WO2004018908A3 - Mems-based fluid valve device - Google Patents
Mems-based fluid valve device Download PDFInfo
- Publication number
- WO2004018908A3 WO2004018908A3 PCT/US2003/026038 US0326038W WO2004018908A3 WO 2004018908 A3 WO2004018908 A3 WO 2004018908A3 US 0326038 W US0326038 W US 0326038W WO 2004018908 A3 WO2004018908 A3 WO 2004018908A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- valve device
- fluid valve
- passages
- mems
- based fluid
- Prior art date
Links
- 239000012530 fluid Substances 0.000 title abstract 6
- 239000007789 gas Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K99/0001—Microvalves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15C—FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING OR CONTROL PURPOSES
- F15C5/00—Manufacture of fluid circuit elements; Manufacture of assemblages of such elements integrated circuits
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K99/0001—Microvalves
- F16K99/0003—Constructional types of microvalves; Details of the cutting-off member
- F16K99/0011—Gate valves or sliding valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K99/0001—Microvalves
- F16K99/0003—Constructional types of microvalves; Details of the cutting-off member
- F16K99/0028—Valves having multiple inlets or outlets
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K99/0001—Microvalves
- F16K99/0034—Operating means specially adapted for microvalves
- F16K99/0042—Electric operating means therefor
- F16K99/0046—Electric operating means therefor using magnets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K2099/0073—Fabrication methods specifically adapted for microvalves
- F16K2099/0074—Fabrication methods specifically adapted for microvalves using photolithography, e.g. etching
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K2099/0073—Fabrication methods specifically adapted for microvalves
- F16K2099/008—Multi-layer fabrications
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003272225A AU2003272225A1 (en) | 2002-08-20 | 2003-08-20 | Mems-based fluid valve device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/224,882 | 2002-08-20 | ||
US10/224,882 US7106493B2 (en) | 1999-07-27 | 2002-08-20 | MEMS-based valve device |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004018908A2 WO2004018908A2 (en) | 2004-03-04 |
WO2004018908A3 true WO2004018908A3 (en) | 2004-12-09 |
Family
ID=31946286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/026038 WO2004018908A2 (en) | 2002-08-20 | 2003-08-20 | Mems-based fluid valve device |
Country Status (3)
Country | Link |
---|---|
US (1) | US7106493B2 (en) |
AU (1) | AU2003272225A1 (en) |
WO (1) | WO2004018908A2 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7665670B2 (en) * | 2004-03-25 | 2010-02-23 | Siemens Industry, Inc. | Method and apparatus for an integrated distributed MEMS based control system |
US7610910B2 (en) * | 2004-03-25 | 2009-11-03 | Siemens Building Technologies, Inc. | Method and apparatus for controlling building component characteristics |
US7548833B2 (en) * | 2004-03-25 | 2009-06-16 | Siemens Building Technologies, Inc. | Method and apparatus for graphical display of a condition in a building system with a mobile display unit |
US7263838B2 (en) * | 2004-10-27 | 2007-09-04 | Raytheon Corporation | Pulse tube cooler with internal MEMS flow controller |
US10215047B2 (en) | 2015-12-28 | 2019-02-26 | General Electric Company | Actuation system utilizing MEMS technology |
US10190702B2 (en) * | 2016-03-15 | 2019-01-29 | Dunan Microstaq, Inc. | MEMS based solenoid valve |
EP3637171A1 (en) | 2018-10-09 | 2020-04-15 | Trilite Technologies GmbH | Apparatus for projecting a light spot |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5449146A (en) * | 1994-11-07 | 1995-09-12 | The Conair Group, Inc. | Gate valve for particulate materials |
US6190034B1 (en) * | 1995-10-03 | 2001-02-20 | Danfoss A/S | Micro-mixer and mixing method |
US6318402B1 (en) * | 2000-05-25 | 2001-11-20 | Richard Ladeira | Pneumatic tank truck closure apparatus |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4283259A (en) | 1979-05-08 | 1981-08-11 | International Business Machines Corporation | Method for maskless chemical and electrochemical machining |
JPS5928337A (en) | 1982-08-09 | 1984-02-15 | Hitachi Ltd | Projection aligner |
