WO2003065454A2 - Split-gate power module and method for suppressing oscillation therein - Google Patents

Split-gate power module and method for suppressing oscillation therein Download PDF

Info

Publication number
WO2003065454A2
WO2003065454A2 PCT/US2003/002326 US0302326W WO03065454A2 WO 2003065454 A2 WO2003065454 A2 WO 2003065454A2 US 0302326 W US0302326 W US 0302326W WO 03065454 A2 WO03065454 A2 WO 03065454A2
Authority
WO
WIPO (PCT)
Prior art keywords
area
gate
die
frequency
array
Prior art date
Application number
PCT/US2003/002326
Other languages
French (fr)
Other versions
WO2003065454A3 (en
Inventor
Richard B. Frey
Original Assignee
Advanced Power Technology, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Power Technology, Inc. filed Critical Advanced Power Technology, Inc.
Priority to JP2003564937A priority Critical patent/JP4732692B2/en
Priority to KR10-2004-7011632A priority patent/KR20040085169A/en
Priority to DE60308148T priority patent/DE60308148T2/en
Priority to EP03705914A priority patent/EP1470588B1/en
Publication of WO2003065454A2 publication Critical patent/WO2003065454A2/en
Publication of WO2003065454A3 publication Critical patent/WO2003065454A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/50Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • H01L25/072Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6627Waveguides, e.g. microstrip line, strip line, coplanar line
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6644Packaging aspects of high-frequency amplifiers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6688Mixed frequency adaptations, i.e. for operation at different frequencies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05599Material
    • H01L2224/056Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/05638Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/05639Silver [Ag] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45139Silver (Ag) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48599Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • H01L2224/486Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48638Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/48639Silver (Ag) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48699Principal constituent of the connecting portion of the wire connector being Aluminium (Al)
    • H01L2224/487Principal constituent of the connecting portion of the wire connector being Aluminium (Al) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48738Principal constituent of the connecting portion of the wire connector being Aluminium (Al) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/48739Silver (Ag) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/645Inductive arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00011Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01047Silver [Ag]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01058Cerium [Ce]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13063Metal-Semiconductor Field-Effect Transistor [MESFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/15786Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787Ceramics, e.g. crystalline carbides, nitrides or oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1903Structure including wave guides
    • H01L2924/19032Structure including wave guides being a microstrip line type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19042Component type being an inductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19043Component type being a resistor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30105Capacitance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • H01L2924/30111Impedance matching

