WO2001096958A3 - Process for producing microfluidic articles - Google Patents

Process for producing microfluidic articles Download PDF

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Publication number
WO2001096958A3
WO2001096958A3 PCT/US2001/019180 US0119180W WO0196958A3 WO 2001096958 A3 WO2001096958 A3 WO 2001096958A3 US 0119180 W US0119180 W US 0119180W WO 0196958 A3 WO0196958 A3 WO 0196958A3
Authority
WO
WIPO (PCT)
Prior art keywords
composition
exposed
polymer
radical
inlet
Prior art date
Application number
PCT/US2001/019180
Other languages
French (fr)
Other versions
WO2001096958A2 (en
Inventor
James G Bentsen
Robert J Devoe
Todd R Williams
Original Assignee
3M Innovative Properties Co
James G Bentsen
Robert J Devoe
Todd R Williams
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co, James G Bentsen, Robert J Devoe, Todd R Williams filed Critical 3M Innovative Properties Co
Priority to AU2001269837A priority Critical patent/AU2001269837A1/en
Priority to EP01948380.9A priority patent/EP1295180B1/en
Priority to US10/297,962 priority patent/US7060419B2/en
Priority to JP2002511023A priority patent/JP2004503392A/en
Publication of WO2001096958A2 publication Critical patent/WO2001096958A2/en
Publication of WO2001096958A3 publication Critical patent/WO2001096958A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0093—Microreactors, e.g. miniaturised or microfabricated reactors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00783—Laminate assemblies, i.e. the reactor comprising a stack of plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00819—Materials of construction
    • B01J2219/00833—Plastic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/12—Specific details about manufacturing devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/08—Geometry, shape and general structure
    • B01L2300/0887—Laminated structure

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Hematology (AREA)
  • Clinical Laboratory Science (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A process for producing microfluidic articles comprises (a) preparing a photoreactive composition comprising (1) at least one reactive species that is a polymer or a polymer precursor and that is capable of undergoing an acid- or radical-initiated chemical reaction and (2) at least one multiphoton photoinitiator system; (b) exposing a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby forming exposed and unexposed portions of the composition, and thereby inducing at least one acid- or radical-initiated chemical reaction in the exposed portion; and (c) removing either the exposed or the unexposed portion of the composition, so as to form a microfluidic article comprising a seamless polymer matrix that defines at least one inlet, at least one outlet, and a microfluid processing architecture that is capable of fluidic communication with the inlet and the outlet and that is otherwise fully enclosed within the polymer matrix.
PCT/US2001/019180 2000-06-15 2001-06-14 Process for producing microfluidic articles WO2001096958A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2001269837A AU2001269837A1 (en) 2000-06-15 2001-06-14 Process for producing microfluidic articles
EP01948380.9A EP1295180B1 (en) 2000-06-15 2001-06-14 Process for producing microfluidic articles
US10/297,962 US7060419B2 (en) 2000-06-15 2001-06-14 Process for producing microfluidic articles
JP2002511023A JP2004503392A (en) 2000-06-15 2001-06-14 Process for manufacturing microfluidic products

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21170700P 2000-06-15 2000-06-15
US60/211,707 2000-06-15

Publications (2)

Publication Number Publication Date
WO2001096958A2 WO2001096958A2 (en) 2001-12-20
WO2001096958A3 true WO2001096958A3 (en) 2002-05-02

Family

ID=22788024

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/019180 WO2001096958A2 (en) 2000-06-15 2001-06-14 Process for producing microfluidic articles

Country Status (6)

Country Link
US (1) US7060419B2 (en)
EP (1) EP1295180B1 (en)
JP (1) JP2004503392A (en)
KR (1) KR100795759B1 (en)
AU (1) AU2001269837A1 (en)
WO (1) WO2001096958A2 (en)

Cited By (2)

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US8885146B2 (en) 2008-02-26 2014-11-11 3M Innovative Properties Company Multi-photon exposure system
US9102083B2 (en) 2007-09-06 2015-08-11 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds

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DE60139620D1 (en) * 2000-06-15 2009-10-01 3M Innovative Properties Co METHOD AND DEVICE FOR OBTAINING REPEATED MULTIPHOTONE ABSORPTION
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
KR100811017B1 (en) * 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 Multidirectional photoreactive absorption method
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
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US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
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