WO2004008592A3 - Remote uv laser system and methods of use - Google Patents

Remote uv laser system and methods of use Download PDF

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Publication number
WO2004008592A3
WO2004008592A3 PCT/US2003/022177 US0322177W WO2004008592A3 WO 2004008592 A3 WO2004008592 A3 WO 2004008592A3 US 0322177 W US0322177 W US 0322177W WO 2004008592 A3 WO2004008592 A3 WO 2004008592A3
Authority
WO
WIPO (PCT)
Prior art keywords
coupled
laser system
oscillator cavity
harmonic generator
remote
Prior art date
Application number
PCT/US2003/022177
Other languages
French (fr)
Other versions
WO2004008592A2 (en
Inventor
James D Kafka
David E Spence
Original Assignee
Spectra Physics
James D Kafka
David E Spence
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Spectra Physics, James D Kafka, David E Spence filed Critical Spectra Physics
Priority to JP2004521886A priority Critical patent/JP2005533380A/en
Priority to EP03764718A priority patent/EP1540782A4/en
Publication of WO2004008592A2 publication Critical patent/WO2004008592A2/en
Publication of WO2004008592A3 publication Critical patent/WO2004008592A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1106—Mode locking
    • H01S3/1112—Passive mode locking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/40—Removing material taking account of the properties of the material involved
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
    • H01S3/06729—Peculiar transverse fibre profile
    • H01S3/06741—Photonic crystal fibre, i.e. the fibre having a photonic bandgap
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1106—Mode locking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/163—Solid materials characterised by a crystal matrix
    • H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
    • H01S3/1673—YVO4 [YVO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383—Parallel arrangements

Abstract

A laser apparatus (100) includes a modelocked laser system (110) with a high reflector (14) and an output coupler (16) that define an oscillator cavity (12). An output beam is produced from the oscillator cavity (12). A gain medium (18) and a modelocking device (19) are positioned in the oscillator cavity (12). A diode pump source (20) produces a pump beam that is incident on the gain medium (18). A second harmonic generator (32) is coupled to the oscillator cavity (12). A third harmonic generator (36) that produces a UV output beam (40), is coupled to the second harmonic generator (32). A photonic crystal fiber (114) is provided with a proximal end (116) coupled to the laser system (110). A delivery device (120) is coupled to a distal portion (118) of the photonic crystal fiber.
PCT/US2003/022177 2002-07-12 2003-07-11 Remote uv laser system and methods of use WO2004008592A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004521886A JP2005533380A (en) 2002-07-12 2003-07-11 Remote UV laser system and method of use
EP03764718A EP1540782A4 (en) 2002-07-12 2003-07-11 Remote uv laser system and methods of use

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/194,439 US6822978B2 (en) 1999-05-27 2002-07-12 Remote UV laser system and methods of use
US10/194,439 2002-07-12

Publications (2)

Publication Number Publication Date
WO2004008592A2 WO2004008592A2 (en) 2004-01-22
WO2004008592A3 true WO2004008592A3 (en) 2004-04-15

Family

ID=30114748

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/022177 WO2004008592A2 (en) 2002-07-12 2003-07-11 Remote uv laser system and methods of use

Country Status (4)