Definitions

  • the present invention relates to power modules containing plural transistor dies providing a single external gate terminal. More particularly, it concerns a power module that operates at a first frequency without oscillation at a second higher frequency that is below a cutoff frequency of the transistors.
  • FIGs. 1 and 2 illustrate two such prior art configurations, Fig. 1 illustrating a device known as the SGS Thompson TH430 and Fig. 2 illustrating a device known as the Toshiba TPM1919.
  • the SGS Thompson TH430 shown in Fig. 1 is a four-die bipolar device incorporating a center base feed with the emitters on the outside of the rectangular array. There is no provision in this design for equalizing the path length from the base terminal to the individual die bases. It is believed that the upper frequency of the die, referred to herein as the cutoff frequency of the transistors, is close to the 50MHz upper frequency limit of the four-die device.
  • the Toshiba TPM1919 shown in Fig. 2 is a 2GHz device having four MESFET dies in a linear array. It uses an "echelon" divider structure to divide the gate signal four ways. There are matching networks between the gate connections and the ends of the divider structure. It is believed that these matching networks provide impedance transformation at the intended frequency of operation which facilitates implementation of the device.
  • the device's input structure provides certain balancing and isolation functions. Its frequency of operation is believed to be near the upper limit of the individual dies. Accordingly, the known prior art devices operate at the top end of the dies' frequency capability.
  • the prior art gate and/or base wires are necessarily short because of the very high frequencies involved. As a result, their parasitic resonant (and potential oscillation) frequency is higher than the frequency at which the dies run out of gain. Thus, there is little or no oscillation.
  • the Motorola design MRF 154 (FIG. 2') is described in U.S. Patent No. 4,639,760 uses series gate resistors to intentionally substantially reduce the gain of the individual gate cells to substantially prevent oscillation.
  • the die has gain response to >500 MHz, but the intended frequency range of the total device was ⁇ 100 MHz. Thus, the Motorola design has excess gain.
  • the invention involves a method of packaging and interconnecting four power transistor dies to operate at a first frequency without oscillation at a second frequency higher than the first frequency but lower than a cutoff frequency of the transistors.
  • the method comprises mounting the dies on a substrate with a lower side (drain) of each die electrically and thermally bonded to a first area of a conductive layer on the substrate; electrically connecting a source of each die to a second area of the conductive layer on the substrate; and electrically connecting a gate of each die to a third, common interior central area of the conductive layer on the substrate via separate electrical leads.
  • the leads are sized to substantially the same electrical length and provide a first impedance corresponding to said electrical length from the common area to each gate that will pass the first frequency substantially unattenuated and providing a second impedance from the gate of one die to the gate of a second die that will substantially attenuate the second frequency.
  • the leads take the form of one or more jumper wires in series with a film resistor.
  • they take the form of one or more meandering striplines having predefined impedance characteristics and one or more gate bonding pads connected to their respective gates with long jumper wires.
  • FIG. 4 is a schematic diagram of a second embodiment of the present invention.
  • FIG. 5 is a more detailed schematic diagram of the gate structure of the embodiment shown in FIG. 3.
  • FIG. 6 is a more detailed schematic diagram of the gate structure of the embodiment shown in FIG. 4.
  • the input capacitance of the transistors in accordance with the invention, is high. This high capacitance lowers the resonant frequency of the parasitic structure of the transistors, which can cause oscillation when the transistors are coupled in parallel in a power module. Because of the higher input capacitance and the use of source resistors, in accordance with a first embodiment of the invention, the gain at the intended frequency of operation is not very high to begin with.
  • a second embodiment of the invention utilizes gate inductors instead of gate resistors, and provides higher gain without oscillation.
  • Fig. 3 illustrates a first embodiment of the invention having balanced gate input connections that utilize printed series resistors.
  • a relatively lower gain amplifier is obtained, but one that performs without undesirable oscillation.
  • smaller dies having greater gain may be used so that the series resistors do not consume most of the gain margin at the desired operating frequency.
