WO2003074421A1 - Titanosilicate, process for its production, and its use in producing oxidized compound - Google Patents
Titanosilicate, process for its production, and its use in producing oxidized compound Download PDFInfo
- Publication number
- WO2003074421A1 WO2003074421A1 PCT/JP2003/002154 JP0302154W WO03074421A1 WO 2003074421 A1 WO2003074421 A1 WO 2003074421A1 JP 0302154 W JP0302154 W JP 0302154W WO 03074421 A1 WO03074421 A1 WO 03074421A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- titanosilicate
- compound
- producing
- precursor
- acid
- Prior art date
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- 150000001875 compounds Chemical class 0.000 title claims description 145
- 238000000034 method Methods 0.000 title claims description 129
- 230000008569 process Effects 0.000 title claims description 76
- 238000004519 manufacturing process Methods 0.000 title description 24
- 238000000862 absorption spectrum Methods 0.000 claims abstract description 61
- 238000010521 absorption reaction Methods 0.000 claims abstract description 50
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 13
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 13
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 13
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 13
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 127
- 239000002243 precursor Substances 0.000 claims description 103
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 85
- 229910001868 water Inorganic materials 0.000 claims description 83
- 229910052710 silicon Inorganic materials 0.000 claims description 78
- 239000010703 silicon Substances 0.000 claims description 78
- 239000000203 mixture Substances 0.000 claims description 77
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 75
- 238000006243 chemical reaction Methods 0.000 claims description 74
- 239000010936 titanium Substances 0.000 claims description 73
- 239000000126 substance Substances 0.000 claims description 66
- 229910052719 titanium Inorganic materials 0.000 claims description 63
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 60
- 239000002253 acid Substances 0.000 claims description 53
- 229910052796 boron Inorganic materials 0.000 claims description 45
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 43
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 36
- -1 nitrogen-containing compound Chemical class 0.000 claims description 36
- 239000010457 zeolite Substances 0.000 claims description 32
- 229910021536 Zeolite Inorganic materials 0.000 claims description 31
- 238000007254 oxidation reaction Methods 0.000 claims description 31
- 238000001354 calcination Methods 0.000 claims description 29
- 238000010438 heat treatment Methods 0.000 claims description 25
- 150000002894 organic compounds Chemical class 0.000 claims description 20
- 150000002978 peroxides Chemical class 0.000 claims description 20
- 238000010306 acid treatment Methods 0.000 claims description 18
- 239000007800 oxidant agent Substances 0.000 claims description 16
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 14
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 13
- 229910017604 nitric acid Inorganic materials 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 11
- 239000002210 silicon-based material Substances 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 230000008961 swelling Effects 0.000 claims description 9
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 7
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 7
- 239000004327 boric acid Substances 0.000 claims description 7
- 238000000634 powder X-ray diffraction Methods 0.000 claims description 7
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 claims description 6
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 claims description 6
- 150000001298 alcohols Chemical class 0.000 claims description 5
- ZSIQJIWKELUFRJ-UHFFFAOYSA-N azepane Chemical compound C1CCCNCC1 ZSIQJIWKELUFRJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 5
- 239000008119 colloidal silica Substances 0.000 claims description 5
- 238000006735 epoxidation reaction Methods 0.000 claims description 5
- 150000002576 ketones Chemical class 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 4
- 150000002825 nitriles Chemical class 0.000 claims description 4
- IBBSNLXNYXWZOQ-UHFFFAOYSA-N 1-ethylnaphthalene;hydrogen peroxide Chemical compound OO.C1=CC=C2C(CC)=CC=CC2=C1 IBBSNLXNYXWZOQ-UHFFFAOYSA-N 0.000 claims description 3
- YWBMNCRJFZGXJY-UHFFFAOYSA-N 1-hydroperoxy-1,2,3,4-tetrahydronaphthalene Chemical compound C1=CC=C2C(OO)CCCC2=C1 YWBMNCRJFZGXJY-UHFFFAOYSA-N 0.000 claims description 3
- UUUYXCLERBDLEO-UHFFFAOYSA-N 1-hydroperoxy-1-methylcyclohexane Chemical compound OOC1(C)CCCCC1 UUUYXCLERBDLEO-UHFFFAOYSA-N 0.000 claims description 3
- GQNOPVSQPBUJKQ-UHFFFAOYSA-N 1-hydroperoxyethylbenzene Chemical compound OOC(C)C1=CC=CC=C1 GQNOPVSQPBUJKQ-UHFFFAOYSA-N 0.000 claims description 3
- XRXANEMIFVRKLN-UHFFFAOYSA-N 2-hydroperoxy-2-methylbutane Chemical compound CCC(C)(C)OO XRXANEMIFVRKLN-UHFFFAOYSA-N 0.000 claims description 3
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 claims description 3
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims description 3
- WQRUARPAYKIKTP-UHFFFAOYSA-N hydrogen peroxide;2-methylpropylbenzene Chemical compound OO.CC(C)CC1=CC=CC=C1 WQRUARPAYKIKTP-UHFFFAOYSA-N 0.000 claims description 3
- FGGJBCRKSVGDPO-UHFFFAOYSA-N hydroperoxycyclohexane Chemical compound OOC1CCCCC1 FGGJBCRKSVGDPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052605 nesosilicate Inorganic materials 0.000 claims description 3
- 150000004762 orthosilicates Chemical class 0.000 claims description 3
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 229910052810 boron oxide Inorganic materials 0.000 claims description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 239000003054 catalyst Substances 0.000 description 61
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 32
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 32
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 30
- 230000000052 comparative effect Effects 0.000 description 30
- 238000001228 spectrum Methods 0.000 description 28
- 239000000243 solution Substances 0.000 description 25
- 239000012265 solid product Substances 0.000 description 24
- 238000003756 stirring Methods 0.000 description 23
- 239000000047 product Substances 0.000 description 22
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 20
- 238000001027 hydrothermal synthesis Methods 0.000 description 18
- 239000007787 solid Substances 0.000 description 15
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 14
- 230000000694 effects Effects 0.000 description 14
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 14
- 238000005406 washing Methods 0.000 description 14
- 239000013078 crystal Substances 0.000 description 13
- 238000004458 analytical method Methods 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 11
- 229910052783 alkali metal Inorganic materials 0.000 description 11
- 150000001340 alkali metals Chemical class 0.000 description 11
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 11
- 125000004432 carbon atom Chemical group C* 0.000 description 10
- 238000001914 filtration Methods 0.000 description 10
- 150000002500 ions Chemical group 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 10
- 238000002441 X-ray diffraction Methods 0.000 description 9
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 9
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 8
- 238000004817 gas chromatography Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000002808 molecular sieve Substances 0.000 description 8
- 150000002924 oxiranes Chemical class 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 241000894007 species Species 0.000 description 8
- 239000004809 Teflon Substances 0.000 description 7
- 229920006362 Teflon® Polymers 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 235000011187 glycerol Nutrition 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 239000000499 gel Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 6
- 229960004063 propylene glycol Drugs 0.000 description 6
- 235000013772 propylene glycol Nutrition 0.000 description 6
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 238000001308 synthesis method Methods 0.000 description 6
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 5
- 229910000323 aluminium silicate Inorganic materials 0.000 description 5
- 238000002425 crystallisation Methods 0.000 description 5
- 230000008025 crystallization Effects 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- RYPKRALMXUUNKS-UHFFFAOYSA-N 2-Hexene Natural products CCCC=CC RYPKRALMXUUNKS-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 4
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 4
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000004299 exfoliation Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 150000001451 organic peroxides Chemical class 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 238000003918 potentiometric titration Methods 0.000 description 4
- 239000011369 resultant mixture Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 229940083957 1,2-butanediol Drugs 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LIESJAYIOKBLIL-UHFFFAOYSA-N 2-methyl-3-propyloxirane Chemical compound CCCC1OC1C LIESJAYIOKBLIL-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- BMRWNKZVCUKKSR-UHFFFAOYSA-N butane-1,2-diol Chemical compound CCC(O)CO BMRWNKZVCUKKSR-UHFFFAOYSA-N 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- 229940035437 1,3-propanediol Drugs 0.000 description 2
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 2
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 229910002808 Si–O–Si Inorganic materials 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical compound CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 2
- 235000019437 butane-1,3-diol Nutrition 0.000 description 2
- 150000001733 carboxylic acid esters Chemical class 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 150000001925 cycloalkenes Chemical class 0.000 description 2
- URYYVOIYTNXXBN-UPHRSURJSA-N cyclooctene Chemical compound C1CCC\C=C/CC1 URYYVOIYTNXXBN-UPHRSURJSA-N 0.000 description 2
- 239000004913 cyclooctene Substances 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N methylene hexane Natural products CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- QMMOXUPEWRXHJS-UHFFFAOYSA-N pentene-2 Natural products CCC=CC QMMOXUPEWRXHJS-UHFFFAOYSA-N 0.000 description 2