Country Link
US (2) US6822978B2 (en)
EP (1) EP1540782A4 (en)
JP (1) JP2005533380A (en)
WO (1) WO2004008592A2 (en)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6822978B2 (en) * 1999-05-27 2004-11-23 Spectra Physics, Inc. Remote UV laser system and methods of use
US6587487B2 (en) * 2000-12-19 2003-07-01 Photonics Industries International, Inc. Harmonic laser
US6697390B2 (en) * 2002-02-01 2004-02-24 Spectra Physics Lasers, Inc. Extended lifetime harmonic generator
GB2395353B (en) * 2002-02-18 2004-10-13 Univ Southampton Pulsed light sources
US7103076B2 (en) * 2002-10-24 2006-09-05 Matsushita Electric Industrial Co., Ltd. Ultrashort pulsed laser and optical head using the same
US7088749B2 (en) * 2003-01-06 2006-08-08 Miyachi Unitek Corporation Green welding laser
US7352456B2 (en) * 2003-04-08 2008-04-01 Kla-Tencor Technologies Corp. Method and apparatus for inspecting a substrate using a plurality of inspection wavelength regimes
EP1697729B1 (en) * 2003-09-04 2010-11-10 KLA-Tencor Corporation Methods for inspection of a specimen using different inspection parameters
EP1517415A1 (en) * 2003-09-18 2005-03-23 Leica Geosystems AG Geodetic apparatus with laser source
US7280570B2 (en) * 2003-12-15 2007-10-09 Leica Microsystems Device for generating a light beam including multiple wavelengths
JP5255838B2 (en) * 2004-08-25 2013-08-07 ケーエルエー−テンカー コーポレイション Fiber amplifier based light source for semiconductor inspection
US7924892B2 (en) * 2004-08-25 2011-04-12 Kla-Tencor Technologies Corporation Fiber amplifier based light source for semiconductor inspection
US7295739B2 (en) * 2004-10-20 2007-11-13 Kla-Tencor Technologies Corporation Coherent DUV illumination for semiconductor wafer inspection
DE102005017607A1 (en) * 2005-04-16 2006-10-19 Leica Microsystems Cms Gmbh Apparatus and method for providing shortwave light
US7492803B2 (en) * 2005-06-10 2009-02-17 Hewlett-Packard Development Company, L.P. Fiber-coupled single photon source
US20080013586A1 (en) * 2005-09-06 2008-01-17 Spence David E Narrow band diode pumping of laser gain materials
US7440176B2 (en) * 2006-02-17 2008-10-21 Newport Corporation Bi-directionally pumped optical fiber lasers and amplifiers
US7457328B2 (en) * 2006-05-17 2008-11-25 Battelle Memorial Institute Polarization methods for diode laser excitation of solid state lasers
US8130800B2 (en) 2006-05-17 2012-03-06 Battelle Memorial Institute Mode-locked solid state lasers using diode laser excitation
US7680170B2 (en) * 2006-06-15 2010-03-16 Oclaro Photonics, Inc. Coupling devices and methods for stacked laser emitter arrays
US7866897B2 (en) * 2006-10-06 2011-01-11 Oclaro Photonics, Inc. Apparatus and method of coupling a fiber optic device to a laser
US20080090396A1 (en) * 2006-10-06 2008-04-17 Semiconductor Energy Laboratory Co., Ltd. Light exposure apparatus and method for making semiconductor device formed using the same
EP1959292A3 (en) * 2007-02-13 2009-06-17 Olympus Corporation Laser microscope
JP2010535361A (en) * 2007-08-01 2010-11-18 ディープ フォトニクス コーポレーション Method and apparatus for pulsed harmonic ultraviolet laser
JP2011507280A (en) * 2007-12-17 2011-03-03 オクラロ フォトニクス，インク． Laser emitter module and construction method
US8804246B2 (en) 2008-05-08 2014-08-12 Ii-Vi Laser Enterprise Gmbh High brightness diode output methods and devices
US20100278200A1 (en) * 2009-05-04 2010-11-04 Coherent, Inc. External frequency-quadruped 1064 nm mode-locked laser
US20120055909A1 (en) * 2009-05-15 2012-03-08 Hideaki Miyake Method of laser-welding and method of manufacturing battery including the same
JP6050684B2 (en) * 2010-01-22 2016-12-21 ニューポート コーポレーション Widely tunable optical parametric oscillator
EP2529452B1 (en) 2010-01-22 2018-05-23 II-VI Laser Enterprise GmbH Homogenization of far field fiber coupled radiation
US8644357B2 (en) 2011-01-11 2014-02-04 Ii-Vi Incorporated High reliability laser emitter modules
US8804233B2 (en) * 2011-08-09 2014-08-12 Ofs Fitel, Llc Fiber assembly for all-fiber delivery of high energy femtosecond pulses
CN102545027B (en) * 2012-02-10 2013-08-21 厦门大学 Yb: YAG (yttrium aluminum garnet) and Cr, Yb: YAG self-Q-switching laser
US9425575B2 (en) * 2013-06-11 2016-08-23 Halliburton Energy Services, Inc. Generating broadband light downhole for wellbore application
JP6069133B2 (en) * 2013-08-30 2017-02-01 株式会社日立ハイテクノロジーズ Defect inspection apparatus and defect inspection method
EP2961012A1 (en) * 2014-06-26 2015-12-30 Light Speed Marker, S.L. Laser system for modifying objects
JP6261471B2 (en) * 2014-07-31 2018-01-17 株式会社キーエンス Laser processing equipment
US10317281B2 (en) * 2015-12-29 2019-06-11 Oak Analytics Compact spectrometer
EP3549212A4 (en) 2016-12-04 2020-08-05 Newport Corporation High-power mode-locked laser system and methods of use
CN110197990A (en) * 2019-06-28 2019-09-03 华中科技大学 A kind of optics frequency tripling booster

