WO2003041109A3 - Spot grid array electron imagine system - Google Patents

Spot grid array electron imagine system Download PDF

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Publication number
WO2003041109A3
WO2003041109A3 PCT/US2002/035657 US0235657W WO03041109A3 WO 2003041109 A3 WO2003041109 A3 WO 2003041109A3 US 0235657 W US0235657 W US 0235657W WO 03041109 A3 WO03041109 A3 WO 03041109A3
Authority
WO
WIPO (PCT)
Prior art keywords
spots
substrate
array
mechanical
imaging
Prior art date
Application number
PCT/US2002/035657
Other languages
French (fr)
Other versions
WO2003041109A2 (en
Inventor
Gilad Almogy
Oren Reches
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to AU2002361592A priority Critical patent/AU2002361592A1/en
Priority to EP02797069.8A priority patent/EP1446676B1/en
Priority to JP2003543055A priority patent/JP4587668B2/en
Publication of WO2003041109A2 publication Critical patent/WO2003041109A2/en
Publication of WO2003041109A3 publication Critical patent/WO2003041109A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H01J2237/0635—Multiple source, e.g. comb or array
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1502—Mechanical adjustments
    • H01J2237/1503—Mechanical scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H01J2237/20228—Mechanical X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Abstract

A high data-rate electron beam spot-grid array imaging system is provided that overcomes the low resolution and severe linearity requirements of prior art systems. Embodiments include an imaging system comprising an electron beam generator for simultaneously irradiating an array of spots spaced apart from each other on a surface of an object to be imaged, and a detector for collecting backscattered and/or secondary electrons emitted as a result of the interaction of the spots with the surface of the object to form an image of the irradiated portions of the object surface. A mechanical system moves the substrate in a direction which is nearly parallel to an axis of the array of spots such that as the substrate is moved across the spot array in the scan direction (the y-direction) the spots trace a path which leaves no gaps in the mechanical cross-scan direction (the x-direction). A compensator, such as a servo or a movable mirror, compensates for mechanical inaccuracies in the moving stage, thereby increasing imaging accuracy. In other embodiments, multiple detectors placed at different angles to the substrate collect electrons to provide multiple perspective imaging of the substrate surface.
PCT/US2002/035657 2001-11-07 2002-11-07 Spot grid array electron imagine system WO2003041109A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2002361592A AU2002361592A1 (en) 2001-11-07 2002-11-07 Spot grid array electron imagine system
EP02797069.8A EP1446676B1 (en) 2001-11-07 2002-11-07 Spot grid array electron beam imaging system
JP2003543055A JP4587668B2 (en) 2001-11-07 2002-11-07 Spot grating array electron imaging system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/986,137 US6946655B2 (en) 2001-11-07 2001-11-07 Spot grid array electron imaging system
US09/986,137 2001-11-07

Publications (2)

Publication Number Publication Date
WO2003041109A2 WO2003041109A2 (en) 2003-05-15
WO2003041109A3 true WO2003041109A3 (en) 2003-09-18

Family

ID=25532115

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/035657 WO2003041109A2 (en) 2001-11-07 2002-11-07 Spot grid array electron imagine system

Country Status (7)

Country Link
US (1) US6946655B2 (en)
EP (1) EP1446676B1 (en)
JP (1) JP4587668B2 (en)
KR (1) KR20050056923A (en)
CN (1) CN100412560C (en)
AU (1) AU2002361592A1 (en)
WO (1) WO2003041109A2 (en)

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US7991242B2 (en) 2005-05-11 2011-08-02 Optosecurity Inc. Apparatus, method and system for screening receptacles and persons, having image distortion correction functionality
US8067732B2 (en) * 2005-07-26 2011-11-29 Ebara Corporation Electron beam apparatus
CA2584683A1 (en) * 2006-04-20 2007-10-20 Optosecurity Inc. Apparatus, method and system for screening receptacles and persons
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US8494210B2 (en) 2007-03-30 2013-07-23 Optosecurity Inc. User interface for use in security screening providing image enhancement capabilities and apparatus for implementing same
US8207499B2 (en) * 2008-09-24 2012-06-26 Applied Materials Israel, Ltd. Variable rate scanning in an electron microscope
US9202667B2 (en) * 2009-02-19 2015-12-01 Hitachi High-Technologies Corporation Charged particle radiation device with bandpass detection
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US8362425B2 (en) * 2011-03-23 2013-01-29 Kla-Tencor Corporation Multiple-beam system for high-speed electron-beam inspection
WO2013036735A1 (en) 2011-09-07 2013-03-14 Rapiscan Systems, Inc. X-ray inspection system that integrates manifest data with imaging/detection processing
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Also Published As

Publication number Publication date
CN100412560C (en) 2008-08-20
KR20050056923A (en) 2005-06-16
CN1602430A (en) 2005-03-30
WO2003041109A2 (en) 2003-05-15
JP4587668B2 (en) 2010-11-24
EP1446676A2 (en) 2004-08-18
US20030085353A1 (en) 2003-05-08
AU2002361592A1 (en) 2003-05-19
US6946655B2 (en) 2005-09-20
JP2006502526A (en) 2006-01-19
EP1446676B1 (en) 2014-07-23

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