WO2003091788A3 - Process for forming a patterned thin film conductive structure on a substrate - Google Patents

Process for forming a patterned thin film conductive structure on a substrate Download PDF

Info

Publication number
WO2003091788A3
WO2003091788A3 PCT/US2003/012692 US0312692W WO03091788A3 WO 2003091788 A3 WO2003091788 A3 WO 2003091788A3 US 0312692 W US0312692 W US 0312692W WO 03091788 A3 WO03091788 A3 WO 03091788A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
printed
conductive structure
forming
thin film
Prior art date
Application number
PCT/US2003/012692
Other languages
French (fr)
Other versions
WO2003091788A2 (en
Inventor
Jeanne E Haubrich
Y S Chaug
Zarng-Arh George Wu
Abbas Hosseini
Paul Gendler
Rong-Chang Liang
Original Assignee
Sipix Imaging Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sipix Imaging Inc filed Critical Sipix Imaging Inc
Priority to EP03724202A priority Critical patent/EP1497692A2/en
Priority to AU2003231077A priority patent/AU2003231077A1/en
Priority to JP2004500109A priority patent/JP4508863B2/en
Publication of WO2003091788A2 publication Critical patent/WO2003091788A2/en
Publication of WO2003091788A3 publication Critical patent/WO2003091788A3/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/13439Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
    • H05K3/048Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0302Properties and characteristics in general
    • H05K2201/0317Thin film conductor layer; Thin film passive component
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0257Brushing, e.g. cleaning the conductive pattern by brushing or wiping
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0264Peeling insulating layer, e.g. foil, or separating mask
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0502Patterning and lithography
    • H05K2203/0522Using an adhesive pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736Methods for applying liquids, e.g. spraying
    • H05K2203/0746Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/146By vapour deposition
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/16Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation by cathodic sputtering
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Printing Methods (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

A process for forming a patterned conductive structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired conductive structures will be formed in the areas where the printed material is not present, i.e. a negative image of conductive structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired conductive structures will be formed in the areas where the printed material is present, i.e. a positive image of the conductive structure is printed. The conductive material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned electrode structures.
PCT/US2003/012692 2002-04-24 2003-04-23 Process for forming a patterned thin film conductive structure on a substrate WO2003091788A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP03724202A EP1497692A2 (en) 2002-04-24 2003-04-23 Process for forming a patterned thin film conductive structure on a substrate
AU2003231077A AU2003231077A1 (en) 2002-04-24 2003-04-23 Process for forming a patterned thin film conductive structure on a substrate
JP2004500109A JP4508863B2 (en) 2002-04-24 2003-04-23 Method for forming a patterned thin film conductor on a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37590202P 2002-04-24 2002-04-24
US60/375,902 2002-04-24

Publications (2)

Publication Number Publication Date
WO2003091788A2 WO2003091788A2 (en) 2003-11-06
WO2003091788A3 true WO2003091788A3 (en) 2004-03-25

Family

ID=29270720

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/012692 WO2003091788A2 (en) 2002-04-24 2003-04-23 Process for forming a patterned thin film conductive structure on a substrate

Country Status (7)

Country Link
US (1) US20030203101A1 (en)
EP (1) EP1497692A2 (en)
JP (1) JP4508863B2 (en)
CN (2) CN1256620C (en)
AU (1) AU2003231077A1 (en)
TW (1) TWI268813B (en)
WO (1) WO2003091788A2 (en)