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000001028 reflection method Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 238000007142 ring opening reaction Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- YCTDZYMMFQCTEO-FNORWQNLSA-N (E)-3-octene Chemical compound CCCC\C=C\CC YCTDZYMMFQCTEO-FNORWQNLSA-N 0.000 description 1
- GVRWIAHBVAYKIZ-FNORWQNLSA-N (e)-dec-3-ene Chemical compound CCCCCC\C=C\CC GVRWIAHBVAYKIZ-FNORWQNLSA-N 0.000 description 1
- IICQZTQZQSBHBY-HWKANZROSA-N (e)-non-2-ene Chemical compound CCCCCC\C=C\C IICQZTQZQSBHBY-HWKANZROSA-N 0.000 description 1
- QMMOXUPEWRXHJS-HYXAFXHYSA-N (z)-pent-2-ene Chemical compound CC\C=C/C QMMOXUPEWRXHJS-HYXAFXHYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- IBTLFDCPAJLATQ-UHFFFAOYSA-N 1-prop-2-enoxybutane Chemical compound CCCCOCC=C IBTLFDCPAJLATQ-UHFFFAOYSA-N 0.000 description 1
- LWJHSQQHGRQCKO-UHFFFAOYSA-N 1-prop-2-enoxypropane Chemical compound CCCOCC=C LWJHSQQHGRQCKO-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OTTZHAVKAVGASB-HYXAFXHYSA-N 2-Heptene Chemical compound CCCC\C=C/C OTTZHAVKAVGASB-HYXAFXHYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- WHNBDXQTMPYBAT-UHFFFAOYSA-N 2-butyloxirane Chemical compound CCCCC1CO1 WHNBDXQTMPYBAT-UHFFFAOYSA-N 0.000 description 1
- OTTZHAVKAVGASB-UHFFFAOYSA-N 2-heptene Natural products CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 1
- ILPBINAXDRFYPL-UHFFFAOYSA-N 2-octene Chemical compound CCCCCC=CC ILPBINAXDRFYPL-UHFFFAOYSA-N 0.000 description 1
- IICQZTQZQSBHBY-UHFFFAOYSA-N 2t-nonene Natural products CCCCCCC=CC IICQZTQZQSBHBY-UHFFFAOYSA-N 0.000 description 1
- ZXABMDQSAABDMG-UHFFFAOYSA-N 3-ethenoxyprop-1-ene Chemical compound C=CCOC=C ZXABMDQSAABDMG-UHFFFAOYSA-N 0.000 description 1
- ZQDPJFUHLCOCRG-UHFFFAOYSA-N 3-hexene Chemical compound CCC=CCC ZQDPJFUHLCOCRG-UHFFFAOYSA-N 0.000 description 1
- FASUFOTUSHAIHG-UHFFFAOYSA-N 3-methoxyprop-1-ene Chemical compound COCC=C FASUFOTUSHAIHG-UHFFFAOYSA-N 0.000 description 1
- JSDZSLGMRRSAHD-UHFFFAOYSA-N 3-methylbutan-2-ylcyclopropane Chemical compound CC(C)C(C)C1CC1 JSDZSLGMRRSAHD-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- ZMFWTUBNIJBJDB-UHFFFAOYSA-N 6-hydroxy-2-methylquinoline-4-carboxylic acid Chemical compound C1=C(O)C=CC2=NC(C)=CC(C(O)=O)=C21 ZMFWTUBNIJBJDB-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical class CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- 101100136092 Drosophila melanogaster peng gene Proteins 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- STNJBCKSHOAVAJ-UHFFFAOYSA-N Methacrolein Chemical compound CC(=C)C=O STNJBCKSHOAVAJ-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- 241001249696 Senna alexandrina Species 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- GNKTZDSRQHMHLZ-UHFFFAOYSA-N [Si].[Si].[Si].[Ti].[Ti].[Ti].[Ti].[Ti] Chemical compound [Si].[Si].[Si].[Ti].[Ti].[Ti].[Ti].[Ti] GNKTZDSRQHMHLZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Inorganic materials [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000002146 bilateral effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- CFBGXYDUODCMNS-UHFFFAOYSA-N cyclobutene Chemical compound C1CC=C1 CFBGXYDUODCMNS-UHFFFAOYSA-N 0.000 description 1
- UCIYGNATMHQYCT-OWOJBTEDSA-N cyclodecene Chemical compound C1CCCC\C=C\CCC1 UCIYGNATMHQYCT-OWOJBTEDSA-N 0.000 description 1
- HYPABJGVBDSCIT-UHFFFAOYSA-N cyclododecene Chemical compound C1CCCCCC=CCCCC1 HYPABJGVBDSCIT-UHFFFAOYSA-N 0.000 description 1
- CGZZMOTZOONQIA-UHFFFAOYSA-N cycloheptanone Chemical compound O=C1CCCCCC1 CGZZMOTZOONQIA-UHFFFAOYSA-N 0.000 description 1
- ZXIJMRYMVAMXQP-UHFFFAOYSA-N cycloheptene Chemical compound C1CCC=CCC1 ZXIJMRYMVAMXQP-UHFFFAOYSA-N 0.000 description 1
- BESIOWGPXPAVOS-UPHRSURJSA-N cyclononene Chemical compound C1CCC\C=C/CCC1 BESIOWGPXPAVOS-UPHRSURJSA-N 0.000 description 1
- YKNMBTZOEVIJCM-UHFFFAOYSA-N dec-2-ene Chemical compound CCCCCCCC=CC YKNMBTZOEVIJCM-UHFFFAOYSA-N 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical class CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- XNMQEEKYCVKGBD-UHFFFAOYSA-N dimethylacetylene Natural products CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 1
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 239000004664 distearyldimethylammonium chloride (DHTDMAC) Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- XGZNHFPFJRZBBT-UHFFFAOYSA-N ethanol;titanium Chemical compound [Ti].CCO.CCO.CCO.CCO XGZNHFPFJRZBBT-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000895 extractive distillation Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- WZHKDGJSXCTSCK-UHFFFAOYSA-N hept-3-ene Chemical compound CCCC=CCC WZHKDGJSXCTSCK-UHFFFAOYSA-N 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052909 inorganic silicate Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000010813 internal standard method Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 238000000622 liquid--liquid extraction Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- JFZUABNDWZQLIJ-UHFFFAOYSA-N methyl 2-[(2-chloroacetyl)amino]benzoate Chemical compound COC(=O)C1=CC=CC=C1NC(=O)CCl JFZUABNDWZQLIJ-UHFFFAOYSA-N 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- AFFLGGQVNFXPEV-UHFFFAOYSA-N n-decene Natural products CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- YCBSHDKATAPNIA-UHFFFAOYSA-N non-3-ene Chemical compound CCCCCC=CCC YCBSHDKATAPNIA-UHFFFAOYSA-N 0.000 description 1
- 238000001225 nuclear magnetic resonance method Methods 0.000 description 1
- 125000002092 orthoester group Chemical group 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010421 standard material Substances 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 125000003375 sulfoxide group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M thiocyanate group Chemical group [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium(IV) ethoxide Substances [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical class CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- B01J35/30—
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B39/00—Compounds having molecular sieve and base-exchange properties, e.g. crystalline zeolites; Their preparation; After-treatment, e.g. ion-exchange or dealumination
- C01B39/02—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof; Direct preparation thereof; Preparation thereof starting from a reaction mixture containing a crystalline zeolite of another type, or from preformed reactants; After-treatment thereof
- C01B39/06—Preparation of isomorphous zeolites characterised by measures to replace the aluminium or silicon atoms in the lattice framework by atoms of other elements, i.e. by direct or secondary synthesis
- C01B39/08—Preparation of isomorphous zeolites characterised by measures to replace the aluminium or silicon atoms in the lattice framework by atoms of other elements, i.e. by direct or secondary synthesis the aluminium atoms being wholly replaced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J29/00—Catalysts comprising molecular sieves
- B01J29/89—Silicates, aluminosilicates or borosilicates of titanium, zirconium or hafnium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
- C01B37/005—Silicates, i.e. so-called metallosilicalites or metallozeosilites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B39/00—Compounds having molecular sieve and base-exchange properties, e.g. crystalline zeolites; Their preparation; After-treatment, e.g. ion-exchange or dealumination
- C01B39/02—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof; Direct preparation thereof; Preparation thereof starting from a reaction mixture containing a crystalline zeolite of another type, or from preformed reactants; After-treatment thereof
- C01B39/06—Preparation of isomorphous zeolites characterised by measures to replace the aluminium or silicon atoms in the lattice framework by atoms of other elements, i.e. by direct or secondary synthesis
- C01B39/08—Preparation of isomorphous zeolites characterised by measures to replace the aluminium or silicon atoms in the lattice framework by atoms of other elements, i.e. by direct or secondary synthesis the aluminium atoms being wholly replaced
- C01B39/085—Group IVB- metallosilicates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B41/00—Formation or introduction of functional groups containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
- C07C29/48—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by oxidation reactions with formation of hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
- C07D301/03—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
- C07D301/12—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with hydrogen peroxide or inorganic peroxides or peracids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2229/00—Aspects of molecular sieve catalysts not covered by B01J29/00
- B01J2229/30—After treatment, characterised by the means used
- B01J2229/37—Acid treatment
Definitions
- TITANOSILICATE PROCESS FOR PRODUCING TITANOSILICATE
- the present invention relates to a titanosilicate, a process for producing the titanosilicate, and a process for producing an oxidized compound using the titanosilicate.
- the present invention relates to a titanosilicate characterized in that in the infrared spectrum measured in the dehydrated state, the spectrum has an absorption band having a relative maximum value at 930 ⁇ 15 cm "1 , and also relates to a process for producing the titanosilicate, and a process for producing an oxidized compound using the titanosilicate.
- zeolite has been long a generic term of crystalline porous aluminosilicates and these are (Si0 4 ) 4" and (A10 4 ) S ⁇ having tetrahedral structures as the basic units of the structure.
- Si0 4 crystalline porous aluminosilicates
- A10 4 crystalline porous aluminosilicates
- IZA International Zeolite Association
- zeolite-like material substances other than aluminosilicate having a similar structure are dealt with as an objective substance of which structure is to be specified, and these are called a zeolite-like material.
- a structure code composed of three alphabetical capital letters derived from the names of standard substances initially used for the clarification of structure, approved by IZA, is used for the structure of zeolite. This includes those recorded in Atlas and those approved in the fifth and later editions .
- the "aluminosilicate” and “titanosilicate” as used in the present invention are not limited at all on the difference such as crystalline/non-crystalline or porous/non-porous and include “aluminosilicates” and “titanosilicates” in all properties.