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5909306A (en) * 1996-02-23 1999-06-01 President And Fellows Of Harvard College Solid-state spectrally-pure linearly-polarized pulsed fiber amplifier laser system useful for ultraviolet radiation generation
US6185253B1 (en) * 1997-10-31 2001-02-06 Lucent Technology, Inc. Perceptual compression and robust bit-rate control system
US6421573B1 (en) * 1999-05-27 2002-07-16 Spectra Physics Lasers, Inc. Quasi-continuous wave lithography apparatus and method

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3626143A (en) * 1969-04-02 1971-12-07 American Can Co Scoring of materials with laser energy
US4377340A (en) * 1980-10-24 1983-03-22 Hamamatsu Systems, Inc. Method and apparatus for detecting particles on a material
US4630276A (en) * 1984-10-09 1986-12-16 Aeronca Electronics, Inc. Compact laser scanning system
US4933944A (en) * 1989-02-28 1990-06-12 University Of New Mexico Laser mode locking method and apparatus
US4942582A (en) * 1989-04-24 1990-07-17 Spectra-Physics Single frequency solid state laser
US5127726A (en) * 1989-05-19 1992-07-07 Eastman Kodak Company Method and apparatus for low angle, high resolution surface inspection
US4989984A (en) * 1989-11-08 1991-02-05 Environmental Research Institute Of Michigan System for measuring optical characteristics of curved surfaces
JPH03249550A (en) * 1990-02-28 1991-11-07 Mitsubishi Electric Corp Pattern defect inspecting device
CN1021269C (en) * 1990-10-11 1993-06-16 中国科学院上海光学精密机械研究所 Chamber type higher harmonic laser device
US5177559A (en) * 1991-05-17 1993-01-05 International Business Machines Corporation Dark field imaging defect inspection system for repetitive pattern integrated circuits
DE4229397C2 (en) * 1992-09-03 1996-11-21 Deutsche Forsch Luft Raumfahrt Device for removing material from a target
US5410559A (en) * 1994-02-04 1995-04-25 Spectra-Physics Lasers, Inc. Diode pumped laser with strong thermal lens crystal
US5394413A (en) * 1994-02-08 1995-02-28 Massachusetts Institute Of Technology Passively Q-switched picosecond microlaser
US5623341A (en) * 1994-02-22 1997-04-22 Rockwell International Corporation Method of monitoring a surface using surface spectroscopy
US5712701A (en) * 1995-03-06 1998-01-27 Ade Optical Systems Corporation Surface inspection system and method of inspecting surface of workpiece
US5627854A (en) * 1995-03-15 1997-05-06 Lucent Technologies Inc. Saturable bragg reflector
DE19529656B4 (en) 1995-08-11 2007-01-04 Heidelberg Instruments Mikrotechnik Gmbh Process for the production of microstructures
US5812308A (en) * 1995-12-20 1998-09-22 Spectra Physics Lasers, Inc. Mode locked laser and amplifier
US5834160A (en) * 1996-01-16 1998-11-10 Lucent Technologies Inc. Method and apparatus for forming fine patterns on printed circuit board
US5940418A (en) * 1996-06-13 1999-08-17 Jmar Technology Co. Solid-state laser system for ultra-violet micro-lithography
US5822345A (en) 1996-07-08 1998-10-13 Presstek, Inc. Diode-pumped laser system and method
US5699160A (en) * 1996-09-23 1997-12-16 International Business Machines Corporation Optical apparatus for inspecting laser texture
