WO2002023231A3 - Generation of a library of periodic grating diffraction signals - Google Patents
Generation of a library of periodic grating diffraction signals Download PDFInfo
- Publication number
- WO2002023231A3 WO2002023231A3 PCT/US2001/027552 US0127552W WO0223231A3 WO 2002023231 A3 WO2002023231 A3 WO 2002023231A3 US 0127552 W US0127552 W US 0127552W WO 0223231 A3 WO0223231 A3 WO 0223231A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- hypothetical
- library
- generation
- periodic grating
- diffraction signals
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F11/00—Error detection; Error correction; Monitoring
- G06F11/22—Detection or location of defective computer hardware by testing during standby operation or during idle time, e.g. start-up testing
- G06F11/26—Functional testing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01968532A EP1319191B1 (en) | 2000-09-15 | 2001-09-06 | Generation of a library of periodic grating diffraction signals |
IL14959601A IL149596A0 (en) | 2000-09-15 | 2001-09-06 | Generation of a library of periodic grating diffraction signals |
DE60133751T DE60133751T2 (en) | 2000-09-15 | 2001-09-06 | GENERATING A LIBRARY OF PERIODIC PASSAGE SIGNALS |
AU2001288775A AU2001288775A1 (en) | 2000-09-15 | 2001-09-06 | Generation of a library of periodic grating diffraction signals |
JP2002527823A JP3740534B2 (en) | 2000-09-15 | 2001-09-06 | Generation of a diffraction grating library of periodic gratings |
IL149596A IL149596A (en) | 2000-09-15 | 2002-05-12 | Generation of a library of periodic grating diffraction signals |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23301700P | 2000-09-15 | 2000-09-15 | |
US60/233,017 | 2000-09-15 | ||
US09/907,488 US6943900B2 (en) | 2000-09-15 | 2001-07-16 | Generation of a library of periodic grating diffraction signals |
US09/907,488 | 2001-07-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002023231A2 WO2002023231A2 (en) | 2002-03-21 |
WO2002023231A3 true WO2002023231A3 (en) | 2003-03-27 |
Family
ID=26926555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/027552 WO2002023231A2 (en) | 2000-09-15 | 2001-09-06 | Generation of a library of periodic grating diffraction signals |
Country Status (10)
Country | Link |
---|---|
US (3) | US6943900B2 (en) |
EP (1) | EP1319191B1 (en) |
JP (1) | JP3740534B2 (en) |
KR (1) | KR100499428B1 (en) |
CN (1) | CN1265215C (en) |
AU (1) | AU2001288775A1 (en) |
DE (1) | DE60133751T2 (en) |
IL (2) | IL149596A0 (en) |
TW (1) | TWI233058B (en) |
WO (1) | WO2002023231A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100971918B1 (en) * | 2002-03-29 | 2010-07-22 | 팀버 테크놀로지스, 인코포레이티드 | Method, system and recording medium having program for adapting metrology diffraction signal |
Families Citing this family (174)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL130874A (en) | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring patterned structures |
US8531678B2 (en) | 1999-07-09 | 2013-09-10 | Nova Measuring Instruments, Ltd. | Method and system for measuring patterned structures |
US6943900B2 (en) * | 2000-09-15 | 2005-09-13 | Timbre Technologies, Inc. | Generation of a library of periodic grating diffraction signals |
US7115858B1 (en) | 2000-09-25 | 2006-10-03 | Nanometrics Incorporated | Apparatus and method for the measurement of diffracting structures |
US7515279B2 (en) * | 2001-03-02 | 2009-04-07 | Nanometrics Incorporated | Line profile asymmetry measurement |
US6898537B1 (en) | 2001-04-27 | 2005-05-24 | Nanometrics Incorporated | Measurement of diffracting structures using one-half of the non-zero diffracted orders |
US6773939B1 (en) * | 2001-07-02 | 2004-08-10 | Advanced Micro Devices, Inc. | Method and apparatus for determining critical dimension variation in a line structure |
