WO2002033461A3 - Method of self-assembly and optical applications of crystalline colloidal patterns on substrates - Google Patents

Method of self-assembly and optical applications of crystalline colloidal patterns on substrates Download PDF

Info

Publication number
WO2002033461A3
WO2002033461A3 PCT/CA2001/001436 CA0101436W WO0233461A3 WO 2002033461 A3 WO2002033461 A3 WO 2002033461A3 CA 0101436 W CA0101436 W CA 0101436W WO 0233461 A3 WO0233461 A3 WO 0233461A3
Authority
WO
WIPO (PCT)
Prior art keywords
photonic
crystals
substrates
optical
colloidal
Prior art date
Application number
PCT/CA2001/001436
Other languages
French (fr)
Other versions
WO2002033461A2 (en
Inventor
Geoffrey Alan Ozin
San Ming Yang
Hernan Miguez
Original Assignee
Ozin Geoffrey A
San Ming Yang
Hernan Miguez
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ozin Geoffrey A, San Ming Yang, Hernan Miguez filed Critical Ozin Geoffrey A
Priority to EP01975922A priority Critical patent/EP1339897A2/en
Priority to AU2001295333A priority patent/AU2001295333A1/en
Priority to JP2002536588A priority patent/JP2004511828A/en
Priority to CA2426105A priority patent/CA2426105C/en
Publication of WO2002033461A2 publication Critical patent/WO2002033461A2/en
Publication of WO2002033461A3 publication Critical patent/WO2002033461A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B05D1/283—Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
    • Y10S977/779—Possessing nanosized particles, powders, flakes, or clusters other than simple atomic impurity doping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/882—Assembling of separate components, e.g. by attaching
    • Y10S977/883—Fluidic self-assembly, FSA
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24372—Particulate matter
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y10T428/24579—Parallel ribs and/or grooves with particulate matter
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y10T428/2462—Composite web or sheet with partial filling of valleys on outer surface

Abstract

This invention describes methods of synthesis and applications of planarized photonic crystals. Provided are simple, quick, reproducible and inexpensive methods that combine self-assembly and lithography to achieve the first examples of vectorial control of thickness, structure, area, topology, orientation and registry of colloidal crystals that have been patterned in substrates for use in lab-on-chip and photonic chip technologies. 1-, 2 and 3-D colloidal crystals patterned either on or within substrates can be used for templating inverted colloidal crystal replica patterns made of materials like silicon as well as building micron scale structural defects in such colloidal crystals. These photonic crystals can form the basis of a range of optical devices that may be integrated within photonic chips and coupled to optical fibers and/or waveguides to enable development of highly compact planarized optically integrated photonic crystal devices and circuits for use in future all-optical computers and optical telecommunication systems.
PCT/CA2001/001436 2000-10-16 2001-10-16 Method of self-assembly and optical applications of crystalline colloidal patterns on substrates WO2002033461A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP01975922A EP1339897A2 (en) 2000-10-16 2001-10-16 Method of self-assembly and optical applications of crystalline colloidal patterns on substrates
AU2001295333A AU2001295333A1 (en) 2000-10-16 2001-10-16 Method of self-assembly and optical applications of crystalline colloidal patterns on substrates
JP2002536588A JP2004511828A (en) 2000-10-16 2001-10-16 Self-assembly method of crystal colloid pattern on substrate and optical application
CA2426105A CA2426105C (en) 2000-10-16 2001-10-16 Method of self-assembly and optical applications of crystalline colloidal patterns on substrates

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US24005500P 2000-10-16 2000-10-16
US60/240,055 2000-10-16
US25308100P 2000-11-28 2000-11-28
US60/253,081 2000-11-28
US29611901P 2001-06-07 2001-06-07
US60/296,119 2001-06-07

Publications (2)

Publication Number Publication Date
WO2002033461A2 WO2002033461A2 (en) 2002-04-25
WO2002033461A3 true WO2002033461A3 (en) 2002-09-06

Family

ID=27399306

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CA2001/001436 WO2002033461A2 (en) 2000-10-16 2001-10-16 Method of self-assembly and optical applications of crystalline colloidal patterns on substrates

Country Status (6)