- the “molecular sieve” as used in the present invention is a substance having an activity, operation or function of sieving molecules by the size and includes zeolite. This is described in detail in "Molecular Sieve” of Hyojun Kagaku Yogo Jiten (Glossary for Standard Chemistry) , compiled by Nippon Kagaku Kai, Maruzen (March 30, 1991) (Non-Patent Document 3).
- titanosilicate which is one of zeolites
- a peroxide as the oxidizing agent.
- titanosilicates TS-1 as one of crystalline titanosilicates is used in various reactions after the synthesis method thereof is disclosed in U.S. Patent 4,410,501 (Patent Document 1) and TS-1 is found to exhibit an activity in oxidation reactions using various peroxides.
- Patent Document 2 Specific examples thereof include a method disclosed in JP-B ("examined Japanese patent publication” )-4-5028 (Patent Document 2) where TS-1 is used as the catalyst in epoxidation of an olefin compound using hydrogen peroxide or an organic peroxide as the oxidizing agent.
- the structure code of TS-1 is MFI similarly to ZSM-5 which is a representative synthetic zeolite, and has an oxygen 10-membered ring.
- ZSM-5 is a representative synthetic zeolite, and has an oxygen 10-membered ring.
- an absorption band having a relative maximum value at 960 cm "1 is observed.
- the pore size is relatively small and 0.5 nm or less and therefore, the olefin compound which can be epoxidized is limited.
- JP-A non-examined Japanese patent publication
- Patent Document 3 discloses a method of epoxidating an olefin compound using a crystalline titanium-containing molecular sieve having a structure similar to aluminum-free zeolite beta (structure code: *BEA) as the catalyst and using hydrogen peroxide or an organic peroxide as the oxidizing agent.
- Non-Patent Document 4 it is reported that a cyclohexene oxide can be produced by producing a crystalline titanosilicate containing a titanium atom in the crystal structure and having a structure code MWW and oxidizing cyclohexene using hydrogen peroxide and using the obtained crystalline titanosilicate as the catalyst.
- an absorption band having a relative maximum value at 960 cm "1 is observed.
- Patent Document 1 U.S; Patent 4,410,501
- Patent Document 3 Patent Document 3
- Patent Document 4 JP-A-7-242649
- Non-Patent Document 3 Yoshio Ono and Tateaki Yajima (compilers), Zeolite no Kagaku to Kogaku (Science and Engineering of Zeolite), published by Kodansha (July 10, 2000) (Non-Patent Document 3)
- Hyojun Kagaku Yogo Jiten (Glossary for Standard Chemistry), compiled by Nippon Kagaku Kai, Maruzen (March 30 , 1991 )
- Non-Patent Document 4 (Non-Patent Document 4)
- An object of the present invention is to provide a titanosilicate usable as a catalyst in an oxidation reaction, a process for producing the titanosilicate, and a process for producing an oxidized compound by an oxidation reaction using the titanosilicate.
- a titanosilicate having an infrared absorption spectrum measured in the dehydrated state such that the absorption spectrum has an absorption band having a relative maximum value at 930 ⁇ 15 cm "1 acts effectively as the catalyst in an oxidation reaction and provides an intended oxidized compound with high selectivity.
- the present invention has been accomplished based on this discovery.
- the present invention (I) is a titanosilicate represented by the following compositional formula (1), wherein in the infrared absorption spectrum measured in the dehydrated state, the absorption spectrum has an absorption band having a relative maximum value at 930+15 cm "1 :
- compositional Formula (1) xTi0 2 « (l-x)Si0 2 (wherein x is from 0.0001 to 0.2).
- the present invention (II) is a process for producing the titanosilicate of the present invention
- the present invention (III) is a process for producing an oxidized compound, wherein an oxidation reaction of an organic compound is performed using an oxidizing agent in the presence of the titanosilicate of the present invention (I).
- the present invention comprises, for example, the following matters.
- a titanosilicate represented by the following compositional formula (1), wherein in the infrared absorption spectrum measured in the dehydrated state, the absorption spectrum has an absorption band having a relative maximum value at 930 ⁇ 15 cm "1 : [Compositional Formula (1) xTi0 2 « (l-x)Si0 2 (wherein x is from 0.0001 to 0.2).
- d/A means that the unit of the lattice spacing d is Angstrom.
- Fig. 1 is a schematic view for illustrating a process for producing a titanosilicate substance by a post-synthesis process.
- Fig. 2 is an infrared absorption spectrum of titanosilicate produced in Example 1.
- Fig. 3 is the first differential (differential of first order) spectrum of Fig. 2.
- Fig. 4 is the second differential spectrum of Fig. 2.
- Fig. 5 is an XRD pattern of the substance obtained in Example 1.
- Fig. 6 is a UV spectrum of the substance obtained in Example 1.
- Fig. 7 is an infrared absorption spectrum of the substance obtained in Comparative Example 1.
- Fig. 8 is an infrared absorption spectrum of the substance obtained in Comparative Example 2.
- Fig. 9 is infrared absorption spectra of MWW type titanosilicate substances having various Si/Ti ratios obtained in Example 7.
- Fig. 10 is an XRD pattern of Catalyst-3 substance obtained in Example 8.
- Fig. 11 is an XRD infrared absorption spectrum of Catalyst-3 substance obtained in Example 8.
- Fig. 12 is the first differential spectrum of Fig. 11.
- Fig. 13 is the second differential spectrum of Fig. 11.
- the present invention (I) is first described.
- the present invention (I) is a titanosilicate represented by the following compositional formula (1), wherein in the infrared absorption spectrum measured in the dehydrated state, the absorption spectrum has an absorption band having a relative (or local) maximum value at 930 ⁇ 15 cm "1 :
- the titanosilicate of the present invention has an infrared absorption spectrum measured in the dehydrated state, where the spectrum has an absorption band having a relative maximum value at 930 ⁇ 15 cm "1 .
- the absorption band having a relative maximum value is not limited thereto and an absorption band having a relative maximum value also at 860 ⁇ 15 cm “1 or 1,010 ⁇ 15 cm “1 may also be present.
- an absorption band having a relative maximum value at 960 cm "1 as seen in general titanosilicates can also be present in combination.
- the greatest (or maximum) value in the region of 900-950cm _1 of the absorption spectrum is present in the range of 930 ⁇ 15cm “1 (more preferably, in the range of 930 ⁇ 10cm “1 ); and that the area of the absorption band having the relative axium valve at 930 ⁇ 15 cm -1 is larger than that of the absorption band having the relative maximum value at 960cm "1 .
- the infrared absorption spectrum to be measured is characterized by an absorption spectrum wherein the absorbance corresponds to the ordinate axis, and the wave number corresponds to the abscissa axis. It is also possible to discuss the characteristic of the spectrum by using an absorption spectrum wherein the transmittance corresponds to the ordinate axis. However, in the present invention, the characteristic of the spectrum is prescribed by using the absorption spectrum, since the characteristic can be described clearly when the measured values are converted into the absorbance.
- the "absorption band having a relative maximum value” includes an absorption band having a relative maximum value in the spectrum.
- the "absorption band having a relative maximum value” also includes a case (such as shoulder peak) wherein an absorption band is present reasonably or definitely in a - Im ⁇
- This treatment is based on the following reasons. That is, in the case of silicate compounds, there is present a very strong absorption band due to Si-O-Si in a region of 1010-1250cm "1 , and an absorption band present in a region of 900-lOOOcm "1 is inevitably affected by this large absorption band to a certain extent. Therefore, when the sample to be measured has a very high concentration, or the measurement conditions are not appropriate, it is not rare that, although there is inherently an absorption band at a predetermined position, the corresponding maximum value is not practically recognized, and only a shoulder peak is recognized (or even a shoulder peak is not practically recognized).
- the method of detecting the relative maximum value should be devised.
- There is a method of detecting the relative maximum value wherein a first differential curve of the absorption spectrum and/or a second differential curve thereof is determined.
- the first differential curve thereof should cross the 0 (zero) point of the ordinate axis, and this point corresponds to the wave number providing the relative maximum value.
- dehydrated state means that water adsorbed to the substance to be measured, which becomes an interfering substance at the measurement of the infrared absorption spectrum in the vicinity of 800 to 1,200 cm “1 , is removed and a measurable state of an intended absorption band is provided.
- the titanosilicate of the present invention is in the state where adsorbed water is present, even when the absorption spectrum in the above- described specific measurement region is measured, a peak with a relative maximum value of 930 ⁇ 15 cm -1 , 865 ⁇ 15 cm “1 or 1,010 ⁇ 15 cm “2 is not observed on the spectrum. This is considered to result because the oscillation showing the peak is inhibited by the adsorbed water.
- adsorbed water in order to confirm such a peak, adsorbed water must be removed.
- the absolute amount of adsorbed water on the substance to be measured is not a problem and it is sufficient if a state of enabling the measurement of the infrared absorption spectrum in that region is provided.
- the "dehydrated state" as used herein can be attained by a treatment for about 1 hour while heating at 500°C under a pressure of 10 "3 Pa. More specifically, this state can be realized by adding an appropriate amount of potassium bromide to a titanosilicate sample, forming the mixture into pellets, setting the pellets in a quartz-made cell, and heating and thereby degassing the cell for 1 hour at 500°C under a pressure of 10 "3 Pa.
- Transmission method is preferred as the measuring method.
- a diffuse reflection method can also be used, but in this case, it is necessary to adopt a method capable of detecting a minute absorption band, e.g., by modifying the spectrum by a Kubelka-Munk method. It is at least necessary to use a Fourier transformation type apparatus. Further, the measurement should be conducted under a condition corresponding to a resolution of 4cm "1 or less, more preferably 2cm "1 or less.
- the ratio of Ti0 2 and Si0 2 present as constituent units can be specified by the molar ratio.
- x means the molar ratio of Ti0 2 present in the titanosilicate and (1-x) is the molar ratio of Si0 2 present.