  • Fig. 3 shows the four-die (each labeled 1) array mounted on a preferably ceramic (e.g. BeO) substrate 2 providing a conductive source connection area 3, a conductive drain connection area 4 and a conductive gate connection area 5.
  • Thin- film source resistors 6 e.g. palladium gold
  • Gate bond wires 7 and source bond wires 8 e.g. aluminum
  • source bond pads 9 e.g. silver
  • Jumper wires 10 e.g. aluminum
  • the far ends of gate resistors 13 are wire bonded by gate bond wires 7 to plural corresponding gate connections on each of the dies 1.
  • Fig. 4 shows a second embodiment of the invention having balanced gate input connections that utilize printed meandering striplines or stripline connection lines 11 exhibiting a relatively high intrinsic inductance. Because the impedance of the inductive striplines is frequency-dependent (unlike that of the resistors, which is frequency-independent), it is possible to achieve higher gain without oscillation in this second embodiment of the invention. It will be appreciated that the layout topology of the second embodiment is like that of the first: the gates' first off-die connection is to be in a common interior central location therein. Those of skill in the art will appreciate that the striplines also intrinsically have a characteristic resistance and capacitance, however low.
  • the meandering striplines are of substantially equal electrical length, i.e. they exhibit nearly identical impedances (including . resistance, inductance and capacitance), and extend from an external gate terminal 5' through jumper wires 10 to a central common landing region L' within the die array and between adjacent dies.
  • the meandering inductors terminate in gate bonding pads 12' for wire bonding using gate bond wires 7' to the plural corresponding gate pads on each of the dies 1.
  • substrate 2, source connection area 3, drain connection area 4, source resistors 6, source bond wires 8 and source bond pads 9 are substantially identical to those of the first embodiment of the invention described above relative to Fig. 3.
  • Fig. 5 is a detailed schematic diagram showing only the gate connection area of the device of Fig. 3.
  • Fig. 5 features the above-described gate connection 5 for the device and bond wires 7. It also shows second (central) gate connection bond wires 10 (six in accordance with the first embodiment shown) providing a controlled-impedance (e.g. resistive/inductive/capacitive) path between gate connection 5 and the centrally located gate landing L. It further shows the gate bonding pads 12 (one per die). Finally, it shows preferably printed circuit resistors 13 (also one per die).
  • the number of jumper wires 10 and their lengths may be adjusted to achieve desired inductance, resistance and current capacity for a given application.
  • the gate series resistors are approximately 3 ⁇ or less. Those of skill in the art will appreciate that the series resistance value is selected to effectively suppress oscillation at a given operating frequency of the device, while not reducing the overall gain of the device more than is necessary. Also, as illustrated in the preferred first embodiment, the six thin jumper wires 10 are arranged in parallel.
  • Fig. 6 is a detailed schematic diagram showing only the gate connection area of the device of Fig. 4.
  • the second embodiment of the invention omits the gate series resistors 13, reconfigures the gate bonding pads 12' to a smaller footprint, and incorporates four controlled-impedance stripline connection lines 11 extending as shown between a common central landing L' and bonding pads 12'.
  • the landing L' may be seen to be connected to the gate connection 5' via six parallel jumper wires 10, as in Figs. 3 and 5.
  • the typical characteristic impedance of the controlled-impedance striplines- -compatible with the selected dies- is approximately 90 ⁇ , as determined by their width and the thickness and dielectric properties of the substrate 2.
  • the striplines are approximately 0.65 inch long and 0.013 inch wide, while the substrate is approximately 40 mils thick.
  • the input impedance of the dies 1 themselves is less than approximately 0.2 ⁇ .
  • striplines may be differently characterized, formed and/or routed, within the spirit and scope of the invention.
  • a rectangular array of four-die is represented.
  • Other geometric arrangements, circular, triangular, etc., with more or less die could also be used with the method described, and are within the spirit and scope of the invention. Accordingly, having illustrated and described the principles of our invention in a preferred embodiment thereof, it should be readily apparent to those skilled in the art that the invention can be modified in arrangement and detail without departing from such principles. We claim all modifications coming within the spirit and scope of the accompanying claims.