US5936983A (en) * 1997-01-24 1999-08-10 Photonics Industries International, Inc. Third harmonic generation apparatus
KR100459813B1 (en) 1997-01-29 2004-12-04 마이크로닉 레이저 시스템즈 에이비 Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
US5840239A (en) * 1997-01-31 1998-11-24 3D Systems, Inc. Apparatus and method for forming three-dimensional objects in stereolithography utilizing a laser exposure system having a diode pumped frequency quadrupled solid state laser
JP3233060B2 (en) * 1997-02-26 2001-11-26 株式会社デンソー Laser processing method for resin products
JPH10258386A (en) * 1997-03-14 1998-09-29 Canon Inc Laser beam machining method and manufacture of liquid jet recording head using this laser beam machining method
US6188704B1 (en) * 1998-01-26 2001-02-13 Rocky Mountain Instrument Co. Diode-pumped laser drive
US6157663A (en) * 1998-04-16 2000-12-05 3D Systems, Inc. Laser with optimized coupling of pump light to a gain medium in a side-pumped geometry
US5987049A (en) * 1998-04-24 1999-11-16 Time-Bandwidth Products Ag Mode locked solid-state laser pumped by a non-diffraction-limited pumping source and method for generating pulsed laser radiation by pumping with a non-diffraction-limited pumping beam
US6185235B1 (en) * 1998-11-24 2001-02-06 Spectra-Physics Lasers, Inc. Lasers with low doped gain medium
EP1340725B1 (en) * 1999-02-19 2006-01-25 Crystal Fibre A/S Method of producing a photonic crystal fibre
US6061370A (en) * 1999-03-26 2000-05-09 Photonics Industries International, Inc. Fourth harmonic generation apparatus
CN1192261C (en) * 1999-04-01 2005-03-09 Nkt研究及创新公司 Photonic crystal fibre and method for its production
US6373565B1 (en) * 1999-05-27 2002-04-16 Spectra Physics Lasers, Inc. Method and apparatus to detect a flaw in a surface of an article
US6246706B1 (en) * 1999-05-27 2001-06-12 Spectra Physics Lasers, Inc. Laser writing method and apparatus
US6822978B2 (en) * 1999-05-27 2004-11-23 Spectra Physics, Inc. Remote UV laser system and methods of use
JP5123456B2 (en) * 2000-01-10 2013-01-23 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド Laser cutting method and laser system for conductive link
EP1186929B2 (en) * 2000-06-17 2009-09-30 Leica Microsystems CMS GmbH System for investigating microscopic samples using a scanning microscope

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5909306A (en) * 1996-02-23 1999-06-01 President And Fellows Of Harvard College Solid-state spectrally-pure linearly-polarized pulsed fiber amplifier laser system useful for ultraviolet radiation generation
US6185253B1 (en) * 1997-10-31 2001-02-06 Lucent Technology, Inc. Perceptual compression and robust bit-rate control system
US6421573B1 (en) * 1999-05-27 2002-07-16 Spectra Physics Lasers, Inc. Quasi-continuous wave lithography apparatus and method

Also Published As

Publication number Publication date
US20030008448A1 (en) 2003-01-09
JP2005533380A (en) 2005-11-04
EP1540782A2 (en) 2005-06-15
US6822978B2 (en) 2004-11-23
US20050094679A1 (en) 2005-05-05
WO2004008592A2 (en) 2004-01-22
EP1540782A4 (en) 2005-09-07

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