- x/(l-x) merely shows the molar ratio of titanium/silicon and does not deny the presence of other elements in the titanosilicate.
- x is from 0.0001 to 0.2, preferably from 0.001 - 0.2, more preferably from 0.005 to 0.2, most preferably from 0.01 to 0.1.
- titanium species present in the site out of the crystal framework for example, 6- coordination titanium species or anatase-like titanium oxide may coexist, however, these titanium species outside the framework generally accelerate the side reaction or narrow the pore to inhibit the diffusion of reactant and therefore, the amount of these species present may preferably be small.
- the specified x is assumed to be the ratio of silicon contained inside the framework, however, in the case where titanium is present outside the framework in addition to titanium inside the framework, it is actually difficult to precisely determine the titanium contained inside the framework.
- the absorption in the vicinity of 210 nm is assigned to titanium inside the framework
- the absorption in the vicinity of 260 nm is assigned to 6- coordination titanium species outside the framework
- the absorption in the vicinity of 330 nm is assigned to anatase-like titanium species.
- the titanosilicate contains titanium inside the framework.
- the titanosilicate of the present invention (I) has an absorption in the vicinity of 220 nm and this reveals that titanium is present inside the framework.
- the ratio of these titanium species present cannot be quantitatively discussed even by combining it with other means such as nuclear magnetic resonance method or infrared absorption method.
- the value in the molar ratio of titanium to silicon calculated from the proportions of titanium and silicon obtained after the composition analysis by elementary analysis or the like is the relative maximum value of the amount of titanium contained inside the framework.
- the molar ratio of titanium contained inside the framework is difficult to directly determine.
- the molar ratio of titanium and silicon calculated as x in compositional formula (1) by the analysis of composition is used as the molar ratio of titanium contained inside the framework.
- the titanosilicate of the present invention (I) where silicon is substituted by titanium may contain other elements in addition to titanium, silicon and oxygen insofar as these elements do not so much adversely affect the reactivity of titanosilicate.
- titanium silicate of the present invention (I) by the production process using boron as the structure supporting agent, which is described later, a very small amount of boron may remain even if an operation of removing boron is performed.
- boron does not so much adversely affect the reactivity of titanosilicate and therefore, may be substantially present.
- other trivalent metals such as aluminum, gallium, iron and chromium can also be used as the structure supporting agent in place of boron and if the case is so, a very small amount of such an element sometimes remains inside and outside the framework.
- alkali metals such as sodium and potassium are generally expected to act as a mineralizer and therefore, can also be used for the purpose of accelerating the crystallization at the production of titanosilicate of the present invention (I).
- alkali metals inhibit the catalytic function of crystalline titanosilicate and are preferably removed by ion exchanging, acid treatment, or the like.
- the structure code MWW is one of known molecular sieve structures and is greatly characterized by having a pore composed of an oxygen 10-membered ring, and a super cage (0.7x0.7x1.8 nm) . Details on the structure are described, for example, in Atlas, 5th ed.
- the molecular sieve having the structure code MWW can be identified by its characteristic pattern on the X-ray diffraction (hereinafter simply referred to as "XRD").
- XRD X-ray diffraction
- Table 2 Powder X-Ray Diffraction Lines Provided by
- the present invention (II) is described below.
- the present invention (II) is a process for producing the titanosilicate, comprising the following first to fourth steps : First Step: a step of heating a mixture containing a template compound, a boron-containing compound, a silicon- containing compound and water to obtain a precursor (A) ; Second Step: a step of acid-treating the precursor (A) obtained in the first step; Third Step: a step of heating the acid-treated precursor (A) obtained in the second step together with a mixture containing a template compound, a titanium-containing compound and water to obtain a precursor (B); and Fourth Step: a step of calcining the precursor (B) obtained in the third step to obtain the titanosilicate.
- Crystalline MWW-type titanosilicates in general can be synthesized by a conventionally known direct synthesis method or a post synthesis method such as atom planting.
- a molecular sieve having an MWW structure containing boron or aluminum is first synthesized, then at least a part of boron or aluminum is removed by a water vapor treatment, and the residue is contacted with a titanium compound such as titanium tetrachloride.
- the titanosilicate of the present invention can be produced only by the production process of the present invention (II) so far.
- the production process of titanosilicate of the present invention (II) is characterized in that the step of producing the titanosilicate comprises four steps, that is, a step of heating a mixture containing a template compound, a boron-containing compound, a silicon-containing compound and water to obtain a precursor (A) ; a step of acid- treating the obtained precursor (A) ; a step of heating the obtained acid-treated precursor (A) together with a mixture containing a template compound, a titanium- containing compound and water to obtain a precursor (B); and a step of finally calcining the obtained precursor (B) to produce the titanosilicate.
- a step other than these may be provided between respective steps.
- the first step is described below.
- the first step in the production process of titanosilicate of the present invention (II) is a step of heating a mixture containing a template compound, a boron-containing compound, a silicon-containing compound and water to obtain a precursor (A) .
- the "template compound” used here is a compound having an activity of specifying the structure, particularly the pore shape at the synthesis of a zeolite having an MWW structure. This compound is not particularly limited as long as it can be removed later by calcination. Examples thereof generally include a nitrogen-containing compound, and preferably amine and/or quaternary ammonium compound. Specific examples thereof include piperidine, hexamethylenei ine and/or a mixture thereof, however, the present invention is not limited thereto.
- the boron compound which can be used in the first step is not particularly limited. Preferred specific examples thereof include boric acid, however, this can be used also in the form of a borate such as sodium borate.
- the silicon-containing compound which can be used in the first step is not particularly limited and specific examples thereof include silicic acid, silicate, silicon oxide, silicon halide, fumed silicas, tetraalkyl orthosilicates and colloidal silica. In any case, a high-purity compound is preferred but particularly in the case of colloidal silica, a colloidal silica having a small alkali content is preferred.
- a seed crystal in addition to these raw materials. In this case, it is sometimes possible to expect an effect of shortening the crystallization time or providing a product having a small particle size.
- the seed crystal it is preferred to use a substance having an MWW structure or a structure similar to MWW such as precursor therefor having a layered structure (e.g., MCM-22 (P)), which has preliminarily been synthesized. It is particularly preferred to use a layered-structure precursor for an MWW type zeolite substance containing boron. For example, it is possible to add a part of a precursor (A) obtained in the past first step, to a mixture to be used in the first step as the seed crystal.
- the timing for the addition thereof is not particularly limited, but it is possible that all the other raw materials are mixed, the seed crystal is added to the resultant mixture, and thereafter the mixture is stirred and then heated.
- alkali metal can provide a tendency such that it can inhibit the introduction of an element other than boron, aluminum, and silicon into the framework of a zeolite substance, or it can promote the reaction of a compound including titanium in itself to form titania or similar compound. It is a well-known fact that titanium does not enter the zeolite framework in a good manner, if an alkali metal is present in the system in the case of synthesis of titanosilicate such as TS-1, and the added titanium source is incorporated the product as titania or the species similar to titania.
- the alkali metal source there are hydroxides, nitric acid salts, chlorides, sulfuric acid salts, salt of other metal acid, but a hydroxide or borate may most preferably be used.
- the heating temperature in the first step is not particularly limited. However, in the case of synthesizing a precursor (A) , this may preferably be performed under the hydrothermal reaction conditions.
- hydrothermal reaction means, as described in "Hydrothermal Reaction” of Hyojun Kagaku Yogo Jiten (Glossary for Standard Chemistry) , compiled by Nippon Kagaku Kai, Maruzen (March 30, 1991), a synthesis or modification reaction performed in the presence of high-temperature water, particularly high-temperature high-pressure water.
- a synthesis reaction using the hydrothermal reaction is referred to as “hydrothermal synthesis”.
- the heating in the first step may preferably be performed by placing a mixture containing a template compound, a boron- containing compound, a silicon-containing compound and water in a closed container such as autoclave, under hydrothermal synthesis conditions of applying a pressure while heating.
- the temperature may preferably be from 110 to 200°C, more preferably from 120 to 190°C. If the temperature in the hydrothermal synthesis is less than this range, the intended product may not be obtained or even if obtained, the heating may take a long time and this is not practical. On the other hand, if the temperature exceeds this range, the purity of the finally obtained titanosilicate disadvantageously decreases .
- the hydrothermal synthesis is usually used for a time period of 2 hours to 30 days.
- the hydrothermal synthesis time may preferably be from 3 hours to 10 days. If the hydrothermal synthesis time is less than this range, crystallization may proceed insufficiently to fail in obtaining a high-performance precursor (A) . On the other hand, even if the hydrothermal synthesis is performed for a time period exceeding this range, the performance of the precursor (A) is not substantially enhanced but rather adverse effects may be caused such as conversion into other phase or increase of the particle size and this it not preferred.
- the second step is described below.
- the second step is a step of acid-treating the precursor (A) obtained in the first step or first-2 step to obtain a deboronated silicate.
- the precursor (A) obtained in the first step may be subjected as it is to the acid treatment but when the precursor is calcined (first-2 step) before the acid treatment and thereafter acid-treated, boron inside the framework can be more efficiently removed.
- the precursors (A) obtained in the first step and first-2 step are inclusively referred to as "precursor (A)".
- the term "acid treatment” as used herein means contacting with an acid, more specifically, to contact a solution containing an acid, or an acid itself with the precursor (A) obtained in the first step.
- the contacting method is not particularly limited and a method of spraying or coating an acid or an acid solution on the precursor (A) or a method of dipping the precursor (A) in an acid or an acid solution may be used.
- the method of dipping the precursor (A) in an acid or an acid solution is preferred because this method is simple and easy.
- the acid used for this step may be an inorganic acid, an organic acid or a salt thereof.
