WO2004003619A1 - Mems structure with mechanical overdeflection limiter - Google Patents

Mems structure with mechanical overdeflection limiter Download PDF

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Publication number
WO2004003619A1
WO2004003619A1 PCT/US2003/020143 US0320143W WO2004003619A1 WO 2004003619 A1 WO2004003619 A1 WO 2004003619A1 US 0320143 W US0320143 W US 0320143W WO 2004003619 A1 WO2004003619 A1 WO 2004003619A1
Authority
WO
WIPO (PCT)
Prior art keywords
mirror
gimbal
overhanging structure
hinge structures
overhanging
Prior art date
Application number
PCT/US2003/020143
Other languages
French (fr)
Inventor
Bryan P. Staker
James P. Spallas
Lawrence P. Muray
Andres Fernandez
Original Assignee
Glimmerglass Networks, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glimmerglass Networks, Inc. filed Critical Glimmerglass Networks, Inc.
Priority to AU2003256311A priority Critical patent/AU2003256311A1/en
Publication of WO2004003619A1 publication Critical patent/WO2004003619A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches

Definitions

  • This invention relates to electro-mechanical components such as micro electrical mechanical system (MEMS) devices or MEMS arrays and particularly to electrostatically- actuated electro-mechanical components wherein undesired deflection of movable elements due to nonlinear attractive effect may be controlled, preventing device failure.
  • Components constructed according to the invention are MEMS mirror arrays or other micromachined elements.
  • MEMS array structures comprise Silicon on Insulator (SOI) array structures on which is fabricated an integrated electrode array.
  • SOI Silicon on Insulator
  • One of the problems encountered is device failure due to uncontrolled electrostatic deflection of the movable element of the device resulting in contact with the underlying substrate during operation due to overvoltage drive or inertial ringing of the device. Failure mechanisms include voltage breakdown, mechanical stiction or welding, and mechanical deformation of hinge elements.
  • a MEMS device having a fixed element and a movable element wherein one of the fixed element and the movable element has at least one radially-extended stop or overdeflection limiter.
  • a fixed overlayer plate forms an aperture.
  • the aperture is sized to minimize vignetting and may be beveled on the margin.
  • Overdeflection limitation occurs during deflection before the movable element can impinge on an underlying electrode.
  • the overdeflection limiter may be conveniently placed adjacent a gimbaled hinge.
  • the mechanical stop may be a plate mounted to the top of a conventional MEMS structure or integrated into a three layer MEMS structure or two two-layer MEMS structures combined.
  • Figure 1 is a perspective view in cutaway of a first embodiment according to the invention of a double-gimbaled mirror with a top mounted overhang stop layer.
  • Figure 2 is a top view of a double gimbaled mirror with mechanical stop tabs extending from the mirror.
  • Figure 3 is a side cross-sectional view of a single array element with a flipped SOI overhang mounted on a standoff.
  • Figure 4 is a side cross-sectional view of a single array element with an overhang formed in a single process step as a bevel.
  • Figure 5 is a perspective view of the element of Figure 4.
  • Figure 6 is a side cross-sectional view of a single array element with an overhang of multiple bonded wafers.
  • Figure 7 is a perspective view in cutaway of a first embodiment according to the invention of a double-gimbaled mirror with a top mounted overhang stop layer.
  • FIG. 1 there is shown a perspective view in cutaway of a first embodiment of a single array element 10 of a MEMS array according to the invention.
  • a mirror 12 is mounted on a first pair of hinges ( Figure 2) 14, 16 to a gimbal 18.
  • the gimbal 18 is connected by a second pair of hinges 20, 22 having one degree of freedom to a frame 24, more particularly to a cantilever 26 of the frame 24 wherein an oxide layer 25 ( Figure 3) is provided for bonding and etch stop during manufacturing.
  • the oxide layer 24 is typically on the order of only one micron thick. The nature of the frame construction is immaterial so long as it provides support.
  • an overhang 28 is provided which serves as a mechanical stop against rotation of the mirror 12.
  • the overhang 28 is typically mounted above the mirror 12 (i.e., outside the electrode cavity) as part of a cap 30.
  • tab extensions 32, 34 extend from the mirror 12 adjacent the second hinge pair 20, 22.
  • an alternative and less desirable embodiment employs tab extensions 32A, 34A which extend from the overhang 28 to encounter the edge of the mirror 12. While the tab extension allow for reduced mirror mass, they potentially vignette the beam to result in signal loss.
  • the frame 24 spaces the mirror from electrodes 36-39 mounted on a substrate 40.
  • a dielectric 42 spaces the frame 24 from the substrate 40, and a plurality of standoffs 44, of which only one is shown in Figures 1 or 7) separate the cap 30 from the frame.
  • the standoffs 44 can be either insulative or conductive. Insulative standoffs are useful if there is a circuit to be formed that senses contact between the mirror and the overhang indicating overdeflection. Conductive standoffs make it easier to construct a conductive cap 30, thus maintaining the mirror 12 and the cap 30 at equal potential.
  • Figure 3 illustrates in cross section a view of Figure 1 or 2 along sight line 3-3 through tabs 32, 34, gimbal 18 and cantilever 26.
  • the overhang 28 is an aperture plate mounted on standoffs 44, which in this embodiment is a separately-formed layer formed on the cap 30.
  • the cap 30 and overhang 28 are typically SOI structures (Silicon on Insulator where two different silicon layers are typically bonded together but separated by an oxide) which are "flipped" after fabrication and mounted by an appropriate adhesive such as an epoxy to standoffs 44, which could be cylinders, beads or the like.
  • Figure 4 is a side cross-sectional view of a single array element along sight line 4-4 with a typical deep KOH etch along exposed crystal planes to form an aperture 30A .
  • the aperture 30A ( Figure 5) is a rectangle with exposed facets 52-56, etc. It can be attached in the same manner as the structure of Figure 3 with an appropriate adhesive to standoffs 44.
  • FIG. 6 is a side cross-sectional view of a single array element with multiple bonds of SOI, so-called triple-stacked SOI.
  • a dielectric 42 separates electrodes 38, 39 from the frame 40, and an oxide layer 25 is disposed between the frame 40 and the layer forming the mirror 12.
  • a further oxide layer 27 is disposed between the layer of the mirror 12 and a further silicon cap 30, which in this case is step etched (before bonding) to form a shelf 31.
  • the cap 30 is bonded to the layer of the mirror 12 at the oxide layer 27 after the oxidation and release step of the manufacturing process.

