WO2003077414A3 - Leistungsverstärker - Google Patents

Leistungsverstärker Download PDF

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Publication number
WO2003077414A3
WO2003077414A3 PCT/EP2003/002533 EP0302533W WO03077414A3 WO 2003077414 A3 WO2003077414 A3 WO 2003077414A3 EP 0302533 W EP0302533 W EP 0302533W WO 03077414 A3 WO03077414 A3 WO 03077414A3
Authority
WO
WIPO (PCT)
Prior art keywords
matching
relates
power amplifier
matching network
power mosfets
Prior art date
Application number
PCT/EP2003/002533
Other languages
English (en)
French (fr)
Other versions
WO2003077414A2 (de
WO2003077414A8 (de
Inventor
Joachim Ziegler
Original Assignee
Huettinger Elektronik Gmbh
Joachim Ziegler
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huettinger Elektronik Gmbh, Joachim Ziegler filed Critical Huettinger Elektronik Gmbh
Publication of WO2003077414A2 publication Critical patent/WO2003077414A2/de
Publication of WO2003077414A3 publication Critical patent/WO2003077414A3/de
Publication of WO2003077414A8 publication Critical patent/WO2003077414A8/de
Priority to US10/937,395 priority Critical patent/US7046088B2/en

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F1/00Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/56Modifications of input or output impedances, not otherwise provided for
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • H03F3/21Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
    • H03F3/211Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • H03F3/21Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
    • H03F3/217Class D power amplifiers; Switching amplifiers

Abstract

Verfahren und Vorrichtung zur Leistungsverstärkung mit einem modifiziertem Klasse E-Verstärker, bei dem ein spezielles Anpassungsnetzwerk sowohl eine Bandpassfilterung für die Grundwelle als auch eine Widerstandsanpassung an die Last vornimmt und sich zugleich durch seine Bauart als Anpassungsnetzwerk zum Zusammenschalten mehrerer nicht identisch gleicher Leistungs-MOS-FETs eignet sowie eine solche Anpassungsschaltung sowie eine geeignete besonders verlustarme Treiberschaltung zur Ansteuerung solcher Leistungs-MOS-FETs
PCT/EP2003/002533 2002-03-12 2003-03-12 Leistungsverstärker WO2003077414A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US10/937,395 US7046088B2 (en) 2002-03-12 2004-09-10 Power amplifier

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10211609.1 2002-03-12
DE10211609A DE10211609B4 (de) 2002-03-12 2002-03-12 Verfahren und Leistungsverstärker zur Erzeugung von sinusförmigen Hochfrequenzsignalen zum Betreiben einer Last

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/937,395 Continuation US7046088B2 (en) 2002-03-12 2004-09-10 Power amplifier

Publications (3)

Publication Number Publication Date
WO2003077414A2 WO2003077414A2 (de) 2003-09-18
WO2003077414A3 true WO2003077414A3 (de) 2004-04-08
WO2003077414A8 WO2003077414A8 (de) 2004-04-29

Family

ID=27797815

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/002533 WO2003077414A2 (de) 2002-03-12 2003-03-12 Leistungsverstärker

Country Status (3)

Country Link
US (1) US7046088B2 (de)
DE (1) DE10211609B4 (de)
WO (1) WO2003077414A2 (de)