Abstract

The invention involves a method of packaging and interconnecting four power transistor dies to operate at a first frequency without oscillation at a second frequency higher than the first frequency but lower than a cutoff frequency of the transistors. The method comprises mounting the dies on a substrate with a lower side (drain) of each die electrically and thermally bonded to a first area of a conductive layer on the substrate; electrically connecting a source of each die to a second area of the conductive layer on the substrate; and electrically connecting a gate of each die to a third, common interior central are of the conductive layer on the substrate via separate electrical leads. The leads are sized to substantially the same electrical length and providing a first impedance corresponding to said electrical length from the common area to each gate that will pass the first frequency substantially unattenuated and providing a second impedance from the gate of one die to the gate of a second die that will substantially attenuate the second frequency. In accordance with a first embodiment, the leads take the form of one or more jumper wires in series with a film resistor. In accordance with a second embodiment, they take the form of one or more meandering striplines having predetermined impedance characteristics, and one or more gate bonding pads connected to their respective gates with long jumper wires.

Description

SPLIT-GATE POWER MODULE AND METHOD FOR SUPPRESSING
OSCILLATION THEREIN
FIELD OF THE INVENTION The present invention relates to power modules containing plural transistor dies providing a single external gate terminal. More particularly, it concerns a power module that operates at a first frequency without oscillation at a second higher frequency that is below a cutoff frequency of the transistors.
BACKGROUND OF THE INVENTION Prior art power module devices utilizing plural transistor dies are known. Figs. 1 and 2 illustrate two such prior art configurations, Fig. 1 illustrating a device known as the SGS Thompson TH430 and Fig. 2 illustrating a device known as the Toshiba TPM1919.
The SGS Thompson TH430 shown in Fig. 1 is a four-die bipolar device incorporating a center base feed with the emitters on the outside of the rectangular array. There is no provision in this design for equalizing the path length from the base terminal to the individual die bases. It is believed that the upper frequency of the die, referred to herein as the cutoff frequency of the transistors, is close to the 50MHz upper frequency limit of the four-die device.
The Toshiba TPM1919 shown in Fig. 2 is a 2GHz device having four MESFET dies in a linear array. It uses an "echelon" divider structure to divide the gate signal four ways. There are matching networks between the gate connections and the ends of the divider structure. It is believed that these matching networks provide impedance transformation at the intended frequency of operation which facilitates implementation of the device. The device's input structure provides certain balancing and isolation functions. Its frequency of operation is believed to be near the upper limit of the individual dies. Accordingly, the known prior art devices operate at the top end of the dies' frequency capability. The prior art gate and/or base wires are necessarily short because of the very high frequencies involved. As a result, their parasitic resonant (and potential oscillation) frequency is higher than the frequency at which the dies run out of gain. Thus, there is little or no oscillation.
The Motorola design MRF 154 (FIG. 2') is described in U.S. Patent No. 4,639,760 uses series gate resistors to intentionally substantially reduce the gain of the individual gate cells to substantially prevent oscillation. The die has gain response to >500 MHz, but the intended frequency range of the total device was <100 MHz. Thus, the Motorola design has excess gain.
SUMMARY OF THE INVENTION
The invention involves a method of packaging and interconnecting four power transistor dies to operate at a first frequency without oscillation at a second frequency higher than the first frequency but lower than a cutoff frequency of the transistors. The method comprises mounting the dies on a substrate with a lower side (drain) of each die electrically and thermally bonded to a first area of a conductive layer on the substrate; electrically connecting a source of each die to a second area of the conductive layer on the substrate; and electrically connecting a gate of each die to a third, common interior central area of the conductive layer on the substrate via separate electrical leads. The leads are sized to substantially the same electrical length and provide a first impedance corresponding to said electrical length from the common area to each gate that will pass the first frequency substantially unattenuated and providing a second impedance from the gate of one die to the gate of a second die that will substantially attenuate the second frequency. In accordance with a first embodiment, the leads take the form of one or more jumper wires in series with a film resistor. In accordance with a second embodiment, they take the form of one or more meandering striplines having predefined impedance characteristics and one or more gate bonding pads connected to their respective gates with long jumper wires. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 illustrates prior art power amplifier. FIG. 2 illustrates another prior art power amplifier. FIG. 2' illustrates a third prior art power amplifier. FIG. 3 is a schematic diagram of a first embodiment of the present invention.
FIG. 4 is a schematic diagram of a second embodiment of the present invention.
FIG. 5 is a more detailed schematic diagram of the gate structure of the embodiment shown in FIG. 3. FIG. 6 is a more detailed schematic diagram of the gate structure of the embodiment shown in FIG. 4.
DETAILED DESCRIPTION In accordance with the present invention, four power MOSFET transistor dies are arranged in a rectangular, e.g. a square, array, as shown in Figs. 3 and 4. The dies have an upper limit of 250 MHz, but they are twice as large as the dies in the Motorola design. As a result, the input capacitance of the transistors, in accordance with the invention, is high. This high capacitance lowers the resonant frequency of the parasitic structure of the transistors, which can cause oscillation when the transistors are coupled in parallel in a power module. Because of the higher input capacitance and the use of source resistors, in accordance with a first embodiment of the invention, the gain at the intended frequency of operation is not very high to begin with. Thus, there is little excess gain, and the gate resistors alone decrease overall amplifier gain. If the resistance needed to suppress oscillation is too high, then inductors may be used instead. Thus a second embodiment of the invention utilizes gate inductors instead of gate resistors, and provides higher gain without oscillation.
