WO2003063233A3 - Systems and methods for closed loop defect reduction - Google Patents

Systems and methods for closed loop defect reduction Download PDF

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Publication number
WO2003063233A3
WO2003063233A3 PCT/US2003/001419 US0301419W WO03063233A3 WO 2003063233 A3 WO2003063233 A3 WO 2003063233A3 US 0301419 W US0301419 W US 0301419W WO 03063233 A3 WO03063233 A3 WO 03063233A3
Authority
WO
WIPO (PCT)
Prior art keywords
specimen
defects
repair
systems
methods
Prior art date
Application number
PCT/US2003/001419
Other languages
French (fr)
Other versions
WO2003063233A2 (en
Inventor
Paul Marella
Original Assignee
Kla Tencor Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Tech Corp filed Critical Kla Tencor Tech Corp
Priority to JP2003562995A priority Critical patent/JP4440647B2/en
Publication of WO2003063233A2 publication Critical patent/WO2003063233A2/en
Publication of WO2003063233A3 publication Critical patent/WO2003063233A3/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity

Abstract

Systems and methods for repairing defects on a specimen are provided. A method may include processing a specimen, detecting defects on the specimen, and repairing one or more of the defects. An additional method may include detecting defects on a specimen, repairing one or more of the defects, and inspecting the specimen to detect defects remaining on the specimen subsequent to repair. A system may include a process chamber, a measurement device configured to detect defects on a specimen, and a repair tool configured to repair one or more of the defects detected on the specimen. An additional system may include a measurement device, a repair tool, and an inspection tool configured to detect defects remaining on the specimen subsequent to repair. The systems may also include a processor configured to alter a parameter of an instrument coupled to the repair tool in response to output from the measurement device.
PCT/US2003/001419 2002-01-16 2003-01-16 Systems and methods for closed loop defect reduction WO2003063233A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003562995A JP4440647B2 (en) 2002-01-16 2003-01-16 Method and system for repairing defects

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34932302P 2002-01-16 2002-01-16
US60/349,323 2002-01-16

Publications (2)

Publication Number Publication Date
WO2003063233A2 WO2003063233A2 (en) 2003-07-31
WO2003063233A3 true WO2003063233A3 (en) 2004-03-25

Family

ID=27613266

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/001419 WO2003063233A2 (en) 2002-01-16 2003-01-16 Systems and methods for closed loop defect reduction

Country Status (3)

Country Link
US (1) US7236847B2 (en)
JP (1) JP4440647B2 (en)
WO (1) WO2003063233A2 (en)

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JP4440647B2 (en) 2010-03-24
WO2003063233A2 (en) 2003-07-31
US20030139838A1 (en) 2003-07-24
JP2005516196A (en) 2005-06-02
US7236847B2 (en) 2007-06-26

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