WO2003052815A3 - Electrode structure for use in an integrated circuit - Google Patents

Electrode structure for use in an integrated circuit Download PDF

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Publication number
WO2003052815A3
WO2003052815A3 PCT/US2002/037020 US0237020W WO03052815A3 WO 2003052815 A3 WO2003052815 A3 WO 2003052815A3 US 0237020 W US0237020 W US 0237020W WO 03052815 A3 WO03052815 A3 WO 03052815A3
Authority
WO
WIPO (PCT)
Prior art keywords
layer
electrode structure
conductive material
binding
integrated circuit
Prior art date
Application number
PCT/US2002/037020
Other languages
French (fr)
Other versions
WO2003052815A2 (en
Inventor
John T Moore
Joseph F Brooks
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Priority to EP02797134A priority Critical patent/EP1446832B1/en
Priority to KR1020047007622A priority patent/KR100593283B1/en
Priority to AU2002362009A priority patent/AU2002362009A1/en
Priority to JP2003553613A priority patent/JP4587670B2/en
Publication of WO2003052815A2 publication Critical patent/WO2003052815A2/en
Publication of WO2003052815A3 publication Critical patent/WO2003052815A3/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H—ELECTRICITY
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    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009—RRAM elements whose operation depends upon chemical change
    • G11C13/0011—RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
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    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76822—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
    • H01L21/76823—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc. transforming an insulating layer into a conductive layer
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    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
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    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H10N70/041—Modification of the switching material, e.g. post-treatment, doping
    • H10N70/046—Modification of the switching material, e.g. post-treatment, doping by diffusion, e.g. photo-dissolution
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    • H10N70/066—Patterning of the switching material by filling of openings, e.g. damascene method
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    • H10N70/24—Multistable switching devices, e.g. memristors based on migration or redistribution of ionic species, e.g. anions, vacancies
    • H10N70/245—Multistable switching devices, e.g. memristors based on migration or redistribution of ionic species, e.g. anions, vacancies the species being metal cations, e.g. programmable metallization cells
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    • H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • H10N70/8265—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices on sidewalls of dielectric structures, e.g. mesa or cup type devices
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    • H10N70/881—Switching materials
    • H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8825—Selenides, e.g. GeSe
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
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    • G11C2213/79—Array wherein the access device being a transistor
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    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001—Internal layers
    • H01L2224/05005—Structure
    • H01L2224/05006—Dual damascene structure
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    • H01L2224/05541—Structure
    • H01L2224/05546—Dual damascene structure
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    • H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901—Structure
    • H01L2924/1904—Component type
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    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/957—Making metal-insulator-metal device

Abstract

An electrode structure (200A) includes a first layer of conductive material (202) and a dielectric layer (204) formed on a surface of the first layer. An opening (206) is formed in the dielectric layer to expose a portion of the surface of the first layer. A binding layer (210) is formed on the dielectric layer and on the exposed portion of the surface of the first layer and a second layer of conductive material (212) is formed on the conductive binding layer. The binding layer can be an oxide and the second layer a conductive material that is diffusible into an oxide. The electrode structure can be annealed to cause conductive material from the second layer to be chemisorbed into the binding layer to improve adhesion between the first and second layers. A programmable cell can be formed by forming a doped glass layer (214) in the electrode structure.
PCT/US2002/037020 2001-11-19 2002-11-19 Electrode structure for use in an integrated circuit WO2003052815A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP02797134A EP1446832B1 (en) 2001-11-19 2002-11-19 Electrode structure for use in an integrated circuit
KR1020047007622A KR100593283B1 (en) 2001-11-19 2002-11-19 Electrode structure for use in an integrated circuit
AU2002362009A AU2002362009A1 (en) 2001-11-19 2002-11-19 Electrode structure for use in an integrated circuit
JP2003553613A JP4587670B2 (en) 2001-11-19 2002-11-19 Electrode structures, memory cells, memory devices, memory systems, semiconductor dies and electronic systems for use in integrated circuits, and methods of forming the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/988,984 2001-11-19
US09/988,984 US6815818B2 (en) 2001-11-19 2001-11-19 Electrode structure for use in an integrated circuit

Publications (2)

Publication Number Publication Date
WO2003052815A2 WO2003052815A2 (en) 2003-06-26
WO2003052815A3 true WO2003052815A3 (en) 2003-11-20

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PCT/US2002/037020 WO2003052815A2 (en) 2001-11-19 2002-11-19 Electrode structure for use in an integrated circuit

Country Status (8)

Country Link
US (4) US6815818B2 (en)
EP (2) EP1780728B1 (en)
JP (1) JP4587670B2 (en)
KR (1) KR100593283B1 (en)
CN (2) CN100521147C (en)
AT (1) ATE512442T1 (en)