Families Citing this family (84)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7156945B2 (en) * 2002-04-24 2007-01-02 Sipix Imaging, Inc. Process for forming a patterned thin film structure for in-mold decoration
US7261920B2 (en) 2002-04-24 2007-08-28 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate
US8002948B2 (en) * 2002-04-24 2011-08-23 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate
US6900876B2 (en) * 2003-02-13 2005-05-31 Eastman Kodak Company Process and structures for selective deposition of liquid-crystal emulsion
WO2005002305A2 (en) * 2003-06-06 2005-01-06 Sipix Imaging, Inc. In mold manufacture of an object with embedded display panel
US7175876B2 (en) * 2003-06-27 2007-02-13 3M Innovative Properties Company Patterned coating method employing polymeric coatings
US8068186B2 (en) * 2003-10-15 2011-11-29 3M Innovative Properties Company Patterned conductor touch screen having improved optics
CA2551836A1 (en) * 2003-12-30 2005-07-21 3M Innovative Properties Company Surface acoustic wave sensor assemblies
AU2004315032A1 (en) * 2003-12-30 2005-08-18 3M Innovative Properties Company Acousto-mechanical detection systems and methods of use
US7575979B2 (en) * 2004-06-22 2009-08-18 Hewlett-Packard Development Company, L.P. Method to form a film
US20060033676A1 (en) * 2004-08-10 2006-02-16 Kenneth Faase Display device
US7301693B2 (en) 2004-08-13 2007-11-27 Sipix Imaging, Inc. Direct drive display with a multi-layer backplane and process for its manufacture
US7042614B1 (en) 2004-11-17 2006-05-09 Hewlett-Packard Development Company, L.P. Spatial light modulator
US7304780B2 (en) * 2004-12-17 2007-12-04 Sipix Imaging, Inc. Backplane design for display panels and processes for their manufacture
JP2007011227A (en) * 2005-07-04 2007-01-18 Bridgestone Corp Method for manufacturing panel for information display
US7767126B2 (en) * 2005-08-22 2010-08-03 Sipix Imaging, Inc. Embossing assembly and methods of preparation
US20070069418A1 (en) * 2005-09-28 2007-03-29 Chih-Yuan Liao In mold manufacturing of an object comprising a functional element
US8264466B2 (en) * 2006-03-31 2012-09-11 3M Innovative Properties Company Touch screen having reduced visibility transparent conductor pattern
US8830561B2 (en) 2006-07-18 2014-09-09 E Ink California, Llc Electrophoretic display
TWI491953B (en) * 2006-07-18 2015-07-11 Sipix Imaging Inc Electrophoretic display
US20150005720A1 (en) 2006-07-18 2015-01-01 E Ink California, Llc Electrophoretic display
CN100479102C (en) * 2006-08-29 2009-04-15 中国科学院声学研究所 Stripping preparation method of graphics platinum/titanium metal thin film
WO2008083279A1 (en) * 2006-12-29 2008-07-10 3M Innovative Properties Company Method of detection of bioanalytes by acousto-mechanical detection systems comprising the addition of liposomes
JP2009049136A (en) * 2007-08-17 2009-03-05 Fujitsu Ltd Wiring board, wiring pattern forming method, and manufacturing method of wiring board
GB0716266D0 (en) * 2007-08-21 2007-09-26 Eastman Kodak Co Method of patterning vapour deposition by printing
CN101418462B (en) * 2007-10-24 2011-03-30 比亚迪股份有限公司 Method for forming pattern on surface of conductive substrate
CN101547574B (en) * 2008-03-28 2011-03-30 富葵精密组件(深圳)有限公司 Base plate of a circuit board and a preparing method of a circuit board with a misalignment structure
TWI353808B (en) * 2008-04-28 2011-12-01 Ind Tech Res Inst Method for fabricating conductive pattern on flexi
JP2011522964A (en) * 2008-06-09 2011-08-04 ナノフィルム テクノロジーズ インターナショナル ピーティーイー リミテッド Rapid deposition of coatings on substrates
KR100991105B1 (en) * 2009-10-23 2010-11-01 한국기계연구원 Method for fabricating highly conductive fine patterns using self-patterned conductors and plating
