WO2004021078A3 - Vent for an optical pellicle system - Google Patents

Vent for an optical pellicle system Download PDF

Info

Publication number
WO2004021078A3
WO2004021078A3 PCT/US2003/026437 US0326437W WO2004021078A3 WO 2004021078 A3 WO2004021078 A3 WO 2004021078A3 US 0326437 W US0326437 W US 0326437W WO 2004021078 A3 WO2004021078 A3 WO 2004021078A3
Authority
WO
WIPO (PCT)
Prior art keywords
frame
vent
optical pellicle
pellicle system
photomask
Prior art date
Application number
PCT/US2003/026437
Other languages
French (fr)
Other versions
WO2004021078A2 (en
Inventor
Ching-Bore Wang
Original Assignee
Micro Lithography Inc
Ching-Bore Wang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micro Lithography Inc, Ching-Bore Wang filed Critical Micro Lithography Inc
Priority to AU2003260021A priority Critical patent/AU2003260021A1/en
Publication of WO2004021078A2 publication Critical patent/WO2004021078A2/en
Publication of WO2004021078A3 publication Critical patent/WO2004021078A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Abstract

The present invention provides an optical pellicle system, which includes a frame having a top side and bottom side, a pellicle membrane configured to cover the top side of the frame, a photomask to which the bottom side of the frame is mounted, and at least one venting slot defined in the photomask, extending under the frame from an area defined within the frame to an area outside of the frame (see Figure 3).
PCT/US2003/026437 2002-08-27 2003-08-22 Vent for an optical pellicle system WO2004021078A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003260021A AU2003260021A1 (en) 2002-08-27 2003-08-22 Vent for an optical pellicle system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/229,437 2002-08-27
US10/229,437 US6841317B2 (en) 2002-08-27 2002-08-27 Vent for an optical pellicle system

Publications (2)

Publication Number Publication Date
WO2004021078A2 WO2004021078A2 (en) 2004-03-11
WO2004021078A3 true WO2004021078A3 (en) 2004-05-06

Family

ID=31976217

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/026437 WO2004021078A2 (en) 2002-08-27 2003-08-22 Vent for an optical pellicle system

Country Status (4)

Country Link
US (1) US6841317B2 (en)
AU (1) AU2003260021A1 (en)
TW (1) TWI290663B (en)
WO (1) WO2004021078A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10246788B4 (en) * 2002-10-08 2007-08-30 Infineon Technologies Ag Protective mask for reflection masks and method for using a protected reflection mask
US7205074B2 (en) * 2002-12-31 2007-04-17 Intel Corporation Venting of pellicle cavity for a mask
US20060269847A1 (en) * 2005-05-25 2006-11-30 International Business Machines Corporaton Binding of hard pellicle structure to mask blank and method
US20070037067A1 (en) * 2005-08-15 2007-02-15 Ching-Bore Wang Optical pellicle with a filter and a vent
TW201308425A (en) * 2011-08-05 2013-02-16 Tian-Xing Huang Mask cleaning device and mask cleaning method
US9658526B2 (en) 2015-06-30 2017-05-23 Taiwan Semiconductor Manufacturing Company, Ltd. Mask pellicle indicator for haze prevention
US10007176B2 (en) 2016-09-01 2018-06-26 Taiwan Semiconductor Manufacturing Co., Ltd Graphene pellicle for extreme ultraviolet lithography
US10162258B2 (en) 2016-12-15 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle fabrication methods and structures thereof
TWI688635B (en) * 2018-03-13 2020-03-21 美商微相科技股份有限公司 DUV photomask protective film aluminum frame adhesive treatment method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6103427A (en) * 1991-05-17 2000-08-15 Dupont Photomasks, Inc. Pressure relieving pellicle
US6436586B1 (en) * 1999-04-21 2002-08-20 Shin-Etsu Chemical Co., Ltd. Pellicle with a filter and method for production thereof

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3927943A (en) 1974-07-01 1975-12-23 Bell Telephone Labor Inc Mask alignment method
US4032233A (en) 1976-05-03 1977-06-28 E. I. Du Pont De Nemours And Company Exposure registry apparatus
DE2653707C3 (en) 1976-11-26 1981-08-27 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Device for precise visual-manual setup and for holding a plate-shaped workpiece with a light-sensitive layer in relation to one or two templates
JPS5670553A (en) 1979-11-14 1981-06-12 Nec Corp Photomask for projection exposure
US4255216A (en) 1980-01-14 1981-03-10 International Business Machines Corporation Pellicle ring removal method and tool
JPS58100852A (en) 1981-12-11 1983-06-15 Hitachi Ltd Photomask
JPS59125270A (en) 1983-01-05 1984-07-19 Mitsubishi Heavy Ind Ltd Poppet valve and its production
US4470508A (en) 1983-08-19 1984-09-11 Micro Lithography, Inc. Dustfree packaging container and method
JPS6085383A (en) 1983-10-15 1985-05-14 Mitsubishi Electric Corp Radiation imaging apparatus
US4833051A (en) 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
US5254375A (en) 1991-08-26 1993-10-19 Yen Yung Tsai Apparatus for controllably separating framed working area from remainder of the membrane
US5168993A (en) 1991-08-26 1992-12-08 Yen Yung Tsai Optical pellicle holder
US5305878A (en) 1993-04-01 1994-04-26 Yen Yung Tsai Packaged optical pellicle
US5529819A (en) 1995-04-17 1996-06-25 Inko Industrial Corporation Pellicle assembly with vent structure
US6190743B1 (en) 1998-07-06 2001-02-20 Micro Lithography, Inc. Photomask protection system
US6524754B2 (en) * 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6103427A (en) * 1991-05-17 2000-08-15 Dupont Photomasks, Inc. Pressure relieving pellicle
US6436586B1 (en) * 1999-04-21 2002-08-20 Shin-Etsu Chemical Co., Ltd. Pellicle with a filter and method for production thereof

Also Published As

Publication number Publication date
WO2004021078A2 (en) 2004-03-11
AU2003260021A1 (en) 2004-03-19
US6841317B2 (en) 2005-01-11
US20040043302A1 (en) 2004-03-04
TW200405956A (en) 2004-04-16
TWI290663B (en) 2007-12-01
AU2003260021A8 (en) 2004-03-19

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