AU (1) AU2002362009A1 (en)
WO (1) WO2003052815A2 (en)

Families Citing this family (133)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8664030B2 (en) 1999-03-30 2014-03-04 Daniel Luch Collector grid and interconnect structures for photovoltaic arrays and modules
JP4742429B2 (en) * 2001-02-19 2011-08-10 住友電気工業株式会社 Method for producing glass particulate deposit
US6734455B2 (en) * 2001-03-15 2004-05-11 Micron Technology, Inc. Agglomeration elimination for metal sputter deposition of chalcogenides
US7102150B2 (en) * 2001-05-11 2006-09-05 Harshfield Steven T PCRAM memory cell and method of making same
US6951805B2 (en) * 2001-08-01 2005-10-04 Micron Technology, Inc. Method of forming integrated circuitry, method of forming memory circuitry, and method of forming random access memory circuitry
US6784018B2 (en) * 2001-08-29 2004-08-31 Micron Technology, Inc. Method of forming chalcogenide comprising devices and method of forming a programmable memory cell of memory circuitry
US6881623B2 (en) * 2001-08-29 2005-04-19 Micron Technology, Inc. Method of forming chalcogenide comprising devices, method of forming a programmable memory cell of memory circuitry, and a chalcogenide comprising device
US6955940B2 (en) * 2001-08-29 2005-10-18 Micron Technology, Inc. Method of forming chalcogenide comprising devices
US6646902B2 (en) 2001-08-30 2003-11-11 Micron Technology, Inc. Method of retaining memory state in a programmable conductor RAM
US6709958B2 (en) * 2001-08-30 2004-03-23 Micron Technology, Inc. Integrated circuit device and fabrication using metal-doped chalcogenide materials
US7656678B2 (en) 2001-10-26 2010-02-02 Entorian Technologies, Lp Stacked module systems
US6815818B2 (en) * 2001-11-19 2004-11-09 Micron Technology, Inc. Electrode structure for use in an integrated circuit
US6791859B2 (en) * 2001-11-20 2004-09-14 Micron Technology, Inc. Complementary bit PCRAM sense amplifier and method of operation
US6909656B2 (en) * 2002-01-04 2005-06-21 Micron Technology, Inc. PCRAM rewrite prevention
US6867064B2 (en) * 2002-02-15 2005-03-15 Micron Technology, Inc. Method to alter chalcogenide glass for improved switching characteristics
US6791885B2 (en) * 2002-02-19 2004-09-14 Micron Technology, Inc. Programmable conductor random access memory and method for sensing same
US7151273B2 (en) * 2002-02-20 2006-12-19 Micron Technology, Inc. Silver-selenide/chalcogenide glass stack for resistance variable memory
US6847535B2 (en) 2002-02-20 2005-01-25 Micron Technology, Inc. Removable programmable conductor memory card and associated read/write device and method of operation
US6809362B2 (en) * 2002-02-20 2004-10-26 Micron Technology, Inc. Multiple data state memory cell
US7087919B2 (en) * 2002-02-20 2006-08-08 Micron Technology, Inc. Layered resistance variable memory device and method of fabrication
US6937528B2 (en) * 2002-03-05 2005-08-30 Micron Technology, Inc. Variable resistance memory and method for sensing same
US6849868B2 (en) 2002-03-14 2005-02-01 Micron Technology, Inc. Methods and apparatus for resistance variable material cells
US6864500B2 (en) * 2002-04-10 2005-03-08 Micron Technology, Inc. Programmable conductor memory cell structure
US6855975B2 (en) * 2002-04-10 2005-02-15 Micron Technology, Inc. Thin film diode integrated with chalcogenide memory cell
US6858482B2 (en) * 2002-04-10 2005-02-22 Micron Technology, Inc. Method of manufacture of programmable switching circuits and memory cells employing a glass layer
US6731528B2 (en) * 2002-05-03 2004-05-04 Micron Technology, Inc. Dual write cycle programmable conductor memory system and method of operation
US6825135B2 (en) 2002-06-06 2004-11-30 Micron Technology, Inc. Elimination of dendrite formation during metal/chalcogenide glass deposition
US6890790B2 (en) * 2002-06-06 2005-05-10 Micron Technology, Inc. Co-sputter deposition of metal-doped chalcogenides
US7209378B2 (en) * 2002-08-08 2007-04-24 Micron Technology, Inc. Columnar 1T-N memory cell structure
US7018863B2 (en) * 2002-08-22 2006-03-28 Micron Technology, Inc. Method of manufacture of a resistance variable memory cell
DE10239845C1 (en) 2002-08-29 2003-12-24 Day4 Energy Inc Electrode for photovoltaic cells, photovoltaic cell and photovoltaic module
US6864521B2 (en) * 2002-08-29 2005-03-08 Micron Technology, Inc. Method to control silver concentration in a resistance variable memory element
US7364644B2 (en) * 2002-08-29 2008-04-29 Micron Technology, Inc. Silver selenide film stoichiometry and morphology control in sputter deposition
US6831019B1 (en) * 2002-08-29 2004-12-14 Micron Technology, Inc. Plasma etching methods and methods of forming memory devices comprising a chalcogenide comprising layer received operably proximate conductive electrodes
US7010644B2 (en) * 2002-08-29 2006-03-07 Micron Technology, Inc. Software refreshed memory device and method
US7314776B2 (en) * 2002-12-13 2008-01-01 Ovonyx, Inc. Method to manufacture a phase change memory
ATE490562T1 (en) * 2002-12-19 2010-12-15 Nxp Bv ELECTRICAL COMPONENT HAVING A LAYER OF PHASE CHANGE MATERIAL AND METHOD FOR PRODUCING IT
US7472170B2 (en) 2003-02-13 2008-12-30 Bruce Zak System and method for managing content on a network interface
US6969867B2 (en) * 2003-03-10 2005-11-29 Energy Conversion Devices, Inc. Field effect chalcogenide devices
US7022579B2 (en) * 2003-03-14 2006-04-04 Micron Technology, Inc. Method for filling via with metal
US7061004B2 (en) * 2003-07-21 2006-06-13 Micron Technology, Inc. Resistance variable memory elements and methods of formation
US6903361B2 (en) * 2003-09-17 2005-06-07 Micron Technology, Inc. Non-volatile memory structure
US20050128559A1 (en) * 2003-12-15 2005-06-16 Nishimura Ken A. Spatial light modulator and method for performing dynamic photolithography
US7098068B2 (en) * 2004-03-10 2006-08-29 Micron Technology, Inc. Method of forming a chalcogenide material containing device
US7583551B2 (en) * 2004-03-10 2009-09-01 Micron Technology, Inc. Power management control and controlling memory refresh operations
US7112836B2 (en) * 2004-03-17 2006-09-26 Macronix International Co., Ltd. Method of forming a chalcogenide memory cell having a horizontal electrode and a memory cell produced by the method