EP2319630A1 (en) * 2009-11-05 2011-05-11 Heidelberger Druckmaschinen AG Method for multi-colour permanent varnishing of a product
CN102118679B (en) * 2009-12-31 2013-11-06 财团法人工业技术研究院 Manufacturing method and device of loudspeaker
CN102285298A (en) * 2010-06-21 2011-12-21 圣维可福斯(广州)电子科技有限公司 Object surface metallized decoration method
CN101922029A (en) * 2010-07-22 2010-12-22 中兴通讯股份有限公司 Mirror surface character processing technique and equipment
CN102453933B (en) * 2010-10-25 2016-05-04 深圳市国人射频通信有限公司 Selective plating method for aluminum material
CN102026490A (en) * 2010-12-14 2011-04-20 叶逸仁 Method for producing ITO coated circuit board
TWI409011B (en) * 2011-04-14 2013-09-11 Polychem Uv Eb Internat Corp Construction and Manufacturing Method of Transparent Conductive Line
CN102762026B (en) * 2011-04-27 2015-03-18 瑞化股份有限公司 Structure and manufacturing method of transparent conducting circuit
KR20140035991A (en) 2011-06-09 2014-03-24 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Method of making touch sensitive device with multilayer electrode and underlayer
TWI444743B (en) * 2011-08-16 2014-07-11 E Ink Holdings Inc Display device and method for manufacturing the same
US8635761B2 (en) * 2011-09-19 2014-01-28 Xerox Corporation System and method for formation of electrical conductors on a substrate
CN102427058B (en) * 2011-11-09 2015-07-22 深南电路有限公司 Method of manufacturing circuit pattern through sputtering technology and rewiring method of chip
JP2013143563A (en) * 2012-01-10 2013-07-22 Hzo Inc Systems for assembling electronic devices with internal moisture-resistant coatings
US10401668B2 (en) 2012-05-30 2019-09-03 E Ink California, Llc Display device with visually-distinguishable watermark area and non-watermark area
KR101450859B1 (en) * 2012-10-10 2014-10-15 한국과학기술연구원 Nerve electrode provided with a antiinflammatory drug and method for manufacturing the same
BR112015013033A2 (en) 2012-12-07 2017-07-11 3M Innovative Properties Co method of manufacturing transparent conductors on substrate
JP6083233B2 (en) 2012-12-19 2017-02-22 Jnc株式会社 Transfer film for in-mold molding, method for producing in-mold molded body, and molded body
US20150362501A1 (en) * 2013-01-17 2015-12-17 Tanaka Kikinzoku Kogyo K.K. Biosensor and process for producing same
FR3003722A1 (en) * 2013-03-19 2014-09-26 Linxens Holding METHOD FOR MANUFACTURING A FLEXIBLE PRINTED CIRCUIT, FLEXIBLE PRINTED CIRCUIT OBTAINED BY THIS METHOD AND CHIP CARD MODULE COMPRISING SUCH A FLEXIBLE PRINTED CIRCUIT
US9066425B2 (en) * 2013-04-01 2015-06-23 Rohm And Haas Electronic Materials Llc Method of manufacturing a patterned transparent conductor
US20160101548A1 (en) * 2013-04-24 2016-04-14 Automobile Patentverwaltungs- und -verwertungsgesellschaft mbH Method for coating functional components made of plastics material
CN103272747B (en) * 2013-05-29 2015-07-22 苏州汉纳材料科技有限公司 Manufacturing method and system of transparent patterning carbon nano tube conducting thin film
GB2519587A (en) * 2013-10-28 2015-04-29 Barco Nv Tiled Display and method for assembling same
FR3013739B1 (en) * 2013-11-28 2016-01-01 Valeo Vision METHOD AND DEVICE FOR COATING THE AUTOMOBILE PIECE
CN103774145A (en) * 2014-03-01 2014-05-07 陈廷 Method for covering metal foil on copper-cladded plate
EP3517308B1 (en) * 2014-06-20 2022-03-16 3M Innovative Properties Company Printing of multiple inks to achieve precision registration during subsequent processing
CN104159408B (en) * 2014-08-05 2017-07-28 上海蓝沛信泰光电科技有限公司 A kind of preparation method of double-side copper FPC
CN104244596A (en) * 2014-09-09 2014-12-24 浙江经立五金机械有限公司 PCB manufacturing process
KR101616769B1 (en) 2015-04-03 2016-05-02 일진다이아몬드(주) The surface treatment method of Shape-Controllable Diamond and the Diamond thereby
