WO2002068713A1 - Vaporizer - Google Patents
Vaporizer Download PDFInfo
- Publication number
- WO2002068713A1 WO2002068713A1 PCT/US2002/006411 US0206411W WO02068713A1 WO 2002068713 A1 WO2002068713 A1 WO 2002068713A1 US 0206411 W US0206411 W US 0206411W WO 02068713 A1 WO02068713 A1 WO 02068713A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- slots
- slot
- vaporizer
- gas
- liquid
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F22—STEAM GENERATION
- F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
- F22B27/00—Instantaneous or flash steam boilers
- F22B27/16—Instantaneous or flash steam boilers involving spray nozzles for sprinkling or injecting water particles on to or into hot heat-exchange elements, e.g. into tubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/12—Mixing gases with gases with vaporisation of a liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/21—Mixing gases with liquids by introducing liquids into gaseous media
- B01F23/213—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids
- B01F23/2132—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids using nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/003—Housing formed from a plurality of the same valve elements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F22—STEAM GENERATION
- F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
- F22B27/00—Instantaneous or flash steam boilers
- F22B27/14—Instantaneous or flash steam boilers built-up from heat-exchange elements arranged within a confined chamber having heat-retaining walls
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D2210/00—Indexing scheme relating to aspects and details of apparatus or devices for dispensing beverages on draught or for controlling flow of liquids under gravity from storage containers for dispensing purposes
- B67D2210/00028—Constructional details
- B67D2210/00047—Piping
- B67D2210/0006—Manifolds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87885—Sectional block structure
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02717526A EP1427868B1 (en) | 2001-02-28 | 2002-02-28 | Vaporizer |
JP2002568805A JP2005506681A (en) | 2001-02-28 | 2002-02-28 | Vaporizer |
DE60204706T DE60204706T2 (en) | 2001-02-28 | 2002-02-28 | EVAPORATOR |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US27194701P | 2001-02-28 | 2001-02-28 | |
US60/271,947 | 2001-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002068713A1 true WO2002068713A1 (en) | 2002-09-06 |
WO2002068713A8 WO2002068713A8 (en) | 2002-10-24 |
Family
ID=23037766
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/006302 WO2002068127A2 (en) | 2001-02-28 | 2002-02-28 | Manifolded fluid delivery system |
PCT/US2002/006411 WO2002068713A1 (en) | 2001-02-28 | 2002-02-28 | Vaporizer |
PCT/US2002/006253 WO2002069065A2 (en) | 2001-02-28 | 2002-02-28 | Flow controller |
PCT/US2002/006313 WO2002074445A2 (en) | 2001-02-28 | 2002-02-28 | Atomizer |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/006302 WO2002068127A2 (en) | 2001-02-28 | 2002-02-28 | Manifolded fluid delivery system |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/006253 WO2002069065A2 (en) | 2001-02-28 | 2002-02-28 | Flow controller |
PCT/US2002/006313 WO2002074445A2 (en) | 2001-02-28 | 2002-02-28 | Atomizer |
Country Status (6)
Country | Link |
---|---|
US (4) | US6604492B2 (en) |
EP (4) | EP1374004A2 (en) |
JP (4) | JP2004524148A (en) |
AU (1) | AU2002242304A1 (en) |
DE (3) | DE60215471T2 (en) |
WO (4) | WO2002068127A2 (en) |
Cited By (3)
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---|---|---|---|---|
US9982341B2 (en) | 2015-01-30 | 2018-05-29 | Lam Research Corporation | Modular vaporizer |
US10107490B2 (en) | 2014-06-30 | 2018-10-23 | Lam Research Corporation | Configurable liquid precursor vaporizer |
US10147597B1 (en) | 2017-09-14 | 2018-12-04 | Lam Research Corporation | Turbulent flow spiral multi-zone precursor vaporizer |
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US7168395B2 (en) * | 2003-10-16 | 2007-01-30 | Gerald E Engdahl | Submerged combustion LNG vaporizer |
US20050147749A1 (en) * | 2004-01-05 | 2005-07-07 | Msp Corporation | High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition |
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- 2002-02-28 JP JP2002567474A patent/JP2004524148A/en active Pending
- 2002-02-28 US US10/087,701 patent/US6604492B2/en not_active Expired - Lifetime
- 2002-02-28 US US10/087,709 patent/US6892762B2/en not_active Expired - Lifetime
- 2002-02-28 JP JP2002568805A patent/JP2005506681A/en active Pending
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- 2002-02-28 JP JP2002568122A patent/JP2004530190A/en active Pending
- 2002-02-28 WO PCT/US2002/006302 patent/WO2002068127A2/en active IP Right Grant
- 2002-02-28 DE DE60215618T patent/DE60215618T2/en not_active Expired - Lifetime
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- 2002-02-28 WO PCT/US2002/006411 patent/WO2002068713A1/en active IP Right Grant
- 2002-02-28 EP EP02717526A patent/EP1427868B1/en not_active Expired - Fee Related
- 2002-02-28 US US10/086,403 patent/US6834848B2/en not_active Expired - Lifetime
- 2002-02-28 JP JP2002573150A patent/JP2004524150A/en active Pending
- 2002-02-28 US US10/087,057 patent/US6694809B2/en not_active Expired - Lifetime
- 2002-02-28 EP EP02707937A patent/EP1372864B1/en not_active Expired - Fee Related
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US10107490B2 (en) | 2014-06-30 | 2018-10-23 | Lam Research Corporation | Configurable liquid precursor vaporizer |
US9982341B2 (en) | 2015-01-30 | 2018-05-29 | Lam Research Corporation | Modular vaporizer |
US10147597B1 (en) | 2017-09-14 | 2018-12-04 | Lam Research Corporation | Turbulent flow spiral multi-zone precursor vaporizer |
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