The invention may be seen to provide a reliable, easily and repeatably manufactured, modular configuration of multiple power MOSFET dies designed for RF power applications. Fig. 3 illustrates a first embodiment of the invention having balanced gate input connections that utilize printed series resistors. Those of skill in the art will appreciate that, in this first embodiment, a relatively lower gain amplifier is obtained, but one that performs without undesirable oscillation. Those of skill also will appreciate that, to increase the gain of such an amplifier embodiment, smaller dies having greater gain may be used so that the series resistors do not consume most of the gain margin at the desired operating frequency.
Fig. 3 shows the four-die (each labeled 1) array mounted on a preferably ceramic (e.g. BeO) substrate 2 providing a conductive source connection area 3, a conductive drain connection area 4 and a conductive gate connection area 5. Thin- film source resistors 6 (e.g. palladium gold) are located on the substrate outside the perimeter of the die array. Gate bond wires 7 and source bond wires 8 (e.g. aluminum), as well as source bond pads 9 (e.g. silver) are provided, as shown. Jumper wires 10 (e.g. aluminum) extend from gate connection area 5 to a centrally located gate landing L adjacent and electrically connected to gate series resistors 13. The far ends of gate resistors 13 are wire bonded by gate bond wires 7 to plural corresponding gate connections on each of the dies 1.
Fig. 4 shows a second embodiment of the invention having balanced gate input connections that utilize printed meandering striplines or stripline connection lines 11 exhibiting a relatively high intrinsic inductance. Because the impedance of the inductive striplines is frequency-dependent (unlike that of the resistors, which is frequency-independent), it is possible to achieve higher gain without oscillation in this second embodiment of the invention. It will be appreciated that the layout topology of the second embodiment is like that of the first: the gates' first off-die connection is to be in a common interior central location therein. Those of skill in the art will appreciate that the striplines also intrinsically have a characteristic resistance and capacitance, however low.
It may be seen from Fig. 4 that the meandering striplines are of substantially equal electrical length, i.e. they exhibit nearly identical impedances (including . resistance, inductance and capacitance), and extend from an external gate terminal 5' through jumper wires 10 to a central common landing region L' within the die array and between adjacent dies. The meandering inductors terminate in gate bonding pads 12' for wire bonding using gate bond wires 7' to the plural corresponding gate pads on each of the dies 1. It will be understood that substrate 2, source connection area 3, drain connection area 4, source resistors 6, source bond wires 8 and source bond pads 9 are substantially identical to those of the first embodiment of the invention described above relative to Fig. 3. Those of skill in the art will appreciate that the meandering nature of the striplines effectively electrically lengthens the leads, without substantially increasing the required connection layout area. Fig. 5 is a detailed schematic diagram showing only the gate connection area of the device of Fig. 3. Fig. 5 features the above-described gate connection 5 for the device and bond wires 7. It also shows second (central) gate connection bond wires 10 (six in accordance with the first embodiment shown) providing a controlled-impedance (e.g. resistive/inductive/capacitive) path between gate connection 5 and the centrally located gate landing L. It further shows the gate bonding pads 12 (one per die). Finally, it shows preferably printed circuit resistors 13 (also one per die). The number of jumper wires 10 and their lengths may be adjusted to achieve desired inductance, resistance and current capacity for a given application. In accordance with a preferred first embodiment, the gate series resistors are approximately 3Ω or less. Those of skill in the art will appreciate that the series resistance value is selected to effectively suppress oscillation at a given operating frequency of the device, while not reducing the overall gain of the device more than is necessary. Also, as illustrated in the preferred first embodiment, the six thin jumper wires 10 are arranged in parallel.
Fig. 6 is a detailed schematic diagram showing only the gate connection area of the device of Fig. 4. As described above with reference to Fig. 4, the second embodiment of the invention omits the gate series resistors 13, reconfigures the gate bonding pads 12' to a smaller footprint, and incorporates four controlled-impedance stripline connection lines 11 extending as shown between a common central landing L' and bonding pads 12'. The landing L' may be seen to be connected to the gate connection 5' via six parallel jumper wires 10, as in Figs. 3 and 5.
The typical characteristic impedance of the controlled-impedance striplines- -compatible with the selected dies-is approximately 90Ω, as determined by their width and the thickness and dielectric properties of the substrate 2. In accordance with the second embodiment of the invention described above by reference to Figs. 4 and 6, the striplines are approximately 0.65 inch long and 0.013 inch wide, while the substrate is approximately 40 mils thick. The input impedance of the dies 1 themselves is less than approximately 0.2Ω. Those of skill in the art will appreciate that the ratio of conductor width to dielectric layer thickness determines the characteristic impedance, and that the length of the conductor determines the series impedance the meandering stripline imparts between the gate and the common connection point L'. Those of skill in the art also will appreciate that the illustrated striplines may be differently characterized, formed and/or routed, within the spirit and scope of the invention. For purpose of description, a rectangular array of four-die is represented. Other geometric arrangements, circular, triangular, etc., with more or less die could also be used with the method described, and are within the spirit and scope of the invention. Accordingly, having illustrated and described the principles of our invention in a preferred embodiment thereof, it should be readily apparent to those skilled in the art that the invention can be modified in arrangement and detail without departing from such principles. We claim all modifications coming within the spirit and scope of the accompanying claims.

