includes, in order from the first surface R side, one negative meniscus lens, one positive lens, '' three positive meniscus lenses, one negative lens, and two positive meniscus. It consists of a lens, two positive lenses, and two positive meniscus lenses, and the second imaging optical system G 2 is configured by one concave mirror, two negative meniscus lenses, and one concave mirror. . The third imaging optical system G3 includes one positive lens, one negative lens, one positive meniscus lens, one positive lens, one positive meniscus lens, one negative meniscus lens, The course is taught by four positive meniscus lenses, one positive lens, one negative meniscus lens and one positive meniscus lens.

The catadioptric optical system of this embodiment has a reduction magnification power S 1/4 times, a numerical aperture NA on the second surface W side of 0.75, and a maximum object height on the first surface R side of 52.8 sq. The maximum image height on the second side W side is 13.2, and the exposure size on the second side W is a rectangular aperture of 25 x 8.8 mm. By scanning and exposing, the overall exposure area is 25 x 33 thighs. The WD is 72.733469.5 on the first surface R side and 17.227255 on the second surface W side.

The diameter of the concave mirror used is 260 mm or less, the effective diameter of the two largest lenses of the lenses used is 259 mm or less, and the effective diameter of most other lenses is 188 mm or less. However, it is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system used in the normal specification.

The shielding ratio of the shielding part of the concave mirror to the light flux is 20% in NA ratio, and has little effect on the imaging performance, and it is possible to obtain sufficiently high performance.

The refractive lens part is made of fluorite and has a chromatic aberration correction with a half-width of 2 pm at a wavelength of 157 nm of ultraviolet F2 excimer laser.

In addition, as shown in FIGS. 9 and 10, spherical aberration, coma, astigmatism, and distortion are all well corrected to almost no aberration, providing an optical system with excellent performance. . Table 3 Two

εεΌ SO α363ώ03:- 12

twenty one

-68.56232 20.000000 CaF2

-70.74293 41.134534

567. 87517 25. 000000 CaF2

-194. 21146 10. 854699

210.32584 30.000000 CaF2

-387.06333 5.932971

163. 81379 35. 000000 CaF2

1102.33199 1.887552

K: 0.000000

A: 0.158223E--06 B:-. 539232E-11

C: 0.7714678E--15 D:-. 255633E-19

140.36912 31.500000 CaF2

794.90624 25.500189

220.90770 36.8333447 Virtual surface

1036. 33936 22.500000 CaF2 G 2

188.66330 94.552939

K: 0.000000

A:-. 256120E- -07 B:-. 895159E-12

C:-. 185484E- -16 D:-. 417720E-21

-240.79096 22.500000 CaF2

K: 0.000000

Λ

n. '• n v. R ϋRΟ1Ι 91 丄 P- -08 B: 0.42147E-12

c: 0.378121E--17 D: 0.191012E-21

-1024.32842 24.739484

-258.87707 -24.739484 REF

-1024. 32842 -22. 500000 CaF2

-240.79096 -94.552939 K: 0.000000

A: 0.668122 IE-08 B: 0.221447E-12

C: 0.378121E-17 D: 0.191012E-21

188.66330 -22.500000 CaF2

K: 0.000000

Α:-. 256120E-07 B:-. 895159E-12

C:-. 185484E-16 D:-. 417720E-21

1036.33936-36.8333447

220.90770 36.8333447 EF

1036.33936 22.500000 CaF2

188.66330 94.552939

K: 0.000000

A:-. 256120E-07 B:-. 895159E-12

C:-. 185484E-16 D:-. 417720E-21

-240.79096 22.500000 CaF2

K: 0.000000

A: 0.6681221E-08 B: 0.42147E-12

C: 0.3378121E-17 D: 0.191012E-21

-1024.32842 24.739484

-258.87707 25.486063 Virtual surface

407.25535 38.190207 CaF2 G3 -80.77131 0.450000

-90.03715 13.500000 CaF2

-3749.7527 11.431836

K: 0.000000

A: 0.179888E-06 B:-. 100180E-10

C: 0.237530E-15 D: 0.234800E-19 -291. 30723 31. 500000 CaF2

129.59272 30.000000 CaF2

209.83508 0.090000

109.82374 36.402419 CaF2

-1410.86181 11.758388

K: 0.000000

A: 0.738536E- -07 B: 0.186966E-11 C:-. 217836E-16 D:-. 114821E-19

64 -257.15288 13.500000 CaF2

K: 0.000000

A: 0.160993E-06 B:-. 241393E-10

C: 0.2214179E-14 D:-.751863E-19

65 -1000.00000 10.984355

66 135.64836 24.135094 CaF2

67 2954.96641 17.227255

(Fourth embodiment)

The catadioptric optical system according to the fourth embodiment includes, as shown in FIG. 11, a first imaging optical system G1, a second imaging optical system G2, and a second surface W in order from the first surface R to the second surface W. It comprises a third imaging optical system G3. The first imaging optical system G1 includes three positive meniscus lenses, one negative meniscus lens, one negative lens, one positive meniscus lens, and two positive lenses in order from the first surface R side. , One positive meniscus lens, one positive lens, and one positive meniscus lens, and the second imaging optical system G2 has two concave mirrors arranged to face each other symmetrically. And two negative meniscus lenses. The third imaging optical system G3 includes one positive meniscus lens, one concave lens, two positive meniscus lenses, one negative meniscus lens, four positive meniscus lenses, one negative lens, It consists of one positive meniscus lens.

