WO2001092818A8 - Verfahren zur korrektur physikalisch bedingter fehler bei der messung mikroskopischer objekte - Google Patents
Verfahren zur korrektur physikalisch bedingter fehler bei der messung mikroskopischer objekteInfo
- Publication number
- WO2001092818A8 WO2001092818A8 PCT/EP2001/006200 EP0106200W WO0192818A8 WO 2001092818 A8 WO2001092818 A8 WO 2001092818A8 EP 0106200 W EP0106200 W EP 0106200W WO 0192818 A8 WO0192818 A8 WO 0192818A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- measuring
- physical errors
- microscopic objects
- correcting physical
- measuring microscopic
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/04—Measuring microscopes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL15072601A IL150726A0 (en) | 2000-05-31 | 2001-05-31 | A method of correcting physically-conditioned errors in the measurement of microscopic objects |
AT01984527T ATE267383T1 (de) | 2000-05-31 | 2001-05-31 | Verfahren zur korrektur physikalisch bedingter fehler bei der messung mikroskopischer objekte |
DE50102355T DE50102355D1 (de) | 2000-05-31 | 2001-05-31 | Verfahren zur korrektur physikalisch bedingter fehler bei der messung mikroskopischer objekte |
EP01984527A EP1330628B1 (de) | 2000-05-31 | 2001-05-31 | Verfahren zur korrektur physikalisch bedingter fehler bei der messung mikroskopischer objekte |
IL150726A IL150726A (en) | 2000-05-31 | 2002-07-14 | A method for correcting errors caused by physical conditions in the measurement of microscopic objects |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10027221A DE10027221A1 (de) | 2000-05-31 | 2000-05-31 | Verfahren zur Korrektur physikalisch bedingter Fehler bei der Messung mikroskopischer Objekte |
DE10027221.5 | 2000-05-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001092818A1 WO2001092818A1 (de) | 2001-12-06 |
WO2001092818A8 true WO2001092818A8 (de) | 2002-02-21 |
Family
ID=7644366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2001/006200 WO2001092818A1 (de) | 2000-05-31 | 2001-05-31 | Verfahren zur korrektur physikalisch bedingter fehler bei der messung mikroskopischer objekte |
Country Status (8)
Country | Link |
---|---|
US (1) | US6795574B1 (de) |
EP (1) | EP1330628B1 (de) |
JP (1) | JP2001343217A (de) |
KR (1) | KR100470217B1 (de) |
AT (1) | ATE267383T1 (de) |
DE (2) | DE10027221A1 (de) |
IL (2) | IL150726A0 (de) |
WO (1) | WO2001092818A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10235437B4 (de) * | 2002-08-02 | 2007-09-20 | Pdf Solutions Gmbh | Verfahren zur Korrektur physikalisch bedingter Fehler bei der Messung eines Objekts |
DE102005025535A1 (de) * | 2005-06-03 | 2006-12-07 | Leica Microsystems Semiconductor Gmbh | Vorrichtung und Verfahren zur Verbesserung der Messgenauigkeit bei der Bestimmung von Strukturdaten |
DE102007032626A1 (de) * | 2007-07-11 | 2009-01-22 | Vistec Semiconductor Systems Gmbh | Vorrichtung und Verfahren zur Verbesserung der Messgenauigkeit in einem optischen CD-Messsystem |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07281413A (ja) * | 1994-04-05 | 1995-10-27 | Mitsubishi Electric Corp | 減衰型位相シフトマスクおよびその製造方法 |
JPH0883753A (ja) * | 1994-09-13 | 1996-03-26 | Nikon Corp | 焦点検出方法 |
EP0845112B1 (de) * | 1995-08-07 | 2002-10-23 | Tomey Co., Ltd. | Reflektierende mikroskopvorrichtung |
JP3469422B2 (ja) * | 1996-02-23 | 2003-11-25 | 株式会社東芝 | 荷電ビーム描画方法及び描画装置 |
AU5748598A (en) * | 1996-12-23 | 1998-07-17 | Ruprecht-Karls-Universitat Heidelberg | Method and devices for measuring distances between object structures |
US5966677A (en) * | 1997-02-28 | 1999-10-12 | Fiekowsky; Peter J. | High accuracy particle dimension measurement system |
US6178360B1 (en) * | 1998-02-05 | 2001-01-23 | Micron Technology, Inc. | Methods and apparatus for determining optimum exposure threshold for a given photolithographic model |
EP1083462A4 (de) * | 1998-03-26 | 2003-12-03 | Nikon Corp | Belichtungsverfahren und system, photomaske, verfahren zu deren herstellung, mikroelement, verfahren zu dessen herstellung |
IL127359A0 (en) * | 1998-12-01 | 1999-10-28 | Yeda Res & Dev | Computerized adaptive imaging |
-
2000
- 2000-05-31 DE DE10027221A patent/DE10027221A1/de not_active Withdrawn
- 2000-07-11 US US09/613,388 patent/US6795574B1/en not_active Expired - Fee Related
- 2000-07-25 JP JP2000223749A patent/JP2001343217A/ja active Pending
-
2001
- 2001-05-31 DE DE50102355T patent/DE50102355D1/de not_active Expired - Fee Related
- 2001-05-31 AT AT01984527T patent/ATE267383T1/de not_active IP Right Cessation
- 2001-05-31 IL IL15072601A patent/IL150726A0/xx active IP Right Grant
- 2001-05-31 EP EP01984527A patent/EP1330628B1/de not_active Expired - Lifetime
- 2001-05-31 WO PCT/EP2001/006200 patent/WO2001092818A1/de active IP Right Grant
- 2001-05-31 KR KR10-2002-7010194A patent/KR100470217B1/ko not_active IP Right Cessation
-
2002
- 2002-07-14 IL IL150726A patent/IL150726A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE50102355D1 (de) | 2004-06-24 |
EP1330628A1 (de) | 2003-07-30 |
IL150726A0 (en) | 2003-02-12 |
ATE267383T1 (de) | 2004-06-15 |
JP2001343217A (ja) | 2001-12-14 |
KR100470217B1 (ko) | 2005-02-05 |
US6795574B1 (en) | 2004-09-21 |
KR20030003228A (ko) | 2003-01-09 |
EP1330628B1 (de) | 2004-05-19 |
DE10027221A1 (de) | 2002-04-18 |
IL150726A (en) | 2006-10-31 |
WO2001092818A1 (de) | 2001-12-06 |
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