- Specific preferred examples of the inorganic acid include a hydrochloric acid, a sulfuric acid, a nitric acid and a phosphoric acid.
- Specific preferred examples of the organic acid include a formic acid, an acetic acid, a propionic acid and a tartaric acid.
- the salt thereof include an ammonium salt.
- the solvent therefor is not particularly limited.
- the solvent include water, alcohols, ethers, esters and ketones. Among these, water is suitable..
- the acid concentration is also not particularly limited but the acid is suitably used in a concentration of 0.1 to 10 mol/liter.
- the treatment may be performed at a temperature of 0 to 200 °C but may preferably be performed at 50 to 180°C, more preferably from 60 to 150 °C.
- the treatment time is from 0.1 hour to 3 days, preferably from 2 hours to 1 day.
- the third step is described below.
- the third step is a step of heating the deboronated silicate obtained in the second step together with a mixture containing a template compound, a titanium-containing compound and water to obtain a precursor (B).
- the "template compound” as used herein is, similarly to that used in the first step, a compound having an activity of specifying the structure, and/or pore shape at the synthesis of a zeolite having an MWW structure.
- This compound is not particularly limited as long as it can be removed later by calcination.
- Examples thereof generally include a nitrogen-containing compound and specific examples thereof include piperidine, hexamethyleneimine and/or a mixture thereof, however, the present invention is not limited thereto.
- the template compound used in the third step may be the same as or different from the template compound used in the first step.
- the titanium-containing compound which can be used in the third step is not particularly limited.
- Specific examples of the titanium-containing compound include titanium oxide, titanium halide and tetraalkyl orthotitanates , however, the present invention is not limited thereto.
- titanium halide and tetraalkyl orthotitanates are preferred in view of easy and simple handleability.
- Specific suitable examples thereof include titanium tetrafluoride, tetraethyl orthotitanate, tetrapropyl orthotitanate and tetrabutyl orthotitanate.
- a water-soluble titanium peroxide which is provided by reacting a titanium compound and hydrogen peroxide is an example of the preferred compound.
- the precursor (B) obtained in the third step can be synthesized by previously mixing all of the acid-treated precursor (A) obtained in the second step, a template compound, a titanium-containing compound and water and heating the mixture to perform a so-called hydrothermal synthesis similarly to the first step.
- the order of mixing is not particularly limited.
- a mixture liquid comprising water, a template compound, and element-containing compound is prepared, and the acid treated precursor (A) provided in the second step is added to the resultant mixture.
- the mixture liquid comprising water, a template compound, and the element-containing compound may preferably be a uniform solution rather than slurry, and it is desirable to devise the kind and concentration of the element- containing compound or mixing condition (temperature, time) so as to achieve such a solution.
- the same conditions as described for the first step may be applied.
- a compound containing titanium is co-present in the third step, it is possible that the adequate synthesis condition is considerably different from that in the first step.
- the third step it is also possible to use a so-called dry gel method wherein a mixture (mixture X) of the acid-treated precursor and the element-containing compound provided in the second step, and a mixture of water and the template compound (mixture Y) are charged separately, and the mixture (mixture X) of the acid-treated precursor provided in the second step and the metal-containing compound is caused to contact the vapor of water and the template compound.
- a so-called dry gel method wherein a mixture (mixture X) of the acid-treated precursor and the element-containing compound provided in the second step, and a mixture of water and the template compound (mixture Y) are charged separately, and the mixture (mixture X) of the acid-treated precursor provided in the second step and the metal-containing compound is caused to contact the vapor of water and the template compound.
- the mixture X can be obtained by a method wherein a solution of an element-containing compound is dispersed in the acid-treated precursor obtained in the second step as uniformly as possible by use of impregnation, dipping, etc., then dried, and pulverized as desired. It is preferred to use a titanium-containing compound which can be formed into a homogeneous solution. For example, it is preferred to use a compound such as titanium peroxide which can be obtained by reacting an alkoxy titanium and aqueous hydrogen peroxide.
- the drying can be conducted by various methods such as air drying at room temperature, vacuum drying at high temperature. In general, an aqueous solution is frequently used, and therefore it is sufficient to effect the drying at 50-
- the end point of the drying is such that the product in a crushable state.
- the mixture Y may be obtained by mixing a template compound and water.
- the kind of the template compound to be used, the kind of the element-containing compound to be co-present, the ratio of the element being co-present to silicon in the precursor, and the ratio of the template compound to silicon in the precursor may be the same as those as described in the case of the above- described normal hydrothermal synthesis.
- the method of charging the mixture X and the mixture Y may be any method, as long as the mixture X and the mixture Y cannot be mixed with each other unless the mixture Y is heated to be vaporized.
- the same conditions as described for the first step may be applied.
- third-3 step a step of heating the precursor (B) obtained in the third step or acid treated precursor obtained in the third-2 step in the presence of a swelling agent so as to swell the layered precursor, to thereby modify the state of the superposition of layers.
- precursors (B) obtained in any of the third step, third-2 step and third-3 step are inclusively referred to as “precursor (B)", in some casses .
- the "swelling agent" to be used in the third-3 step is an agent having an action of penetrating into a position between layers of a layered precursor for an MWW- ype zeolite substance, by intercalation, etc., and as a result, enlarging the distance between the layers to thereby swell the precursor.
- the swelling agent is not particularly limited, as long as it can be removed by calcination. In general, it is possible to use a surfactant, preferably a quaternary ammonium salt or amine having at least one long alkyl group.
- Particularly preferred examples thereof may include trimethyl ammonium salt and triethyl ammonium salt having one alkyl chain of 8-20 carbon atoms, dimethyl ammonium salt or diethyl ammonium salt having two of such an alkyl chain. Further, it is also p'ossible to use a primary or secondary amine compound having at least one alkyl chain of 8-20 carbon atoms, or mixtures thereof. In the case of quaternary ammonium salt, it may be any of chloride, bromide, hydroxide, and iodide.
- halide it is preferred to use a product obtained by hydrolyzing at least a part of the halide to be converted into hydroxide, in the co-presence of aqueous ammonia or another quaternary ammonium salt such as tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, and tetrapropyl ammonium hydroxide.
- aqueous ammonia or another quaternary ammonium salt such as tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, and tetrapropyl ammonium hydroxide.
- the swelling agent may include lauryl trimethyl ammonium chloride, bromide, hydroxide, cetyl trimethyl ammonium chloride, bromide, hydroxide, stearyl trimethyl ammonium chloride, bromide, hydroxide, distearyl dimethyl ammonium chloride, bromide, hydroxide, etc.
- the temperature in the third-3 step is not particularly limited, but it is preferred to use room temperature to 170°C, more preferably 50-150°C. When the temperature is too high, the precursor can be dissolved in some cases, and therefore it is necessary to search a suitable condition, e.g., by relatively lowering the pH.
- a pH range of 10-14 is suitable at the time of the processing in the third-3 step.
- the "pH at the time of the processing” refers to the pH value obtained by measuring the resultant mixture at room temperature after mixing the acid-treated precursor, swelling agent, others, water or all of the additives such as quaternary ammonium hydroxide.
- the processing time is not particularly limited, but 5 minutes to two days is suitable.
- the swollen layered precursor is agitated further vigorously, or the precursor is irradiated with ultrasonic waves so as to effect layer exfoliation (delamination) of at least a part of the layered precursor, to thereby form a so-called card house type structure.
- the precursor by using an ultrasonic irradiation machine having an output of 50 W or more, for 10 minutes to 2 hours .
- the slurry after the layer exfoliation can be recovered as such by filtration and centrifugal separation, but it is possible that an acid is added to the liquid to lower the pH to about 2 so as to promote the precipitation of solid contents, and then the solid contents are separated from the processed liquid and recovered.
- the third-3 step may be conducted after the third-2 step. It is also possible to conduct the third-3 step after the third step, without conducting the third-2 step.
- the fourth step is described below.
- the fourth step is a step of calcining the precursor (B) obtained in any of the third step, third-2 step and third-3 step to obtain the titanosilicate.
- the method for the calcination of precursor performed between the first step and the second step (first-2 step) and in the fourth step is not particularly limited and the calcination can be performed under conditions known for normal catalyst calcination.
- the calcination may be performed in a closed system or a flow system and as long as an oxygen necessary for the burning of the template compound is present.
- the calcination in the air is most easy, but it is also possible that for the purpose of avoiding the excessive heat production, the precursor is heated to a predetermined temperature in an inert gas stream such as nitrogen to degrade the template inside, and then oxygen is introduced to thereby remove the residue by burning.
- the calcination temperature may preferably be from 200 to 700°C, more preferably from 300 to 650°C, most preferably from.400 to 600 °C. If the calcination temperature is less than 200 °C, the template compound may not be satisfactorily removed, whereas if it exceeds 700°C, the MWW-type crystal structure may be broken and this disadvantageously causes an adverse effect on the precursor performance in the case of calcination between the first step and the second step and on the titanosilicate in the case of calcination of the fourth step.
- the temperature rising rate at the calcination may preferably be l°C/min but is not limited thereto if breakage of the MWW-type crystal structure does not occur.
- titanosilicate of the present invention (II) is described in more detail below.
- the production process of an MWW-type zeolite substance of the present invention (I) is described more specifically below, while referring to Fig. 1 as a view for schematically showing the series of these steps. Referring to Fig.
- the production process of the present invention (I) is a method wherein a layered precursor (A) to be converted into an MWW-type borosilicate is synthesized from a boric acid and a silicon-containing compound using piperidine or hexamethyleneimine as the template (the above procedure is the first step), and acid-treating the layered precursor borosilicate (the above procedure is the second step) to synthesize a deboronated silicate (acid-treated precursor). Prior to the second step, it is also possible to calcine the layered precursor to be converted into the MWW-type borosilicate (the first-2 step).
- Fig. 1 is a view for schematically showing the series of these steps.