CN104897759A (en) * 2015-06-26 2015-09-09 彭梓 Method for modifying indium tin oxide electrochemiluminescence reaction electrodes
KR101750361B1 (en) * 2015-09-17 2017-06-23 한국기계연구원 Method of manufacturing a printing plate
CN105137639B (en) 2015-10-20 2018-06-05 京东方科技集团股份有限公司 The thining method and display device of a kind of display panel
CN106118552B (en) * 2016-06-30 2018-05-11 九牧厨卫股份有限公司 A kind of hot water dissolving's type hot melt adhesive and its application
CN106245096B (en) * 2016-06-30 2018-07-17 九牧厨卫股份有限公司 A kind of trichromatic diagram case electrophoresis method of metal surface
US10167559B2 (en) 2016-08-29 2019-01-01 International Business Machines Corporation Negative patterning approach for ultra-narrow gap devices
US10802373B1 (en) 2017-06-26 2020-10-13 E Ink Corporation Reflective microcells for electrophoretic displays and methods of making the same
US10921676B2 (en) 2017-08-30 2021-02-16 E Ink Corporation Electrophoretic medium
US10698265B1 (en) 2017-10-06 2020-06-30 E Ink California, Llc Quantum dot film
CN108834322A (en) * 2018-03-30 2018-11-16 广州大正新材料科技有限公司 A kind of method of printed circuit
CN108684156A (en) * 2018-03-30 2018-10-19 广州安檀科技有限公司 A kind of circuit printing method
CN111936311A (en) * 2018-04-17 2020-11-13 3M创新有限公司 Conductive film
US11397366B2 (en) 2018-08-10 2022-07-26 E Ink California, Llc Switchable light-collimating layer including bistable electrophoretic fluid
KR102521143B1 (en) 2018-08-10 2023-04-12 이 잉크 캘리포니아 엘엘씨 Switchable light collimation layer with reflector
WO2020033787A1 (en) 2018-08-10 2020-02-13 E Ink California, Llc Driving waveforms for switchable light-collimating layer including bistable electrophoretic fluid
CN109972128A (en) * 2019-03-29 2019-07-05 南昌大学 The method that inkjet printing combination electroless plating prepares super thin metal mesh flexible transparent electrode
CN111224020A (en) * 2020-01-14 2020-06-02 吉林建筑大学 Thin film electrode material deposition method based on ink-jet fusion
KR20210138829A (en) * 2020-05-12 2021-11-22 한국생산기술연구원 Method for manufacturing electrode for metal mesh touch screen panel using lift-off from the inkjet-printed pattern and electrode for touch screen panel manufactured accordingly
CN112410729B (en) * 2020-11-09 2022-12-06 中国科学院宁波材料技术与工程研究所 Ultrathin liquid metal film, preparation method and application
CN114517314A (en) * 2020-11-20 2022-05-20 嘉兴阿特斯技术研究院有限公司 Electroplating slurry for screen printing and preparation method and application thereof
CN112592575B (en) * 2020-12-15 2022-09-23 江西省萍乡市轩品塑胶制品有限公司 Preparation method of biodegradable modified resin
CN113151769B (en) * 2021-04-01 2022-08-05 西安交通大学 Micropore and microcrack composite toughened millimeter-sized thick ceramic coating and preparation method thereof
CN113427921A (en) * 2021-06-01 2021-09-24 Tcl华星光电技术有限公司 Silver paste transfer printing method, Micro-LED transfer printing method and Micro-LED
CN114023915B (en) * 2021-10-19 2023-09-05 Tcl华星光电技术有限公司 Circuit manufacturing method for substrate of display device
CN114427077B (en) * 2021-12-23 2023-08-15 青岛歌尔智能传感器有限公司 Selective sputtering method and electronic product thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0390465A2 (en) * 1989-03-27 1990-10-03 Matsushita Electric Industrial Co., Ltd. Method of forming a film pattern on a substrate
JPH0384521A (en) * 1989-08-29 1991-04-10 Mitsumura Genshiyokuban Insatsujiyo:Kk Pattering method
JPH09254332A (en) * 1996-03-23 1997-09-30 Fujimori Kogyo Kk Plastic substrate
US6080606A (en) * 1996-03-26 2000-06-27 The Trustees Of Princeton University Electrophotographic patterning of thin film circuits
WO2002001281A2 (en) * 2000-06-28 2002-01-03 Sipix Imaging, Inc. Manufacturing process for electrophoretic display