US6713753B1 (en) | 2001-07-03 | 2004-03-30 | Nanometrics Incorporated | Combination of normal and oblique incidence polarimetry for the characterization of gratings |
US6704661B1 (en) | 2001-07-16 | 2004-03-09 | Therma-Wave, Inc. | Real time analysis of periodic structures on semiconductors |
US6785638B2 (en) * | 2001-08-06 | 2004-08-31 | Timbre Technologies, Inc. | Method and system of dynamic learning through a regression-based library generation process |
US6867866B1 (en) * | 2001-08-10 | 2005-03-15 | Therma-Wave, Inc. | CD metrology analysis using green's function |
US7061615B1 (en) | 2001-09-20 | 2006-06-13 | Nanometrics Incorporated | Spectroscopically measured overlay target |
US6898596B2 (en) * | 2001-10-23 | 2005-05-24 | Therma-Wave, Inc. | Evolution of library data sets |
US6853942B2 (en) * | 2002-03-26 | 2005-02-08 | Timbre Technologies, Inc. | Metrology hardware adaptation with universal library |
US6982793B1 (en) | 2002-04-04 | 2006-01-03 | Nanometrics Incorporated | Method and apparatus for using an alignment target with designed in offset |
US6949462B1 (en) | 2002-04-04 | 2005-09-27 | Nanometrics Incorporated | Measuring an alignment target with multiple polarization states |
US20030197872A1 (en) * | 2002-04-17 | 2003-10-23 | Littau Michael E. | Scatterometric measurement of undercut multi-layer diffracting signatures |
US7216045B2 (en) * | 2002-06-03 | 2007-05-08 | Timbre Technologies, Inc. | Selection of wavelengths for integrated circuit optical metrology |
US6775015B2 (en) * | 2002-06-18 | 2004-08-10 | Timbre Technologies, Inc. | Optical metrology of single features |
US6947135B2 (en) * | 2002-07-01 | 2005-09-20 | Therma-Wave, Inc. | Reduced multicubic database interpolation method for optical measurement of diffractive microstructures |
US7330279B2 (en) * | 2002-07-25 | 2008-02-12 | Timbre Technologies, Inc. | Model and parameter selection for optical metrology |
US6992764B1 (en) | 2002-09-30 | 2006-01-31 | Nanometrics Incorporated | Measuring an alignment target with a single polarization state |
US20040090629A1 (en) * | 2002-11-08 | 2004-05-13 | Emmanuel Drege | Diffraction order selection for optical metrology simulation |
US7072049B2 (en) * | 2003-02-03 | 2006-07-04 | Timbre Technologies, Inc. | Model optimization for structures with additional materials |
JP2007524808A (en) * | 2003-03-07 | 2007-08-30 | インターナショナル インダストリー サポート、インク | Scanning system with stereoscopic camera set |
US7274472B2 (en) * | 2003-05-28 | 2007-09-25 | Timbre Technologies, Inc. | Resolution enhanced optical metrology |
US20040267397A1 (en) * | 2003-06-27 | 2004-12-30 | Srinivas Doddi | Optical metrology of structures formed on semiconductor wafer using machine learning systems |
US7394554B2 (en) * | 2003-09-15 | 2008-07-01 | Timbre Technologies, Inc. | Selecting a hypothetical profile to use in optical metrology |
US7224471B2 (en) * | 2003-10-28 | 2007-05-29 | Timbre Technologies, Inc. | Azimuthal scanning of a structure formed on a semiconductor wafer |
US7126700B2 (en) * | 2003-12-12 | 2006-10-24 | Timbre Technologies, Inc. | Parametric optimization of optical metrology model |
DE102004006258B4 (en) * | 2004-02-09 | 2007-08-02 | Infineon Technologies Ag | Method for matching two measuring methods for the measurement of structure widths on a substrate |
US7523076B2 (en) | 2004-03-01 | 2009-04-21 | Tokyo Electron Limited | Selecting a profile model for use in optical metrology using a machine learning system |
US7388677B2 (en) * | 2004-03-22 | 2008-06-17 | Timbre Technologies, Inc. | Optical metrology optimization for repetitive structures |
CN1702849A (en) * | 2004-05-26 | 2005-11-30 | 松下电器产业株式会社 | Temperature abnormality detection method and semiconductor manufacturing apparatus |
US20050275850A1 (en) * | 2004-05-28 | 2005-12-15 | Timbre Technologies, Inc. | Shape roughness measurement in optical metrology |
US7065423B2 (en) * | 2004-07-08 | 2006-06-20 | Timbre Technologies, Inc. | Optical metrology model optimization for process control |
US7566181B2 (en) * | 2004-09-01 | 2009-07-28 | Tokyo Electron Limited | Controlling critical dimensions of structures formed on a wafer in semiconductor processing |
US7171284B2 (en) | 2004-09-21 | 2007-01-30 | Timbre Technologies, Inc. | Optical metrology model optimization based on goals |
US7280229B2 (en) * | 2004-12-03 | 2007-10-09 | Timbre Technologies, Inc. | Examining a structure formed on a semiconductor wafer using machine learning systems |
TWI269870B (en) | 2004-12-30 | 2007-01-01 | Ind Tech Res Inst | Method for deciding structure parameters of a grating |
US7274465B2 (en) * | 2005-02-17 | 2007-09-25 | Timbre Technologies, Inc. | Optical metrology of a structure formed on a semiconductor wafer using optical pulses |
US20060187466A1 (en) * | 2005-02-18 | 2006-08-24 | Timbre Technologies, Inc. | Selecting unit cell configuration for repeating structures in optical metrology |
US7421414B2 (en) * | 2005-03-31 | 2008-09-02 | Timbre Technologies, Inc. | Split machine learning systems |
US7355728B2 (en) * | 2005-06-16 | 2008-04-08 | Timbre Technologies, Inc. | Optical metrology model optimization for repetitive structures |
US7515282B2 (en) * | 2005-07-01 | 2009-04-07 | Timbre Technologies, Inc. | Modeling and measuring structures with spatially varying properties in optical metrology |
US7467064B2 (en) | 2006-02-07 | 2008-12-16 | Timbre Technologies, Inc. | Transforming metrology data from a semiconductor treatment system using multivariate analysis |
JP2007218711A (en) * | 2006-02-16 | 2007-08-30 | Hitachi High-Technologies Corp | Method for measuring measurement target pattern using electron microscope device |
US7523021B2 (en) * | 2006-03-08 | 2009-04-21 | Tokyo Electron Limited | Weighting function to enhance measured diffraction signals in optical metrology |
US9158941B2 (en) * | 2006-03-16 | 2015-10-13 | Arm Limited | Managing access to content in a data processing apparatus |
US7428060B2 (en) | 2006-03-24 | 2008-09-23 | Timbre Technologies, Inc. | Optimization of diffraction order selection for two-dimensional structures |
US7302367B2 (en) * | 2006-03-27 | 2007-11-27 | Timbre Technologies, Inc. | Library accuracy enhancement and evaluation |
US7324193B2 (en) * | 2006-03-30 | 2008-01-29 | Tokyo Electron Limited | Measuring a damaged structure formed on a wafer using optical metrology |
US7576851B2 (en) * | 2006-03-30 | 2009-08-18 | Tokyo Electron Limited | Creating a library for measuring a damaged structure formed on a wafer using optical metrology |
US7623978B2 (en) * | 2006-03-30 | 2009-11-24 | Tokyo Electron Limited | Damage assessment of a wafer using optical metrology |
US7474420B2 (en) * | 2006-03-30 | 2009-01-06 | Timbre Technologies, Inc. | In-die optical metrology |
US7522293B2 (en) * | 2006-03-30 | 2009-04-21 | Tokyo Electron Limited | Optical metrology of multiple patterned layers |
US7619731B2 (en) * | 2006-03-30 | 2009-11-17 | Tokyo Electron Limited | Measuring a damaged structure formed on a wafer using optical metrology |
US7446887B2 (en) * | 2006-05-22 | 2008-11-04 | Tokyo Electron Limited | Matching optical metrology tools using hypothetical profiles |
US7446888B2 (en) * | 2006-05-22 | 2008-11-04 | Tokyo Electron Limited | Matching optical metrology tools using diffraction signals |
US7518740B2 (en) * | 2006-07-10 | 2009-04-14 | Tokyo Electron Limited | Evaluating a profile model to characterize a structure to be examined using optical metrology |
US7525673B2 (en) * | 2006-07-10 | 2009-04-28 | Tokyo Electron Limited | Optimizing selected variables of an optical metrology system |
US7526354B2 (en) * | 2006-07-10 | 2009-04-28 | Tokyo Electron Limited | Managing and using metrology data for process and equipment control |
US7515283B2 (en) * | 2006-07-11 | 2009-04-07 | Tokyo Electron, Ltd. | Parallel profile determination in optical metrology |
US7469192B2 (en) * | 2006-07-11 | 2008-12-23 | Tokyo Electron Ltd. | Parallel profile determination for an optical metrology system |
US20080013107A1 (en) * | 2006-07-11 | 2008-01-17 | Tokyo Electron Limited | Generating a profile model to characterize a structure to be examined using optical metrology |
US7523439B2 (en) * | 2006-07-11 | 2009-04-21 | Tokyo Electron Limited | Determining position accuracy of double exposure lithography using optical metrology |
US7742888B2 (en) * | 2006-07-25 | 2010-06-22 | Tokyo Electron Limited | Allocating processing units to generate simulated diffraction signals used in optical metrology |
DE102006041003B4 (en) * | 2006-08-31 | 2017-08-24 | Advanced Micro Devices, Inc. | A method for determining an orientation of a crystal lattice of a first substrate relative to a crystal lattice of a second substrate |
US7765076B2 (en) * | 2006-09-22 | 2010-07-27 | Tokyo Electron Limited | Allocating processing units to processing clusters to generate simulated diffraction signals |
US20080074678A1 (en) * | 2006-09-26 | 2008-03-27 | Tokyo Electron Limited | Accuracy of optical metrology measurements |
US7763404B2 (en) * | 2006-09-26 | 2010-07-27 | Tokyo Electron Limited | Methods and apparatus for changing the optical properties of resists |
US20080074677A1 (en) * | 2006-09-26 | 2008-03-27 | Tokyo Electron Limited | accuracy of optical metrology measurements |
US7300730B1 (en) | 2006-09-26 | 2007-11-27 | Tokyo Electron Limited | Creating an optically tunable anti-reflective coating |
US7555395B2 (en) * | 2006-09-26 | 2009-06-30 | Tokyo Electron Limited | Methods and apparatus for using an optically tunable soft mask to create a profile library |
US20080076046A1 (en) * | 2006-09-26 | 2008-03-27 | Tokyo Electron Limited | accuracy of optical metrology measurements |
US7783669B2 (en) * | 2006-10-12 | 2010-08-24 | Tokyo Electron Limited | Data flow management in generating profile models used in optical metrology |
US7765234B2 (en) * | 2006-10-12 | 2010-07-27 | Tokyo Electron Limited | Data flow management in generating different signal formats used in optical metrology |
US7522295B2 (en) * | 2006-11-07 | 2009-04-21 | Tokyo Electron Limited | Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer |
US7417750B2 (en) * | 2006-11-07 | 2008-08-26 | Tokyo Electron Limited | Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer |
US7428044B2 (en) * | 2006-11-16 | 2008-09-23 | Tokyo Electron Limited | Drift compensation for an optical metrology tool |
US7505148B2 (en) | 2006-11-16 | 2009-03-17 | Tokyo Electron Limited | Matching optical metrology tools using spectra enhancement |
US7639375B2 (en) * | 2006-12-14 | 2009-12-29 | Tokyo Electron Limited | Determining transmittance of a photomask using optical metrology |
US7327475B1 (en) | 2006-12-15 | 2008-02-05 | Tokyo Electron Limited | Measuring a process parameter of a semiconductor fabrication process using optical metrology |
US7667858B2 (en) * | 2007-01-12 | 2010-02-23 | Tokyo Electron Limited | Automated process control using optical metrology and a correlation between profile models and key profile shape variables |
US7596422B2 (en) * | 2007-01-12 | 2009-09-29 | Tokyo Electron Limited | Determining one or more profile parameters of a structure using optical metrology and a correlation between profile models and key profile shape variables |
US7451054B2 (en) * | 2007-01-30 | 2008-11-11 | Tokyo Electron Limited | Method of using a wafer-temperature-dependent profile library |
US7571074B2 (en) * | 2007-01-30 | 2009-08-04 | Tokyo Electron Limited | Method of using a wafer-thickness-dependant profile library |
US7639351B2 (en) * | 2007-03-20 | 2009-12-29 | Tokyo Electron Limited | Automated process control using optical metrology with a photonic nanojet |
US7949618B2 (en) * | 2007-03-28 | 2011-05-24 | Tokyo Electron Limited | Training a machine learning system to determine photoresist parameters |
US7567353B2 (en) * | 2007-03-28 | 2009-07-28 | Tokyo Electron Limited | Automated process control using optical metrology and photoresist parameters |
US7728976B2 (en) | 2007-03-28 | 2010-06-01 | Tokyo Electron Limited | Determining photoresist parameters using optical metrology |
US7511835B2 (en) * | 2007-04-12 | 2009-03-31 | Tokyo Electron Limited | Optical metrology using a support vector machine with simulated diffraction signal inputs |
US7483809B2 (en) * | 2007-04-12 | 2009-01-27 | Tokyo Electron Limited | Optical metrology using support vector machine with profile parameter inputs |
US7372583B1 (en) * | 2007-04-12 | 2008-05-13 | Tokyo Electron Limited | Controlling a fabrication tool using support vector machine |
KR101461667B1 (en) * | 2007-07-26 | 2014-11-13 | 도쿄엘렉트론가부시키가이샤 | Apparatus for examining a patterned structure and method of managing metrology data |
KR101357326B1 (en) * | 2007-07-26 | 2014-02-03 | 도쿄엘렉트론가부시키가이샤 | System for examining patterned structure |
CN101359612B (en) * | 2007-07-30 | 2012-07-04 | 东京毅力科创株式会社 | Managing and using metering data for process and apparatus control |
US7729873B2 (en) * | 2007-08-28 | 2010-06-01 | Tokyo Electron Limited | Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology |
US7949490B2 (en) * | 2007-08-30 | 2011-05-24 | Tokyo Electron Limited | Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology |
US7627392B2 (en) * | 2007-08-30 | 2009-12-01 | Tokyo Electron Limited | Automated process control using parameters determined with approximation and fine diffraction models |
US8069020B2 (en) * | 2007-09-19 | 2011-11-29 | Tokyo Electron Limited | Generating simulated diffraction signal using a dispersion function relating process parameter to dispersion |
US7912679B2 (en) * | 2007-09-20 | 2011-03-22 | Tokyo Electron Limited | Determining profile parameters of a structure formed on a semiconductor wafer using a dispersion function relating process parameter to dispersion |
US7636649B2 (en) * | 2007-09-21 | 2009-12-22 | Tokyo Electron Limited | Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion |
US7598099B2 (en) * | 2007-11-07 | 2009-10-06 | Tokyo Electron Limited | Method of controlling a fabrication process using an iso-dense bias |
US20090116040A1 (en) * | 2007-11-07 | 2009-05-07 | Tokyo Electron Limited | Method of Deriving an Iso-Dense Bias Using a Hybrid Grating Layer |
US7639370B2 (en) * | 2007-11-07 | 2009-12-29 | Tokyo Electron Limited | Apparatus for deriving an iso-dense bias |
CN101855715A (en) * | 2007-11-07 | 2010-10-06 | 东京毅力科创株式会社 | Method and apparatus for deriving an iso-dense bias and controlling a fabrication process |
US20090234687A1 (en) * | 2008-03-17 | 2009-09-17 | Tokyo Electron Limited | Method of designing an optical metrology system optimized for operating time budget |
US20090240537A1 (en) * | 2008-03-18 | 2009-09-24 | Tokyo Electron Limited | Apparatus for designing an optical metrology system optimized for operating time budget |
US7742889B2 (en) * | 2008-03-27 | 2010-06-22 | Tokyo Electron Limited | Designing an optical metrology system optimized with signal criteria |
US7595869B1 (en) | 2008-06-18 | 2009-09-29 | Tokyo Electron Limited | Optical metrology system optimized with a plurality of design goals |
US7761250B2 (en) * | 2008-06-18 | 2010-07-20 | Tokyo Electron Limited | Optical metrology system optimized with design goals |
US7761178B2 (en) * | 2008-06-18 | 2010-07-20 | Tokyo Electron Limited | Automated process control using an optical metrology system optimized with design goals |
US7990534B2 (en) * | 2008-07-08 | 2011-08-02 | Tokyo Electron Limited | System and method for azimuth angle calibration |
US7742163B2 (en) * | 2008-07-08 | 2010-06-22 | Tokyo Electron Limited | Field replaceable units (FRUs) optimized for integrated metrology (IM) |
US7940391B2 (en) * | 2008-07-08 | 2011-05-10 | Tokyo Electron Limited | Pre-aligned metrology system and modules |
US7595471B1 (en) | 2008-09-30 | 2009-09-29 | Tokyo Electron Limited | Auto focusing of a workpiece using an array detector each with a detector identification |
US7948630B2 (en) * | 2008-10-08 | 2011-05-24 | Tokyo Electron Limited | Auto focus of a workpiece using two or more focus parameters |
US7660696B1 (en) | 2008-10-08 | 2010-02-09 | Tokyo Electron Limited | Apparatus for auto focusing a workpiece using two or more focus parameters |
US20100118316A1 (en) * | 2008-11-13 | 2010-05-13 | Tokyo Electron Limited | Auto focus array detector optimized for operating objectives |
US7924422B2 (en) * | 2009-02-12 | 2011-04-12 | Tokyo Electron Limited | Calibration method for optical metrology |
US8107073B2 (en) * | 2009-02-12 | 2012-01-31 | Tokyo Electron Limited | Diffraction order sorting filter for optical metrology |
US8024676B2 (en) * | 2009-02-13 | 2011-09-20 | Tokyo Electron Limited | Multi-pitch scatterometry targets |
US8183062B2 (en) * | 2009-02-24 | 2012-05-22 | Tokyo Electron Limited | Creating metal gate structures using Lithography-Etch-Lithography-Etch (LELE) processing sequences |
US8030632B2 (en) * | 2009-03-30 | 2011-10-04 | Tokyo Electron Limted | Controlling angle of incidence of multiple-beam optical metrology tools |
US7961306B2 (en) * | 2009-03-30 | 2011-06-14 | Tokyo Electron Limited | Optimizing sensitivity of optical metrology measurements |
US8030631B2 (en) * | 2009-03-30 | 2011-10-04 | Tokyo Electron Limited | Apparatus for controlling angle of incidence of multiple illumination beams |
US8289527B2 (en) | 2010-04-01 | 2012-10-16 | Tokyo Electron Limited | Optimization of ray tracing and beam propagation parameters |
US9103664B2 (en) | 2010-04-01 | 2015-08-11 | Tokyo Electron Limited | Automated process control using an adjusted metrology output signal |
US9523800B2 (en) * | 2010-05-21 | 2016-12-20 | Kla-Tencor Corporation | Computation efficiency by iterative spatial harmonics order truncation |
US8381140B2 (en) * | 2011-02-11 | 2013-02-19 | Tokyo Electron Limited | Wide process range library for metrology |
US8173450B1 (en) | 2011-02-14 | 2012-05-08 | Tokyo Electron Limited | Method of designing an etch stage measurement system |
US8173451B1 (en) | 2011-02-16 | 2012-05-08 | Tokyo Electron Limited | Etch stage measurement system |
US8193007B1 (en) | 2011-02-17 | 2012-06-05 | Tokyo Electron Limited | Etch process control using optical metrology and sensor devices |
US9257292B2 (en) | 2011-03-30 | 2016-02-09 | Tokyo Electron Limited | Etch system and method for single substrate processing |
US8980651B2 (en) | 2011-09-30 | 2015-03-17 | Tokyo Electron Limited | Overlay measurement for a double patterning |
US20130110477A1 (en) * | 2011-10-31 | 2013-05-02 | Stilian Pandev | Process variation-based model optimization for metrology |
US9085045B2 (en) | 2011-11-04 | 2015-07-21 | Tokyo Electron Limited | Method and system for controlling a spike anneal process |
US8812277B2 (en) | 2011-12-09 | 2014-08-19 | Tokyo Electron Limited | Method of enhancing an optical metrology system using ray tracing and flexible ray libraries |
US8570531B2 (en) | 2011-12-11 | 2013-10-29 | Tokyo Electron Limited | Method of regenerating diffraction signals for optical metrology systems |
US8838422B2 (en) | 2011-12-11 | 2014-09-16 | Tokyo Electron Limited | Process control using ray tracing-based libraries and machine learning systems |
KR101319413B1 (en) * | 2012-01-10 | 2013-10-17 | 한국과학기술연구원 | Summary Information Generating System and Method for Review of Product and Service |
US9134807B2 (en) | 2012-03-02 | 2015-09-15 | Microsoft Technology Licensing, Llc | Pressure sensitive key normalization |
US9075566B2 (en) | 2012-03-02 | 2015-07-07 | Microsoft Technoogy Licensing, LLC | Flexible hinge spine |
US8940103B2 (en) | 2012-03-06 | 2015-01-27 | Tokyo Electron Limited | Sequential stage mixing for single substrate strip processing |
US9075318B2 (en) | 2012-03-07 | 2015-07-07 | Tokyo Electron Limited | Sequential stage mixing for a resist batch strip process |
US20130300590A1 (en) | 2012-05-14 | 2013-11-14 | Paul Henry Dietz | Audio Feedback |
KR102072966B1 (en) | 2012-11-30 | 2020-02-05 | 삼성디스플레이 주식회사 | Display substrate and method for measuring pattern dimensions of display substrate |
US9291554B2 (en) * | 2013-02-05 | 2016-03-22 | Kla-Tencor Corporation | Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection |
US10481088B2 (en) * | 2013-06-04 | 2019-11-19 | Kla-Tencor Corporation | Automatic determination of fourier harmonic order for computation of spectral information for diffraction structures |
US9304235B2 (en) | 2014-07-30 | 2016-04-05 | Microsoft Technology Licensing, Llc | Microfabrication |
US10324733B2 (en) | 2014-07-30 | 2019-06-18 | Microsoft Technology Licensing, Llc | Shutdown notifications |
US10254942B2 (en) | 2014-07-31 | 2019-04-09 | Microsoft Technology Licensing, Llc | Adaptive sizing and positioning of application windows |
US9787576B2 (en) | 2014-07-31 | 2017-10-10 | Microsoft Technology Licensing, Llc | Propagating routing awareness for autonomous networks |
US10592080B2 (en) | 2014-07-31 | 2020-03-17 | Microsoft Technology Licensing, Llc | Assisted presentation of application windows |
US10678412B2 (en) | 2014-07-31 | 2020-06-09 | Microsoft Technology Licensing, Llc | Dynamic joint dividers for application windows |
US9535253B2 (en) | 2015-02-09 | 2017-01-03 | Microsoft Technology Licensing, Llc | Display system |
US10317677B2 (en) | 2015-02-09 | 2019-06-11 | Microsoft Technology Licensing, Llc | Display system |
US9827209B2 (en) | 2015-02-09 | 2017-11-28 | Microsoft Technology Licensing, Llc | Display system |
US9372347B1 (en) | 2015-02-09 | 2016-06-21 | Microsoft Technology Licensing, Llc | Display system |
US10018844B2 (en) | 2015-02-09 | 2018-07-10 | Microsoft Technology Licensing, Llc | Wearable image display system |
US9429692B1 (en) | 2015-02-09 | 2016-08-30 | Microsoft Technology Licensing, Llc | Optical components |
US11086216B2 (en) | 2015-02-09 | 2021-08-10 | Microsoft Technology Licensing, Llc | Generating electronic components |
US9513480B2 (en) | 2015-02-09 | 2016-12-06 | Microsoft Technology Licensing, Llc | Waveguide |
US9423360B1 (en) | 2015-02-09 | 2016-08-23 | Microsoft Technology Licensing, Llc | Optical components |
US20160283618A1 (en) * | 2015-03-26 | 2016-09-29 | Tapani Levola | Diffraction Grating Modelling |
JP6810734B2 (en) * | 2015-07-17 | 2021-01-06 | エーエスエムエル ネザーランズ ビー.ブイ. | Methods and equipment for simulating radiation interactions with structures, metrology methods and equipment, and device manufacturing methods. |
JP6377582B2 (en) * | 2015-08-06 | 2018-08-22 | 株式会社リガク | X-ray analysis operation guide system, operation guide method, and operation guide program |
US10094774B2 (en) | 2015-08-12 | 2018-10-09 | Industrial Technology Research Institute | Scattering measurement system and method |
WO2017148759A1 (en) * | 2016-03-04 | 2017-09-08 | Asml Netherlands B.V. | Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer program |
CN108120371A (en) * | 2016-11-30 | 2018-06-05 | 中国科学院福建物质结构研究所 | Sub-wavelength dimensions microelectronic structure optical critical dimension method for testing and analyzing and device |
CN107679706A (en) * | 2017-09-11 | 2018-02-09 | 中航(重庆)微电子有限公司 | Wafer unfilled corner statistical query method and based on website lookup method the problem of its |
US11624836B2 (en) | 2019-09-24 | 2023-04-11 | Continental Autonomous Mobility US, LLC | Detection of damage to optical element of illumination system |
CN113936746B (en) * | 2021-12-16 | 2022-02-22 | 中国工程物理研究院流体物理研究所 | Quick analysis method, system, terminal and medium for ray diffraction of polyatomic system |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5599594A (en) * | 1991-06-13 | 1997-02-04 | Australian Gem Exchange Pty. Ltd. | Simulated objects |
DE19636612A1 (en) * | 1996-09-10 | 1998-03-12 | Dietmar Dr Ing Wuensche | X-ray evaluation method with electron diffraction photos for orientation determination |
US6091486A (en) * | 1999-01-05 | 2000-07-18 | International Business Machines Corporation | Blazed grating measurements of lithographic lens aberrations |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5963329A (en) | 1997-10-31 | 1999-10-05 | International Business Machines Corporation | Method and apparatus for measuring the profile of small repeating lines |
US6049762A (en) * | 1997-12-18 | 2000-04-11 | Perkin Elmer Llc | Standardizing a spectrometric instrument |
IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring patterned structures |
US6943900B2 (en) | 2000-09-15 | 2005-09-13 | Timbre Technologies, Inc. | Generation of a library of periodic grating diffraction signals |
-
2001
- 2001-07-16 US US09/907,488 patent/US6943900B2/en not_active Expired - Lifetime
- 2001-09-06 CN CNB018024564A patent/CN1265215C/en not_active Expired - Lifetime
- 2001-09-06 WO PCT/US2001/027552 patent/WO2002023231A2/en active IP Right Grant
- 2001-09-06 IL IL14959601A patent/IL149596A0/en active IP Right Grant
- 2001-09-06 KR KR10-2002-7006119A patent/KR100499428B1/en not_active IP Right Cessation
- 2001-09-06 JP JP2002527823A patent/JP3740534B2/en not_active Expired - Lifetime
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- 2001-09-06 AU AU2001288775A patent/AU2001288775A1/en not_active Abandoned
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- 2002-05-12 IL IL149596A patent/IL149596A/en not_active IP Right Cessation
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- 2005-07-25 US US11/189,161 patent/US7277189B2/en not_active Expired - Lifetime
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- 2007-10-02 US US11/866,408 patent/US7593119B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5599594A (en) * | 1991-06-13 | 1997-02-04 | Australian Gem Exchange Pty. Ltd. | Simulated objects |
DE19636612A1 (en) * | 1996-09-10 | 1998-03-12 | Dietmar Dr Ing Wuensche | X-ray evaluation method with electron diffraction photos for orientation determination |
US6091486A (en) * | 1999-01-05 | 2000-07-18 | International Business Machines Corporation | Blazed grating measurements of lithographic lens aberrations |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100971918B1 (en) * | 2002-03-29 | 2010-07-22 | 팀버 테크놀로지스, 인코포레이티드 | Method, system and recording medium having program for adapting metrology diffraction signal |
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TWI233058B (en) | 2005-05-21 |
US6943900B2 (en) | 2005-09-13 |
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CN1529827A (en) | 2004-09-15 |
US20020035455A1 (en) | 2002-03-21 |
JP2004509341A (en) | 2004-03-25 |
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