CN101834198A (en) * 2004-05-14 2010-09-15 瑞萨电子株式会社 Semiconductor storage unit
US7326950B2 (en) 2004-07-19 2008-02-05 Micron Technology, Inc. Memory device with switching glass layer
US7190048B2 (en) * 2004-07-19 2007-03-13 Micron Technology, Inc. Resistance variable memory device and method of fabrication
US7354793B2 (en) 2004-08-12 2008-04-08 Micron Technology, Inc. Method of forming a PCRAM device incorporating a resistance-variable chalocogenide element
US7226857B2 (en) 2004-07-30 2007-06-05 Micron Technology, Inc. Front-end processing of nickel plated bond pads
US7365411B2 (en) 2004-08-12 2008-04-29 Micron Technology, Inc. Resistance variable memory with temperature tolerant materials
US7151688B2 (en) * 2004-09-01 2006-12-19 Micron Technology, Inc. Sensing of resistance variable memory devices
US7760513B2 (en) 2004-09-03 2010-07-20 Entorian Technologies Lp Modified core for circuit module system and method
US7443023B2 (en) 2004-09-03 2008-10-28 Entorian Technologies, Lp High capacity thin module system
US7423885B2 (en) 2004-09-03 2008-09-09 Entorian Technologies, Lp Die module system
DE102004046804B4 (en) * 2004-09-27 2006-10-05 Infineon Technologies Ag Resistively switching semiconductor memory
US7109584B2 (en) * 2004-11-23 2006-09-19 International Business Machines Corporation Dendrite growth control circuit
DE102004061548A1 (en) * 2004-12-21 2006-06-29 Infineon Technologies Ag Memory cell matrix for integration of solid electrolyte memory cells has word line and plate line that are controlled by means of selection transistor and exhibits common plate electrode which is connected to common plate circuit
US7374174B2 (en) * 2004-12-22 2008-05-20 Micron Technology, Inc. Small electrode for resistance variable devices
US20060131555A1 (en) * 2004-12-22 2006-06-22 Micron Technology, Inc. Resistance variable devices with controllable channels
KR100707182B1 (en) * 2005-02-18 2007-04-13 삼성전자주식회사 Phase change memory device and fabricating method of the same
US7317200B2 (en) 2005-02-23 2008-01-08 Micron Technology, Inc. SnSe-based limited reprogrammable cell
DE102005016244A1 (en) * 2005-04-08 2006-10-19 Infineon Technologies Ag Non-volatile memory cell for memory device, has memory material region provided as memory unit between two electrodes, where region is formed with or from self-organised nano-structure, which is partially or completely oxidic
US7427770B2 (en) * 2005-04-22 2008-09-23 Micron Technology, Inc. Memory array for increased bit density
US7709289B2 (en) * 2005-04-22 2010-05-04 Micron Technology, Inc. Memory elements having patterned electrodes and method of forming the same
US7449355B2 (en) * 2005-04-27 2008-11-11 Robert Bosch Gmbh Anti-stiction technique for electromechanical systems and electromechanical device employing same
US7269079B2 (en) * 2005-05-16 2007-09-11 Micron Technology, Inc. Power circuits for reducing a number of power supply voltage taps required for sensing a resistive memory
US7233520B2 (en) * 2005-07-08 2007-06-19 Micron Technology, Inc. Process for erasing chalcogenide variable resistance memory bits
US7274034B2 (en) * 2005-08-01 2007-09-25 Micron Technology, Inc. Resistance variable memory device with sputtered metal-chalcogenide region and method of fabrication
US7332735B2 (en) * 2005-08-02 2008-02-19 Micron Technology, Inc. Phase change memory cell and method of formation
US7317567B2 (en) * 2005-08-02 2008-01-08 Micron Technology, Inc. Method and apparatus for providing color changing thin film material
US7579615B2 (en) 2005-08-09 2009-08-25 Micron Technology, Inc. Access transistor for memory device
US20070037316A1 (en) * 2005-08-09 2007-02-15 Micron Technology, Inc. Memory cell contact using spacers
US7304368B2 (en) * 2005-08-11 2007-12-04 Micron Technology, Inc. Chalcogenide-based electrokinetic memory element and method of forming the same
US7251154B2 (en) * 2005-08-15 2007-07-31 Micron Technology, Inc. Method and apparatus providing a cross-point memory array using a variable resistance memory cell and capacitance
US7277313B2 (en) * 2005-08-31 2007-10-02 Micron Technology, Inc. Resistance variable memory element with threshold device and method of forming the same
US7541607B2 (en) * 2005-11-02 2009-06-02 Elpida Memory, Inc. Electrically rewritable non-volatile memory element and method of manufacturing the same
US20070144577A1 (en) * 2005-12-23 2007-06-28 Rubin George L Solar cell with physically separated distributed electrical contacts
KR100744273B1 (en) * 2005-12-28 2007-07-30 동부일렉트로닉스 주식회사 Method for manufacturing phase-change memory element
US7498508B2 (en) 2006-02-24 2009-03-03 Day4 Energy, Inc. High voltage solar cell and solar cell module
US9865758B2 (en) 2006-04-13 2018-01-09 Daniel Luch Collector grid and interconnect structures for photovoltaic arrays and modules
US8884155B2 (en) 2006-04-13 2014-11-11 Daniel Luch Collector grid and interconnect structures for photovoltaic arrays and modules
US9006563B2 (en) 2006-04-13 2015-04-14 Solannex, Inc. Collector grid and interconnect structures for photovoltaic arrays and modules
US8729385B2 (en) 2006-04-13 2014-05-20 Daniel Luch Collector grid and interconnect structures for photovoltaic arrays and modules
US9236512B2 (en) 2006-04-13 2016-01-12 Daniel Luch Collector grid and interconnect structures for photovoltaic arrays and modules
US8822810B2 (en) 2006-04-13 2014-09-02 Daniel Luch Collector grid and interconnect structures for photovoltaic arrays and modules
US7968967B2 (en) * 2006-07-17 2011-06-28 Taiwan Semiconductor Manufacturing Company, Ltd. One-time-programmable anti-fuse formed using damascene process
US7560723B2 (en) 2006-08-29 2009-07-14 Micron Technology, Inc. Enhanced memory density resistance variable memory cells, arrays, devices and systems including the same, and methods of fabrication
US8097535B2 (en) * 2006-09-04 2012-01-17 Nxp B.V. Fabrication of self-assembled nanowire-type interconnects on a semiconductor device
US8232175B2 (en) * 2006-09-14 2012-07-31 Spansion Llc Damascene metal-insulator-metal (MIM) device with improved scaleability
US20080092944A1 (en) * 2006-10-16 2008-04-24 Leonid Rubin Semiconductor structure and process for forming ohmic connections to a semiconductor structure