Abstract

A mirror (12) is mounted on a first pair of hinges (14, 16) to a gimble (18). The gimble (18) is connected by a second pair of hinges (20, 21) having one degree of freedom to a frame (24) wherein an oxide layer (25) is provided for bonding and etch stop during manufacturing.

Description

MEMS STRUCTURE WITH MECHANICAL OVERDEFLECTION
LIMITER
CROSS-REFERENCES TO RELATED APPLICATIONS [01] NOT APPLICABLE
STATEMENT AS TO RIGHTS TO INVENTIONS MADE UNDER FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT [02] NOT APPLICABLE
REFERENCE TO A "SEQUENCE LISTING," A TABLE, OR A COMPUTER PROGRAM LISTING APPENDIX SUBMITTED ON A COMPACT DISK. [03] NOT APPLICABLE
BACKGROUND OF THE INVENTION
[04] This invention relates to electro-mechanical components such as micro electrical mechanical system (MEMS) devices or MEMS arrays and particularly to electrostatically- actuated electro-mechanical components wherein undesired deflection of movable elements due to nonlinear attractive effect may be controlled, preventing device failure. Components constructed according to the invention are MEMS mirror arrays or other micromachined elements.
[05] Conventional MEMS array structures comprise Silicon on Insulator (SOI) array structures on which is fabricated an integrated electrode array. One of the problems encountered is device failure due to uncontrolled electrostatic deflection of the movable element of the device resulting in contact with the underlying substrate during operation due to overvoltage drive or inertial ringing of the device. Failure mechanisms include voltage breakdown, mechanical stiction or welding, and mechanical deformation of hinge elements. Anyone one of these failures can render a cell useless and severely hamper the usefulness of an array. [06] In a commonly-owned co-pending patent application Serial No. 10/128,368 filed
April 23, 2002, the structure of a MEMS device is disclosed which employs a form of a stop based on the present invention. The co-pending application is not prior art to the present invention.
[07] In U.S. Patent No. 6,315,423 claiming a priority date of July 13, 1999, one form of mechanical stop is disclosed for a MEMS device which has high angles of displacement with highly compliant hinges. The travel stops therein are for overswing and x-axis shock protection, since the hinge design therein allows for large desired rotational motions as well as undesired multi-axis translational motions. Hence the travel stops therein are not one- dimensional stops.
[08] A solution is needed that limits the maximum deflection of the MEMS device due to inherent electrostatic parallel plate instability without compromising device performance or manufacturability.
SUMMARY OF THE INVENTION
[09] According to the invention, a MEMS device is provided having a fixed element and a movable element wherein one of the fixed element and the movable element has at least one radially-extended stop or overdeflection limiter. A fixed overlayer plate forms an aperture.
The aperture is sized to minimize vignetting and may be beveled on the margin.
Overdeflection limitation occurs during deflection before the movable element can impinge on an underlying electrode. The overdeflection limiter may be conveniently placed adjacent a gimbaled hinge.
[10] The mechanical stop may be a plate mounted to the top of a conventional MEMS structure or integrated into a three layer MEMS structure or two two-layer MEMS structures combined. The invention will be better understood by reference to the following detailed description in connection with the accompanying illustrations.
BRIEF DESCRIPTION OF THE DRAWINGS
[11] Figure 1 is a perspective view in cutaway of a first embodiment according to the invention of a double-gimbaled mirror with a top mounted overhang stop layer.
[12] Figure 2 is a top view of a double gimbaled mirror with mechanical stop tabs extending from the mirror.
[13] Figure 3 is a side cross-sectional view of a single array element with a flipped SOI overhang mounted on a standoff.
[14] Figure 4 is a side cross-sectional view of a single array element with an overhang formed in a single process step as a bevel. [15] Figure 5 is a perspective view of the element of Figure 4.
[16] Figure 6 is a side cross-sectional view of a single array element with an overhang of multiple bonded wafers.
[17] Figure 7 is a perspective view in cutaway of a first embodiment according to the invention of a double-gimbaled mirror with a top mounted overhang stop layer.
