WO2003032351A3 - Method and device for aligning a charged particle beam column - Google Patents
Method and device for aligning a charged particle beam column Download PDFInfo
- Publication number
- WO2003032351A3 WO2003032351A3 PCT/IB2002/005792 IB0205792W WO03032351A3 WO 2003032351 A3 WO2003032351 A3 WO 2003032351A3 IB 0205792 W IB0205792 W IB 0205792W WO 03032351 A3 WO03032351 A3 WO 03032351A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- aligning
- charged particle
- particle beam
- beam column
- stigmator
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/263—Contrast, resolution or power of penetration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1532—Astigmatism
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/21—Focus adjustment
- H01J2237/216—Automatic focusing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2002358245A AU2002358245A1 (en) | 2001-10-10 | 2002-10-04 | Method and device for aligning a charged particle beam column |
JP2003535224A JP3959063B2 (en) | 2001-10-10 | 2002-10-04 | Alignment method and apparatus for charged particle beam column |
US10/492,257 US7335893B2 (en) | 2001-10-10 | 2002-10-04 | Method and device for aligning a charged particle beam column |
US11/689,870 US7385205B2 (en) | 2001-10-10 | 2007-03-22 | Method and device for aligning a charged particle beam column |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32845201P | 2001-10-10 | 2001-10-10 | |
US60/328,452 | 2001-10-10 | ||
EP02016839.9 | 2002-07-29 | ||
EP02016839A EP1302971B1 (en) | 2001-10-10 | 2002-07-29 | Method and device for the automatic generation of images adapted to align a charged particle beam column |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/689,870 Division US7385205B2 (en) | 2001-10-10 | 2007-03-22 | Method and device for aligning a charged particle beam column |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003032351A2 WO2003032351A2 (en) | 2003-04-17 |
WO2003032351A3 true WO2003032351A3 (en) | 2003-10-02 |
Family
ID=26077582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2002/005792 WO2003032351A2 (en) | 2001-10-10 | 2002-10-04 | Method and device for aligning a charged particle beam column |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3959063B2 (en) |
CN (1) | CN100341106C (en) |
AU (1) | AU2002358245A1 (en) |
WO (1) | WO2003032351A2 (en) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4652830B2 (en) * | 2005-01-26 | 2011-03-16 | キヤノン株式会社 | Aberration adjustment method, device manufacturing method, and charged particle beam exposure apparatus |
JP4708854B2 (en) | 2005-05-13 | 2011-06-22 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
EP1783811A3 (en) | 2005-11-02 | 2008-02-27 | FEI Company | Corrector for the correction of chromatic aberrations in a particle-optical apparatus |
JP4538472B2 (en) * | 2007-03-15 | 2010-09-08 | 株式会社日立ハイテクノロジーズ | Image forming method and electron microscope |
EP2091062A1 (en) | 2008-02-13 | 2009-08-19 | FEI Company | TEM with aberration corrector and phase plate |
EP2131385A1 (en) | 2008-06-05 | 2009-12-09 | FEI Company | Hybrid phase plate |
EP2166557A1 (en) | 2008-09-22 | 2010-03-24 | FEI Company | Method for correcting distortions in a particle-optical apparatus |
EP2197018A1 (en) | 2008-12-12 | 2010-06-16 | FEI Company | Method for determining distortions in a particle-optical apparatus |
EP2325862A1 (en) | 2009-11-18 | 2011-05-25 | Fei Company | Corrector for axial aberrations of a particle-optical lens |
EP2511936B1 (en) | 2011-04-13 | 2013-10-02 | Fei Company | Distortion free stigmation of a TEM |
DE102012102608B4 (en) * | 2012-03-27 | 2016-07-21 | Aixacct Systems Gmbh | Method for determining beam parameters of a charged particle beam, measuring device and charged particle beam device |
CN103456590B (en) * | 2012-05-31 | 2016-08-24 | 睿励科学仪器(上海)有限公司 | Scanning electron microscope has alignment device and the method thereof of multi-stage mechanical aligning guide |
RU2627732C2 (en) * | 2012-06-01 | 2017-08-11 | Сименс Акциенгезелльшафт | Tilting plate and a device for deviation of charged particles |
EP3016130A1 (en) * | 2014-10-28 | 2016-05-04 | Fei Company | Composite scan path in a charged particle microscope |
JP6620170B2 (en) * | 2016-01-29 | 2019-12-11 | 株式会社日立ハイテクノロジーズ | Charged particle beam apparatus and optical axis adjustment method thereof |
US10790114B2 (en) * | 2017-06-29 | 2020-09-29 | Kla-Tencor Corporation | Scanning electron microscope objective lens calibration using X-Y voltages iteratively determined from images obtained using said voltages |
JP6863208B2 (en) * | 2017-09-29 | 2021-04-21 | 株式会社ニューフレアテクノロジー | Multi-charged particle beam drawing device and multi-charged particle beam drawing method |
US10923318B2 (en) * | 2018-12-20 | 2021-02-16 | Fei Company | Optical alignment correction using convolutional neural network evaluation of a beam image |