The catadioptric optical system of this embodiment has a reduction magnification of 1/4, a numerical aperture on the second surface W side of 0.75, a maximum object height on the first surface R side of 52.8 thighs, and a second surface. The maximum image height on the W side is 13.2 mm, and the exposure size on the second surface W is a rectangular aperture of 25.0 X 8.8 ram. With this, scanning and exposure are performed, and the entire exposure area is set to 25.0 X 33 rows. In addition, WD is 78.864226 on the first surface R side and 12.628525 on the second surface W side.

The diameter of the concave mirror used is less than 265 cm, the effective diameter of the two largest lenses of the lenses used is less than 260 mm, and the effective diameter of most other lenses is less than 183 cm. , The effective lens of the refractive system spherical optical system used in this specification It is much smaller than the diameter.

The shielding ratio of the shielding part of the concave mirror to the light beam is 20% in NA ratio, and the effect on the imaging performance is small, and sufficiently high performance can be obtained.

The refractive lens part is made of fluorite, and has a chromatic aberration correction with a half-value width of 2.0 pm at a wavelength of 157 nm of an ultraviolet excimer laser.

In addition, as shown in Figs. 12 and 13, spherical aberration, coma, astigmatism, and distortion are all well corrected to almost no aberration, providing an optical system with excellent performance. . Table 4

Surface number Curvature radius Surface spacing

-3000.00000 22.075897 CaF2 G 1

K: 0.000000

A:-. 654529E-07 B:-. 199200E-11

C:-. 674789E-16 D:-. 342457E-20

2 -386.8014052.772690

3 -373. 50991 27.882563 CaF2

4-156.04363 100.139573

5 -3000. 00000 35. 000000 CaF2

K: 0.000000

A: 0.530589E-08 B: 0.169821E-11

C:-. 942769E-16 D: 0.40941E-21

6 -229. 11836 1. 000000

7 88.82633 50.737308 CaF2

8 65.21188 45.509130

9 -108.82430 23.450398 CaF2

: 0.000000 609S9 '66 ^ T69 '681

z o zd ^ o oooogz 'Z 69 Έ96 η

Μ ~ εε8 9 · 6ε f9 £ S 'SZZ

6Ϊ-Η8920Ι9-: dΐ- -368902 ^ "0: 0Π-38ΠΖ9Ζ'-: a 90- -3SZ690C Ό: V

000000 Ό: ¾ f8Bl £ '9fl ζζ z ^ d omz' ζε ZLI Z '901 ιζ

6Χ-Η9 ^ Τ08Ζ α: α -'aeizzi '-:

TT-a089S98: 9 ιο- -3X92909 Ό: V

000000 ：:

000000 · ΐ 9Π99 "Z68- 02

000000 Ί 00000 OOS 81 ¾ 000000 '92 Τ6ΐεε 'Lfz LI

-f l £ Z L "I8S- 91

998 '68Z 91

000000 66S9 ^ "S6T- fl

Π8 "99 ει 8tSS9 'Z 29866' Ψ91- 8T-a22C9T2 ：: d fl- -as ^ oin Ό:

0T-3868ZS2 "0: 9 LO- -3Z8S8TT Ό: V

000000 Ό: zd ^ o 89 09 'εε LL O 1S9- II

S90S99 ΊΤ · £ 0Ζ 01 T-az6S909-: α l- '-: D

Οΐ-3906998 ·-: Η 90- -H09SSZI '0: V

9Z

ZT600 / I0df / X3d Z0S6S / T0 OAV K: 0.000000

Α:-. 252659E-07 B:-. 830414E-12

C:-. 175740E-16 D:-. 268579E-21 -297. 63016 24.750000 CaF2 K: 0.000000

A: 0.5546102E-08 B: 0.289886E-12

C: 0.177975E-17 D: 0.1119389E-21 -2160.94390 24.864215

-281.20741 ― ■ 24.854215 REF -2160.94390-■ 24.750000 CaF2 -297.63016-.99. 636094

K: 0.000000

A: 0.5546102E-08 B: 0.289886E-12

C: 0.177975E-17 D: 0.1119388E-21 189.59124 1 • 24.750000 CaF2 K: 0.000000

A:-. 252659E- 07 B:-. 830414E-12

C:-. 176740E-16 D:-. 268579E-21 963. 69544--39. 634833

228.49364 39.634833 REF 963.69544 24.750000 CaF2 189.59124 99.636094

K: 0.000000

A:-. 252659E-07 B:-. 830414E-12

C ―. 176740E-16 D:-.268579E-21 -297. 63016 24.750000 CaF2 K: 0.000000 A 0. 546102E-08 B: 0.289886E-12

C 0.177975E-17D: 0.1119388E-21

2160.94390 24.864215

-281.20741 31.125800 Virtual surface

3000.00000 35.472862 CaF2 G 3

K 0.000000

A-. 170069E-06 B: 0.674464E-11

C 0. 186386E- • 14 D: 0.143709E—18

-92.54829 3.008806

-249. 24892, 24. 585174 CaF2

4651.12185 19.289496

1377. 18462 30. 000000 CaF2

K 0.000000

A-. 548419E- ■ 07 B: 0.426591E-12

C 0. 201460E- • 15 D:-. 141841E-19

-137. 02413 1. 000000

-529.67962 41.532614 CaF2

-178. 30383 32. 564995

1120.95257 20.000000 CaF2

950.03072 33.00000

243.45289 20.00000000 CaF2

817.22813 43.500000

K 0.000000

A 0.114940E- -07 B: 0.694313E-12

C-. 162058E- -16 D:-. 112537E-20

INFINITY 14. 493571 STO

259.52152 30.000000 CaF2 53 1200.60898 30. 738619

54 120. 15502 25. 979031 CaF2

55 338. 49381 3.701219

K: 0.000000

A: 0.433295E-07 B:-· 118741E-11

C:-. 719231E-16 D:-. 375588E-20

56 101. 37860 32. 225269 CaF2

57 1768.45447 9.504206

58 -297. 45709 15.890847 CaF2

K: 0.000000

Α: 0.17164E-07 B: 0.3316707E-11

C:-. 333732E-15 D: 0.1112876E-19

59 274.59785 8.773853

60 74.77999 40.562463 CaF2

61 2700.00000 12.629629525

(Fifth embodiment)

The catadioptric optical system according to the fifth embodiment includes, as shown in FIG. 14, a first imaging optical system G1, a second imaging optical system G2, and a second surface W in order from the first surface R. It comprises a third imaging optical system G3. The first imaging optical system G 1 includes, in order from the first surface R side, one positive meniscus lens, one positive lens, one negative meniscus lens, one negative lens, and two positive meniscus lenses The second imaging optical system G2 is provided by one concave mirror, two negative meniscus lenses, and one concave mirror. The second imaging optical system G2 is provided by two positive lenses and one concave meniscus lens. The third imaging optical system G3 has two positive lenses, one negative meniscus lens, one positive meniscus lens, one positive lens, one positive lens, one positive meniscus lens, One negative meniscus lens, two positive lenses, one negative meniscus lens, one positive meniscus lens, and one negative meniscus lens. The catadioptric optical system of this example has a reduction ratio of 1/4, a numerical aperture NA on the second surface W side of 0.75, a maximum object height on the first surface R side of 52.8 mm, The maximum image height on the W side of the second surface is 13.2 thighs, and the exposure size on the second surface W is a rectangular aperture of 25 x 8.8 thighs. The exposure area is 25 X 8.8 ram, and the WD is 110.490999 on the first surface R side and 13.000594 on the second surface W side.

The diameter of the concave mirror used is 313 mm or less, the effective diameter of the two largest lenses of the lenses used is 308 or less, and the effective diameter of most other lenses is 195 awake or less. However, it is considerably smaller than the effective diameter of the lens used in the refractive spherical optical system used in the ordinary spec.

The shielding ratio of the shielding portion of the concave mirror to the light beam is 23% in NA ratio, and has little effect on the imaging performance, and it is possible to obtain sufficiently high performance.

The refractive lens part is made of fluorite and has a chromatic aberration correction with a half-width of 2 pm at a wavelength of 157 nm of an ultraviolet excimer laser.

In addition, as shown in Figs. 15 and 16, spherical aberration, coma, astigmatism, and distortion are all well corrected to almost no aberration, providing an optical system with excellent performance. . Table 5

Surface number Curvature radius Surface spacing

1 159. 32095 25. 651285 CaF2 G 1

K: 0.000000

A:-. 324889E-07 B:-. 524220E-12

C:-. 273309E-16 D:-138335E-20

2 2637.91245 142.138736

3 151.60085 26.901202 CaF2

4 -509. 70443 1. 877036

5 74.09675 20.000000 CaF2 57.88708 35.542620

K: 0.000000

A:-. 363303E-7 B: _. 410027E-1 11

C:-. 415849E- -15 D:-. 286718E-18

-159. 68008 15. 000000 CaF2

253.42748 13.780501

-82. 56455 30. 000000 CaF2

-70.90308 1.002904

K: 0.000000

A:-. 114773E--06 B: 0.234099E-12

C: 0. OOOOOOE + 00 D: 0. OOOOOOE + 00

-87. 46332 24. 956992

301.65849 28.809544 CaF2

-170.13474 16.440815

145. 40564 24. 000000 CaF2

-373.48587 1.115491

-523. 17400 20. 611851 CaF2

K: 0.000000

A:-. 158656E--06 B: 0.146192E-11

C: 0.214154E- -15 D: 0.937835E-20

-202.52624 37.489392

252. 45443 40.015913 Virtual surface

603.99618 32.760000 CaF2 G 2

181.82657 114.201884

K: 0.000000

A: I. 661884E- -08 B:-.: 157014E— 12 C:-. 424640E-17 D:-. 969518E-22 -391. 73360 32. 760000 CaF2 K: 0.000000

Α: 0.755172E-08 B: 0.392267E— 12 C:-. 266238E-17D: 0.2240423E-21 -2749. 75395 25.587922

-336.43406 -25.587922 REF -2749.75395 -32.760000 CaF2 -391.73360 -114.201884

K: 0.000000

A: 0.755172E-08 B: 0.392267E-12 C:-. 266238E- ■ 17 D: 0.2240423E-21 181.882657-32.760000 CaF2 K: 0.000000

A:-. 661884E- 08 B:-. 157014E-12 C:-. 424640E- • 17 D: _. 969518E-22 603. 99618 -40. 015913

252.45443 40.015913 REF 603.99618 32.760000 CaF2 181.882657 114.201884

K: 0.000000

A:-. 661884E- • 08 B:-. 157014E-12 C:-. 424640E- ■ 17 D:-. 969518E-22 -391. 73360 32. 760000 CaF2 K: 0.000000

A: 0.755172E- -08 B: 0.392267E-12 C:-. 266238E- -17 D: 0.2240423E-21 2T-a ^ 80 g "ο: a o- -aS6Z68I '-: V

