WO2003053791A3 - Apparatus and method for monitoring environment within a container - Google Patents

Apparatus and method for monitoring environment within a container Download PDF

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Publication number
WO2003053791A3
WO2003053791A3 PCT/US2002/041307 US0241307W WO03053791A3 WO 2003053791 A3 WO2003053791 A3 WO 2003053791A3 US 0241307 W US0241307 W US 0241307W WO 03053791 A3 WO03053791 A3 WO 03053791A3
Authority
WO
WIPO (PCT)
Prior art keywords
container
monitoring environment
periods
recording
environmental conditions
Prior art date
Application number
PCT/US2002/041307
Other languages
French (fr)
Other versions
WO2003053791A2 (en
WO2003053791B1 (en
Inventor
Stephanie J Moehnke
James N L Pedersen
Wayne C Olson
William J Shaner
Connie E Barela
Philip S Glynn
Original Assignee
Entegris Inc
Stephanie J Moehnke
James N L Pedersen
Wayne C Olson
William J Shaner
Connie E Barela
Philip S Glynn
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris Inc, Stephanie J Moehnke, James N L Pedersen, Wayne C Olson, William J Shaner, Connie E Barela, Philip S Glynn filed Critical Entegris Inc
Priority to EP02805681A priority Critical patent/EP1467915A4/en
Priority to AU2002357374A priority patent/AU2002357374A1/en
Priority to JP2003554522A priority patent/JP2005513459A/en
Priority to KR10-2004-7009740A priority patent/KR20040075896A/en
Publication of WO2003053791A2 publication Critical patent/WO2003053791A2/en
Publication of WO2003053791A3 publication Critical patent/WO2003053791A3/en
Publication of WO2003053791B1 publication Critical patent/WO2003053791B1/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67389Closed carriers characterised by atmosphere control
    • H01L21/67393Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/02Devices for withdrawing samples
    • G01N2001/021Correlating sampling sites with geographical information, e.g. GPS

Abstract

An apparatus and method for recording the environmental conditions within a container (50) during transportation or periods of extended storage, the container (50) for receiving semiconductor wafers (5) or other sensitive components.
PCT/US2002/041307 2001-12-20 2002-12-20 Apparatus and method for monitoring environment within a container WO2003053791A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP02805681A EP1467915A4 (en) 2001-12-20 2002-12-20 Apparatus and method for monitoring environment within a container
AU2002357374A AU2002357374A1 (en) 2001-12-20 2002-12-20 Apparatus and method for monitoring environment within a container
JP2003554522A JP2005513459A (en) 2001-12-20 2002-12-20 Apparatus and method for monitoring the environment in a container
KR10-2004-7009740A KR20040075896A (en) 2001-12-20 2002-12-20 Apparatus and method for monitoring environment within a container

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/026,386 US20030115978A1 (en) 2001-12-20 2001-12-20 Apparatus and method for monitoring environment within a container
US10/026,386 2001-12-20

Publications (3)

Publication Number Publication Date
WO2003053791A2 WO2003053791A2 (en) 2003-07-03
WO2003053791A3 true WO2003053791A3 (en) 2004-01-29
WO2003053791B1 WO2003053791B1 (en) 2004-04-08

Family

ID=21831546

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/041307 WO2003053791A2 (en) 2001-12-20 2002-12-20 Apparatus and method for monitoring environment within a container

Country Status (7)

Country Link
US (2) US20030115978A1 (en)
EP (1) EP1467915A4 (en)
JP (1) JP2005513459A (en)
KR (1) KR20040075896A (en)
CN (1) CN1656368A (en)
AU (1) AU2002357374A1 (en)
WO (1) WO2003053791A2 (en)

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KR100669070B1 (en) * 2005-05-27 2007-01-15 건양대학교산학협력단 Wireless telemetry system for monitoring structure
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US8138913B2 (en) * 2007-01-19 2012-03-20 System Planning Corporation Panel system and method with embedded electronics
JP4644871B2 (en) * 2007-11-05 2011-03-09 独立行政法人 日本原子力研究開発機構 Physical quantity measuring device and measuring method in airtight container
JP4730384B2 (en) * 2008-02-21 2011-07-20 Tdk株式会社 Closed container and its management system
US8299920B2 (en) 2009-09-25 2012-10-30 Fedex Corporate Services, Inc. Sensor based logistics system
US9633327B2 (en) 2009-09-25 2017-04-25 Fedex Corporate Services, Inc. Sensor zone management
US8239169B2 (en) 2009-09-25 2012-08-07 Gregory Timothy L Portable computing device and method for asset management in a logistics system
JP5830818B2 (en) * 2011-02-15 2015-12-09 イマジニアリング株式会社 Measuring device for internal combustion engine
CN103620758B (en) * 2011-06-28 2017-02-15 动力微系统公司 Semiconductor stocker systems and methods
US8726721B2 (en) 2011-08-03 2014-05-20 Charles Mitchell Minges Apparatus and method for monitoring and sampling air quality in an interior space of a wall
KR102081584B1 (en) * 2012-11-02 2020-02-26 삼성전자 주식회사 A method of operating the memory device and the memory system
KR20140066858A (en) * 2012-11-13 2014-06-03 삼성전자주식회사 Secondary memory device and electronic system employing the same
US9239997B2 (en) * 2013-03-15 2016-01-19 The United States Of America As Represented By The Secretary Of The Navy Remote environmental and condition monitoring system
CN104716069B (en) * 2015-03-23 2017-10-17 上海华力微电子有限公司 The monitoring method and monitoring device of wafer acceptability test machine inside environment
US11569138B2 (en) * 2015-06-16 2023-01-31 Kla Corporation System and method for monitoring parameters of a semiconductor factory automation system
US10216100B2 (en) 2015-07-16 2019-02-26 Asml Netherlands B.V. Inspection substrate and an inspection method
US10067070B2 (en) * 2015-11-06 2018-09-04 Applied Materials, Inc. Particle monitoring device
JP6630142B2 (en) * 2015-12-18 2020-01-15 株式会社ディスコ Static electricity detector
US10818561B2 (en) 2016-01-28 2020-10-27 Applied Materials, Inc. Process monitor device having a plurality of sensors arranged in concentric circles
US11150140B2 (en) * 2016-02-02 2021-10-19 Kla Corporation Instrumented substrate apparatus for acquiring measurement parameters in high temperature process applications
CN105737892B (en) * 2016-03-01 2018-10-12 深圳市北鼎科技有限公司 It is shown with environment measuring and the household storage accessories of wireless transmission function
US10416049B2 (en) 2016-04-05 2019-09-17 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Processing of solid micron sized particles for rapid deposition on substrate surfaces with uniform particle distribution
US10543988B2 (en) 2016-04-29 2020-01-28 TricornTech Taiwan Real-time mobile carrier system for facility monitoring and control
JP6689672B2 (en) * 2016-05-25 2020-04-28 信越ポリマー株式会社 Substrate storage container, management system thereof, and substrate storage container management method
JP6689673B2 (en) * 2016-05-25 2020-04-28 信越ポリマー株式会社 Board storage container management system
US9725302B1 (en) * 2016-08-25 2017-08-08 Applied Materials, Inc. Wafer processing equipment having exposable sensing layers
KR20180035265A (en) * 2016-09-28 2018-04-06 삼성전자주식회사 Semiconductor module comprising semiconductor package and semiconductor package
JP6855774B2 (en) * 2016-12-13 2021-04-07 Tdk株式会社 Wafer transfer container atmosphere measuring device, wafer transfer container, wafer transfer container internal cleaning device, and wafer transfer container internal cleaning method
JP6638671B2 (en) * 2017-02-27 2020-01-29 株式会社ダイフク Storage container
JP6282770B1 (en) * 2017-06-02 2018-02-21 株式会社マクニカ Sensor device set and sensor system
JP6916685B2 (en) * 2017-08-03 2021-08-11 信越ポリマー株式会社 Board storage container and its handling method
US10621674B2 (en) 2017-10-13 2020-04-14 Munich Reinsurance Company Computer-based systems employing a network of sensors to support the storage and/or transport of various goods and methods of use thereof to manage losses from quality shortfall
US11342210B2 (en) * 2018-09-04 2022-05-24 Applied Materials, Inc. Method and apparatus for measuring wafer movement and placement using vibration data
KR102276821B1 (en) * 2019-08-01 2021-07-13 주식회사 유타렉스 Foup management system
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US4972099A (en) * 1988-01-30 1990-11-20 Dai Nippon Printing Co., Ltd. Sensor card
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US5936523A (en) * 1998-04-24 1999-08-10 West; Joe F. Device and method for detecting unwanted disposition of the contents of an enclosure
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US20020187025A1 (en) * 2001-01-10 2002-12-12 Speasl Jerry A. Transportable container including an internal environment monitor

Also Published As

Publication number Publication date
WO2003053791A2 (en) 2003-07-03
EP1467915A2 (en) 2004-10-20
JP2005513459A (en) 2005-05-12
US20030115956A1 (en) 2003-06-26
AU2002357374A8 (en) 2003-07-09
AU2002357374A1 (en) 2003-07-09
US20030115978A1 (en) 2003-06-26
EP1467915A4 (en) 2005-09-07
CN1656368A (en) 2005-08-17
WO2003053791B1 (en) 2004-04-08
KR20040075896A (en) 2004-08-30

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