Claims

1. A method of packaging and interconnecting plural power transistor dies to operate at a first frequency without oscillation at a second frequency higher than the first frequency but lower than a cutoff frequency of the transistors, the method comprising: mounting the dies on a substrate with a lower side (drain) of each die electrically and thermally bonded to a first area of a conductive layer on the substrate; electrically connecting a source of each die to a second area of the conductive layer on the substrate; and electrically connecting a gate of each die to a third, common, interior central landing area of the conductive layer on the substrate via separate electrical leads, the leads being sized to substantially the same electrical length and providing a first impedance corresponding to said electrical length from the common area to each gate that will pass the first frequency substantially unattenuated and providing a second impedance from the gate of one die to the gate of a second die that will substantially attenuate the second frequency.
2. A method according to claim 1 , wherein the plural dies are arranged in an array, and the substrate is arranged so that the second area coupled to the sources is positioned outside the array and the third area is interior and central to the array and between the dies.
3. A method according to claim 1, wherein the plural dies are arranged in an array, which further comprises a set of conductive first jumper wires connecting the third area to a fourth area, and wherein the substrate is arranged so that the second area coupled to the sources is positioned outside of the array on opposite first and second sides, the third area is positioned approximately centrally within the array and the fourth area is substantially outside the array.
4. A method according to claim 1, wherein the leads each include a first portion extending from the third area to a gate pad corresponding to a gate of a respective die, the first portion including one or more controlled-impedance films, a second portion connected in series with the first portion, the second portion including the gate pad and a third portion connected in series with the second portion, the third portion including one or more conductive jumpers extending to the gate of the respective die.
5. A method according to claim 4, wherein at least the first and second portions of the leads are integrally formed in the conductive layer so as to delineate lines of substantially equal, defined impedance on the substrate having substantially equal resistance, inductance and capacitance, and wherein the conductive jumpers are configured to be of substantially equal, defined impedance coupling each gate pad to a respective gate.
6. A method according to claim 1 , wherein the leads each include a first portion that is integrally formed in the conductive layer and that extends between the third area and an electrically-separate gate pad corresponding with one of the dies, the first portion taking the form of a meandering stripline, and wherein the leads each include a second portion that includes a first set of plural conductive jumpers configured to be of substantially equal, defined impedance coupling each gate pad to a respective gate.
7. The method of claim 6, wherein the plural dies are arranged in an array, which further comprises a set of conductive first jumper wires connecting the third area to a fourth area, and wherein the substrate is arranged so that the second area coupled to the sources is positioned outside of the array on opposite first and second sides, the third area is positioned approximately centrally within the array and the fourth area is substantially outside the array.
8. The method of claims 2, 3, or 7, wherein the array is rectangular.
PCT/US2003/002326 2002-01-29 2003-01-27 Split-gate power module and method for suppressing oscillation therein WO2003065454A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003564937A JP4732692B2 (en) 2002-01-29 2003-01-27 Power module and manufacturing method thereof
KR10-2004-7011632A KR20040085169A (en) 2002-01-29 2003-01-27 Split-gate power module and method for suppressing oscillation therein
DE60308148T DE60308148T2 (en) 2002-01-29 2003-01-27 POWER MODULE WITH PARTITIONED GATE AND METHOD FOR SUPPRESSING VIBRATIONS THEREIN
EP03705914A EP1470588B1 (en) 2002-01-29 2003-01-27 Split-gate power module and method for suppressing oscillation therein