Family Cites Families (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3612758A (en) * 1969-10-03 1971-10-12 Xerox Corp Color display device
US3668106A (en) * 1970-04-09 1972-06-06 Matsushita Electric Ind Co Ltd Electrophoretic display device
US3697679A (en) * 1970-07-01 1972-10-10 Ampex Automatic threading video recorder
GB1423952A (en) * 1973-06-26 1976-02-04 Oike & Co Process for preparing a metallized resin film for condenser element
US4093534A (en) * 1974-02-12 1978-06-06 Plessey Handel Und Investments Ag Working fluids for electrophoretic image display devices
GB1464051A (en) * 1974-04-30 1977-02-09 Fuji Photo Film Co Ltd Photographic recording elements
US4119483A (en) * 1974-07-30 1978-10-10 U.S. Philips Corporation Method of structuring thin layers
US4022927A (en) * 1975-06-30 1977-05-10 International Business Machines Corporation Methods for forming thick self-supporting masks
US4071430A (en) * 1976-12-06 1978-01-31 North American Philips Corporation Electrophoretic image display having an improved switching time
US4217182A (en) * 1978-06-07 1980-08-12 Litton Systems, Inc. Semi-additive process of manufacturing a printed circuit
US4285801A (en) * 1979-09-20 1981-08-25 Xerox Corporation Electrophoretic display composition
EP0030732B1 (en) * 1979-12-15 1984-11-28 Nitto Electric Industrial Co., Ltd. Transparent electrically conductive film and process for production thereof
US4368281A (en) * 1980-09-15 1983-01-11 Amp Incorporated Printed circuits
JPS57126971A (en) * 1981-01-29 1982-08-06 Susumu Hosaka Method for precisely processing metal wafer
US4420515A (en) * 1981-08-21 1983-12-13 Sicpa Holding, S.A. Metallization process for protecting documents of value
JPS5978987A (en) * 1982-10-29 1984-05-08 マルイ工業株式会社 Formation of pattern on metal coating
JPS60150508A (en) * 1984-01-18 1985-08-08 日本写真印刷株式会社 Method of producing transparent electrode board
JPS60173842A (en) * 1984-02-20 1985-09-07 Canon Inc Forming method of pattern
US4655897A (en) * 1984-11-13 1987-04-07 Copytele, Inc. Electrophoretic display panels and associated methods
US4741988A (en) * 1985-05-08 1988-05-03 U.S. Philips Corp. Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
US4714631A (en) * 1985-08-28 1987-12-22 W. H. Brady Co. Rapidly removable undercoating for vacuum deposition of patterned layers onto substrates
JPH0680606B2 (en) * 1985-12-18 1994-10-12 松下電器産業株式会社 Method for producing manganese-aluminum-carbon alloy magnet
US4680103A (en) * 1986-01-24 1987-07-14 Epid. Inc. Positive particles in electrophoretic display device composition
DE3743780A1 (en) * 1987-12-23 1989-07-06 Bayer Ag METHOD FOR IMPROVING THE ADHESIVITY OF CURRENTLY DEPOSITED METAL LAYERS ON POLYIMIDE SURFACES
US4977013A (en) * 1988-06-03 1990-12-11 Andus Corporation Tranparent conductive coatings
JPH0295893A (en) * 1988-09-30 1990-04-06 Nissha Printing Co Ltd Metallic luster pattern transfer material
US5059454A (en) * 1989-04-26 1991-10-22 Flex Products, Inc. Method for making patterned thin film
US4995718A (en) * 1989-11-15 1991-02-26 Honeywell Inc. Full color three-dimensional projection display
US5177476A (en) * 1989-11-24 1993-01-05 Copytele, Inc. Methods of fabricating dual anode, flat panel electrophoretic displays
US5495981A (en) * 1994-02-04 1996-03-05 Warther; Richard O. Transaction card mailer and method of making
US5326865A (en) * 1990-06-08 1994-07-05 Hercules Incorporated Arylazo and poly(arylazo) dyes having at least one core radical selected from naphthyl or anthracyl and having at least one 2,3-dihydro-1,3-dialkyl perimidine substituent
US5221967A (en) * 1991-05-08 1993-06-22 The University Of British Columbia Signal quality monitoring system
CA2114650C (en) * 1991-08-29 1999-08-10 Frank J. Disanto Electrophoretic display panel with internal mesh background screen
DE4209708A1 (en) * 1992-03-25 1993-09-30 Bayer Ag Process for improving the adhesive strength of electrolessly deposited metal layers
US5279511A (en) * 1992-10-21 1994-01-18 Copytele, Inc. Method of filling an electrophoretic display
US5395740A (en) * 1993-01-27 1995-03-07 Motorola, Inc. Method for fabricating electrode patterns
CA2162874A1 (en) * 1993-05-21 1994-12-08 Wei-Hsin Hou Methods of preparing electrophoretic dispersions containing two types of particles with different colors and opposite charges
US5380362A (en) * 1993-07-16 1995-01-10 Copytele, Inc. Suspension for use in electrophoretic image display systems
US5411628A (en) * 1993-10-21 1995-05-02 E. I. Du Pont De Nemours And Company Diffusion patterning process and screen therefor
US6111598A (en) * 1993-11-12 2000-08-29 Peveo, Inc. System and method for producing and displaying spectrally-multiplexed images of three-dimensional imagery for use in flicker-free stereoscopic viewing thereof
US5403518A (en) * 1993-12-02 1995-04-04 Copytele, Inc. Formulations for improved electrophoretic display suspensions and related methods
US5699097A (en) * 1994-04-22 1997-12-16 Kabushiki Kaisha Toshiba Display medium and method for display therewith