000000 · 0: I

Si 99ΠΖ0 '6Z 0Ζ6 £ ζ88Τ-8

OIS 69 ζ A1INWNI Lf

T9ZZ6S '8ΐ ε½ε' οεζ 9

Zd ^ D 6 ^ 6S 'OS 68 9ΐ69ΐ

oooooo τ 99ZLZ Ί 9_

02-Η098Τ9Ι '-: d91- -H0 Z6I · 0: 3

2ΐ-3 ^ 6990Ζ-: a zo- -H0S206Z "-: V

000000 · 0: ¾

Zi ^ D 0000008Ζ6S 98Ζ8 Zf

Ϊ0289Ι 'S 98S60 "99ΐ- Z

Ζή ^ Ο I96T0 "S 98 ^ 80 '9Ζΐ- If

8CG00S 'f ΪΖΖ98' SSI- Of

6Ι-3Τ88Τ Π Ό: α 9Τ- -aZST60T '-: 0

Ζΐ-3 ^ 066Ζ8'-: Η Ζ0- -3Τ96δΠ ': V

000000 '0: 1

Zd ^ O 999Ϊ60 τζ szsze τζι- 68

Ζ68Ι9 · 89Ζ_

00 + 3000000 Ό: α 00 + 3000000: 3 zi-mzLZZL ·-: a o- -H9I9Z8S Ό: V

000000:

Ζή ^ Ο S96 89 'Z 290 ^' S88 S

ε ο Zd ^ D 90Z806 '9 99ΖΗ '80 εΐ 9S ffif ^ 09t8S8' 6f 90 "9εε-

96SSZ '6flZ- εε

εε

ZT600 / I0df / X3d Z0S6S / T0 OAV C:-. 708602E--16 D: 0.313415E-20

49 -242. 4891 78. 739019

50 39.841080 CaF2

K: 0.000000

A:-. 394487Ε- -07Β:-. 442516E-12

C:-. 396969Ε- -16 D: 0.5575958Ε- 21

51 -883.24052 2.195912

52 737.47989 28.00000000 CaF2

53 ■ 1302. 38891 1. 112464

54 117.94897 37.991002 GaF2

55 85. 68253 1. 000000

K: 0.000000

A: One. 123733E--06 Β:-.: 140293E-10

c:-. 164551E- -14D:-. 238378E-18

56 81.00762 26. 342878 CaF2

57 274. 41527 1. 081239

58 147. 55374 35. 700000 CaF2

59 103. 84485 13.000594

(Sixth embodiment)

As shown in FIG. 17, the catadioptric optical system according to the sixth embodiment includes, in order from the first surface R to the second surface W side, a first imaging optical system Gl, a second imaging optical system G2, It comprises a third imaging optical system G3. The first imaging optical system G 1 includes, in order from the first surface R side, one positive lens, one positive meniscus lens, two negative meniscus lenses, two positive lenses, and one positive meniscus lens The second imaging optical system G2 is provided by one concave mirror, two negative meniscus lenses, and one concave mirror. The third imaging optical system G3 is controlled by one positive lens, two positive meniscus lenses, two positive lenses, one positive meniscus lens, one positive lens, and two positive meniscus lenses. Done It is.

The catadioptric optical system of this example has a reduction ratio of 1/4, an image-side numerical aperture NA of 0.75, a maximum object height of 51.2 讓, and a maximum image height of 12.8 讓. The exposure size on the wafer is a 25 x 5.5 mm rectangular aperture. Thus, scanning and exposure are performed, and the overall exposure area is 25 X 33 mm. The WD is 224.250603 on the first surface R side and 18.245931 on the second surface W side.

The diameter of the tetrahedron used is 272 ram or less, the effective diameter of the two largest lenses of the lenses used is 269.2 mm or less, and the effective diameter of most other lenses is 191.6. mm or less, which is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this spec.

In addition, as shown in FIGS. 18 and 19, spherical aberration, coma, astigmatism, and distortion are all well corrected to almost no aberration, providing an optical system with excellent performance. . Table 6