- the titanosilicate which can be obtained by the production process of the present invention (II) can be used as it is as a catalyst in an oxidation reaction, however, the anatase phase generated as a result of condensation of titanium itself present in the titanosilicate obtained by the production process and not contributing to the oxidation reaction can be at least partially removed by contacting it with an acid. By this contacting with an acid, a titanosilicate catalyst having higher performance can be obtained.
- the contacting with an acid as used herein is effective even if it is performed before or after or both before and after the calcination in the fourth step, but this treatment is most effective when applied in the precursor. state before the calcination (third-2 step) .
- this treatment is most effective when applied in the precursor. state before the calcination (third-2 step) .
- the production of anatase phase as a byproduct can be greatly inhibited.
- the "contacting with an acid” used here and the “contacting with an acid” described with respect to the second step have the same meaning and as for the contacting method, the acid used for the contacting, the concentration of acid used for the contacting, the timing of contacting and when the acid is used as a solution, the solvent and the like, the conditions described with respect to the second step can be applied.
- the present invention (III) is described below.
- the present invention (III) is a process for producing an oxidized compound, comprising performing an oxidation reaction of an organic compound using an oxidizing agent in the presence of the titanosilicate of the present invention (I) .
- the oxidizing agent which can be used in the present invention (III) specifically includes, for example, oxygen or peroxides.
- the peroxide include hydrogen peroxide and an organic peroxide.
- the organic peroxide include tert-butyl hydroperoxide, tert-amyl hydroperoxide, cumene hydroperoxide, ethylbenzene hydroperoxide, cyclohexyl hydroperoxide, methylcyclohexyl hydroperoxide, tetralin hydroperoxide, isobutylbenzene hydroperoxide, ethylnaphthalene hydroperoxide and peracetic acid, however, the present invention is not limited thereto.
- peroxides may be used in combination of two or more thereof.
- ammonia may be added to the peroxide.
- the peroxide is most preferably hydrogen peroxide.
- An aqueous hydrogen peroxide solution having a concentration of 30 mass%, 60 mass% or 90 mass% can be used.
- the amount of the peroxide added is not particularly limited and may be equivalent or more to the carbon-carbon double bond or carbon-oxygen double bond contained in the organic compound as the raw substance subjected to the oxidation reaction or depending on the conditions, may be equivalent or less.
- the organic compound used in the a process for producing an oxidized compound of the present invention (III) may or may not contain one or more other functional group as long as it is a compound having a carbon-carbon double bond or carbon-oxygen double bond within one molecule.
- the "other functional group” of course includes a carbon-carbon double bond or carbon- oxygen double bond.
- the other functional group include an alkenyl group, an alkynyl group, an aryl group, an arene group, an alcohol group, a phenol group, an ether group, an epoxide group, a halogen group, an aldehyde group, a ketone group, a carbonyl group, an ester group, an amide group, a cyanate group, an isocyanate group, a thiocyanate group, an amine group, a diazo group, a nitro group, a nitrile group, a nitroso group, a sulfide group, a sulfoxide group, a sulfone group, a thiol group, an orthoester group, a urea group and an i ino group, however, the present invention is not limited thereto.
- the compound may have two or more same functional groups or may have two or more kinds of functional groups .
- organic compound examples include alkenes having from 2 to 10 carbon atoms, cycloalkenes having from 4 to 10 carbon atoms, allyl ethers, compounds having 3 to 10 carbon atoms, ethers of polyhydric alcohol, cycloalkanones having from 4 to 10 carbon atoms and carboxylic acid esters. Of course, a mixture of two or more thereof may be used.
- examples of the alkenes having from 2 to 10 carbon atoms include ethylene, propylene, butene, pentene, hexene, heptene, octene, nonene, decene, 2-butene, isobutene, 2-pentene, 3-pentene, 2-hexene, 3- hexene, 4-methyl-l-pentene, 2-heptene, 3-heptene, 2- octene, 3-octene, 2-nonene, 3-nonene, 2-decene and 3- decene.
- Examples of the cycloalkenes having from 4 to 10 carbon atoms include cyclobutene, cyclopentene, cyclohexene, cycloheptene, cyclooctene, cyclononene and cyclodecene.
- allyl ethers examples include allyl methyl ether, allyl ethyl ether, allyl propyl ether, allyl butyl ether, allyl vinyl ether and diallyl ether.
- compounds having from 3 to 10 carbon atoms include allyl alcohol, allyl bromide, allyl chloride, acrolein, methacrolein and acrylic acid.
- ethers of polyhydric alcohol examples include ethylene glycol monoalkenyl ether, ethylene glycol dialkenyl ether, 1 , 2-propanediol monoalkenyl ether, 1,2- propanediol dialkenyl ether, 1 ,3-propanediol monoalkenyl ether, 1 , 3-propanediol dialkenyl ether, 1, 2-butanediol monoalkenyl ether, 1, 2-butanediol dialkenyl ether, 1,3- butanediol monoalkenyl ether, 1 ,3-butanediol dialkenyl ether, 1,4-butanediol monoalkenyl ether, 1, 4-butanediol dialkenyl ether, pentaerythritol monoalkenyl ether, pentaerythritol dialkenyl ether, pentaerythritol trialkenyl
- carboxylic acid esters examples include allyl formate, allyl acetate, allyl tartrate, allyl propionate and allyl methacrylate.
- the combination of the organic compound and the oxidizing agent used in the a process for producing an oxidized compound of the present invention (III) is most preferably a combination such that the organic compound is one or more compound selected from the group consisting of propylene, diallyl ether, allyl alcohol, allyl chloride, allyl acetate, allyl methacrylate, cyclohexene and cyclohexanone and the oxidizing agent is hydrogen peroxide.
- the amount of titanosilicate used as the catalyst in the a process for producing an oxidized compound of the present invention (III) is not particularly limited.
- the preferred range thereof varies depending on the kind of oxidation reaction, the reaction temperature, the reactivity and temperature of substrate, the peroxide concentration, the kind and concentration of solvent, and the reaction form (batch system or continuous system) .
- the amount of titanosilicate is, in terms of the concentration in the reactant mixture, suitably from 0.1 to 20 mass%, preferably from 0.5 to 10 mass%.
- titanosilicate may preferably be used in an apparent catalytic amount larger than this range.
- the titanosilicate used as the catalyst is not particularly limited on the form and may be used in the form of powder, fine sphere, pellet or extrusion-molded article or may be supported on a support.
- a binder may be used.
- the binder and the support each may preferably be a substantially non-acidic or weakly acidic substance which does not accelerate the decomposition reaction of the peroxide or the intended oxide .
- the oxidation reaction in the a process for producing an oxidized compound of the present invention (III) may be performed without using a solvent or in the presence of an appropriate solvent.
- the appropriate solvent include alcohols, ketones, nitriles and water.
- the alcohols include methanol, ethanol, 1-propanol, 2- ⁇ ropanol, 1-butanol, 2- butanol, tert-butanol, amyl alcohol, ethylene glycol, propylene glycol and 1,2-butanediol.
- Specific examples of the ketones include acetone, methyl ethyl ketone and diethyl ketone.
- nitriles include acetonitrile, pripionitrile and benzonitrile. These solvents may be used individually or as a mixture. Among these solvents, preferred are acetone, acetonitrile and water, more preferred is acetonitrile.
- the reaction temperature at the oxidation reaction in the a process for producing an oxidized compound of the present invention (III) is not particularly limited and may preferably be from 0 to 150 °C, more preferably from 10 to 100°C.
- the reaction temperature is less than 0°C, the reaction rate is low and not practical, whereas if it exceeds 150 °C, the decomposition reaction of the peroxide seriously occurs and also, the decomposition reaction of the intended product may be disadvantageously accelerated.
- the oxidation reaction is generally an exothermic reaction and therefore, the heat of reaction may preferably be removed by an appropriate method so as to control the reaction temperature in a constant range.
- the reaction pressure is not particularly limited.
- the oxidation reaction in the a process for producing an oxidized compound of the present invention (III) may be performed in a batch system, a continuous system or a semi-continuous system using an appropriate reactor or reaction device such as fixed bed, transporting bed, stirring slurry or CSTR reactor and any method may be used.
- the mixture comprising titanosilicate as the catalyst, an organic compound as the substrate and a peroxide may be mixed all at once or in sequence.
- the desired oxidized compound can be separated by a separation purification method in the normal purification step. More specifically, for example, when the reaction is preformed in a batch system, the oxidized compound can be separated and recovered from the reaction mixture using an arbitrary known method such as fractional distillation, extractive distillation and liquid-liquid extraction after the amount of the oxidized compound produced reaches the desired level.
- the titanosilicate catalyst can be recovered by an appropriate method such as filtration or centrifugation and the recovered catalyst can be reused as the catalyst in the oxidation reaction.
- the titanosilicate catalyst can be easily separated, while being held in the reactor, from the product oxidized compound, solvent, unreacted raw substance organic compound and peroxide.
- the recovered titanosilicate catalyst, unreacted raw substance organic compound and peroxide can be again used after these are purified by an appropriate method or without passing through the purification.
- the recovered titanosilicate catalyst for use in the present invention decreases in the activity on repeated use and does not exhibit the initial activity.
- the recovered catalyst must be regenerated.
- the regeneration of the recovered catalyst can be performed by a conventionally known method. More specifically, the recovered catalyst can be regenerated to the initial activity, for example, by calcining it in air at a temperature of 100 to 600°C. [Examples ]
- the conversion of allyl alcohol is shown by a molar ratio of allyl alcohol consumed in the reaction to the allyl alcohol charged before the reaction.
- the allyl alcohol consumed in the reaction was calculated from the increase or decrease of allyl alcohol between before and after the reaction. At this time, the allyl alcohol was determined quantitatively by using the GC (gas chromatography) method as described hereinafter.