US5795527A (en) * 1994-04-29 1998-08-18 Nissha Printing Co., Ltd. Method of manufacturing decorated article using a transfer material
CA2191084A1 (en) * 1994-05-26 1995-12-07 Wei-Hsin Hou Fluorinated dielectric suspensions for electrophoretic image displays and related methods
US6017584A (en) * 1995-07-20 2000-01-25 E Ink Corporation Multi-color electrophoretic displays and materials for making the same
US6120588A (en) * 1996-07-19 2000-09-19 E Ink Corporation Electronically addressable microencapsulated ink and display thereof
US6120839A (en) * 1995-07-20 2000-09-19 E Ink Corporation Electro-osmotic displays and materials for making the same
US5835174A (en) * 1995-10-12 1998-11-10 Rohm And Haas Company Droplets and particles containing liquid crystal and films and apparatus containing the same
US6037058A (en) * 1995-10-12 2000-03-14 Rohms And Haas Company Particles and droplets containing liquid domains and method for forming in an acueous medium
US6117300A (en) * 1996-05-01 2000-09-12 Honeywell International Inc. Method for forming conductive traces and printed circuits made thereby
DE19624071A1 (en) * 1996-06-17 1997-12-18 Bayer Ag Process for the production of sheet-like metal-coated foils
US5930026A (en) * 1996-10-25 1999-07-27 Massachusetts Institute Of Technology Nonemissive displays and piezoelectric power supplies therefor
US5837609A (en) * 1997-01-16 1998-11-17 Ford Motor Company Fully additive method of applying a circuit pattern to a three-dimensional, nonconductive part
US5961804A (en) * 1997-03-18 1999-10-05 Massachusetts Institute Of Technology Microencapsulated electrophoretic display
US6252624B1 (en) * 1997-07-18 2001-06-26 Idemitsu Kosan Co., Ltd. Three dimensional display
US6067185A (en) * 1997-08-28 2000-05-23 E Ink Corporation Process for creating an encapsulated electrophoretic display
US6232950B1 (en) * 1997-08-28 2001-05-15 E Ink Corporation Rear electrode structures for displays
US6130774A (en) * 1998-04-27 2000-10-10 E Ink Corporation Shutter mode microencapsulated electrophoretic display
JP3993691B2 (en) * 1997-09-24 2007-10-17 関西ペイント株式会社 Resist pattern forming method
US6222136B1 (en) * 1997-11-12 2001-04-24 International Business Machines Corporation Printed circuit board with continuous connective bumps
US6131512A (en) * 1998-02-03 2000-10-17 Agfa-Gevaert, N.V. Printing master comprising strain gauges
US5914806A (en) * 1998-02-11 1999-06-22 International Business Machines Corporation Stable electrophoretic particles for displays
DE19812880A1 (en) * 1998-03-24 1999-09-30 Bayer Ag Shaped part and flexible film with protected conductor track and process for its production
JP4053136B2 (en) * 1998-06-17 2008-02-27 株式会社半導体エネルギー研究所 Reflective semiconductor display device
DE19828846C2 (en) * 1998-06-27 2001-01-18 Micronas Gmbh Process for coating a substrate
US6184856B1 (en) * 1998-09-16 2001-02-06 International Business Machines Corporation Transmissive electrophoretic display with laterally adjacent color cells
US6312304B1 (en) * 1998-12-15 2001-11-06 E Ink Corporation Assembly of microencapsulated electronic displays
US6327072B1 (en) * 1999-04-06 2001-12-04 E Ink Corporation Microcell electrophoretic displays
JP5394601B2 (en) * 1999-07-01 2014-01-22 イー インク コーポレイション Electrophoretic medium provided with spacer
US6337761B1 (en) * 1999-10-01 2002-01-08 Lucent Technologies Inc. Electrophoretic display and method of making the same
DE19955214B4 (en) * 1999-11-17 2006-05-11 Stork Gmbh Method for producing conductor structures
US6930818B1 (en) * 2000-03-03 2005-08-16 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US6933098B2 (en) * 2000-01-11 2005-08-23 Sipix Imaging Inc. Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
US20020083858A1 (en) * 2000-05-15 2002-07-04 Macdiarmid Alan G. Spontaneous pattern formation of functional materials
US6507376B2 (en) * 2000-12-25 2003-01-14 Kawasaki Microelectronics, Inc. Display device formed on semiconductor substrate and display system using the same
US6795138B2 (en) * 2001-01-11 2004-09-21 Sipix Imaging, Inc. Transmissive or reflective liquid crystal display and novel process for its manufacture
CN1307480C (en) * 2001-08-23 2007-03-28 皇家飞利浦电子股份有限公司 Electrophoretic display device
US7156945B2 (en) * 2002-04-24 2007-01-02 Sipix Imaging, Inc. Process for forming a patterned thin film structure for in-mold decoration
US7261920B2 (en) * 2002-04-24 2007-08-28 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0390465A2 (en) * 1989-03-27 1990-10-03 Matsushita Electric Industrial Co., Ltd. Method of forming a film pattern on a substrate
JPH0384521A (en) * 1989-08-29 1991-04-10 Mitsumura Genshiyokuban Insatsujiyo:Kk Pattering method
JPH09254332A (en) * 1996-03-23 1997-09-30 Fujimori Kogyo Kk Plastic substrate
US6080606A (en) * 1996-03-26 2000-06-27 The Trustees Of Princeton University Electrophotographic patterning of thin film circuits
WO2002001281A2 (en) * 2000-06-28 2002-01-03 Sipix Imaging, Inc. Manufacturing process for electrophoretic display

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 015, no. 262 (P - 1222) 3 July 1991 (1991-07-03) *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 01 30 January 1998 (1998-01-30) *

Also Published As

Publication number Publication date
TWI268813B (en) 2006-12-21
AU2003231077A8 (en) 2003-11-10
AU2003231077A1 (en) 2003-11-10
CN1453624A (en) 2003-11-05
TW200404620A (en) 2004-04-01
EP1497692A2 (en) 2005-01-19
WO2003091788A2 (en) 2003-11-06
CN1716073A (en) 2006-01-04
US20030203101A1 (en) 2003-10-30
CN1256620C (en) 2006-05-17
JP2005524100A (en) 2005-08-11
JP4508863B2 (en) 2010-07-21
CN100430810C (en) 2008-11-05

Similar Documents

Publication Publication Date Title
WO2003091788A3 (en) Process for forming a patterned thin film conductive structure on a substrate
WO2005028176A3 (en) Process for forming a patterned thin film structure for in-mold decoration
EP0875071B1 (en) Roll coated el panel
WO2008048928A3 (en) Methods of patterning a material on polymeric substrates
ATE333674T1 (en) METHOD FOR PRODUCING A TOUCH SENSITIVE SCREEN
CA2672296A1 (en) Large area circuitry using appliques
EP0850758A3 (en) Method for preparing and using a screen printing stencil having raised edges
AU4628600A (en) Methods for patterning polymer films, and use of the methods
EP1207557A3 (en) Method of attaching layer material and forming layer in predetermined pattern on substrate using mask
EP1014399A3 (en) Flexible thin film capacitor and method for producing the same
WO2004015662A3 (en) Liquid manufacturing processes for panel layer fabrication
TW200520056A (en) Pattern formation method, electronic circuit manufactured by the same, and electronic apparatus using the same
TWI268367B (en) Patterned member and production method thereof
AU2003258742A1 (en) Method for manufacturing an electrically conductive pattern
WO2009035488A3 (en) Control of properties of printed electrodes in at least two dimensions
EP1383364A3 (en) Circuit elements having an ink receptive coating and a conductive trace and methods of manufacture
CA2336918A1 (en) Improved method for forming conductive traces and printed circuits made thereby
WO2003063562A3 (en) A method of applying an edge electrode pattern to a touch screen
EP1375154A3 (en) Process of manufacturing nozzle plate for ink-jet print head
ATE246847T1 (en) PLANAR ANTENNA ARRANGEMENT
TW200706704A (en) Mask and method for electrokinetic deposition and patterning process on substrates
WO2007136734B1 (en) Fabrication of conductive micro traces using a deform and selective removal process
TW200620555A (en) Method of manufacturing a thin film transistor substrate and stripping composition
US20080101839A1 (en) Keyboard and Method for Producing a Keyboard
TW429568B (en) Method for thick film coating via hole sidewalls

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2004500109

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 2003724202

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 2003724202

Country of ref document: EP