US7767994B2 (en) * 2006-12-05 2010-08-03 Electronics And Telecommunications Research Institute Phase-change random access memory device and method of manufacturing the same
US7888228B2 (en) * 2007-04-05 2011-02-15 Adesto Technology Corporation Method of manufacturing an integrated circuit, an integrated circuit, and a memory module
US20080290368A1 (en) * 2007-05-21 2008-11-27 Day4 Energy, Inc. Photovoltaic cell with shallow emitter
US8237149B2 (en) * 2007-06-18 2012-08-07 Samsung Electronics Co., Ltd. Non-volatile memory device having bottom electrode
KR100911473B1 (en) * 2007-06-18 2009-08-11 삼성전자주식회사 Phase-change memory unit, method of forming the phase-change memory unit, phase-change memory device having the phase-change memory unit and method of manufacturing the phase-change memory device
KR100881055B1 (en) * 2007-06-20 2009-01-30 삼성전자주식회사 Phase-change memory unit, method of forming the phase-change memory unit, phase-change memory device having the phase-change memory unit and method of manufacturing the phase-change memory device
FR2922368A1 (en) * 2007-10-16 2009-04-17 Commissariat Energie Atomique METHOD FOR MANUFACTURING A CBRAM MEMORY HAVING IMPROVED RELIABILITY
KR101168977B1 (en) 2007-11-19 2012-07-26 삼성전자주식회사 method of fabricating integrated circuit memory device having a growth- inhibiting layer on the interlayer insulating layer adjacent a contact hole
US7994075B1 (en) * 2008-02-26 2011-08-09 Honeywell International, Inc. Low weight and high durability soft body armor composite using topical wax coatings
US7855435B2 (en) * 2008-03-12 2010-12-21 Qimonda Ag Integrated circuit, method of manufacturing an integrated circuit, and memory module
US7579210B1 (en) * 2008-03-25 2009-08-25 Ovonyx, Inc. Planar segmented contact
JP5223004B2 (en) 2008-07-28 2013-06-26 デイ４ エネルギー インコーポレイテッド Crystalline silicon PV cell with selective emitters manufactured by low temperature precision etch-back and passivation process
US8467236B2 (en) * 2008-08-01 2013-06-18 Boise State University Continuously variable resistor
US7825479B2 (en) * 2008-08-06 2010-11-02 International Business Machines Corporation Electrical antifuse having a multi-thickness dielectric layer
EP2202816B1 (en) * 2008-12-24 2012-06-20 Imec Method for manufacturing a resistive switching memory device
TWI383950B (en) 2009-04-22 2013-02-01 Ind Tech Res Inst Method of forming nanometer-scale point materials
CN101615655B (en) * 2009-07-21 2012-09-05 中国科学院上海微系统与信息技术研究所 Conductive oxide transition layer and phase-changing memory unit with same
TWI415139B (en) * 2009-11-02 2013-11-11 Ind Tech Res Inst Electrically conductive composition and fabrication method thereof
JP5183708B2 (en) * 2010-09-21 2013-04-17 株式会社日立製作所 Semiconductor device and manufacturing method thereof
US8524599B2 (en) 2011-03-17 2013-09-03 Micron Technology, Inc. Methods of forming at least one conductive element and methods of forming a semiconductor structure
US8486743B2 (en) 2011-03-23 2013-07-16 Micron Technology, Inc. Methods of forming memory cells
CN102760832B (en) * 2011-04-29 2015-06-03 中芯国际集成电路制造(上海)有限公司 Manufacture method of phase change semiconductor device and phase change semiconductor device
US8994489B2 (en) 2011-10-19 2015-03-31 Micron Technology, Inc. Fuses, and methods of forming and using fuses
US9252188B2 (en) 2011-11-17 2016-02-02 Micron Technology, Inc. Methods of forming memory cells
US9006075B2 (en) 2011-11-17 2015-04-14 Micron Technology, Inc. Memory cells, semiconductor devices including such cells, and methods of fabrication
US8723155B2 (en) 2011-11-17 2014-05-13 Micron Technology, Inc. Memory cells and integrated devices
US8546231B2 (en) 2011-11-17 2013-10-01 Micron Technology, Inc. Memory arrays and methods of forming memory cells
US9117515B2 (en) * 2012-01-18 2015-08-25 Macronix International Co., Ltd. Programmable metallization cell with two dielectric layers
US9136467B2 (en) 2012-04-30 2015-09-15 Micron Technology, Inc. Phase change memory cells and methods of forming phase change memory cells
US8765555B2 (en) 2012-04-30 2014-07-01 Micron Technology, Inc. Phase change memory cells and methods of forming phase change memory cells
US9018613B2 (en) * 2012-08-14 2015-04-28 Kabushiki Kaisha Toshiba Semiconductor memory device with a memory cell block including a block film
US9437266B2 (en) 2012-11-13 2016-09-06 Macronix International Co., Ltd. Unipolar programmable metallization cell
US9553262B2 (en) 2013-02-07 2017-01-24 Micron Technology, Inc. Arrays of memory cells and methods of forming an array of memory cells
KR101431656B1 (en) * 2013-04-05 2014-08-21 한국과학기술연구원 Chacogenide switching device using germanium and selenium and manufacture method thereof
WO2015016851A1 (en) * 2013-07-31 2015-02-05 Hewlett-Packard Development Company, L.P. Memristor and methods for making the same
US9881971B2 (en) 2014-04-01 2018-01-30 Micron Technology, Inc. Memory arrays
US9362494B2 (en) 2014-06-02 2016-06-07 Micron Technology, Inc. Array of cross point memory cells and methods of forming an array of cross point memory cells
US9343506B2 (en) 2014-06-04 2016-05-17 Micron Technology, Inc. Memory arrays with polygonal memory cells having specific sidewall orientations
US10163917B2 (en) * 2016-11-01 2018-12-25 Micron Technology, Inc. Cell disturb prevention using a leaker device to reduce excess charge from an electronic device
US20190237629A1 (en) * 2018-01-26 2019-08-01 Lumileds Llc Optically transparent adhesion layer to connect noble metals to oxides
CN111029417A (en) * 2019-12-02 2020-04-17 上海集成电路研发中心有限公司 Photoelectric detector and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0310108A2 (en) * 1987-10-02 1989-04-05 Kabushiki Kaisha Toshiba Interconnection structure of a semiconductor device and method of manufacturing the same
EP0501120A2 (en) * 1991-01-22 1992-09-02 Myson Technology, Inc. Programmable antifuse structure, process, logic cell and architecture for programmable integrated circuits
DE4238080A1 (en) * 1991-11-11 1993-05-13 Mitsubishi Electric Corp Through hole connection structure mfr. for multilayer integrated circuit - selectively etching insulating layer and using CVD process with gas containing titanium and forming conducting layers for coupling to connecting layer