Country Link
US (3) US7045195B2 (en)
EP (1) EP1339897A2 (en)
JP (1) JP2004511828A (en)
AU (1) AU2001295333A1 (en)
CA (1) CA2426105C (en)
WO (1) WO2002033461A2 (en)

Families Citing this family (143)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6713238B1 (en) * 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
US6858079B2 (en) 2000-11-28 2005-02-22 Nec Laboratories America, Inc. Self-assembled photonic crystals and methods for manufacturing same
JP2002266072A (en) * 2001-03-09 2002-09-18 Sumitomo Electric Ind Ltd Laminated film and film deposition method
JP4611573B2 (en) * 2001-06-15 2011-01-12 浜松ホトニクス株式会社 Method for forming light control unit
WO2003022010A1 (en) * 2001-08-30 2003-03-13 Fujitsu Limited Method for manufacturing organic el device and organic el device
US6940636B2 (en) 2001-09-20 2005-09-06 Analog Devices, Inc. Optical switching apparatus and method of assembling same
US7253091B2 (en) * 2001-09-28 2007-08-07 Hrl Laboratories, Llc Process for assembling three-dimensional systems on a chip and structure thus obtained
US7018575B2 (en) * 2001-09-28 2006-03-28 Hrl Laboratories, Llc Method for assembly of complementary-shaped receptacle site and device microstructures
US6974604B2 (en) * 2001-09-28 2005-12-13 Hrl Laboratories, Llc Method of self-latching for adhesion during self-assembly of electronic or optical components
US7351660B2 (en) * 2001-09-28 2008-04-01 Hrl Laboratories, Llc Process for producing high performance interconnects
US6893574B2 (en) * 2001-10-23 2005-05-17 Analog Devices Inc MEMS capping method and apparatus
JP2003185832A (en) * 2001-12-17 2003-07-03 Ricoh Co Ltd Particulate structure and method of making particulate structure
US7022604B2 (en) * 2002-04-09 2006-04-04 Micron Technology, Inc. Method of forming spatial regions of a second material in a first material
US6752868B2 (en) 2002-07-31 2004-06-22 Mcnc Research & Development Institute Layer-by-layer assembly of photonic crystals
JP2004119428A (en) * 2002-09-24 2004-04-15 Ricoh Co Ltd Process for fabricating fine particle structure
US20040063237A1 (en) * 2002-09-27 2004-04-01 Chang-Han Yun Fabricating complex micro-electromechanical systems using a dummy handling substrate
US6964882B2 (en) 2002-09-27 2005-11-15 Analog Devices, Inc. Fabricating complex micro-electromechanical systems using a flip bonding technique
US6933163B2 (en) * 2002-09-27 2005-08-23 Analog Devices, Inc. Fabricating integrated micro-electromechanical systems using an intermediate electrode layer
ATE429661T1 (en) * 2002-10-09 2009-05-15 Andre Arsenault WAVELENGTH TUNABLE MULTICOLOR PHOTONIC COLLOIDAL CRYSTAL DEVICE
GB0227902D0 (en) * 2002-11-29 2003-01-08 Ingenia Holdings Ltd Template
US20060165984A1 (en) * 2002-12-16 2006-07-27 Hernan Miguez Method of producing 3-d photonic crystal fibers
US6878643B2 (en) * 2002-12-18 2005-04-12 The Regents Of The University Of California Electronic unit integrated into a flexible polymer body
US20060137601A1 (en) * 2003-01-10 2006-06-29 Hernan Miguez Method of synthesis of 3d silicon colloidal photonic crystals by micromolding in inverse silica opal (miso)
ZA200506095B (en) * 2003-01-30 2006-10-25 Univ Cape Town A thin film semiconductor device and method of manufacturing a thin film semiconductor device
US20040255841A1 (en) * 2003-06-20 2004-12-23 Massachusetts Institute Of Technology Method for producing photonic crystal, and photonic crystal
US7079309B1 (en) * 2003-06-25 2006-07-18 Sandia Corporation Use of a photonic crystal for optical amplifier gain control
US7149076B2 (en) * 2003-07-15 2006-12-12 Cabot Corporation Capacitor anode formed of metallic columns on a substrate
US7223635B1 (en) 2003-07-25 2007-05-29 Hrl Laboratories, Llc Oriented self-location of microstructures with alignment structures
US7527829B2 (en) * 2003-07-31 2009-05-05 Soken Chemical & Engineering Co., Ltd. Fluid colloid crystal and process for producing three-dimensional aligned particle mass therefrom
US8268446B2 (en) 2003-09-23 2012-09-18 The University Of North Carolina At Chapel Hill Photocurable perfluoropolyethers for use as novel materials in microfluidic devices
US20050069713A1 (en) * 2003-09-30 2005-03-31 Rahul Gupta Capillary coating method
WO2005045478A1 (en) * 2003-10-31 2005-05-19 Corning Incorporated Large-scale colloidal crystals and macroporous polymers and method for producing
US7153360B2 (en) * 2003-12-16 2006-12-26 Hewlett-Packard Development Company, Lp. Template and methods for forming photonic crystals
KR101376715B1 (en) 2003-12-19 2014-03-27 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
US9040090B2 (en) * 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US20050162396A1 (en) * 2004-01-28 2005-07-28 The Boeing Company Dynamic seat labeling and passenger identification system
WO2005084191A2 (en) * 2004-02-13 2005-09-15 The University Of North Carolina At Chapel Hill Functional materials and novel methods for the fabrication of microfluidic devices
KR100594804B1 (en) * 2004-02-19 2006-07-03 삼성전자주식회사 Method for patterning self-assembled colloidal structures and fabrication methods of inverted-opal structured 3-dimensional photonic crystal waveguides by using the methode thereof
US20050250158A1 (en) * 2004-03-03 2005-11-10 Atul Parikh Arrays of colloidal crystals
JP4671102B2 (en) * 2004-03-05 2011-04-13 株式会社豊田中央研究所 Method for producing colloidal crystals
US20080138927A1 (en) * 2004-03-11 2008-06-12 The University Of Vermont And State Agricultural College Systems and Methods for Fabricating Crystalline Thin Structures Using Meniscal Growth Techniques
US8054540B2 (en) * 2004-03-15 2011-11-08 Sharp Laboratories Of America, Inc. Optical waveguide amplifier using high quantum efficiency silicon nanocrystal embedded silicon oxide
US7106938B2 (en) 2004-03-16 2006-09-12 Regents Of The University Of Minnesota Self assembled three-dimensional photonic crystal
KR20060001251A (en) * 2004-06-30 2006-01-06 엘지.필립스 엘시디 주식회사 Back light unit
EP2455333A3 (en) * 2004-08-19 2013-03-20 The University of Akron Photonic crystal, conjugated polymers suitable for photonic crystals, and a method for synthesizing conjugated polymers
US20060177634A1 (en) 2004-09-01 2006-08-10 John Lazar Activator means for pre-applied adhesives
US7342311B2 (en) * 2004-09-13 2008-03-11 Lawrence Livermore National Security, Llc Electronic unit integrated into a flexible polymer body
US20060147344A1 (en) * 2004-09-30 2006-07-06 The University Of Cincinnati Fully packed capillary electrophoretic separation microchips with self-assembled silica colloidal particles in microchannels and their preparation methods
JP4661326B2 (en) * 2004-10-29 2011-03-30 亮 川崎 Photonic crystal manufacturing method
US20060099733A1 (en) * 2004-11-09 2006-05-11 Geefay Frank S Semiconductor package and fabrication method
FR2877662B1 (en) * 2004-11-09 2007-03-02 Commissariat Energie Atomique PARTICLE NETWORK AND METHOD FOR MAKING SUCH A NETWORK
WO2006084123A2 (en) * 2005-02-02 2006-08-10 Marshall Robert A Self-assembly method, opal, photonic band gap, and light source
US20090027603A1 (en) * 2005-02-03 2009-01-29 Samulski Edward T Low Surface Energy Polymeric Material for Use in Liquid Crystal Displays
US7389023B2 (en) * 2005-03-15 2008-06-17 Hewlett-Packard Development Company, L.P. Method and apparatus for forming a photonic crystal
US7999353B1 (en) * 2005-04-26 2011-08-16 Northwestern University Mesoscale pyramids, hole arrays and methods of preparation
WO2006132224A1 (en) * 2005-06-09 2006-12-14 Tokyo University Of Agriculture And Technology Reflectivity variable sensor, optical measuring apparatus, reflectivity variable sensor manufacturing method, self-organized fine particle single layer film for reflectivity variable sensor, self-organized fine particle single layer film, and method for manufacturing such single layer films
CN101218624A (en) * 2005-07-11 2008-07-09 科兹莫斯·M.·莱尔斯 Stringed instrument that maintains relative tune
EP1746446A1 (en) * 2005-07-22 2007-01-24 CSEM Centre Suisse d'Electronique et de Microtechnique SA Recherche et Développement Structured color element
WO2007133235A2 (en) * 2005-08-08 2007-11-22 Liquidia Technologies, Inc. Micro and nano-structure metrology
EP2537657A3 (en) 2005-08-09 2016-05-04 The University of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
US7427570B2 (en) * 2005-09-01 2008-09-23 Micron Technology, Inc. Porous organosilicate layers, and vapor deposition systems and methods for preparing same
CN100391825C (en) * 2005-10-20 2008-06-04 南京大学 Non close parked metal hollow ball shell ordered network structure material and its making method
WO2007055489A1 (en) 2005-11-08 2007-05-18 Lg Chem, Ltd. Colloidal photonic crystals using colloidal nanoparticles and method for preparation thereof
JP2007190899A (en) * 2005-12-21 2007-08-02 Fujifilm Corp Nanostructure material having regular arrangement and manufacturing method thereof
US20100273667A1 (en) * 2006-02-10 2010-10-28 The Regents Of The University Of Michigan Cell culture well-plates having inverted colloidal crystal scaffolds
US20090041825A1 (en) * 2006-02-10 2009-02-12 Kotov Nicholas A Cell culture well-plates having inverted colloidal crystal scaffolds
JP2007272217A (en) * 2006-03-08 2007-10-18 Hokkaido Univ Method for manufacturing three-dimensional photonic crystal
US7592528B2 (en) * 2006-03-15 2009-09-22 Cosmos Lyles Stringed musical instrument using spring tension
US20090162616A1 (en) * 2006-04-13 2009-06-25 Chmelka Bradley F Mesostructured materials with controlled orientational ordering
WO2007134177A2 (en) * 2006-05-11 2007-11-22 President And Fellows Of Harvard College Methods, materials and devices for light manipulation with oriented molecular assemblies in micronscale photonic circuit elements with high-q or slow light
KR20070113762A (en) * 2006-05-26 2007-11-29 삼성전자주식회사 Method for forming nanoparticle array using capillarity and nanopartlce array preparaed by the same
US20080181958A1 (en) * 2006-06-19 2008-07-31 Rothrock Ginger D Nanoparticle fabrication methods, systems, and materials
JP2008008931A (en) * 2006-06-27 2008-01-17 Hokkaido Univ Manufacturing method of 3-dimensional photonic crystal
AU2007264405B2 (en) 2006-06-28 2012-08-16 Swinburne University Of Technology Bead immobilisation method and bead arrays made thereby
WO2008027571A2 (en) * 2006-08-30 2008-03-06 Liquidia Technologies, Inc. Nanoparticles having functional additives for self and directed assembly and methods of fabricating same
US7875952B1 (en) 2006-09-19 2011-01-25 Hrl Laboratories, Llc Method of transistor level heterogeneous integration and system
EP1942341A1 (en) * 2007-01-05 2008-07-09 Danmarks Tekniske Universitet A device and a system for analysis of a fluid sample
FI20075153A0 (en) * 2007-03-02 2007-03-02 Valtion Teknillinen Capillary transport of nano- or microparticles to form an ordered structure
WO2008106771A1 (en) * 2007-03-02 2008-09-12 Mark Ungrin Devices and methods for production of cell aggregates
US20100151031A1 (en) * 2007-03-23 2010-06-17 Desimone Joseph M Discrete size and shape specific organic nanoparticles designed to elicit an immune response
US8179034B2 (en) * 2007-07-13 2012-05-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display and lighting devices
US20090015142A1 (en) * 2007-07-13 2009-01-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display devices
US20090038537A1 (en) * 2007-08-07 2009-02-12 Covalent Materials Corporation Method of pulling up silicon single crystal
GB0717054D0 (en) * 2007-09-01 2007-10-17 Eastman Kodak Co Patterning method
US7934921B2 (en) * 2007-10-31 2011-05-03 Hitachi Global Storage Technologies Netherlands B.V. Apparatus, system, and method for guided growth of patterned media using monodisperse nanospheres
JP2011517367A (en) * 2008-02-28 2011-06-02 スリーエム イノベイティブ プロパティズ カンパニー Method for patterning a conductor on a substrate
WO2009109048A1 (en) * 2008-03-05 2009-09-11 Opalux Incorporated Photonic crystal electrical property indicator
US20100084081A1 (en) * 2008-08-06 2010-04-08 Academia Sinica Method for Fabricating Organic Optoelectronic Multi-Layer Devices
KR20100025330A (en) * 2008-08-27 2010-03-09 삼성전자주식회사 Method for preparing microarrays by using optically transparent array molds with an array of concaves
US20100110551A1 (en) * 2008-10-31 2010-05-06 3M Innovative Properties Company Light extraction film with high index backfill layer and passivation layer
US20100119194A1 (en) * 2008-11-13 2010-05-13 Seagate Technology Llc Optical Waveguide With Reflector
US7957621B2 (en) * 2008-12-17 2011-06-07 3M Innovative Properties Company Light extraction film with nanoparticle coatings
WO2010117102A1 (en) * 2009-04-09 2010-10-14 서강대학교 산학협력단 Method for aligning colloidal crystals as single crystals
CN102803562B (en) * 2009-06-25 2015-09-30 3M创新有限公司 The method of Wet-type etching self-assembled monolayer patterned substrate and metal pattern goods
EP3567416A1 (en) 2009-10-12 2019-11-13 The Trustees of Columbia University in the City of New York Photonic crystal spectrometer
KR101161060B1 (en) * 2009-11-30 2012-06-29 서강대학교산학협력단 Arranging apparatus into columnar structure for nano particles and Method for arranging the same
FR2956991B1 (en) * 2010-03-02 2012-11-02 Commissariat Energie Atomique METHOD FOR DEPOSITING A LAYER OF PARTICLES ORGANIZED ON A SUBSTRATE
US8477402B2 (en) 2010-09-20 2013-07-02 The Invention Science Fund I Llc Photonic modulation of a photonic band gap
US9341742B2 (en) 2010-10-12 2016-05-17 The Regents Of The University Of California Magnetic assembly of nonmagnetic particles into photonic crystal structures
ITMI20102295A1 (en) * 2010-12-15 2012-06-16 Consiglio Nazionale Ricerche METHOD FOR THE REALIZATION OF COMPLEX STRUCTURES ON MICROMETRIC OR NANOMETRIC STAIRS, AND COMPLEX STRUCTURE SO OBTAINED
JP5905033B2 (en) * 2011-02-24 2016-04-20 ナショナル ユニバーシティ オブ シンガポール Light reflecting fabric material and method of forming light reflecting fabric material
US8692446B2 (en) 2011-03-17 2014-04-08 3M Innovative Properties Company OLED light extraction films having nanoparticles and periodic structures
US8602482B2 (en) * 2011-03-30 2013-12-10 GM Global Technology Operations LLC Closure assembly and method of manufacturing same
US8842946B1 (en) * 2011-04-01 2014-09-23 Kotura, Inc. Light sensor having reduced dark current
WO2013090177A1 (en) * 2011-12-12 2013-06-20 The Trustees Of Columbia University In The City Of New York Systems and methods for suspended polymer photonic crystal cavities and waveguides
KR101370119B1 (en) * 2011-12-13 2014-03-04 엠파이어 테크놀로지 디벨롭먼트 엘엘씨 Elastomer adhesions
CN102560643B (en) * 2011-12-29 2015-09-30 广东爱康太阳能科技有限公司 A kind of template for the preparation of colloidal crystal and make the processing method of this template
US9453942B2 (en) 2012-06-08 2016-09-27 National University Of Singapore Inverse opal structures and methods for their preparation and use
US9932664B2 (en) * 2012-11-06 2018-04-03 Purdue Research Foundation Methods for directed irradiation synthesis with ion and thermal beams
US20160070059A1 (en) * 2013-05-01 2016-03-10 Corning Incorporated Random air line rod
US9970749B2 (en) 2013-08-06 2018-05-15 Fuji Kagaku Corporation Sheet of colloidal crystals immobilized in resin, method of displaying structural color using same, method for detecting unevenness distribution or hardness distribution of subject using same, and structural color sheet
JP6111390B2 (en) * 2013-08-06 2017-04-12 富士化学株式会社 Resin-fixed colloidal crystal sheet, method of displaying structural color using the same, method of detecting unevenness distribution or hardness distribution of specimen using the same, and structural color sheet
US8999742B1 (en) * 2013-12-10 2015-04-07 Nthdegree Technologies Worldwide Inc. Silicon microsphere fabrication
US9849464B2 (en) 2014-04-18 2017-12-26 The Regents Of The University Of Michigan Devices and methods for spatially and temporally reconfigurable assembly of colloidal crystals
US9472788B2 (en) 2014-08-27 2016-10-18 3M Innovative Properties Company Thermally-assisted self-assembly method of nanoparticles and nanowires within engineered periodic structures
CN104597631B (en) * 2014-09-29 2018-09-18 欧阳征标 A kind of three port photocirculator of broadband introducing triangle guide post
CN104950384B (en) * 2014-09-29 2020-11-13 欧阳征标 Circular hole type square lattice photonic crystal low-refractive-index double-compensation scattering column right-angle waveguide
CN107074580B (en) 2014-10-17 2020-05-22 国立研究开发法人产业技术总合研究所 Method for arranging nanocrystals, method for producing nanocrystal structure, nanocrystal structure-forming substrate, and method for producing nanocrystal structure-forming substrate
GB201419879D0 (en) * 2014-11-07 2014-12-24 Ibm Self-limited, anisotropic wet etching of transverse vias in microfluidic chips
EP3289039A4 (en) 2015-04-27 2018-10-17 The Regents of The University of Michigan Durable icephobic surfaces
US10156025B2 (en) * 2015-05-04 2018-12-18 University Of South Carolina Monolithic heterogeneous single crystals with multiple regimes for solid state laser applications
WO2017172437A1 (en) * 2016-03-30 2017-10-05 Tufts University Fabrication of macroporous polymeric hydrogel microparticles
CN105947970A (en) * 2016-05-16 2016-09-21 华南师范大学 Ordered large-area single-layer microspheres/nanospheres assisted by template and preparation method thereof
KR102036759B1 (en) * 2016-12-08 2019-10-28 한국과학기술원 Multi-functional film with simultaneous color filter and phase retardation functions
US11156914B2 (en) * 2017-02-10 2021-10-26 Northeastern University Damascene template for nanoelement printing fabricated without chemomechanical planarization
CN106702492A (en) * 2017-02-24 2017-05-24 江西德义半导体科技有限公司 Gallium arsenide ultrathin substrate and application thereof
GB201713150D0 (en) * 2017-08-16 2017-09-27 Lig Nanowise Ltd Method for manufacturing a microsphere array
FR3072038B1 (en) * 2017-10-05 2021-11-05 Centre Nat Rech Scient GRAVITATIONAL PARTICLE ASSEMBLY PROCESS
US10527790B2 (en) * 2017-12-13 2020-01-07 Cisco Technology, Inc. Passive fiber coupler with UV windows
KR102173895B1 (en) * 2018-01-18 2020-11-04 한양대학교 산학협력단 Tunable Colloidal Crystalline Patterns on Micro-Patterned Curved Surfaces and Method for Fabricating the Same
WO2019190706A2 (en) 2018-03-05 2019-10-03 The Regents Of The University Of Michigan Anti-icing surfaces exhibiting low interfacial toughness with ice
US10686493B2 (en) 2018-03-26 2020-06-16 At&T Intellectual Property I, L.P. Switching of data channels provided in electromagnetic waves and methods thereof
US10547545B2 (en) 2018-03-30 2020-01-28 At&T Intellectual Property I, L.P. Method and apparatus for switching of data channels provided in electromagnetic waves
CN108919402B (en) * 2018-07-24 2021-11-16 京东方科技集团股份有限公司 Color filter substrate, manufacturing method thereof and display device
CN109231151A (en) * 2018-09-26 2019-01-18 天津大学 A kind of device and application for making self-assembly structure
KR102115180B1 (en) * 2018-10-17 2020-05-26 한국조폐공사 Secure device using light reflection property
WO2020089255A1 (en) * 2018-10-29 2020-05-07 Universität Hamburg Magnetically tunable resonator
LU101038B1 (en) * 2018-12-14 2020-06-15 Univ Hamburg Magnetically tunable resonator
US10812291B1 (en) 2019-12-03 2020-10-20 At&T Intellectual Property I, L.P. Method and apparatus for communicating between a waveguide system and a base station device
US10930992B1 (en) 2019-12-03 2021-02-23 At&T Intellectual Property I, L.P. Method and apparatus for communicating between waveguide systems
CN112928013B (en) * 2019-12-05 2022-10-04 天津大学 Method for controlling particle orientation using curved surfaces and evacuation attraction potential
CN111688189B (en) * 2020-06-18 2022-04-19 南京工业大学 Method for preparing structural color three-dimensional array pattern based on sessile liquid drops
US11562984B1 (en) 2020-10-14 2023-01-24 Hrl Laboratories, Llc Integrated mechanical aids for high accuracy alignable-electrical contacts

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4728591A (en) * 1986-03-07 1988-03-01 Trustees Of Boston University Self-assembled nanometer lithographic masks and templates and method for parallel fabrication of nanometer scale multi-device structures
WO2000010040A1 (en) * 1998-08-11 2000-02-24 Massachusetts Institute Of Technology Composite photonic crystals
EP1030196A1 (en) * 1999-02-11 2000-08-23 Lucent Technologies Inc. Electrochemical process for fabricating article exhibiting substantial three-dimensional order and resultant article
EP1081513A1 (en) * 1999-09-01 2001-03-07 Lucent Technologies Inc. Process for fabricating a colloidal crystal having substantial three-dimensional order

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014246A (en) * 1996-11-06 2000-01-11 University Of Pittsburgh Of The Commonwealth System Of Higher Education Thermally switchable optical devices
US6337117B1 (en) * 1998-07-01 2002-01-08 Mitsubishi Chemical Corporation Optical memory device
US6194316B1 (en) * 1998-08-10 2001-02-27 Vacuum Metallurgical Co., Ltd. Method for forming CU-thin film
US6734029B2 (en) * 2000-06-30 2004-05-11 Seiko Epson Corporation Method for forming conductive film pattern, and electro-optical device and electronic apparatus
US6392787B1 (en) * 2000-09-01 2002-05-21 Agere Systems Guardian Corp. Process for fabricating article comprising photonic band gap material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4728591A (en) * 1986-03-07 1988-03-01 Trustees Of Boston University Self-assembled nanometer lithographic masks and templates and method for parallel fabrication of nanometer scale multi-device structures
WO2000010040A1 (en) * 1998-08-11 2000-02-24 Massachusetts Institute Of Technology Composite photonic crystals
EP1030196A1 (en) * 1999-02-11 2000-08-23 Lucent Technologies Inc. Electrochemical process for fabricating article exhibiting substantial three-dimensional order and resultant article
EP1081513A1 (en) * 1999-09-01 2001-03-07 Lucent Technologies Inc. Process for fabricating a colloidal crystal having substantial three-dimensional order

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
AIZENBERG ET AL: "PATTERNED COLLOIDAL DEPOSITION CONTROLLED BY ELECTROSTATIC AND CAPILLARY FORCES", PHYSICAL REVIEW LETTERS, vol. 84, no. 13, 27 March 2000 (2000-03-27), USA, pages 2997 - 3000, XP001074766 *
CHEN: "SELECTIVE SELF ORGANIZATION OF COLLOIDS ON PATTERNED POLYELECTROLYTE TEMPLATES", LANGMUIR, vol. 16, 2000, USA, pages 7825 - 7834, XP001074759 *
CHOMSKI E ET AL: "PANOSCOPIC SILICON - A MATERIAL FOR ALL LENGTH SCALES", ADVANCED MATERIALS, VCH VERLAGSGESELLSCHAFT, WEINHEIM, DE, vol. 12, no. 14, 19 July 2000 (2000-07-19), pages 1071 - 1078, XP000959392, ISSN: 0935-9648 *
GATES B ET AL: "SELF-ASSEMBLY OF MESO- AND NANOPARTICLES INTO 3D ORDERED ARRAYS AND ITS APPLICATIONS", ORGANIC/INORGANIC HYBRID MATERIALS II. SAN FRANCISCO, CA, APRIL 5 - 9, 1999, MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. VOL. 576, WARRENDALE, PA: MRS, US, vol. 576, 5 April 1999 (1999-04-05), pages 149 - 154, XP000897904, ISBN: 1-55899-483-1 *
KIM E ET AL: "TWO- AND THREE-DIMENSIONAL CRYSTALLIZATION OF POLYMERIC MICROSPHERES BY MICROMOLDING IN CAPILLARIES", ADVANCED MATERIALS, VCH VERLAGSGESELLSCHAFT, WEINHEIM, DE, vol. 8, no. 3, 1 March 1996 (1996-03-01), pages 245 - 247, XP000558255, ISSN: 0935-9648 *
OLESCHUK: "TRAPPING OF BEAD-BASED REAGENTS WITHIN MICROFLUIDIC SYSTEMS", ANAL. CHEM, vol. 72, 2000, USA, pages 585 - 590, XP001074756 *

Also Published As

Publication number Publication date
US7758919B2 (en) 2010-07-20
US20040053009A1 (en) 2004-03-18
US7247349B2 (en) 2007-07-24
EP1339897A2 (en) 2003-09-03
US20020045030A1 (en) 2002-04-18
CA2426105C (en) 2010-07-13
WO2002033461A2 (en) 2002-04-25
JP2004511828A (en) 2004-04-15
CA2426105A1 (en) 2002-04-25
US7045195B2 (en) 2006-05-16
US20070196571A1 (en) 2007-08-23
AU2001295333A1 (en) 2002-04-29

Similar Documents

Publication Publication Date Title
WO2002033461A3 (en) Method of self-assembly and optical applications of crystalline colloidal patterns on substrates
WO2003065091A3 (en) Optical circuit including hollow core optical waveguides
EP1353200A3 (en) Diffraction grating based fibre-to-waveguide coupler for polarisation independent photonic integrated circuits
FR2817395B1 (en) METHOD FOR MANUFACTURING A SUBSTRATE, IN PARTICULAR FOR OPTICS, ELECTRONICS OR OPTOELECTRONICS AND SUBSTRATE OBTAINED THEREBY
WO2005107026A3 (en) Multi-level integrated photonic devices
WO2005104756A3 (en) Composite patterning devices for soft lithography
PH12013500597B1 (en) Polarizing photochromic devices and methods of making the same
WO2002061470A8 (en) Optical device and method for manufacturing same
WO2002086560A2 (en) Grating structures and methods of making the grating structures
WO2001075495A3 (en) Integrated optical circuits
DE59801875D1 (en) INTEGRATED OPTICAL CIRCUIT
AU2001233057A1 (en) Patterning of nanocrystalline diamond films for diamond microstructures useful in mems and other devices
WO2004003599A3 (en) Anisotropic films based on 1,8-naphthoylene-1',2'-benzimidazole sulfonates and lyotropic liquid crystal systems and methods for making
WO2005050317A3 (en) Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light
JPH07508596A (en) Optical polymer elements for coupling optical elements into integrated optical circuits
DE60134211D1 (en) IMPROVED INTEGRATED OPTICAL DEVICE
CA2278826A1 (en) Optical waveguide device and method of producing the same
DE59902673D1 (en) Mirror with a crystal substrate for EUV
US20060261032A1 (en) Integrated optical MEMS devices
WO2001041539A3 (en) Micro optical bench component clip structures
de Ridder et al. An integrated optic adiabatic TE/TM mode splitter on silicon
CN100465675C (en) Optical waveguide chip and method of manufacturing the same
WO2002006890A3 (en) Method for producing non-linear optical organic crystal film
EP2940500A1 (en) An integrated optical circuit and methods for its manufacturing and reconfiguring
DE60201237D1 (en) Manufacturing process for optical elements by liquid crystal layer structuring

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PH PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2002536588

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 2426105

Country of ref document: CA

WWE Wipo information: entry into national phase

Ref document number: 2001975922

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

WWP Wipo information: published in national office

Ref document number: 2001975922

Country of ref document: EP