No. Curvature radius Surface spacing

1 675. 27704 28. 000000 CaF2 G 1

Κ 0.000000

A-. 146813E-07 B: 0.539491E-13

C 0. 103176E-17 D:-. 244047E-21

2 335. 34816 1. 000000

3 157. 23297 33. 000000 CaF2

4 661.95829 111.498290 534. 17597 15.000000 CaF2

79.28442 24.533018

K: 0.000000

A:-. 797912E- 06 B: 0.168232E-10

C: 0.1117292E-13 D: 1. 330075E-18

-319.67720 60.00000000 CaF2

-495.87689 8.881377

K: 0.000000

Α:-. 546569E- 07 B:-. 157901E-10

C: 0.228747E-14 D:-.168939E-17

232.64869 60.00000000 CaF2

-146.64044 62.387678

K: 0.000000

A:-. 200960E-06 B: 0.264632E-10

C:-. 626544E- 15 D: 0.109885E 18

107.02679 25.087487 CaF2

-841. 18145 0.100000

K: 0.000000

A: 0.129965E- ■ 06 B:-700973Ε-Π

C: 0.30494E- ■ 15 D: _. 199817E-19

100.79906 23.657931 CaF2

K: 0.000000

A:-. 240247E- ■ 06 B:-. 168548E-10

C:-. 4Π925Ε-15 D:-. 888645E-19

875.61302 25.002516

241. 41202 38.633224 Virtual surface

1168. 21411 30. 000000 CaF2 G 2 203.40383 112.439708

K 0.000000

A 833351E 08B:-. 207642E-12 C-. 102761E-16 D:-. 273382E-21 -202. 10723 30. 000000 CaF2

K 0.000000

A 0.990715E- .08 B: 0.324224E-12 C i. 514650E- ■ 18 D: 0. 201608E-21 -425. 74836 14.807807

-283.61051 -14.907875 REF -425.74836 -30.000000 CaF2 -202.10723 -112.439708

K 0.000000

A 0.990715E- 08 B: 0.324224E-12 C ―. 514650E-18 D: 0. 201608E-21 203. 40383 -30. 000000 CaF2

K 0.000000

A-. 833351E- 08 B:-. 207642E-12 C-. 102761E- .16 D:-. 273382E-21 1169. 21411 -38. 633224

241.41202 38.633224 REF 1168.21911 30.000000 CaF2 203.40383 112.439708

K 0.000000

A-. 833351E- 08 B:-. 207642E-12 C-. 102761E-16 D:-. 273382E-21 202. 10723 30. 000000 CaF2 K: 0.000000

A: 0.9990715E- 08 B: 0.324224E-12

C:-. 514650E-18 D: 0. 20160BE-21

-425.74836 14.80707

-283.61051 25.000000 virtual, surface

408.30244 15.958879 CaF2 G 3 -129.66207 0.100000

K: 0.000000

Α: 0.308939E-06 B:-. 495584E-12

C: 0.5568005E-14 D:-. 203678E-17

841.18145 43.602945 CaF2

3875.93725 10. 578146

K: 0.000000

Α: 0.171725E- ■ 07 B: 0.334495E-10

C:-. 131126E- 13 D: 0.5512647E-18

-167.86677 60.00000000 CaF2

K: 0.000000

A: 0.391387E-06 B: —. 110373E-10

C:-. 549672E-14 D:-. 497050E-18

-112.93534 24.501940

616.75392 43.453476 CaF2

K: 0.000000

A:-. 198458E--06 B: 0.30691E-11

C: one. 118837E- -15 D: 0.134586E-19

-373. 27621 31. 163698

224. 13016 35. 000000 CaF2

-1362. 06585 32. 000000 K: 0.000000

A: 0.5545277E-07 B: 0.3699811E-11

C:-. 103696E-15 D:-. 453358E-20

41 INFINITY 37.587346 STO

42 254. 79537 25.432188 CaF2

43 542.88995 71.860654

K: 0.000000

A: One 126528E-06 B: 0.785291E-11

C: one. 506945E-15 D: 0.132815E-19

44 154. 13901 26. 723139 CaF2

K: 0.000000

A:-. 118663E-06 B:-. 148063E-10

C: 0.1101438E-14 D:-. 509185E-19

45 -841. 18145 0.100000

46 130. 58367 35. 411951 CaF2

: 0.000000

A: 0.639539E-07 B: 0.195918E-10

C:-. 415162E-15 D: 0.7727844E-19

47 1672. 54131 1.000 000

48 70.06949 34.000000 CaF2

49 51. 37703 18. 245931

(Seventh embodiment)

As shown in FIG. 20, the catadioptric optical system according to the seventh embodiment includes a first imaging optical system Gl, a second imaging optical system G2, It comprises a third imaging optical system G3. The first imaging optical system G 1 includes three positive meniscus lenses, one negative meniscus lens, one negative lens, one positive meniscus lens, and two positive lenses in order from the first surface R side. , One positive meniscus lens, one positive lens, one positive lens The second imaging optical system G2 is composed of two concave mirrors and two negative meniscus lenses which are arranged symmetrically facing each other. The third imaging optical system G3 includes one positive meniscus lens, one negative lens, two positive meniscus lenses, one negative meniscus lens, four positive meniscus lenses, and one negative meniscus lens. The lens consists of one positive lens.

The catadioptric optical system of this embodiment has a reduction ratio of 1/4, an image-side numerical aperture NA of 0.75, a maximum object height of 41.6, and a maximum image height of 10.4. The exposure size of the second side WJ is a 20.0 X 5.5 ram rectangular aperture. Thus, scanning and exposure are performed, and the entire exposed area is set to 20.0 X 33 awake. WD is 166.292101 on the first surface R side and 15.484990 on the second surface W side.

The diameter of the concave mirror used is 264.3 mm or less, the effective diameter of the two largest lenses of the used lenses is 259.8 or less, and the effective diameter of most other lenses is 182. It is 5 mm or less, which is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.

The refractive lens part is made of fluorite, and has a chromatic aberration correction with a half-width of 2.0 pm at a wavelength of 157 nm of an ultraviolet excimer laser.

