WO2004062050A3 - Method and apparatus for generating a membrane target for laser produced plasma - Google Patents

Method and apparatus for generating a membrane target for laser produced plasma Download PDF

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Publication number
WO2004062050A3
WO2004062050A3 PCT/US2003/041694 US0341694W WO2004062050A3 WO 2004062050 A3 WO2004062050 A3 WO 2004062050A3 US 0341694 W US0341694 W US 0341694W WO 2004062050 A3 WO2004062050 A3 WO 2004062050A3
Authority
WO
WIPO (PCT)
Prior art keywords
membranes
target
membrane
illumination
advantageous
Prior art date
Application number
PCT/US2003/041694
Other languages
French (fr)
Other versions
WO2004062050A2 (en
Inventor
Harry Rieger
Edmond Turcu
Jim Morris
Original Assignee
Jmar Res Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jmar Res Inc filed Critical Jmar Res Inc
Priority to AU2003303542A priority Critical patent/AU2003303542A1/en
Publication of WO2004062050A2 publication Critical patent/WO2004062050A2/en
Publication of WO2004062050A3 publication Critical patent/WO2004062050A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Abstract

A method and apparatus for generating membrane targets for a laser induced plasma is disclosed herein. Membranes are advantageous targets for laser induced plasma because they are very thin and can be readily illuminated by high-power coherent light (525), such as a laser, and converted into plasma. Membranes are also advantageous because illumination of the membrane with coherent light (525) produces less debris and splashing than illumination of a thicker, solid target. Spherical membranes possess additional advantages in that they can be readily illuminated from variety of directions and because they can be easily placed (i.e. blown) into a target region for illumination by coherent light (525). Membranes are also advantageous because they can be formed from a liquid or molten phase of the target material (520). According to another embodiment, membranes can be formed from a solution in which the target materials (520) are solvated. Membranes can be formed in a variety of ways, such as by rotating a circular apparatus (505) through a reservoir (515) of liquid target material (520) such that membranes form across apertures (510) that are disposed in the circular apparatus (505). Spherical membranes can also be formed by applying a gas (i.e. blowing) against a membrane formed in an aperture (510) of a circular apparatus (505).
PCT/US2003/041694 2003-01-02 2003-12-31 Method and apparatus for generating a membrane target for laser produced plasma WO2004062050A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003303542A AU2003303542A1 (en) 2003-01-02 2003-12-31 Method and apparatus for generating a membrane target for laser produced plasma

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43764703P 2003-01-02 2003-01-02
US60/437,647 2003-01-02

Publications (2)

Publication Number Publication Date
WO2004062050A2 WO2004062050A2 (en) 2004-07-22
WO2004062050A3 true WO2004062050A3 (en) 2005-02-10

Family

ID=32713212

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/041694 WO2004062050A2 (en) 2003-01-02 2003-12-31 Method and apparatus for generating a membrane target for laser produced plasma

Country Status (3)

Country Link
US (1) US6977383B2 (en)
AU (1) AU2003303542A1 (en)
WO (1) WO2004062050A2 (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7465946B2 (en) * 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
DE10219173A1 (en) * 2002-04-30 2003-11-20 Philips Intellectual Property Process for the generation of extreme ultraviolet radiation
WO2005094318A2 (en) * 2004-03-29 2005-10-13 Jmar Research, Inc. Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma
EP1775756B1 (en) * 2004-06-24 2011-09-21 Nikon Corporation Euv light source, euv exposure equipment and semiconductor device manufacturing method
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
JPWO2006075535A1 (en) * 2005-01-12 2008-06-12 株式会社ニコン Laser plasma EUV light source, target member, tape member, target member manufacturing method, target supply method, and EUV exposure apparatus
US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
DE102005023060B4 (en) * 2005-05-19 2011-01-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gas discharge radiation source, in particular for EUV radiation
CN100498420C (en) * 2005-11-04 2009-06-10 中国科学院电工研究所 Fragment isolator for plasma light source of extreme ultraviolet laser
JP5075389B2 (en) * 2006-10-16 2012-11-21 ギガフォトン株式会社 Extreme ultraviolet light source device
JP5386799B2 (en) * 2007-07-06 2014-01-15 株式会社ニコン EUV light source, EUV exposure apparatus, EUV light emission method, EUV exposure method, and electronic device manufacturing method
US20090218521A1 (en) * 2008-02-08 2009-09-03 Nikon Corporation Gaseous neutral density filters and related methods
JP5657535B2 (en) * 2008-07-18 2015-01-21 コーニンクレッカ フィリップス エヌ ヴェ Extreme ultraviolet radiation generator including contaminant traps
US8976932B2 (en) * 2010-07-09 2015-03-10 Bsr Co., Ltd. X-ray generating device
WO2013107860A1 (en) * 2012-01-19 2013-07-25 Technische Universität Dresden Arrangement and method for generating accelerated particles from targets for radiotherapy
JP6010438B2 (en) * 2012-11-27 2016-10-19 浜松ホトニクス株式会社 Quantum beam generating apparatus, quantum beam generating method, and laser fusion apparatus
TWI605788B (en) * 2016-10-26 2017-11-21 財團法人工業技術研究院 Laser apparatus
US10887973B2 (en) * 2018-08-14 2021-01-05 Isteq B.V. High brightness laser-produced plasma light source
RU2670273C2 (en) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Device and method for emission generation from laser plasma
US10880982B2 (en) * 2018-07-31 2020-12-29 Taiwan Semiconductor Manufacturing Company Ltd. Light generation system using metal-nonmetal compound as precursor and related light generation method
US11310902B2 (en) * 2018-08-27 2022-04-19 Dana-Farber Cancer Institute, Inc. Compact multi-isotope solid target system utilizing liquid retrieval
CN113728410A (en) * 2019-04-26 2021-11-30 Euv实验室有限公司 X-ray source with rotating liquid metal target

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040171017A1 (en) * 2001-07-02 2004-09-02 Giuseppe Firrao Method to distribute liquids containing molecules in solution and to deposit said molecules on solid supports, and relative device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5577091A (en) * 1994-04-01 1996-11-19 University Of Central Florida Water laser plasma x-ray point sources
US5459771A (en) * 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
US6377651B1 (en) * 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
US6831963B2 (en) * 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040171017A1 (en) * 2001-07-02 2004-09-02 Giuseppe Firrao Method to distribute liquids containing molecules in solution and to deposit said molecules on solid supports, and relative device

Also Published As

Publication number Publication date
AU2003303542A8 (en) 2004-07-29
WO2004062050A2 (en) 2004-07-22
AU2003303542A1 (en) 2004-07-29
US20040200977A1 (en) 2004-10-14
US6977383B2 (en) 2005-12-20

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