EP0807967A2 (en) * 1996-05-09 1997-11-19 International Business Machines Corporation Diffused titanium resistor and method for fabricating same
EP0973195A1 (en) * 1998-06-22 2000-01-19 STMicroelectronics, Inc. Silver metallization by damascene method

Family Cites Families (181)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3271591A (en) * 1963-09-20 1966-09-06 Energy Conversion Devices Inc Symmetrical current controlling device
US3622319A (en) 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same
US3868651A (en) * 1970-08-13 1975-02-25 Energy Conversion Devices Inc Method and apparatus for storing and reading data in a memory having catalytic material to initiate amorphous to crystalline change in memory structure
US3743847A (en) 1971-06-01 1973-07-03 Motorola Inc Amorphous silicon film as a uv filter
US4267261A (en) * 1971-07-15 1981-05-12 Energy Conversion Devices, Inc. Method for full format imaging
US3961314A (en) * 1974-03-05 1976-06-01 Energy Conversion Devices, Inc. Structure and method for producing an image
US3966317A (en) * 1974-04-08 1976-06-29 Energy Conversion Devices, Inc. Dry process production of archival microform records from hard copy
US4177474A (en) 1977-05-18 1979-12-04 Energy Conversion Devices, Inc. High temperature amorphous semiconductor member and method of making the same
JPS5565365A (en) 1978-11-07 1980-05-16 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
DE2901303C2 (en) 1979-01-15 1984-04-19 Max Planck Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Solid ionic conductor material, its use and process for its manufacture
US4312938A (en) 1979-07-06 1982-01-26 Drexler Technology Corporation Method for making a broadband reflective laser recording and data storage medium with absorptive underlayer
US4269935A (en) 1979-07-13 1981-05-26 Ionomet Company, Inc. Process of doping silver image in chalcogenide layer
US4316946A (en) 1979-12-03 1982-02-23 Ionomet Company, Inc. Surface sensitized chalcogenide product and process for making and using the same
US4499557A (en) 1980-10-28 1985-02-12 Energy Conversion Devices, Inc. Programmable cell for use in programmable electronic arrays
US4405710A (en) 1981-06-22 1983-09-20 Cornell Research Foundation, Inc. Ion beam exposure of (g-Gex -Se1-x) inorganic resists
US4737379A (en) * 1982-09-24 1988-04-12 Energy Conversion Devices, Inc. Plasma deposited coatings, and low temperature plasma method of making same
US4545111A (en) * 1983-01-18 1985-10-08 Energy Conversion Devices, Inc. Method for making, parallel preprogramming or field programming of electronic matrix arrays
US4608296A (en) * 1983-12-06 1986-08-26 Energy Conversion Devices, Inc. Superconducting films and devices exhibiting AC to DC conversion
US4795657A (en) 1984-04-13 1989-01-03 Energy Conversion Devices, Inc. Method of fabricating a programmable array
US4843443A (en) * 1984-05-14 1989-06-27 Energy Conversion Devices, Inc. Thin film field effect transistor and method of making same
US4769338A (en) * 1984-05-14 1988-09-06 Energy Conversion Devices, Inc. Thin film field effect transistor and method of making same
US4668968A (en) * 1984-05-14 1987-05-26 Energy Conversion Devices, Inc. Integrated circuit compatible thin film field effect transistor and method of making same
US4670763A (en) * 1984-05-14 1987-06-02 Energy Conversion Devices, Inc. Thin film field effect transistor
US4673957A (en) * 1984-05-14 1987-06-16 Energy Conversion Devices, Inc. Integrated circuit compatible thin film field effect transistor and method of making same
US4678679A (en) * 1984-06-25 1987-07-07 Energy Conversion Devices, Inc. Continuous deposition of activated process gases
US4646266A (en) * 1984-09-28 1987-02-24 Energy Conversion Devices, Inc. Programmable semiconductor structures and methods for using the same
US4637895A (en) * 1985-04-01 1987-01-20 Energy Conversion Devices, Inc. Gas mixtures for the vapor deposition of semiconductor material
US4664939A (en) * 1985-04-01 1987-05-12 Energy Conversion Devices, Inc. Vertical semiconductor processor
US4710899A (en) 1985-06-10 1987-12-01 Energy Conversion Devices, Inc. Data storage medium incorporating a transition metal for increased switching speed
US4671618A (en) 1986-05-22 1987-06-09 Wu Bao Gang Liquid crystalline-plastic material having submillisecond switch times and extended memory
US4766471A (en) * 1986-01-23 1988-08-23 Energy Conversion Devices, Inc. Thin film electro-optical devices
US4818717A (en) * 1986-06-27 1989-04-04 Energy Conversion Devices, Inc. Method for making electronic matrix arrays
US4728406A (en) * 1986-08-18 1988-03-01 Energy Conversion Devices, Inc. Method for plasma - coating a semiconductor body
US4809044A (en) * 1986-08-22 1989-02-28 Energy Conversion Devices, Inc. Thin film overvoltage protection devices
US4845533A (en) * 1986-08-22 1989-07-04 Energy Conversion Devices, Inc. Thin film electrical devices with amorphous carbon electrodes and method of making same
US4853785A (en) * 1986-10-15 1989-08-01 Energy Conversion Devices, Inc. Electronic camera including electronic signal storage cartridge
US4788594A (en) * 1986-10-15 1988-11-29 Energy Conversion Devices, Inc. Solid state electronic camera including thin film matrix of photosensors
US4847674A (en) 1987-03-10 1989-07-11 Advanced Micro Devices, Inc. High speed interconnect system with refractory non-dogbone contacts and an active electromigration suppression mechanism
US4800526A (en) 1987-05-08 1989-01-24 Gaf Corporation Memory element for information storage and retrieval system and associated process
US4891330A (en) * 1987-07-27 1990-01-02 Energy Conversion Devices, Inc. Method of fabricating n-type and p-type microcrystalline semiconductor alloy material including band gap widening elements
US4775425A (en) * 1987-07-27 1988-10-04 Energy Conversion Devices, Inc. P and n-type microcrystalline semiconductor alloy material including band gap widening elements, devices utilizing same
US5272359A (en) 1988-04-07 1993-12-21 California Institute Of Technology Reversible non-volatile switch based on a TCNQ charge transfer complex
GB8910854D0 (en) 1989-05-11 1989-06-28 British Petroleum Co Plc Semiconductor device
DE59009235D1 (en) * 1989-11-30 1995-07-20 Siemens Ag Process for reducing the reflectivity of sputter layers.