In addition, as shown in FIGS. 21 and 22, spherical aberration, coma, astigmatism, and distortion are all well corrected to almost no aberration, providing an optical system with excellent performance. . Table 7

Surface number Curvature radius Surface spacing

1 -525.71881 18.855219 CaF2 G 1

K: 0.000000

A:-. 460704E-07 B: 0.5530079E-12 C:-. 290541E- -16 D:-.: 118063E-20

-168. 10582 1. 000000

174.09049 31.02363 CaF2

-434. 44522 83. 565235

-195.85797 15.000000 CaF2

134. 23857 18. 083546

K: 0.000000

A-. 517515E-06 B: .770290E-10

C 0.262130E-13 D: 0.155727E-17

-96. 19280 39. 200000 CaF2

-98.15241 34.935677

2573. 98955 60.00000000 CaF2

-104. 16392 46.463326

105.53430 57.942150 CaF2

-841. 18145 0.100000

126.95491 15.457412 CaF2

K 0.000000

A. 415551E-06 B:-270373E-10

C-. 131530E-14 D: 0.759664E-18

-516. 33392 25. 000000

239.22664 37.963959 Virtual surface

1137.01670 30.000000 CaF2 G2 203.83422 112.004716

K 0.000000

A-. 155989E-07 B:. 113913E-12

C 0.404793E-17D:-. 636121E-22

223. 15574 30. 000000 CaF2 K: 0.000000

A: 0.115838E- 07 B: 0.244013E-12 C: 0.366112E- ■ 17 D 0.376420E-21 -552.28008 17.415175

-290.52506 -17.415175 REF -552.28008-30.000000 CaF2 -223.15574 -112.004716

: 0.000000

: 0.115838E- 07 B: 0.244013E-12: 0.366112E- • 17 D: 0.3376420E-21

203.83422-30. 000000 CaF2: 0.000000

:-. 155989E- 07 B:-. 113913E-12: 0.404793E-17 D:-. 636121E-22 1137. 01670-37. 963959

239.22664 37.963959 REF 1137.01670 30.000000 CaF2

203.83422 112.004716

: 0.000000

:-. 155989E- .07 B:-. 113913E-12: 0.404793E-17 D:-. 636121E-22 -223. 15574 30. 000000 CaF2: 0.000000

: 0.115838E- • 07 B: 0.244013E-12: 0.366112E-17 D: 0.3376420E-21 -552. 28008 17. 415175

-290.52506 30.053542 Virtual surface -1386.54471 26.805234 CaF2 G 3 -91.53532 0.100000

K: 0.000000

A: 0.18052E-06 B: 0.195629E-10

C:-. 110934E- 14 D: 0.386843E-18

841.18145 23.670554 CaF2

-711. 10712 12.5422840

-105.01372 59.999909 CaF2

K: 0.000000

Α: 0.381349E-06 B:-. 473502E-10

C: 0.3331465E-14 D:-. 247388E-18

-110.87458 7.115651

-457. 60456 51. 201496 CaF2

K: 0.000000

Α:-. 143466E-06 B: 0.244627E-11

C: 0.115659E-15 D: 0.3357474E-20

-172. 32176 64.093132

248. 24178 35. 000000 CaF2

-2267. 70363 32. 973714

K: 0.000000

A: 0.601607E-07 B:-. 668204E-12

C: 0.109411E- ■ 15 D: 0.240099E-20

INFINITY 95.819153 ST0

148.49449.34.0000000000 CaF2

1034.52186 23.149391

264.65948 20.021296 CaF2

K: 0.000000 A-. 928883E-07 B-. 318545E-11

C 0.395198E- 15 D-. 615977E-20

45 -841. 18145 0.100000

46 192.76008 42.091338 CaF2

K 0.000000

Α 0.100517E-06 B-. 214895E-11

C-. 536036E- 15 D-. 797901E-19

47 -722. 90445 1.000 000

48 82. 59564 34. 000000 CaF2

49 58. 64 470 15.484990

(Eighth embodiment)

The catadioptric optical system according to the eighth embodiment includes, as shown in FIG. 23, a first imaging optical system G1, a second imaging optical system G2, and It comprises a third imaging optical system G3. The first imaging optical system G 1 includes, in order from the first surface R side, one negative meniscus lens, one positive lens, three positive meniscus lenses, one negative meniscus lens, and two positive meniscus lenses. The second imaging optical system G2 includes a lens, two positive lenses, and two positive meniscus lenses.The second imaging optical system G2 includes one concave mirror, two negative meniscus lenses, and one concave mirror. . The third imaging optical system G3 has one positive lens, one negative meniscus lens, one positive meniscus lens, one positive lens, one positive meniscus lens, and one negative lens. It consists of a meniscus lens, four positive meniscus lenses, one positive lens, one negative meniscus lens, and one positive meniscus lens.

The catadioptric optical system of this example has a reduction ratio of 1/4, an image-side numerical aperture of 0.75, a maximum object height of 52.8 mm, and a maximum image height of 13.2 mm. The exposure size on the two sides W is a 25 x 8.8 rectangular aperture. Thus, scanning and exposure are performed, and the overall exposure area is 25 X 33 mm. WD is 181.103882 on the first surface R side and 18.788119 on the second surface W side. The diameter of the concave mirror used is 260.0 mm or less, the effective diameter of the two largest lenses of the lenses used is 258.1 mm or less, and the effective diameter of most other lenses is 174 thighs. This is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.

The shielding ratio of the shielding part of the concave mirror to the light beam is 24.0% in NA ratio, and has little effect on the imaging performance, and it is possible to obtain sufficiently high performance.