DE102019204575B3 (en) * | 2019-04-01 | 2020-08-06 | Carl Zeiss Smt Gmbh | Method, device and computer program for determining a wavefront of a mass-laden particle beam |
JP7413105B2 (en) * | 2019-09-25 | 2024-01-15 | 株式会社日立ハイテクサイエンス | Charged particle beam device |
JP7391735B2 (en) * | 2019-09-25 | 2023-12-05 | 株式会社日立ハイテクサイエンス | Charged particle beam device |
US11361951B2 (en) * | 2019-10-03 | 2022-06-14 | Kla Corporation | System and method for photomultiplier tube image correction |
US20230411109A1 (en) * | 2022-06-16 | 2023-12-21 | Fei Company | Methods for determining the virtual source location of a liquid metal ion source |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4162403A (en) * | 1978-07-26 | 1979-07-24 | Advanced Metals Research Corp. | Method and means for compensating for charge carrier beam astigmatism |
US4451737A (en) * | 1981-06-24 | 1984-05-29 | Hitachi, Ltd. | Electron beam control device for electron microscopes |
US5627373A (en) * | 1996-06-17 | 1997-05-06 | Hewlett-Packard Company | Automatic electron beam alignment and astigmatism correction in scanning electron microscope |
-
2002
- 2002-10-04 JP JP2003535224A patent/JP3959063B2/en not_active Expired - Fee Related
- 2002-10-04 WO PCT/IB2002/005792 patent/WO2003032351A2/en active Search and Examination
- 2002-10-04 CN CNB028229541A patent/CN100341106C/en not_active Expired - Lifetime
- 2002-10-04 AU AU2002358245A patent/AU2002358245A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4162403A (en) * | 1978-07-26 | 1979-07-24 | Advanced Metals Research Corp. | Method and means for compensating for charge carrier beam astigmatism |
US4451737A (en) * | 1981-06-24 | 1984-05-29 | Hitachi, Ltd. | Electron beam control device for electron microscopes |
US5627373A (en) * | 1996-06-17 | 1997-05-06 | Hewlett-Packard Company | Automatic electron beam alignment and astigmatism correction in scanning electron microscope |
Also Published As
Publication number | Publication date |
---|---|
AU2002358245A1 (en) | 2003-04-22 |
CN100341106C (en) | 2007-10-03 |
JP3959063B2 (en) | 2007-08-15 |
WO2003032351A2 (en) | 2003-04-17 |
CN1589490A (en) | 2005-03-02 |
JP2005505899A (en) | 2005-02-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003032351A3 (en) | Method and device for aligning a charged particle beam column | |
EP1302971A3 (en) | Method and device for aligning a charged particle beam column | |
WO2001056056A3 (en) | Objective lens for a charged particle beam device | |
WO2004107050A3 (en) | Charged particle beamlet exposure system | |
EP1280184A3 (en) | Inspecting system for particle-optical imaging of an object, deflection device for charged particles and method for operating the same | |
WO2005071708A3 (en) | Focussing lens for charged particle beams | |
WO2001075949A1 (en) | Multibeam exposure apparatus comprising multiaxis electron lens and method for manufacturing semiconductor device | |
WO2004055856A3 (en) | Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens | |
EP1081741A3 (en) | Focusing method and system | |
WO2008071303A3 (en) | Particle-optical arrangement | |
EP0926666A3 (en) | Optical pickup position control device | |
WO2003032359A3 (en) | Method and device for aligning a charged particle beam column | |
TW200620429A (en) | Weakening focusing effect of acceleration-deceleration column of ion implanter | |
EP0641010A3 (en) | Dynamic off-axis defocusing correction for deflection lens crt. | |
JPS5851710B2 (en) | television receiver | |
WO2004086452A3 (en) | Charged particle beam device | |
WO2005071709A3 (en) | Beam optical component having a charged particle lens | |
MY117965A (en) | Speaker apparatus and television set | |
WO2000075954A3 (en) | Apparatus and method for forming a charged particle beam of arbitrary shape | |
JPH036615B2 (en) | ||
WO2020249859A3 (en) | Sound field related rendering | |
CA2155452A1 (en) | Dynamic Focus Circuit | |
EP1104179A3 (en) | Method and device for adapting the propagation time difference of a video and audiosignal in a television apparatus | |
AU2002340156A1 (en) | System and method for fast focal length alterations | |
AU3167797A (en) | Device for determining the quality of an output signal to be generated by a signal processing circuit, and also method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BY BZ CA CH CN CO CR CU CZ DE DM DZ EC EE ES FI GB GD GE GH HR HU ID IL IN IS JP KE KG KP KR LC LK LR LS LT LU LV MA MD MG MN MW MX MZ NO NZ OM PH PL PT RU SD SE SG SI SK SL TJ TM TN TR TZ UA UG US UZ VC VN YU ZA ZM |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ UG ZM ZW AM AZ BY KG KZ RU TJ TM AT BE BG CH CY CZ DK EE ES FI FR GB GR IE IT LU MC PT SE SK TR BF BJ CF CG CI GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2003535224 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 20028229541 Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10492257 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase | ||
DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) |