- the selectivity of glycidol is shown by a molar ratio of glycidol and glycerin calculated from the analysis results of the filtrate after the reaction. At this time, the glycidol and glycerin were determined quantitatively by using the GC method as described hereinafter.
- Calculation Method of Conversion of Hydrogen Peroxide The conversion of hydrogen peroxide is shown by a ratio of hydrogen peroxide consumed in the reaction to the hydrogen peroxide charged before reaction. The hydrogen peroxide consumed in the reaction was calculated from the increase or decrease of hydrogen peroxide between before and after the reaction. At this time, the hydrogen peroxide was determined quantitatively by using the titration method as described hereinafter.
- the efficiency of hydrogen peroxide is shown by a ratio of hydrogen peroxide consumed in the reaction excluding the hydrogen peroxide consumed in the decomposition into oxygen, namely, a ratio of hydrogen peroxide consumed in the epoxidation reaction out of the hydrogen peroxide consumed.
- This yield is an yield of epoxide compound as an intended oxidized compound, based on hydrogen peroxide, after the completion of oxidation reaction using hydrogen peroxide and shown by a molar ratio of the amount of the epoxy compound produced to the hydrogen peroxide charged.
- Analysis Method of Titanosilicate Element Titanosilicate was weighed into a Teflon (registered trademark of E.I. du Pont de Nemours and Company) beaker and hydrofluoric acid (50 mass%) was added and dissolved. Pure water was added thereto and the component analysis was performed using a desk-type inductively coupled plasma spectrometer (JY38S) manufactured by Rigaku. Measuring Method of Infrared Absorption Spectrum of Titanosilicate
- the ultraviolet visible absorption spectrum of a sample was measured by a diffuse reflection method by use of the following apparatus, and conditions.
- Apparatus JASCO UV/VIS spectrometer V-550 mfd. by Nihon Bunko Company
- the concentration was measured by the following gas chromatography analyzer under the following conditions.
- the analysis was performed according to an internal standard method by injecting a 0.4 ⁇ l portion of the analysis solution which was obtained by adding 1 ml of 1,4-dioxane as the internal standard to 10 ml of the reaction solution.
- Gas chromatography
- GC-14B manufactured by Shimadzu Corporation
- Column capillary column TC-WAX (length: 30 m, inner diameter: 0.25 mm, membrane thickness: 0.25 ⁇ m)
- Carrier gas nitrogen (split ratio: 20, column flow rate: 2 ml/min)
- Temperature conditions The detector and the vaporization chamber were at a temperature of 200 °C, and the column temperature was kept at 50 °C for 5 minutes from the start of analysis, then elevated to 150°C at a temperature rising rate of 10°C/min, kept at 150°C for 10 minutes, thereafter elevated to 200°C at a temperature rising rate of 10°C/min, and kept for 25 minutes.
- Detector :
- a potentiometric titration was performed using an auto-potentiometric titrator AT-012 manufactured by Kyoto Denshi Kagaku Kogyo and using a Ce( IV) -containing solution as the titration reagent.
- Example 1 Production of Catalyst 1
- This mixture was transferred to a 2 liter-volume Teflon (registered trademark of E.I. du Pont de Nemours and Company) -made autoclave and stirred for 120 hours at a rotation speed of 100 rpm at a temperature of 170 °C. After stopping the rotation, the contents were cooled to 25 °C and the solid product was separated from the contents by filtration and washed with ion exchanged water. The washing was repeated until the pH of the washing water became 9 or less. The obtained solid product was dried at a temperature of 80 °C and calcined at a temperature of 600 °C.
- Teflon registered trademark of E.I. du Pont de Nemours and Company
- the resulting solid product was subjected to an acid treatment for 20 hours at a temperature of 100 °C by adding 30 ml of 6 mol/liter nitric acid per g of the solid product. After the completion of acid treatment, the product was filtered and the obtained solid was calcined for 10 hours at a temperature of 600 °C. The boron/silicon molar ratio of this solid (Deborosilicate A) was 0.0217. This solid was further subjected to an acid treatment- at a temperature of 100 °C for 20 hours by adding 30 ml of 6 mol/liter nitric acid per g of the solid.
- the solid (Deborosilicate B) obtained by filtration after the completion of acid treatment had a boron/silicon molar ratio of 0.0017.
- PI produced by Wako Pure Chemical Industries, Ltd., purity: 98%) was dissolved at 25 °C to prepare an aqueous PI solution.
- tetrabutyl orthotitanate produced by Wako Pure Chemical Industries, Ltd., purity: 95%) was added while vigorously stirring.
- This mixture was transferred to a 150 ml-volume Teflon (registered trademark of E.I. du Pont de Nemours and Company) -made autoclave and stirred for 158 hours at a rotation speed of 40 rp at a temperature of 175 °C. After stopping the rotation, the contents were cooled to 25 °C and the solid product was separated from the contents by filtration and washed with ion exchanged water. The washing was repeated until the pH of the washing water became 9 or less. The obtained solid product was dried at a temperature of 80 °C and subjected to an acid treatment for 20 hours at a temperature of 100°C by adding 20 ml of 2 mol/liter nitric acid per g of the solid product.
- Teflon registered trademark of E.I. du Pont de Nemours and Company
- Fig. 2 shows the spectrum.
- Figs. 3 and 4 are respectively the first differential spectrum of this absorbance spectrum, and the second differential spectrum of this absorbance spectrum.
- This solid mixture was placed in a 5 ml-volume Teflon (registered trademark of E.I. du Pont de Nemours and Company) -made beaker and the beaker was transferred to a 50 ml-volume Teflon (registered trademark of E.I. du Pont de Nemours and Company) -made beaker and the beaker was transferred to a 50 ml-volume Teflon (registered trademark of E.I. du Pont de Nemours and Company) -made beaker and the beaker was transferred to a 50 ml-volume Teflon (registered trademark of E.I. du
- the product was filtered and the obtained solid was calcined for 10 hours at a temperature of 600 °C to obtain an MWW-type titanosilicate catalyst as the final intended product.
- the titanium/silicon molar ratio of this titanosilicate catalyst was 0.0167 and the boron/silicon molar ratio was 0.0018.
- the infrared absorption spectrum was measured in the dehydrated state and on the spectrum, an absorption band having a relative maximum value at 930 cm "1 was observed.
- Example 3 Production of Oxidized Compound Using Titanosilicate Catalyst 1
- a 20 ml-volume three-neck flask equipped with a thermometer, a reflux condenser and a magnetic stirrer 0.58 g (10 mmol) of allyl alcohol and 3.9 g (5 ml) of acetonitrile were added and then the MWW-Type titanosilicate catalyst (50 mg) prepared in Example 1 was charged.
- the mixture was heated in a hot bath at 60 °C and vigorously stirred. Immediately after the temperature of the reaction mixture reached 57°C, 1.1 g (10 mmol as hydrogen peroxide) of an aqueous 30 mass% hydrogen peroxide solution was added to the system.
- reaction start time By setting the reaction start time to this point, the stirring was continued until the passing of 30 minutes from the start of reaction. After 30 minutes from the start of reaction, the reaction mixture was immediately cooled with ice bath to stop the reaction. Thereafter, the reaction mixture was filtered to separate unreacted allyl alcohol, unreacted hydrogen peroxide, water, product and solvent from the catalyst. At this time, the concentration of organic substance in the obtained filtrate was analyzed by gas chromatography and the concentration of unreacted hydrogen peroxide was determined by potentiometric titration using Ce(IV). The reaction results are shown in Table 4.
- Example 4 The same operation as in Example 3 was performed except for using the MWW-type titanosilicate catalyst (50 mg) prepared in Example 2.
- the reaction results are shown in Table 4.
- the conversion of allyl alcohol was 97.0%, the selectivity of glycidol as the produced epoxy compound was 100%, the conversion of hydrogen peroxide was 98.0% and the efficiency of hydrogen peroxide was 99 . 0 % .
- Comparative Example 1 Comparative Catalyst-1; Production of MWW-Type Titanosilicate by Direct Synthesis Method and Production of Oxidized Compound In 513 g of ion exchanged water, 182.5 g of PI
- This gel was transferred to a 2 liter-volume Teflon (registered trademark of E.I. du Pont de Nemours and Company) -made autoclave, stirred for 24 hours at a rotation speed of 100 rpm at a temperature of 130 °C, then stirred for 24 hours at a rotation speed of 100 rpm at a temperature of 150 °C and further stirred for 120 hours at a rotation speed of 100 rpm at a temperature of 170 °C. After stopping the rotation, the contents were cooled to 25°C and the solid product was separated from the contents by filtration and washed with ion exchanged water. The washing was repeated until the pH of the washing water became 9 or less.
- Teflon registered trademark of E.I. du Pont de Nemours and Company
- the obtained solid product was dried at a temperature of 50 °C and subjected to an acid treatment for 20 hours at a temperature of 100 °C by adding 20 ml of 6 mol/liter nitric acid per g of the solid product. After the completion of acid treatment, the product was filtered and the obtained solid was calcined for 10 hours at a temperature of 530 °C to obtain an MWW-type titanosilicate catalyst.
- the titanium/silicon molar ratio of this titanosilicate catalyst was 0.0217 and the boron/silicon molar ratio was 0.0204.
- the infrared absorption spectrum was measured in the dehydrated state and on the spectrum, an absorption band having a relative maximum value at 960 cm "1 was observed.
- Fig. 7 shows the spectrum.
- Comparative Example 2 Comparative Catalyst 2 ; Production of MFI-Type Titanosilicate Catalyst and Production of Oxidized Compound
- Example 5 Study of Reaction Substrate In a 20 ml-volume three-neck flask equipped with a thermometer, a reflux condenser and a magnetic stirrer, 0.84 g (10 mmol) of 2-hexane and 7.8 g (10 ml) of acetonitrile were added and then the MWW-type titanosilicate catalyst 1 (50 mg) prepared in Example 1 was charged. The mixture was heated in a hot bath at 60°C and vigorously stirred.