US5159661A (en) * 1990-10-05 1992-10-27 Energy Conversion Devices, Inc. Vertically interconnected parallel distributed processor
US5314772A (en) 1990-10-09 1994-05-24 Arizona Board Of Regents High resolution, multi-layer resist for microlithography and method therefor
JPH0770731B2 (en) 1990-11-22 1995-07-31 松下電器産業株式会社 Electroplastic element
US5166758A (en) * 1991-01-18 1992-11-24 Energy Conversion Devices, Inc. Electrically erasable phase change memory
US5406509A (en) * 1991-01-18 1995-04-11 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
US5335219A (en) * 1991-01-18 1994-08-02 Ovshinsky Stanford R Homogeneous composition of microcrystalline semiconductor material, semiconductor devices and directly overwritable memory elements fabricated therefrom, and arrays fabricated from the memory elements
US5341328A (en) 1991-01-18 1994-08-23 Energy Conversion Devices, Inc. Electrically erasable memory elements having reduced switching current requirements and increased write/erase cycle life
US5534711A (en) * 1991-01-18 1996-07-09 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
US5414271A (en) * 1991-01-18 1995-05-09 Energy Conversion Devices, Inc. Electrically erasable memory elements having improved set resistance stability
US5536947A (en) * 1991-01-18 1996-07-16 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory element and arrays fabricated therefrom
US5534712A (en) * 1991-01-18 1996-07-09 Energy Conversion Devices, Inc. Electrically erasable memory elements characterized by reduced current and improved thermal stability
US5296716A (en) * 1991-01-18 1994-03-22 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
US5596522A (en) * 1991-01-18 1997-01-21 Energy Conversion Devices, Inc. Homogeneous compositions of microcrystalline semiconductor material, semiconductor devices and directly overwritable memory elements fabricated therefrom, and arrays fabricated from the memory elements
US5128099A (en) 1991-02-15 1992-07-07 Energy Conversion Devices, Inc. Congruent state changeable optical memory material and device
US5219788A (en) 1991-02-25 1993-06-15 Ibm Corporation Bilayer metallization cap for photolithography
US5177567A (en) * 1991-07-19 1993-01-05 Energy Conversion Devices, Inc. Thin-film structure for chalcogenide electrical switching devices and process therefor
DE4127189C2 (en) * 1991-08-19 2001-08-16 Gustav Schumacher Control device for an oscillating assembly on an agricultural machine
US5359205A (en) * 1991-11-07 1994-10-25 Energy Conversion Devices, Inc. Electrically erasable memory elements characterized by reduced current and improved thermal stability
GB2261565B (en) 1991-11-15 1995-05-03 Sony Broadcast & Communication Video image filtering
US5238862A (en) 1992-03-18 1993-08-24 Micron Technology, Inc. Method of forming a stacked capacitor with striated electrode
JP2803940B2 (en) * 1992-06-23 1998-09-24 シャープ株式会社 Semiconductor device
KR940004732A (en) 1992-08-07 1994-03-15 가나이 쯔또무 Pattern formation method and thin film formation method used for pattern formation
US5350484A (en) 1992-09-08 1994-09-27 Intel Corporation Method for the anisotropic etching of metal films in the fabrication of interconnects
US5818749A (en) 1993-08-20 1998-10-06 Micron Technology, Inc. Integrated circuit memory device
BE1007902A3 (en) 1993-12-23 1995-11-14 Philips Electronics Nv Switching element with memory with schottky barrier tunnel.
US5415271A (en) * 1994-09-12 1995-05-16 Foster; Raymond K. Reciprocating floor conveyor with overlay, protective plate
US5500532A (en) 1994-08-18 1996-03-19 Arizona Board Of Regents Personal electronic dosimeter
JP2643870B2 (en) 1994-11-29 1997-08-20 日本電気株式会社 Method for manufacturing semiconductor memory device
US5543737A (en) * 1995-02-10 1996-08-06 Energy Conversion Devices, Inc. Logical operation circuit employing two-terminal chalcogenide switches
US5869843A (en) 1995-06-07 1999-02-09 Micron Technology, Inc. Memory array having a multi-state element and method for forming such array or cells thereof
JP3363154B2 (en) 1995-06-07 2003-01-08 ミクロン テクノロジー、インコーポレイテッド Stack / trench diode for use with multi-state material in a non-volatile memory cell
US6420725B1 (en) 1995-06-07 2002-07-16 Micron Technology, Inc. Method and apparatus for forming an integrated circuit electrode having a reduced contact area
US5751012A (en) 1995-06-07 1998-05-12 Micron Technology, Inc. Polysilicon pillar diode for use in a non-volatile memory cell
US5789758A (en) 1995-06-07 1998-08-04 Micron Technology, Inc. Chalcogenide memory cell with a plurality of chalcogenide electrodes
US5879955A (en) 1995-06-07 1999-03-09 Micron Technology, Inc. Method for fabricating an array of ultra-small pores for chalcogenide memory cells
US5714768A (en) * 1995-10-24 1998-02-03 Energy Conversion Devices, Inc. Second-layer phase change memory array on top of a logic device
US5837564A (en) 1995-11-01 1998-11-17 Micron Technology, Inc. Method for optimal crystallization to obtain high electrical performance from chalcogenides
US5694054A (en) * 1995-11-28 1997-12-02 Energy Conversion Devices, Inc. Integrated drivers for flat panel displays employing chalcogenide logic elements
US5591501A (en) * 1995-12-20 1997-01-07 Energy Conversion Devices, Inc. Optical recording medium having a plurality of discrete phase change data recording points
US6653733B1 (en) 1996-02-23 2003-11-25 Micron Technology, Inc. Conductors in semiconductor devices
US5687112A (en) * 1996-04-19 1997-11-11 Energy Conversion Devices, Inc. Multibit single cell memory element having tapered contact
US5852870A (en) 1996-04-24 1998-12-29 Amkor Technology, Inc. Method of making grid array assembly
US5851882A (en) 1996-05-06 1998-12-22 Micron Technology, Inc. ZPROM manufacture and design and methods for forming thin structures using spacers as an etching mask
US5761115A (en) 1996-05-30 1998-06-02 Axon Technologies Corporation Programmable metallization cell structure and method of making same
US5814527A (en) 1996-07-22 1998-09-29 Micron Technology, Inc. Method of making small pores defined by a disposable internal spacer for use in chalcogenide memories
US5789277A (en) 1996-07-22 1998-08-04 Micron Technology, Inc. Method of making chalogenide memory device
JPH1050836A (en) * 1996-07-31 1998-02-20 Sumitomo Metal Ind Ltd Manufacture of semiconductor device
US5998244A (en) 1996-08-22 1999-12-07 Micron Technology, Inc. Memory cell incorporating a chalcogenide element and method of making same
