WO2004010164A3 - Catadioptric projection objective - Google Patents

Catadioptric projection objective Download PDF

Info

Publication number
WO2004010164A3
WO2004010164A3 PCT/EP2003/007758 EP0307758W WO2004010164A3 WO 2004010164 A3 WO2004010164 A3 WO 2004010164A3 EP 0307758 W EP0307758 W EP 0307758W WO 2004010164 A3 WO2004010164 A3 WO 2004010164A3
Authority
WO
WIPO (PCT)
Prior art keywords
projection objective
objective
catadioptric
concave mirror
diaphragm
Prior art date
Application number
PCT/EP2003/007758
Other languages
French (fr)
Other versions
WO2004010164A2 (en
Inventor
Alexander Epple
Aurelian Dodoc
Original Assignee
Zeiss Carl Smt Ag
Alexander Epple
Aurelian Dodoc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Alexander Epple, Aurelian Dodoc filed Critical Zeiss Carl Smt Ag
Priority to AU2003258519A priority Critical patent/AU2003258519A1/en
Priority to JP2004522476A priority patent/JP2005533285A/en
Priority to EP03765012A priority patent/EP1523692A2/en
Publication of WO2004010164A2 publication Critical patent/WO2004010164A2/en
Publication of WO2004010164A3 publication Critical patent/WO2004010164A3/en
Priority to US11/036,155 priority patent/US7203010B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Abstract

A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective whilst generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.
PCT/EP2003/007758 2002-07-18 2003-07-17 Catadioptric projection objective WO2004010164A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2003258519A AU2003258519A1 (en) 2002-07-18 2003-07-17 Catadioptric projection objective
JP2004522476A JP2005533285A (en) 2002-07-18 2003-07-17 Catadioptric projection objective
EP03765012A EP1523692A2 (en) 2002-07-18 2003-07-17 Catadioptric projection objective
US11/036,155 US7203010B2 (en) 2002-07-18 2005-01-18 Catadioptric projection objective

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39655202P 2002-07-18 2002-07-18
US60/396,552 2002-07-18

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/036,155 Continuation US7203010B2 (en) 2002-07-18 2005-01-18 Catadioptric projection objective

Publications (2)

Publication Number Publication Date
WO2004010164A2 WO2004010164A2 (en) 2004-01-29
WO2004010164A3 true WO2004010164A3 (en) 2004-06-03

Family

ID=30770919

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/007758 WO2004010164A2 (en) 2002-07-18 2003-07-17 Catadioptric projection objective

Country Status (5)

Country Link
US (1) US7203010B2 (en)
EP (1) EP1523692A2 (en)
JP (1) JP2005533285A (en)
AU (1) AU2003258519A1 (en)
WO (1) WO2004010164A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10316428A1 (en) * 2003-04-08 2004-10-21 Carl Zeiss Smt Ag Catadioptric reduction lens
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101376931B1 (en) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 Catadioptric projection objective with intermediate images
KR101500052B1 (en) 2004-06-10 2015-03-09 칼 짜이스 에스엠티 게엠베하 Projection objective for a microlithographic projection exposure apparatus
US20090115986A1 (en) * 2005-06-02 2009-05-07 Carl Zeiss Smt Ag Microlithography projection objective
EP1746463A2 (en) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Method for correcting a lithographic projection objective and projection objective of such a kind
EP1837695A1 (en) * 2006-03-22 2007-09-26 Carl Zeiss SMT AG Catadioptric imaging system with beam splitter
DE102008001216A1 (en) 2007-04-18 2008-10-23 Carl Zeiss Smt Ag Projection objective for microlithography
DE102011003145A1 (en) 2010-02-09 2011-08-11 Carl Zeiss SMT GmbH, 73447 Optical system with aperture device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0869383A2 (en) * 1997-04-01 1998-10-07 Nikon Corporation Catadioptric optical system
US5999333A (en) * 1994-04-28 1999-12-07 Nikon Corporation Exposure apparatus having catadioptric projection optical system
EP1079253A1 (en) * 1998-04-07 2001-02-28 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system
EP1115019A2 (en) * 1999-12-29 2001-07-11 Carl Zeiss Projection exposure lens with aspheric elements

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5052764A (en) 1989-08-31 1991-10-01 Hughes Aircraft Company System and method for forming a holographic exposure with a simulated source
DE4417489A1 (en) 1994-05-19 1995-11-23 Zeiss Carl Fa High-aperture catadioptric reduction lens for microlithography
EP1293832A1 (en) * 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
KR100854052B1 (en) 1999-12-29 2008-08-26 칼 짜이스 에스엠테 아게 Projection objective lens comprising adjacent aspheric lens surfaces
TWI282487B (en) * 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5999333A (en) * 1994-04-28 1999-12-07 Nikon Corporation Exposure apparatus having catadioptric projection optical system
EP0869383A2 (en) * 1997-04-01 1998-10-07 Nikon Corporation Catadioptric optical system
EP1079253A1 (en) * 1998-04-07 2001-02-28 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system
EP1115019A2 (en) * 1999-12-29 2001-07-11 Carl Zeiss Projection exposure lens with aspheric elements

Also Published As

Publication number Publication date
US20050207029A1 (en) 2005-09-22
EP1523692A2 (en) 2005-04-20
US7203010B2 (en) 2007-04-10
WO2004010164A2 (en) 2004-01-29
AU2003258519A1 (en) 2004-02-09
AU2003258519A8 (en) 2004-02-09
JP2005533285A (en) 2005-11-04

Similar Documents

Publication Publication Date Title
JP5084330B2 (en) Observation optical system
WO2005111689A3 (en) Catadioptric projection objective with intermediate images
WO2007079061A3 (en) Projection system with beam homogenizer
ATE553597T1 (en) SELF-REGULATING STEREOSCOPIC CAMERA SYSTEM
WO2007134137A3 (en) High resolution imaging system
ES2187394T1 (en) WAVE FRONT SENSOR WITH MULTIPOTENCY BEAM MODES, INDEPENDENT ADJUSTMENT CAMERA AND ACCOMMODATION FIELD MEASUREMENT.
WO2002006767A8 (en) Dental panoramic imaging system
WO2004107050A3 (en) Charged particle beamlet exposure system
MXPA03006835A (en) An illumination engine for a projection display using a tapered light pipe.
EP1580579A3 (en) Beam homogenizer and laser irradiation apparatus
CA2211622A1 (en) Stereomicroscope
WO2004010164A3 (en) Catadioptric projection objective
WO2002056062A3 (en) Catoptric and catadioptric imaging systems
WO2005040890A3 (en) Catadioptric projection objective with real intermediate images
WO2002094088A3 (en) Ophthalmoscope
CA2384172A1 (en) Imaging technique for use with optical mems devices
PL1611473T3 (en) Optical system for a fundus camera
EP1762874A3 (en) Lens apparatus comprising a focus-state detecting unit
GB0513929D0 (en) Zoom optics for a laser scanning microscope with point-like light source distribution and usage
GEP20094580B (en) Method and arrangement for imaging a primarily two-dimensional target
ATE212732T1 (en) OPTICAL IMAGING SYSTEM AND GRAPHIC USER INTERFACE
WO2001075507A3 (en) Optical system with extended boresight source
TW200501136A (en) Optical scanning device
FR2893720B1 (en) LONG-RANGE VIEWING DEVICE
IT1319810B1 (en) FOCUSING SYSTEM FOR VIDEO PROJECTOR.

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2004522476

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 11036155

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 2003765012

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 2003765012

Country of ref document: EP