DETAILED DESCRIPTION OF THE INVENTION [18] Referring to Figure 1 there is shown a perspective view in cutaway of a first embodiment of a single array element 10 of a MEMS array according to the invention. A mirror 12 is mounted on a first pair of hinges (Figure 2) 14, 16 to a gimbal 18. The gimbal 18 is connected by a second pair of hinges 20, 22 having one degree of freedom to a frame 24, more particularly to a cantilever 26 of the frame 24 wherein an oxide layer 25 (Figure 3) is provided for bonding and etch stop during manufacturing. The oxide layer 24 is typically on the order of only one micron thick. The nature of the frame construction is immaterial so long as it provides support. For example, surface micromachine processes and bulk micromachine processes can be employed to construct a frame without departing from the spirit and scope of the invention. According to the invention, an overhang 28 is provided which serves as a mechanical stop against rotation of the mirror 12. The overhang 28 is typically mounted above the mirror 12 (i.e., outside the electrode cavity) as part of a cap 30. In Figure 1, tab extensions 32, 34 extend from the mirror 12 adjacent the second hinge pair 20, 22. Referring to Figure 7, an alternative and less desirable embodiment employs tab extensions 32A, 34A which extend from the overhang 28 to encounter the edge of the mirror 12. While the tab extension allow for reduced mirror mass, they potentially vignette the beam to result in signal loss. [19] The frame 24 spaces the mirror from electrodes 36-39 mounted on a substrate 40. A dielectric 42 spaces the frame 24 from the substrate 40, and a plurality of standoffs 44, of which only one is shown in Figures 1 or 7) separate the cap 30 from the frame. Depending on the design of over-rotation sensors, the standoffs 44 can be either insulative or conductive. Insulative standoffs are useful if there is a circuit to be formed that senses contact between the mirror and the overhang indicating overdeflection. Conductive standoffs make it easier to construct a conductive cap 30, thus maintaining the mirror 12 and the cap 30 at equal potential.
[20] Figure 3 illustrates in cross section a view of Figure 1 or 2 along sight line 3-3 through tabs 32, 34, gimbal 18 and cantilever 26. The overhang 28 is an aperture plate mounted on standoffs 44, which in this embodiment is a separately-formed layer formed on the cap 30. The cap 30 and overhang 28 are typically SOI structures (Silicon on Insulator where two different silicon layers are typically bonded together but separated by an oxide) which are "flipped" after fabrication and mounted by an appropriate adhesive such as an epoxy to standoffs 44, which could be cylinders, beads or the like. Alternatively, the top layer of the mirror 12 on its frame 24 could be etched to match a complementary cross etch in the mating face of the overhang 28 to assure accurate seating when beads are used as spacers. A KOH etch technique could be used wherein the crystal structures of the respective SOI chips are cross-ways to one another. [21] Figure 4 is a side cross-sectional view of a single array element along sight line 4-4 with a typical deep KOH etch along exposed crystal planes to form an aperture 30A . The aperture 30A (Figure 5) is a rectangle with exposed facets 52-56, etc. It can be attached in the same manner as the structure of Figure 3 with an appropriate adhesive to standoffs 44. [22] Flipped SOI has advantanges over conventional KOH fabrication of an aperture, since it permits relatively loose manufacturing tolerances of lithography, thus allowing the tabs 32, 34 to be reliably shorter. It should be noted, however, that polishing and spacing are critical to the required tolerances.
[23] Figure 6 is a side cross-sectional view of a single array element with multiple bonds of SOI, so-called triple-stacked SOI. A dielectric 42 separates electrodes 38, 39 from the frame 40, and an oxide layer 25 is disposed between the frame 40 and the layer forming the mirror 12. A further oxide layer 27 is disposed between the layer of the mirror 12 and a further silicon cap 30, which in this case is step etched (before bonding) to form a shelf 31. The cap 30 is bonded to the layer of the mirror 12 at the oxide layer 27 after the oxidation and release step of the manufacturing process. This structure was disclosed but not claimed in a co-pending patent application which is not prior art. No extra assembly is required, since the triple SOI manufacturing step is an integrated process. However, it may be difficult to maintain isolation of mechanical stop layer from the stand-off layer due to the thin oxide. [24] The invention has been explained with reference to specific embodiments. Other embodiments will be evident to those of skill in the art. It is therefore not intended that this invention be limited, except as indicated by the appended claims.