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DE102007026784A1 (de) * 2007-06-09 2008-12-24 Isle Gmbh Verfahren zur Bestimmung von Kapazitäts-Spannungskennlinien elektronischer Schaltelemente
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FR2919762B1 (fr) 2007-08-02 2009-10-02 Thales Sa Coupleur de puissance pour generateur haute frequence industrielle
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US8575843B2 (en) 2008-05-30 2013-11-05 Colorado State University Research Foundation System, method and apparatus for generating plasma
WO2011123124A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
EP2297377B1 (de) 2008-05-30 2017-12-27 Colorado State University Research Foundation Auf plasma basierende chemikalienquellenvorrichtung und verfahren zu ihrer verwendung
US7948312B2 (en) * 2009-05-13 2011-05-24 Qualcomm, Incorporated Multi-bit class-D power amplifier system
WO2011046979A2 (en) 2009-10-12 2011-04-21 Cyclos Semiconductor, Inc. Method for selecting natural frequency in resonant clock distribution networks with no inductor overhead
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
EP2552340A4 (de) 2010-03-31 2015-10-14 Univ Colorado State Res Found Plasmavorrichtung mit flüssig-gas-schnittstelle
WO2011148711A1 (ja) * 2010-05-27 2011-12-01 京セラ株式会社 増幅回路ならびにそれを用いた送信装置および通信装置
CN102170277A (zh) * 2011-01-20 2011-08-31 中国科学院半导体研究所 基于移相相与获取皮秒精度窄脉宽ttl信号的方法
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
WO2016147272A1 (ja) * 2015-03-13 2016-09-22 日本電気株式会社 生体検知装置、生体検知方法、および、記録媒体
DE102015212232B4 (de) 2015-06-30 2020-03-05 TRUMPF Hüttinger GmbH + Co. KG Leistungscombiner zur Kopplung von Hochfrequenzsignalen und Leistungscombineranordnung mit einem solchen Leistungscombiner
JP2020526965A (ja) 2017-06-30 2020-08-31 エアリティー・テクノロジーズ・インコーポレイテッドAirity Technologies, Inc. 抵抗性出力インピーダンスのための高利得共振増幅器
US10555412B2 (en) 2018-05-10 2020-02-04 Applied Materials, Inc. Method of controlling ion energy distribution using a pulse generator with a current-return output stage
US10938358B2 (en) * 2018-10-31 2021-03-02 Kabushiki Kaisha Toshiba Digital power amplifier
US11476145B2 (en) 2018-11-20 2022-10-18 Applied Materials, Inc. Automatic ESC bias compensation when using pulsed DC bias
JP7451540B2 (ja) 2019-01-22 2024-03-18 アプライド マテリアルズ インコーポレイテッド パルス状電圧波形を制御するためのフィードバックループ
US11508554B2 (en) 2019-01-24 2022-11-22 Applied Materials, Inc. High voltage filter assembly
US11462389B2 (en) 2020-07-31 2022-10-04 Applied Materials, Inc. Pulsed-voltage hardware assembly for use in a plasma processing system
US11798790B2 (en) 2020-11-16 2023-10-24 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11901157B2 (en) 2020-11-16 2024-02-13 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11495470B1 (en) 2021-04-16 2022-11-08 Applied Materials, Inc. Method of enhancing etching selectivity using a pulsed plasma
US11948780B2 (en) 2021-05-12 2024-04-02 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11791138B2 (en) 2021-05-12 2023-10-17 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11967483B2 (en) 2021-06-02 2024-04-23 Applied Materials, Inc. Plasma excitation with ion energy control
US11810760B2 (en) 2021-06-16 2023-11-07 Applied Materials, Inc. Apparatus and method of ion current compensation
US11569066B2 (en) 2021-06-23 2023-01-31 Applied Materials, Inc. Pulsed voltage source for plasma processing applications
US11776788B2 (en) 2021-06-28 2023-10-03 Applied Materials, Inc. Pulsed voltage boost for substrate processing
US11476090B1 (en) 2021-08-24 2022-10-18 Applied Materials, Inc. Voltage pulse time-domain multiplexing
CN113904421A (zh) * 2021-10-28 2022-01-07 丰码科技(南京)有限公司 一种用于自动导向车的信号源
US11694876B2 (en) 2021-12-08 2023-07-04 Applied Materials, Inc. Apparatus and method for delivering a plurality of waveform signals during plasma processing

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US4717884A (en) * 1986-04-14 1988-01-05 Motorola, Inc. High efficiency RF power amplifier
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Also Published As

Publication number Publication date
WO2003077414A2 (de) 2003-09-18
US20050088231A1 (en) 2005-04-28
WO2003077414A8 (de) 2004-04-29
DE10211609B4 (de) 2009-01-08
DE10211609A1 (de) 2003-10-09
US7046088B2 (en) 2006-05-16

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