In addition, as shown in FIGS. 24 and 25, spherical aberration, coma, astigmatism, and distortion are all well corrected to almost no aberration, providing an optical system with excellent performance. . Table 8

Surface number Curvature radius Surface spacing

1 -522. 12779 30. 000000 CaF2 G 1

K: 0.000000

A:-. 836382E- 07 B:-. 232619E-12

C: 0.147976E-16 D:-. 418940E-20

2 -132. 55730 1. 000000

3 128. 94 293 35. 000000 CaF2

4 -12753. 60003 59.866513

5 -6802.25073 20.0000000 CaF2

6 55.79157 80.243257

K: 0.000000

A:-. 546724E-06 B:-. 181493E-09

C ： 0.1.24455E-15 D ：-. 176747E-16

7 -47.47029 20.0000000 CaF2 -60.32191 7.654429

290. 99547 40. 000000 CaF2

-113.88786 67.900717

K: 0.000000

A:-. 389830E-07 B: 0.132957E-10

C:-. 154157E-15D: 0.3371446E-19

157.77320 35.000000 CaF2

-841. 18145 0.100000

75.95634 35. 000000 CaF2

K: 0.000000

Α:-. 188721E-06 B:-. 172094E-10

C:-. 230506E-14 D:-. 451419E-18

136.73212 29.629039

236.80433 38.189196 Virtual, plane

1123.83252 25.000000 CaF2 G2 215.20242 118.218608

K: 0.000000

A:-. 125437E-07 B:-. 384933E-12

C:-548370E-17 D:-. 130736E-21

-230. 30939 25. 000000 CaF2

K: 0.000000

A: 0.794466E-08 B: 0.292879E-12

C: 0.193439E-17 D: 0.178964E-21

-715.80903 18.001730

-290.18558-18.001730 REF

-715.80903 -25.000000 CaF2

-230. 30939 -118. 218608 000000 '0: ¾

Zd ^ O 000000 • οτ B £ z τοι- εε

000000 'S 89189' 8 ー

'-: Α 0 60-aSC669I-: a 90-3T £ 88SC'-V

000000 Ό 1 ε ο 'ΐε L6f9 · 63ε is • 9S 8S98I · 06 OS οεζτοο · 8ΐ S0608' 1L ΐ2-3 ^ 968Ζΐ Ό: α ΐ— 36S½6I · 0 0 2I-36 8S62 Ό: 9 80-399 ^ 6Ζ V

000000 0

2 ^ 3 000000 "9Ζ 6S60S 'OSS— 82 ΐ2-39ε οει'-: α 3 2T-aes6t88-: a o-a s ^ 9ST '-V

000000 Ό

2 ^ 3 000000 92 ήΜ 96T68T '8ε εε 08' 9 £ ζ Z 96Τ68Ϊ • 8S- Ζ2Ζ £ 8-£ Zll fZ TZ-H9SZ0ST-: α ZT-aOZS8 9 '-0 zi-ass6 ^ 8e-: a L0- 2l £ f9Zl-V

000000 '0 1

Si 000000 '92-Z OZ 'ΪΖ

ΪΖ- 3 968 I 'O: α I-H6S ^ e6T Ό D

80-H99 ^ 6A "0 V

000000 I

ZT600 / I0df / X3d Z0S6S / T0 OAV n-as6½iz-: a o-as 9z 9: v

000000: 1

08 9606

00000T "0 ^ 8006 2 0Z-398S06T"-: α 9ΐ-9 £ ZL-: 0Ζΐ-3 08½'0: e 90-39SS66T: V

000000 "0: I

Zd ^ D fL £ LQ 'OS 9Z692 ΈΟΐ

000000 'ΐ 8998Τ · 98Τ- If 0Z-386Z 69-: α ΐ- 3686801 · 0: 3 IT-aZ9TS98'-: e 90- ■ ζζιιη · ο ν

000000: 1

Ζύ ^ Ο 000000 ΌΖ 6Τ920 'π— Of OIS 88SISZ -Qf AIINWNI 6G

6i-a 60osi · ο: a ST- ■ 39S 9S-: 0

39-39 6 9 '0: 9 90- ■ 3 0Ζ02Ϊ' 0: V

000000 · 0: I S09960 6ZT90 '86S-8S

00S96 Ό ^ Τ

S8S0T9 "SB LZL68 '68 -9C zT-asio99i'-: α ετ- -39I0S ：: 30T-as 9T6 ^-: a 90- {399Ζ0} · 0: V

000000 Ό: ¾

Zd ^ D 000000 'οε U6VZ '89 Ζ- 80S86 -92L- n

Π-Ά £ 9 98 £-: α ει- -329 ^ 0 ΐ '-: 0 60-3Α926ΖΤ ：: Η 90--oz —: V

ί1600 / 10 <ΙΓ / Χ3 <Ι Z0S6S / T0 OAV -16 D 0.299820E-19

45 -2124.35764 4.092115

46 -423.57811 10.000000 CaF2

47 347.85468 4.136085

48 92 · − 34253 33. 000000 CaF2

49 581.34791 18.788119

Next, an embodiment of a projection exposure apparatus equipped with the above catadioptric optical system as a projection optical system will be described with reference to FIG.