Claims

WHAT IS CLAIMED IS:
1. A double-gimbaled micromachined mirror structure for parallel-plate electrostatic operation, said mirror structure comprising: a frame; a mirror; a gimbal around said mirror; a plurality of hinge structures at four positions on said gimbal, a first pair of said hinge structures connecting said mirror to said gimbal and a second pair of said hinge structures connecting said frame to said gimbal, said hinge structures permitting motion substantially only normal to said mirror and wherein adjacent each element of said second pair is a tab extension from said mirror for serving as rotational displacement limitation; and overhanging structure adjacent each of said four positions and disposed to confront each said tab extension to limit rotational displacement of said mirror.
2. The apparatus according to claim 1 wherein said overhanging structure and said mirror are maintained in sufficient differential in potential to permit detection of contact of said overhanging structure and said mirror through detection of voltage change.
3. The apparatus according to claim 1 wherein said overhanging structure and said mirror are maintained in sufficient differential in potential to permit detection of contact of said overhanging structure and said mirror through detection of current change.
4. The apparatus according to claim 1 wherein said overhanging structure and said mirror are maintained in equipotential.
5. The apparatus according to claim 1 wherein said detectable differential is sufficiently small to inhibit arcing upon contact between said overhanging structure and said mirror or gimbal.
6. The apparatus according to claim 1 wherein each of said first pair of hinge structures includes a gimbal wraparound for serving as rotational displacement limitation in confrontation with said overhanging structure.
7. The apparatus according to claim 1 wherein said overhanging structure is disposed to provide a clear aperture at all design viewing angles of said mirror.
8. The apparatus according to claim 1 wherein said detectable differential is sufficiently small to inhibit arcing upon contact between said overhanging structure and said mirror or gimbal.
9. A double-gimbaled micromachined mirror structure for parallel-plate electrostatic operation, said mirror structure comprising: a frame; a mirror; a gimbal around said mirror; a plurality of hinge structures at four positions on said gimbal, a first pair of said hinge structures connecting said mirror to said gimbal and a second pair of said hinge structures connecting said frame to said gimbal, said hinge structures permitting motion substantially only normal to said mirror and wherein adjacent each element of said first pair is a gimbal wraparound for serving as rotational displacement limitation; and overhanging structure adjacent each of said four positions and disposed to confront each said gimbal wraparound to limit rotational displacement of said mirror.
10. The apparatus according to claim 9 wherein said overhanging structure and said mirror are maintained in sufficient differential in potential to permit detection of contact of said substrate and said mirror through detection of voltage change.
11. The apparatus according to claim 9 wherein said overhanging structure and said mirror are maintained in sufficient differential in potential to permit detection of contact of said substrate and said mirror through detection of current change.
12. The apparatus according to claim 9 wherein said overhanging structure and said mirror are maintained in equipotential.
13. The apparatus according to claim 9 wherein said detectable differential is sufficiently small to inhibit arcing upon contact between said mirror and said overhang.
14. The apparatus according to claim 9 wherein near each element of said second pair is a tab extension from said overhanging structure for serving as rotational displacement limitation on said mirror.
15. The apparatus according to claim 9 wherein said overhanging structure is disposed to provide a clear aperture at all design viewing angles of said mirror.
16. The apparatus according to claim 1 wherein said overhanging structure is disposed over said mirror and mounted on a flipped SOI handle structure.
17. The apparatus according to claim 9 wherein said overhanging structure is disposed over said mirror and mounted on a flipped SOI handle structure.
18. The apparatus according to claim 1 wherein said overhanging structure is disposed over said mirror and formed in a bevel etched by potassium hydroxide.
19. The apparatus according to claim 9 wherein said overhanging structure is disposed over said mirror and formed in a bevel etched by potassium hydroxide.
20. The apparatus according to claim 1 wherein said overhanging structure is disposed over said mirror and formed of a thinned silicon wafer.
21. The apparatus according to claim 9 wherein said overhanging structure is disposed over said mirror and formed of a thinned silicon wafer.
22. The apparatus according to claim 1 wherein said hinge structures are folded longitudinal gimbal hinge structures.
23. The apparatus according to claim 9 wherein said hinge structures are folded longitudinal gimbal hinge structures.
24. The apparatus according to claim 1 wherein said folded longitudinal gimbal hinge structures attached to the gimbal are recessed into the mirror.
25. The apparatus according to claim 1 wherein said mirror is round.
PCT/US2003/020143 2002-06-28 2003-06-24 Mems structure with mechanical overdeflection limiter WO2004003619A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003256311A AU2003256311A1 (en) 2002-06-28 2003-06-24 Mems structure with mechanical overdeflection limiter