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US35380902P 2002-01-29 2002-01-29
US60/353,809 2002-01-29

Publications (2)

Publication Number Publication Date
WO2003065454A2 true WO2003065454A2 (en) 2003-08-07
WO2003065454A3 WO2003065454A3 (en) 2004-02-26

Family

ID=27663256

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/002326 WO2003065454A2 (en) 2002-01-29 2003-01-27 Split-gate power module and method for suppressing oscillation therein

Country Status (8)

Country Link
US (2) US6939743B2 (en)
EP (1) EP1470588B1 (en)
JP (1) JP4732692B2 (en)
KR (1) KR20040085169A (en)
CN (1) CN100380661C (en)
AT (1) ATE339013T1 (en)
DE (1) DE60308148T2 (en)
WO (1) WO2003065454A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4342232B2 (en) * 2003-07-11 2009-10-14 三菱電機株式会社 Semiconductor power module and main circuit current measuring system for measuring main circuit current value of the module
GB201105912D0 (en) * 2011-04-07 2011-05-18 Diamond Microwave Devices Ltd Improved matching techniques for power transistors
US8581660B1 (en) * 2012-04-24 2013-11-12 Texas Instruments Incorporated Power transistor partial current sensing for high precision applications
CN104380463B (en) * 2012-06-19 2017-05-10 Abb 技术有限公司 Substrate for mounting multiple power transistors thereon and power semiconductor module
DE102014111931B4 (en) * 2014-08-20 2021-07-08 Infineon Technologies Ag Low-inductance circuit arrangement with load current busbar
WO2018109069A1 (en) 2016-12-16 2018-06-21 Abb Schweiz Ag Power semiconductor module with low gate path inductance
JP6838243B2 (en) 2017-09-29 2021-03-03 日立Astemo株式会社 Power converter
DE102019112935B4 (en) 2019-05-16 2021-04-29 Danfoss Silicon Power Gmbh Semiconductor module
JP6772355B1 (en) * 2019-10-15 2020-10-21 株式会社京三製作所 Switching module
JP7351209B2 (en) 2019-12-17 2023-09-27 富士電機株式会社 semiconductor equipment
JP2021097146A (en) 2019-12-18 2021-06-24 富士電機株式会社 Semiconductor device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4907068A (en) * 1987-01-21 1990-03-06 Siemens Aktiengesellschaft Semiconductor arrangement having at least one semiconductor body
EP0645815A2 (en) * 1993-09-07 1995-03-29 Delco Electronics Corporation High power semiconductor switch module
US5731970A (en) * 1989-12-22 1998-03-24 Hitachi, Ltd. Power conversion device and semiconductor module suitable for use in the device
DE19644009A1 (en) * 1996-10-31 1998-05-07 Siemens Ag Large-area high-current module of a field-controlled, switchable power semiconductor switch

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4639760A (en) * 1986-01-21 1987-01-27 Motorola, Inc. High power RF transistor assembly
JP2751707B2 (en) * 1992-01-29 1998-05-18 株式会社日立製作所 Semiconductor module and power conversion device using the same
JPH04183001A (en) * 1990-11-16 1992-06-30 Mitsubishi Electric Corp Package for microwave ic
JPH0575314A (en) * 1991-09-13 1993-03-26 Matsushita Electron Corp Microwave integrated circuit element
JP3053298B2 (en) * 1992-08-19 2000-06-19 株式会社東芝 Semiconductor device
DE59304797D1 (en) * 1992-08-26 1997-01-30 Eupec Gmbh & Co Kg Power semiconductor module
US6291878B1 (en) * 1993-04-22 2001-09-18 Sundstrand Corporation Package for multiple high power electrical components
JP2973799B2 (en) * 1993-04-23 1999-11-08 富士電機株式会社 Power transistor module
JP2000323647A (en) * 1999-05-12 2000-11-24 Toshiba Corp Module semiconductor device and manufacture thereof
JP4163818B2 (en) * 1999-07-07 2008-10-08 三菱電機株式会社 Internally matched transistor
JP4138192B2 (en) * 1999-12-27 2008-08-20 三菱電機株式会社 Semiconductor switch device
US6617679B2 (en) * 2002-02-08 2003-09-09 Advanced Energy Industries, Inc. Semiconductor package for multiple high power transistors