US5225771A (en) | 1988-05-16 | 1993-07-06 | Dri Technology Corp. | Making and testing an integrated circuit using high density probe points |
US5109149A (en) | 1990-03-15 | 1992-04-28 | Albert Leung | Laser, direct-write integrated circuit production system |
US5062689A (en) * | 1990-08-21 | 1991-11-05 | Koehler Dale R | Electrostatically actuatable light modulating device |
US5298939A (en) | 1991-11-04 | 1994-03-29 | Swanson Paul A | Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
US5459098A (en) | 1992-10-19 | 1995-10-17 | Marietta Energy Systems, Inc. | Maskless laser writing of microscopic metallic interconnects |
US5607601A (en) | 1995-02-02 | 1997-03-04 | The Aerospace Corporation | Method for patterning and etching film layers of semiconductor devices |
US5691541A (en) | 1996-05-14 | 1997-11-25 | The Regents Of The University Of California | Maskless, reticle-free, lithography |
US5994816A (en) | 1996-12-16 | 1999-11-30 | Mcnc | Thermal arched beam microelectromechanical devices and associated fabrication methods |
US5781331A (en) | 1997-01-24 | 1998-07-14 | Roxburgh Ltd. | Optical microshutter array |
US5808384A (en) | 1997-06-05 | 1998-09-15 | Wisconsin Alumni Research Foundation | Single coil bistable, bidirectional micromechanical actuator |
US6121626A (en) | 1998-09-17 | 2000-09-19 | Vanguard International Semiconductor Corporation | Method and system of exposure with a universal dynamic mask and charge coupled device image feedback control |
-
2002
- 2002-08-20 US US10/224,882 patent/US7106493B2/en not_active Expired - Fee Related
-
2003
- 2003-08-20 AU AU2003272225A patent/AU2003272225A1/en not_active Abandoned
- 2003-08-20 WO PCT/US2003/026038 patent/WO2004018908A2/en not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5449146A (en) * | 1994-11-07 | 1995-09-12 | The Conair Group, Inc. | Gate valve for particulate materials |
US6190034B1 (en) * | 1995-10-03 | 2001-02-20 | Danfoss A/S | Micro-mixer and mixing method |
US6318402B1 (en) * | 2000-05-25 | 2001-11-20 | Richard Ladeira | Pneumatic tank truck closure apparatus |
Also Published As
Publication number | Publication date |
---|---|
US20030058515A1 (en) | 2003-03-27 |
US7106493B2 (en) | 2006-09-12 |
AU2003272225A1 (en) | 2004-03-11 |
WO2004018908A2 (en) | 2004-03-04 |
AU2003272225A8 (en) | 2004-03-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2002097865A3 (en) | Fluidic valves, agitators, and pumps and methods thereof | |
WO2002070932A3 (en) | Microvalve | |
WO2004058425A3 (en) | Micro electromechanical systems for delivering high purity fluids in a chemical delivery system | |
ATE263942T1 (en) | ELECTRICALLY CONTROLLED VALVE | |
WO2002068849A8 (en) | Microfluidic valve and microactuator for a microvalve | |
WO2002055198A3 (en) | Microfluidic flow control devices | |
AU2003261360A1 (en) | Integrated microchip design | |
DK1065378T3 (en) | Elastomeric micropump and micro valve systems | |
WO2004011148A3 (en) | Actuator for deformable valves in a microfluidic device, and method | |
MXPA05008119A (en) | Microfluidic device with thin-film electronic devices. | |
WO2001067087A3 (en) | Fluid handling devices with diamond-like films | |
WO2003032957A3 (en) | Methods for hermetically sealing microchip reservoir devices | |
CA2333618A1 (en) | Microfluidic device | |
DE60033410D1 (en) | DOUBLE DIAPHRAGM PUMP | |
WO2005072138A3 (en) | Valve element | |
WO2005097324A3 (en) | Microfluidic device including displaceable material trap, and system | |
ATE319016T1 (en) | PASSIVE MICRO VALVE | |
PL1820571T3 (en) | 3D structures based on 2D substrates | |
CA2470436A1 (en) | Interventionless bi-directional barrier | |
WO2004018908A3 (en) | Mems-based fluid valve device | |
CN101067460A (en) | Valve mechanism and flow channel substrate | |
TW201440975A (en) | Reduced pressure adhesion device | |
AU2002353330A1 (en) | A device for regulating the flow of a fluid, in particular for solenoid valves | |
EP1531002A3 (en) | Device and method to electrostatically seal microfluidic devices | |
WO2004011143A3 (en) | One-directional microball valve for a microfluidic device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
122 | Ep: pct application non-entry in european phase | ||
NENP | Non-entry into the national phase |
Ref country code: JP |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |