WO2004097063A3 - Method for producing silicon oxide film and method for producing optical multilayer film - Google Patents

Method for producing silicon oxide film and method for producing optical multilayer film Download PDF

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Publication number
WO2004097063A3
WO2004097063A3 PCT/JP2004/005875 JP2004005875W WO2004097063A3 WO 2004097063 A3 WO2004097063 A3 WO 2004097063A3 JP 2004005875 W JP2004005875 W JP 2004005875W WO 2004097063 A3 WO2004097063 A3 WO 2004097063A3
Authority
WO
WIPO (PCT)
Prior art keywords
producing
silicon oxide
oxide film
film
optical multilayer
Prior art date
Application number
PCT/JP2004/005875
Other languages
French (fr)
Other versions
WO2004097063A2 (en
Inventor
Toru Ikeda
Takahiro Mashimo
Eiji Shidoji
Toshihisa Kamiyama
Yoshihito Katayama
Original Assignee
Asahi Glass Co Ltd
Asahi Glass Ceramics Co Ltd
Toru Ikeda
Takahiro Mashimo
Eiji Shidoji
Toshihisa Kamiyama
Yoshihito Katayama
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd, Asahi Glass Ceramics Co Ltd, Toru Ikeda, Takahiro Mashimo, Eiji Shidoji, Toshihisa Kamiyama, Yoshihito Katayama filed Critical Asahi Glass Co Ltd
Priority to DE602004031832T priority Critical patent/DE602004031832D1/en
Priority to EP04729212A priority patent/EP1627095B1/en
Publication of WO2004097063A2 publication Critical patent/WO2004097063A2/en
Publication of WO2004097063A3 publication Critical patent/WO2004097063A3/en
Priority to KR1020057019949A priority patent/KR101073415B1/en
Priority to US11/256,941 priority patent/US7842168B2/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0094—Reactive sputtering in transition mode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements

Abstract

The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.
PCT/JP2004/005875 2003-04-25 2004-04-23 Method for producing silicon oxide film and method for producing optical multilayer film WO2004097063A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE602004031832T DE602004031832D1 (en) 2003-04-25 2004-04-23 METHOD FOR PRODUCING A SILICON OXIDE FILM U
EP04729212A EP1627095B1 (en) 2003-04-25 2004-04-23 METHOD FOR PRODUCING SILICON OXIDE FILM AND an OPTICAL MULTILAYER FILM
KR1020057019949A KR101073415B1 (en) 2003-04-25 2005-10-20 Method for producing silicon oxide film and method for producing optical multilayer film
US11/256,941 US7842168B2 (en) 2003-04-25 2005-10-25 Method for producing silicon oxide film and method for producing optical multilayer film

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003-121527 2003-04-25
JP2003121527 2003-04-25
JP2003339748 2003-09-30
JP2003-339748 2003-09-30

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/256,941 Continuation US7842168B2 (en) 2003-04-25 2005-10-25 Method for producing silicon oxide film and method for producing optical multilayer film

Publications (2)

Publication Number Publication Date
WO2004097063A2 WO2004097063A2 (en) 2004-11-11
WO2004097063A3 true WO2004097063A3 (en) 2005-02-24

Family

ID=33422040

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2004/005875 WO2004097063A2 (en) 2003-04-25 2004-04-23 Method for producing silicon oxide film and method for producing optical multilayer film

Country Status (6)

Country Link
US (1) US7842168B2 (en)
EP (1) EP1627095B1 (en)
JP (1) JP4486838B2 (en)
KR (1) KR101073415B1 (en)
DE (1) DE602004031832D1 (en)
WO (1) WO2004097063A2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7820296B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coating technology
US7862910B2 (en) 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
USRE43817E1 (en) 2004-07-12 2012-11-20 Cardinal Cg Company Low-maintenance coatings

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JP4533815B2 (en) * 2005-07-08 2010-09-01 株式会社東芝 Sputtering target and optical thin film manufacturing method using the same
US7901778B2 (en) * 2006-01-13 2011-03-08 Saint-Gobain Performance Plastics Corporation Weatherable multilayer film
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
JP2008152839A (en) * 2006-12-15 2008-07-03 Toshiba Corp Optical recording medium and manufacturing method of optical recording medium
JP2009007636A (en) * 2007-06-28 2009-01-15 Sony Corp Low refractive index film and method for depositing the same, and antireflection film
JP5078470B2 (en) 2007-07-05 2012-11-21 ペンタックスリコーイメージング株式会社 Optical low-pass filter and imaging apparatus including the same
KR20090009612A (en) * 2007-07-20 2009-01-23 엘지디스플레이 주식회사 Method of forming inorganic insulating layer by sputtering
JP2014114497A (en) * 2012-12-12 2014-06-26 Ulvac Japan Ltd Sputtering equipment
JP6332109B2 (en) * 2015-03-31 2018-05-30 信越化学工業株式会社 Method for manufacturing halftone phase shift photomask blank
JP6500791B2 (en) * 2016-01-22 2019-04-17 信越化学工業株式会社 Halftone phase shift photomask blank and method of manufacturing the same
JP6677139B2 (en) * 2016-09-28 2020-04-08 信越化学工業株式会社 Manufacturing method of halftone phase shift type photomask blank
EP3541762B1 (en) 2016-11-17 2022-03-02 Cardinal CG Company Static-dissipative coating technology
GB201701846D0 (en) * 2017-02-03 2017-03-22 Univ Manchester Method of producing sputtered silicon oxide electrolyte
JP7332324B2 (en) * 2019-04-10 2023-08-23 デクセリアルズ株式会社 Inorganic polarizing plate, manufacturing method thereof, and optical device
KR102176552B1 (en) * 2020-06-19 2020-11-09 한화시스템 주식회사 Hybrid type deformable mirror apparatus and driving method thereof

Citations (3)

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JPH08109473A (en) * 1994-10-14 1996-04-30 Asahi Glass Co Ltd Formation of silicon oxide film
EP1176434A1 (en) * 2000-07-27 2002-01-30 Asahi Glass Company Ltd. Substrate provide with antireflection films and its production method
US20020117785A1 (en) * 1999-10-13 2002-08-29 Asahi Glass Company Limited Sputtering target, process for its production and film forming method

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Non-Patent Citations (2)

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Cited By (5)

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Publication number Priority date Publication date Assignee Title
USRE43817E1 (en) 2004-07-12 2012-11-20 Cardinal Cg Company Low-maintenance coatings
USRE44155E1 (en) 2004-07-12 2013-04-16 Cardinal Cg Company Low-maintenance coatings
US7862910B2 (en) 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US7820296B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coating technology
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings

Also Published As

Publication number Publication date
EP1627095B1 (en) 2011-03-16
US20060032739A1 (en) 2006-02-16
KR101073415B1 (en) 2011-10-17
US7842168B2 (en) 2010-11-30
EP1627095A2 (en) 2006-02-22
WO2004097063A2 (en) 2004-11-11
DE602004031832D1 (en) 2011-04-28
JP4486838B2 (en) 2010-06-23
KR20060003890A (en) 2006-01-11
JP2005126813A (en) 2005-05-19

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