On the first surface R of the projection optical system PL, a reticle as a projection original plate on which a predetermined circuit pattern is formed is arranged, and on the second surface W of the projection optical system PL, a photoresist as a substrate is applied. Wafer is placed. The reticle is held on a reticle stage R S, the wafer is held on a wafer stage W S, and an illumination optical device I S for uniformly illuminating the reticle is arranged above the reticle.

The illumination optical device includes a light source that emits exposure light, and an illumination optical system that uniformly irradiates a light beam from the light source onto a reticle. In this embodiment, the light source is an F2 excimer laser light source, and emits exposure light having a wavelength of 157 nm. The illumination optics system consists of a fly-eye lens for uniforming the illuminance distribution, an illumination system aperture stop, a variable field stop (reticle blind), and a condenser lens system. The projection optical system PL is substantially telecentric on the reticle side and the wafer side as described above. The exposure light supplied from the illumination optical device IS illuminates the reticle, and an image of the light source of the illumination optical device IS is formed at the position of the aperture stop STO of the projection optical system PL, so-called Koehler illumination is performed. Then, the circuit pattern of the reticle illuminated with Koehler illumination is reduced at a predetermined magnification via the projection optical system PL and projected onto the wafer.

An example of the operation when forming a predetermined circuit pattern on a wafer using this projection exposure apparatus will be described with reference to the flowchart in FIG. First, in step 1, a metal film is deposited on one lot of wafers. In step 2, A photoresist is applied on the metal film. Thereafter, in step 3, the pattern on the reticle is sequentially scanned and exposed on each exposure area on the wafer via the projection optical system PL using the above-mentioned projection exposure apparatus. Then, in step 4, the photoresist on the wafer is developed. As a result, a resist pattern is formed on the wafer. Next, in step 5, a circuit pattern corresponding to the resist pattern on the reticle is formed in each exposure region on the wafer by etching the wafer on which the resist pattern is formed.

After that, a device such as a semiconductor element is manufactured by forming a circuit pattern of a further upper layer. Industrial applicability

As described above, in the present invention, since the first imaging optical system G1 to the third imaging optical system G3 constituting the imaging portion are configured to have one optical axis, the entire optical system is optically controlled. The search can be performed with the axis as the center, and the inclination and displacement of each internal lens can be detected. As a result, it is possible to obtain an effective diaphragm installation part, obtain a sufficient working distance, and obtain an optical system with a dramatically small concave mirror, and finally use the smallest aspherical element. However, it consists of a single optical axis that is easy to adjust, and the reticle scanning direction can be taken in a direction perpendicular to gravity.

Claims

The scope of the claims

1. From the first surface to the second surface side, in order from the first imaging optical system composed of a refractive lens, the second imaging optical system having at least one concave lens and two reflecting mirrors, and the refractive lens And a catadioptric optical system comprising:

The first imaging optical system forms a first intermediate image of the first surface, and the second imaging optical system forms a second intermediate image by re-imaging the first intermediate image. The third imaging optical system re-images the second intermediate image on the second surface.

2. The catadioptric optical system according to claim 1, wherein a numerical aperture on the second surface side is NA0, and an effective diameter of at least one concave lens of the second imaging optical system is Φ. Satisfies the following conditions.

3 Χ Φ 1 0 0 0 X NA0

3. The catadioptric optical system according to claim 1, wherein the catadioptric optical system comprises 21 or more refractive lenses.

4. The catadioptric optical system according to claim 1, wherein the catadioptric optical system comprises 20 or less refractive lenses.

5. The catadioptric optical system according to claim 1, wherein an aperture is provided between the two reflecting mirrors.

6. The catadioptric optical system according to claim 1, wherein the two reflecting mirrors are concave mirrors arranged with their concave reflecting surfaces facing each other.

7. The catadioptric optical system according to claim 1, wherein the first imaging optical system is: The third imaging optical system includes at least two or more positive lenses, and the third imaging optical system includes at least two or more positive lenses.

8. The catadioptric optical system according to claim 1, wherein at least one aperture stop is arranged in said first imaging optical system or said third imaging optical system.

9. The catadioptric optical system according to claim 1, wherein at least one or more central shielding plates are arranged in the first imaging optical system or the third imaging optical system.

10. The catadioptric optical system according to claim 1, wherein said catadioptric optical system includes at least five or more aspherical surfaces.

11. The catadioptric optical system according to claim 1, wherein all refractive lenses of the catadioptric optical system are made of the same glass material.

12. The catadioptric optical system according to claim 6, wherein, of the two concave mirrors, one arranged closer to the first surface side is a first concave mirror, The one located closer to the second surface is called the second concave mirror, the distance from the position of the first intermediate image to the position of the first concave mirror is d1, and the distance from the second intermediate image position to the second concave mirror is When the distance to the position is defined as d 2 and the diameter of the exposure area on the second surface is defined as, the following condition is satisfied.

I d l I <

I d 2 I <Φ ΑΛ

13. The catadioptric optical system according to claim 1, wherein the catadioptric optical system is a telecentric optical system on the first surface side or the second surface side.

14. The light source according to any one of claims 1 to 13, wherein the light source; an illumination optical system configured to uniformly irradiate the light flux from the light source onto the first surface; and the first surface is projected onto the second surface. A catadioptric system, and a projection exposure apparatus including

15. An illuminating light is emitted from a light source, and the illuminating light is uniformly illuminated on the first surface by an illuminating optical system. A projection exposure method for projecting one surface onto the second surface and exposing the second surface.