- Example 5 The same operation as in Example 5 was performed except for using 0.82 g (10 mmol) of cyclohexene and 0.55 g (5 mmol as hydrogen peroxide) of 30 mass% hydrogen peroxide.
- the reaction results are shown in Table 5.
- Comparative Examples 5 and 6 The same operations as in Examples 5 and 6 were performed except for using the MFI-type titanosilicate catalyst obtained in Comparative Example 2. The reaction results are shown in Table 4. The yield of 2,3- epoxyhexane as the intended epoxide compound was 16.8% and the yield of cyclohexene oxide was 0.9%.
- Example 7 Preparation of MWW type titanosilicate of various Si/Ti ratios
- Example 8 Preparation of layer-exfoliation type titanosilicate catalyst-3 [Preparation of Ti-MWW (P) ] At 25 °C, 14.5g of PI (mfd. by Wako Pure Chemical
- the resultant mixture was stirred for 30 minutes to completely promote the hydrolysis of tetrabutylorthotitanate, and thereafter lOg of the deboronated silicate B having a mole ratio of the boron/silicon of 0.0017 obtained in Example 1 was added thereto, and the stirring was continued for further two hours to obtain a mixture having a mole ratio of 1-Si0 2 : 0 . 038 - TiO 2 : 1 - PI : 10 « H 2 O .
- This mixture was transferred to a 150 ml-volume Teflon-made autoclave and stirred for 158 hours at a rotation speed of 40 rpm at a temperature of 175 °C. After stopping the rotation, the contents were cooled to 25 °C and the solid product was separated from the contents by filtration and washed with ion-exchanged water. The washing was repeated until the pH of the washing water became 9 or less. The thus obtained solid product was dried at a temperature of 80°C, to obtain a layered titanosilicate Ti-MWW(P) as a precursor for an MWW-type zeolite. This layered substance had a titanium/silicon molar ratio of 0.033 and a boron/silicon molar ratio of 0.0019. [Modification of Ti-MWW (P)]
- the slurry was heated to 80°C and left standing for 16 hours. Then, the suspension was treated in an ultrasonic irradiation device at 300W, 35kHz for one hour, and under stirring, nitric acid of 2 mol/1 was added thereto until the pH became 2 or less.
- the solid content was collected by centrifugal separation, and further, the solid product was washed with ion-exchanged water. This washing was repeated until the pH of the rinse water became 9 or less.
- the thus obtained solid product was dried at a temperature of 80°C, and then calcined at a temperature of 600°C.
- 30ml of nitric acid of 6mol/l was added thereto to acid-treat the solid product at a temperature of 100°C for 20 hours, after the acid treatment, the solid obtained by filtration was calcined at a temperature of 600 °C for ten hours.
- the mole ratio of titanium/silicon of this modified layered substance was 0.024.
- the XRD pattern of the thus obtained modified layered substance is shown in Fig. 10.
- This layered substance provides a diffraction pattern similar to that of MWW-type zeolite substance, and therefore it was found that this substance maintains a structure similar to MWW- type structure.
- IR absorbance spectrum of this substance is shown in Fig. 11, and the first and second differential spectra thereof are respectively shown in Figs. 12 and 13.
- the curve of the second differential spectrum of Fig. 13 crosses the zero point of the ordinate axis in the neighborhood of at 930cm "1 , and there is a local minimum value in the neighborhood of 930cm "1 .
- Example 9 Preparation of layer-exfoliation type titanosilicate catalyst 4 A modified layered titanosilicate catalyst was obtained in the same manner as in Example 8, except that the irradiation of ultrasonic waves and pH adjustment were not conducted.
- Example 6 The same procedure was repeated in the same manner as in Example 5, except that lOmg of each of titanosilicate catalysts obtained in Examples 1, 8 and 9 was used, and 0.84g (lOmmol) of 1- hexene was used.
- the obtained reaction results are in Table 6.
- the yield of the intended 1,2-epoxy hexane was respectively 29.3%, 51.8%, and 24,8%.
- the turn over number (TON) which had been obtained by dividing the mol number of the product by the mol number of Ti, was respectively 934mol/mol-Ti, 1390mol/mol-Ti, and 863mol/mol-Ti.
- Example 10 The procedure of Example 10 was repeated except that 25mg of the Comparative catalyst, MFI type titanosilicate catalyst obtained in Comparative Example 2 was used, and 0.42g of 1- hexene (5mmol), 3.9g (5ml) of acetonitrile, and 0.55g of 30 mass % (in terms of hydrogen peroxide, 5mmol) were used.
- the thus obtained reaction results are shown in Table 6.
- Example 13-15 The procedure of Example 10 was repeated except that 25mg of each of the titanosilicate catalysts obtained in Examples 1, 8 and 9 was used, and 0.34g (5mmol) of cyclopentene, 3.9g (5ml) of acetonitrile, and 0.55g of 30 mass % (in terms of hydrogen peroxide, 5mmol) were used; and the reaction was started when the temperature of the reaction mixture reached 37°C in a water bath of 40°C. The thus obtained reaction results are shown in Table 6. Comparative Example 8
- Example 22 The procedure of Example 19 was repeated except that the Comparative catalyst-2, MFI type titanosilicate catalyst obtained in Comparative Example 2 was used. The thus obtained reaction results are shown in Table 6.
- the MWW-type titanosilicate catalyst 1 (lOmg) obtained in Example 1 was charged in a 30ml-autoclave equipped with a magnetic stirrer, and 7.8g (10ml) of acetonitrile, l.lg of 30 wt.% of aqueous hydrogen peroxide solution (in terms of hydrogen peroxide, 10m mol) were added thereto. After the resultant reaction system was cooled, the air in the autoclave was evacuated with vacuum pump.
- the autoclave under stirring with the magnetic stirrer, the autoclave was heated in a water bath of 40 °C, and propylene was supplied to the autoclave by connecting the autoclave with a propylene gas cylinder equipped with a pressure controller and the internal pressure in the autoclave was maintained at 0.25MPa.
- propylene gas was stopped, the gaseous product in the autoclave was trapped by bubbling the gaseous product in 10 ml of acetonitrile, and then the suspension in autoclave was added to this trap liquid to collect all of the product.
- the catalyst was separated by a centrifugal separation device, and the concentration of organic substances in the thus obtained reaction liquid was analyzed by gas chromatography.
- the concentration of the unreacted hydrogen peroxide was determined by potentiometric titration using Ce (IV). It was found that 6.00mmol of propylene glycol and 0.003mmol of propylene oxide were produced, and the selectivities thereof were respectively 99.95% and 0.05%. In addition, in addition, the conversion of hydrogen peroxide was 67.4%, and the efficiency of the hydrogen peroxide was 85.1%. Comparative Example 11
- the titanosilicate catalyst of the present invention represented by the following compositional formula (I) and characterized by the infrared absorption spectrum measured in the dehydrated state, where on the spectrum, an absorption band having a relative maximum value at 930 ⁇ 15 cm "1 is observed, is a very useful catalyst for use in the production of an oxidized compound of an oxide compound using a peroxide as the oxidizing agent.
- Compositional Formula (1) xTi0 2 * (l-x)Si0 2 (wherein x is from 0.0001 to 0.2).
Abstract
Description
Claims
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CA002478103A CA2478103C (en) | 2002-03-07 | 2003-02-26 | Titanosilicate, process for its production, and its use in producing oxidized compound |
US10/506,336 US7323154B2 (en) | 2002-03-07 | 2003-02-26 | Titanosilicate, process for its production, and its use in producing oxidized compound |
KR1020047013605A KR100753070B1 (en) | 2002-03-07 | 2003-02-26 | Titanosilicate, process for its production, and its use in producing oxidized compound |
EP03707102A EP1490300B1 (en) | 2002-03-07 | 2003-02-26 | Titanosilicate, process for its production, and its use in producing oxidized compound |
DE60327060T DE60327060D1 (en) | 2002-03-07 | 2003-02-26 | TITANOSILICATE, THE PRODUCTION THEREOF AND THE USE THEREOF FOR THE PREPARATION OF OXIDIZED COMPOUNDS |
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JP2003036747A JP4270901B2 (en) | 2002-03-07 | 2003-02-14 | Titanosilicate, method for producing the same, and method for producing an oxidized compound using titanosilicate |
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AT (1) | ATE427911T1 (en) |
AU (1) | AU2003208615A1 (en) |
CA (1) | CA2478103C (en) |
ES (1) | ES2322574T3 (en) |
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US7081426B2 (en) | 2002-03-04 | 2006-07-25 | Sumitomo Chemical Company, Limited | Method for improving crystalline titanosilicate catalyst having MWW structure |
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- 2003-02-26 EP EP03707102A patent/EP1490300B1/en not_active Expired - Lifetime
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- 2003-02-26 WO PCT/JP2003/002154 patent/WO2003074421A1/en active Application Filing
- 2003-02-26 CN CNB038053446A patent/CN100537427C/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
---|---|
JP4270901B2 (en) | 2009-06-03 |
KR100753070B1 (en) | 2007-08-31 |
AU2003208615A1 (en) | 2003-09-16 |
CN1639064A (en) | 2005-07-13 |
EP1490300A1 (en) | 2004-12-29 |
EP1490300B1 (en) | 2009-04-08 |
JP2004292171A (en) | 2004-10-21 |
CA2478103C (en) | 2009-04-14 |
ES2322574T3 (en) | 2009-06-23 |
KR20040093086A (en) | 2004-11-04 |
CA2478103A1 (en) | 2003-09-12 |
ATE427911T1 (en) | 2009-04-15 |
CN100537427C (en) | 2009-09-09 |
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