US5825046A (en) * 1996-10-28 1998-10-20 Energy Conversion Devices, Inc. Composite memory material comprising a mixture of phase-change memory material and dielectric material
US6087674A (en) * 1996-10-28 2000-07-11 Energy Conversion Devices, Inc. Memory element with memory material comprising phase-change material and dielectric material
US5846889A (en) 1997-03-14 1998-12-08 The United States Of America As Represented By The Secretary Of The Navy Infrared transparent selenide glasses
GB2323704B (en) * 1997-03-24 2001-10-24 United Microelectronics Corp Self-aligned unlanded via metallization
US5998066A (en) 1997-05-16 1999-12-07 Aerial Imaging Corporation Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass
US5952671A (en) * 1997-05-09 1999-09-14 Micron Technology, Inc. Small electrode for a chalcogenide switching device and method for fabricating same
US6031287A (en) 1997-06-18 2000-02-29 Micron Technology, Inc. Contact structure and memory element incorporating the same
US5933365A (en) * 1997-06-19 1999-08-03 Energy Conversion Devices, Inc. Memory element with energy control mechanism
US6051511A (en) 1997-07-31 2000-04-18 Micron Technology, Inc. Method and apparatus for reducing isolation stress in integrated circuits
KR100371102B1 (en) 1997-12-04 2003-02-06 엑손 테크놀로지스 코포레이션 Programmable sub-surface aggregating metallization structure and method of making the same
US6011757A (en) * 1998-01-27 2000-01-04 Ovshinsky; Stanford R. Optical recording media having increased erasability
US5993365A (en) * 1998-03-26 1999-11-30 Eastman Kodak Company Tool attachment and release device for robotic arms
US6141241A (en) * 1998-06-23 2000-10-31 Energy Conversion Devices, Inc. Universal memory element with systems employing same and apparatus and method for reading, writing and programming same
US6297170B1 (en) 1998-06-23 2001-10-02 Vlsi Technology, Inc. Sacrificial multilayer anti-reflective coating for mos gate formation
US5912839A (en) * 1998-06-23 1999-06-15 Energy Conversion Devices, Inc. Universal memory element and method of programming same
US6469364B1 (en) 1998-08-31 2002-10-22 Arizona Board Of Regents Programmable interconnection system for electrical circuits
US6388324B2 (en) * 1998-08-31 2002-05-14 Arizona Board Of Regents Self-repairing interconnections for electrical circuits
US6184477B1 (en) * 1998-12-02 2001-02-06 Kyocera Corporation Multi-layer circuit substrate having orthogonal grid ground and power planes
US6487106B1 (en) 1999-01-12 2002-11-26 Arizona Board Of Regents Programmable microelectronic devices and method of forming and programming same
US6825489B2 (en) 2001-04-06 2004-11-30 Axon Technologies Corporation Microelectronic device, structure, and system, including a memory structure having a variable programmable property and method of forming the same
US6635914B2 (en) * 2000-09-08 2003-10-21 Axon Technologies Corp. Microelectronic programmable device and methods of forming and programming the same
US6177338B1 (en) 1999-02-08 2001-01-23 Taiwan Semiconductor Manufacturing Company Two step barrier process
KR20010110433A (en) * 1999-02-11 2001-12-13 알란 엠. 포스칸져 Programmable microelectronic devices and methods of forming and programming same
JP3974284B2 (en) * 1999-03-18 2007-09-12 株式会社東芝 Manufacturing method of semiconductor device
US6072716A (en) 1999-04-14 2000-06-06 Massachusetts Institute Of Technology Memory structures and methods of making same
US6143604A (en) 1999-06-04 2000-11-07 Taiwan Semiconductor Manufacturing Company Method for fabricating small-size two-step contacts for word-line strapping on dynamic random access memory (DRAM)
US6350679B1 (en) 1999-08-03 2002-02-26 Micron Technology, Inc. Methods of providing an interlevel dielectric layer intermediate different elevation conductive metal layers in the fabrication of integrated circuitry
US6423628B1 (en) 1999-10-22 2002-07-23 Lsi Logic Corporation Method of forming integrated circuit structure having low dielectric constant material and having silicon oxynitride caps over closely spaced apart metal lines
US6914802B2 (en) * 2000-02-11 2005-07-05 Axon Technologies Corporation Microelectronic photonic structure and device and method of forming the same
US6501111B1 (en) * 2000-06-30 2002-12-31 Intel Corporation Three-dimensional (3D) programmable device
US6429064B1 (en) * 2000-09-29 2002-08-06 Intel Corporation Reduced contact area of sidewall conductor
US6567293B1 (en) * 2000-09-29 2003-05-20 Ovonyx, Inc. Single level metal memory cell using chalcogenide cladding
US6555860B2 (en) * 2000-09-29 2003-04-29 Intel Corporation Compositionally modified resistive electrode
US6563164B2 (en) * 2000-09-29 2003-05-13 Ovonyx, Inc. Compositionally modified resistive electrode
US6339544B1 (en) * 2000-09-29 2002-01-15 Intel Corporation Method to enhance performance of thermal resistor device
US6404665B1 (en) * 2000-09-29 2002-06-11 Intel Corporation Compositionally modified resistive electrode
US6653193B2 (en) * 2000-12-08 2003-11-25 Micron Technology, Inc. Resistance variable device
US6649928B2 (en) 2000-12-13 2003-11-18 Intel Corporation Method to selectively remove one side of a conductive bottom electrode of a phase-change memory cell and structure obtained thereby
US6696355B2 (en) * 2000-12-14 2004-02-24 Ovonyx, Inc. Method to selectively increase the top resistance of the lower programming electrode in a phase-change memory
US6437383B1 (en) * 2000-12-21 2002-08-20 Intel Corporation Dual trench isolation for a phase-change memory cell and method of making same
US6569705B2 (en) * 2000-12-21 2003-05-27 Intel Corporation Metal structure for a phase-change memory device
US6646297B2 (en) 2000-12-26 2003-11-11 Ovonyx, Inc. Lower electrode isolation in a double-wide trench
US6534781B2 (en) * 2000-12-26 2003-03-18 Ovonyx, Inc. Phase-change memory bipolar array utilizing a single shallow trench isolation for creating an individual active area region for two memory array elements and one bipolar base contact
US6531373B2 (en) * 2000-12-27 2003-03-11 Ovonyx, Inc. Method of forming a phase-change memory cell using silicon on insulator low electrode in charcogenide elements
US6687427B2 (en) * 2000-12-29 2004-02-03 Intel Corporation Optic switch
US6638820B2 (en) 2001-02-08 2003-10-28 Micron Technology, Inc. Method of forming chalcogenide comprising devices, method of precluding diffusion of a metal into adjacent chalcogenide material, and chalcogenide comprising devices