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4907068A (en) * 1987-01-21 1990-03-06 Siemens Aktiengesellschaft Semiconductor arrangement having at least one semiconductor body
US5731970A (en) * 1989-12-22 1998-03-24 Hitachi, Ltd. Power conversion device and semiconductor module suitable for use in the device
EP0645815A2 (en) * 1993-09-07 1995-03-29 Delco Electronics Corporation High power semiconductor switch module
DE19644009A1 (en) * 1996-10-31 1998-05-07 Siemens Ag Large-area high-current module of a field-controlled, switchable power semiconductor switch

Also Published As

Publication number Publication date
JP4732692B2 (en) 2011-07-27
EP1470588B1 (en) 2006-09-06
EP1470588A2 (en) 2004-10-27
WO2003065454A3 (en) 2004-02-26
CN1625807A (en) 2005-06-08
US7342262B2 (en) 2008-03-11
ATE339013T1 (en) 2006-09-15
CN100380661C (en) 2008-04-09
DE60308148T2 (en) 2007-08-16
KR20040085169A (en) 2004-10-07
US20030141587A1 (en) 2003-07-31
DE60308148D1 (en) 2006-10-19
US20050218500A1 (en) 2005-10-06
JP2006502560A (en) 2006-01-19
US6939743B2 (en) 2005-09-06

Similar Documents

Publication Publication Date Title
US7342262B2 (en) Split-gate power module for suppressing oscillation therein
EP1573813B1 (en) Rf power transistor with internal bias feed
JP6388428B2 (en) Semiconductor device having impedance matching circuit and manufacturing method thereof
EP3160042A1 (en) Rf power transistors with video bandwidth circuits, and methods of manufacture thereof
US7149496B2 (en) High-frequency module and radio communication apparatus
US7372334B2 (en) Output match transistor
CN108242920B (en) Input circuit for RF amplifier device and method of manufacturing the same
CN109861654B (en) RF power transistor with impedance matching circuit and method of manufacturing the same
KR20010080542A (en) High frequency power transistor divice
US4200880A (en) Microwave transistor with distributed output shunt tuning
EP3213411B1 (en) Output matching network having a single combined series and shunt capacitor component
US4393392A (en) Hybrid transistor
EP0544387B1 (en) High gain monolithic microwave integrated circuit amplifier
US6384492B1 (en) Power semiconductor packaging
US6777791B2 (en) Multiple ground signal path LDMOS power package
EP3340463A1 (en) Distributed amplifiers with impedance compensation circuits
EP0015709B1 (en) Constructional arrangement for semiconductor devices
US7019362B2 (en) Power MOSFET with reduced dgate resistance
US4975659A (en) Amplifier package using vertical power transistors with ungrounded common terminals
US6583673B2 (en) Stability enhanced multistage power amplifier
US6624703B1 (en) Terminal arrangement for an electrical device
JPH104325A (en) High frequency amplifier, high frequency communication equipment, active semiconductor device, impedance matching device and lead frame
US11049837B2 (en) Bond wire array for packaged semiconductor device
EP1744604B1 (en) Amplifier with feedback bridge
WO2023043686A1 (en) Bridged class-d rf amplifier circuit

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2003705914

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2003564937

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 1020047011632

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2003802909X

Country of ref document: CN

WWP Wipo information: published in national office

Ref document number: 2003705914

Country of ref document: EP

WWG Wipo information: grant in national office

Ref document number: 2003705914

Country of ref document: EP