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/186,566 2002-06-28
US10/186,566 US6641273B1 (en) 2002-06-28 2002-06-28 MEMS structure with mechanical overdeflection limiter

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WO2004003619A1 true WO2004003619A1 (en) 2004-01-08

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AU (1) AU2003256311A1 (en)
WO (1) WO2004003619A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI256940B (en) * 2004-06-18 2006-06-21 Walsin Lihwa Corp Integration manufacturing process for MEMS element
WO2006069305A2 (en) * 2004-12-22 2006-06-29 University Of Virginia Patent Foundation The use of microwaves for thermal and non-thermal applications in micro and nanoscale devices
KR100868759B1 (en) * 2007-01-25 2008-11-17 삼성전기주식회사 MEMS device and fabrication method of the same
JP2010107628A (en) * 2008-10-29 2010-05-13 Topcon Corp Mems scanning type mirror and method of manufacturing the same
GB2506171B (en) * 2012-09-24 2015-01-28 Wolfson Microelectronics Plc MEMS device and process
US9335544B2 (en) * 2013-03-15 2016-05-10 Rit Wireless Ltd. Electrostatically steerable actuator
US9672289B1 (en) 2013-07-23 2017-06-06 Plentyoffish Media Ulc Apparatus, method and article to facilitate matching of clients in a networked environment
US9519135B2 (en) * 2014-03-05 2016-12-13 Palo Alto Research Center Incorporated Aperture for illuminating micromirror arrays having mirror tilt axis not parallel with an array axis
EP3192770B1 (en) 2016-01-12 2019-07-17 TRUMPF Schweiz AG Device for two-dimensional deflection of a laser beam
EP3620429A1 (en) * 2018-09-06 2020-03-11 Infineon Technologies AG Mems membrane transducer and method for producing same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4721274A (en) * 1985-08-21 1988-01-26 Erb Robert C Gimbal assembly

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4337506A (en) * 1978-12-20 1982-06-29 Terada James I Adjustable lamp
US4598585A (en) * 1984-03-19 1986-07-08 The Charles Stark Draper Laboratory, Inc. Planar inertial sensor
US5016072A (en) * 1988-01-13 1991-05-14 The Charles Stark Draper Laboratory, Inc. Semiconductor chip gyroscopic transducer
US5488862A (en) * 1993-10-18 1996-02-06 Armand P. Neukermans Monolithic silicon rate-gyro with integrated sensors
US6315423B1 (en) 1999-07-13 2001-11-13 Input/Output, Inc. Micro machined mirror
US6337760B1 (en) * 2000-07-17 2002-01-08 Reflectivity, Inc. Encapsulated multi-directional light beam steering device
US6379510B1 (en) * 2000-11-16 2002-04-30 Jonathan S. Kane Method of making a low voltage micro-mirror array light beam switch

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4721274A (en) * 1985-08-21 1988-01-26 Erb Robert C Gimbal assembly

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US6805454B2 (en) 2004-10-19
US6641273B1 (en) 2003-11-04
AU2003256311A1 (en) 2004-01-19
US20040001263A1 (en) 2004-01-01

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