US6727192B2 (en) 2001-03-01 2004-04-27 Micron Technology, Inc. Methods of metal doping a chalcogenide material
US6348365B1 (en) 2001-03-02 2002-02-19 Micron Technology, Inc. PCRAM cell manufacturing
US6818481B2 (en) 2001-03-07 2004-11-16 Micron Technology, Inc. Method to manufacture a buried electrode PCRAM cell
US6734455B2 (en) * 2001-03-15 2004-05-11 Micron Technology, Inc. Agglomeration elimination for metal sputter deposition of chalcogenides
US6473332B1 (en) 2001-04-04 2002-10-29 The University Of Houston System Electrically variable multi-state resistance computing
US6724069B2 (en) * 2001-04-05 2004-04-20 International Business Machines Corporation Spin-on cap layer, and semiconductor device containing same
DE60220912T2 (en) 2001-05-07 2008-02-28 Advanced Micro Devices, Inc., Sunnyvale MEMORY DEVICE WITH A SELF-INSTALLING POLYMER AND METHOD FOR THE PRODUCTION THEREOF
US6480438B1 (en) * 2001-06-12 2002-11-12 Ovonyx, Inc. Providing equal cell programming conditions across a large and high density array of phase-change memory cells
US6613604B2 (en) * 2001-08-02 2003-09-02 Ovonyx, Inc. Method for making small pore for use in programmable resistance memory element
US6589714B2 (en) * 2001-06-26 2003-07-08 Ovonyx, Inc. Method for making programmable resistance memory element using silylated photoresist
US6570784B2 (en) * 2001-06-29 2003-05-27 Ovonyx, Inc. Programming a phase-change material memory
US6462984B1 (en) * 2001-06-29 2002-10-08 Intel Corporation Biasing scheme of floating unselected wordlines and bitlines of a diode-based memory array
US6487113B1 (en) * 2001-06-29 2002-11-26 Ovonyx, Inc. Programming a phase-change memory with slow quench time
US6642102B2 (en) * 2001-06-30 2003-11-04 Intel Corporation Barrier material encapsulation of programmable material
US6605527B2 (en) * 2001-06-30 2003-08-12 Intel Corporation Reduced area intersection between electrode and programming element
US6514805B2 (en) * 2001-06-30 2003-02-04 Intel Corporation Trench sidewall profile for device isolation
US6673700B2 (en) * 2001-06-30 2004-01-06 Ovonyx, Inc. Reduced area intersection between electrode and programming element
US6511867B2 (en) * 2001-06-30 2003-01-28 Ovonyx, Inc. Utilizing atomic layer deposition for programmable device
US6511862B2 (en) * 2001-06-30 2003-01-28 Ovonyx, Inc. Modified contact for programmable devices
US6951805B2 (en) 2001-08-01 2005-10-04 Micron Technology, Inc. Method of forming integrated circuitry, method of forming memory circuitry, and method of forming random access memory circuitry
US6590807B2 (en) * 2001-08-02 2003-07-08 Intel Corporation Method for reading a structural phase-change memory
US6737312B2 (en) * 2001-08-27 2004-05-18 Micron Technology, Inc. Method of fabricating dual PCRAM cells sharing a common electrode
US6881623B2 (en) * 2001-08-29 2005-04-19 Micron Technology, Inc. Method of forming chalcogenide comprising devices, method of forming a programmable memory cell of memory circuitry, and a chalcogenide comprising device
US6955940B2 (en) * 2001-08-29 2005-10-18 Micron Technology, Inc. Method of forming chalcogenide comprising devices
US6784018B2 (en) * 2001-08-29 2004-08-31 Micron Technology, Inc. Method of forming chalcogenide comprising devices and method of forming a programmable memory cell of memory circuitry
US20030047765A1 (en) * 2001-08-30 2003-03-13 Campbell Kristy A. Stoichiometry for chalcogenide glasses useful for memory devices and method of formation
US6709958B2 (en) * 2001-08-30 2004-03-23 Micron Technology, Inc. Integrated circuit device and fabrication using metal-doped chalcogenide materials
US6646902B2 (en) * 2001-08-30 2003-11-11 Micron Technology, Inc. Method of retaining memory state in a programmable conductor RAM
US6507061B1 (en) * 2001-08-31 2003-01-14 Intel Corporation Multiple layer phase-change memory
EP2112659A1 (en) * 2001-09-01 2009-10-28 Energy Convertion Devices, Inc. Increased data storage in optical data storage and retrieval systems using blue lasers and/or plasmon lenses
US6545287B2 (en) * 2001-09-07 2003-04-08 Intel Corporation Using selective deposition to form phase-change memory cells
US6586761B2 (en) * 2001-09-07 2003-07-01 Intel Corporation Phase change material memory device
US6690026B2 (en) * 2001-09-28 2004-02-10 Intel Corporation Method of fabricating a three-dimensional array of active media
US6566700B2 (en) * 2001-10-11 2003-05-20 Ovonyx, Inc. Carbon-containing interfacial layer for phase-change memory
US6545907B1 (en) * 2001-10-30 2003-04-08 Ovonyx, Inc. Technique and apparatus for performing write operations to a phase change material memory device
US6576921B2 (en) * 2001-11-08 2003-06-10 Intel Corporation Isolating phase change material memory cells
US6815818B2 (en) * 2001-11-19 2004-11-09 Micron Technology, Inc. Electrode structure for use in an integrated circuit
US6791859B2 (en) * 2001-11-20 2004-09-14 Micron Technology, Inc. Complementary bit PCRAM sense amplifier and method of operation
US6625054B2 (en) * 2001-12-28 2003-09-23 Intel Corporation Method and apparatus to program a phase change memory
US6667900B2 (en) 2001-12-28 2003-12-23 Ovonyx, Inc. Method and apparatus to operate a memory cell
US6512241B1 (en) * 2001-12-31 2003-01-28 Intel Corporation Phase change material memory device
US6671710B2 (en) * 2002-05-10 2003-12-30 Energy Conversion Devices, Inc. Methods of computing with digital multistate phase change materials
US6918382B2 (en) * 2002-08-26 2005-07-19 Energy Conversion Devices, Inc. Hydrogen powered scooter

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0310108A2 (en) * 1987-10-02 1989-04-05 Kabushiki Kaisha Toshiba Interconnection structure of a semiconductor device and method of manufacturing the same
EP0501120A2 (en) * 1991-01-22 1992-09-02 Myson Technology, Inc. Programmable antifuse structure, process, logic cell and architecture for programmable integrated circuits
DE4238080A1 (en) * 1991-11-11 1993-05-13 Mitsubishi Electric Corp Through hole connection structure mfr. for multilayer integrated circuit - selectively etching insulating layer and using CVD process with gas containing titanium and forming conducting layers for coupling to connecting layer
EP0807967A2 (en) * 1996-05-09 1997-11-19 International Business Machines Corporation Diffused titanium resistor and method for fabricating same
EP0973195A1 (en) * 1998-06-22 2000-01-19 STMicroelectronics, Inc. Silver metallization by damascene method

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