WO2004114400A1 - High-performance cmos soi device on hybrid crystal-oriented substrates - Google Patents

High-performance cmos soi device on hybrid crystal-oriented substrates Download PDF

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Publication number
WO2004114400A1
WO2004114400A1 PCT/EP2004/050946 EP2004050946W WO2004114400A1 WO 2004114400 A1 WO2004114400 A1 WO 2004114400A1 EP 2004050946 W EP2004050946 W EP 2004050946W WO 2004114400 A1 WO2004114400 A1 WO 2004114400A1
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WIPO (PCT)
Prior art keywords
semiconductor
layer
bonded substrate
semiconductor layer
crystallographic
Prior art date
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PCT/EP2004/050946
Other languages
French (fr)
Inventor
Bruce Doris
Kathryn Guarini
Meikei Leong
Shreesh Narasimha
Kern Rim
Jeffrey W. Sleight
Min Yang
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International Business Machines Corporation
Compagnie Ibm France
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Publication date
Application filed by International Business Machines Corporation, Compagnie Ibm France filed Critical International Business Machines Corporation
Priority to EP04741667A priority Critical patent/EP1639637A1/en
Priority to JP2006516124A priority patent/JP4931211B2/en
Publication of WO2004114400A1 publication Critical patent/WO2004114400A1/en
Priority to IL172517A priority patent/IL172517A0/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8232—Field-effect technology
    • H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
    • H01L21/8238—Complementary field-effect transistors, e.g. CMOS
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
    • H01L21/76275—Vertical isolation by bonding techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8232—Field-effect technology
    • H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
    • H01L21/8238—Complementary field-effect transistors, e.g. CMOS
    • H01L21/823807—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body

Definitions

  • the present invention relates to semiconductor devices, and more particularly to integrated semiconductor devices, such as silicon-on-insulator(SO]y complementary metal oxide semiconductor (CMOS) devices, that are formed on a hybrid crystal oriented substrate.
  • CMOS complementary metal oxide semiconductor
  • the present invention provides a means for integrating at least two types of semiconductor devices, such as NFETs and PFETs, onto a bonded substrate having different crystallographic orientations. The location of each device on the bonded substrate is dependent upon the performance of that device has on a particular crystal orientation.
  • the present invention forms NFETs on a (100) surface, while the PFETs are formed on a (110) surface.
  • the (100) crystal surface provides NFETs with high performance, while the (110) crystal surface provides PFETs with high performance.
  • CMOS devices such as NFETs or PFETs
  • semiconductor wafers such as Si
  • Si semiconductor wafers
  • Electrons are known to have a high mobility for a (100) Si surface orientation, but holes are known to have high mobility for a (110) surface orientation. That is, hole mobility values on (100) Si are roughly 2x-4x lower than the corresponding electron hole mobility for this crystallographic orientation.
  • PFETs are typically designed with larger widths in order to balance pull-up currents against theNFET pull-down currents and achieve uniform circuit switching. NFETs having larger widths are undesirable since they take up a significant amount of chip area.
  • (110) Si surface is shown, for example, in FIG. 1.
  • the solid line represents electron mobility, while the dashed line represents hole mobility.
  • the (110) Si surface is optimal for PFET devices because of excellent hole mobility, yet such a crystal orientation is completely inappropriate forNFET devices. Instead, the (100) Si surface is optimal forNFET devices since that crystal orientation favors electron mobility.
  • the (100) Si surface is optimal forNFET devices since that crystal orientation favors electron mobility.
  • aPFET PFET
  • a certain crystallographic surface e.g., a (110) surface
  • another type of device such as, for example, anNFET
  • another crystallographic surface e.g., a (100) surface.
  • One object of the present invention is to provide a method of integrating semiconductor devices such that different types of devices axe formed upon a specific crystal orientation of a bonded substrate that enhances the performance of the device.
  • Another object of the present invention is to provide a method of integrating semiconductor devices such that the PFETs are located on a (110) crystallographic plane, while the NFETs are located on a (100) crystallographic plane of a bonded substrate.
  • a further object of the present invention is to provide a method of integrating silicon-on-insulator(SOI) technology with complementary metal oxide semiconductor(CMOS) technology using simple and easy processing steps.
  • a still further object of the present invention is to provide a method in which one
  • CMOS device will beSOI-like, while the other CMOS device will be bulk-like.
  • An even further object of the present invention is to provide a method in which both
  • a yet even further object of the present invention is to provide a method to integrate strained-siliconNFETs on a (100) crystallographic surface plane with silicon or strained-silicon PFETs on a (110) crystallographic surface plane.
  • An additional object of the present invention is to provide a method of integrating different CMOS devices onto a bonded substrate having different crystallographic surface planes wherein isolation regions are formed between the different types ofCMOS devices.
  • the method of the present invention comprises the steps of: providing a bonded substrate comprising at least a first semiconductor layer of a first crystallographic orientation and a second semiconductor layer of a second crystallographic orientation separated by an insulating layer, said first crystallographic orientation is different from said second crystallographic orientation and said first semiconductor layer lies above said second semiconductor layer; protecting a portion of the bonded substrate to define a first device area, while leaving another portion of the bonded substrate unprotected, said unprotected portion of the bonded substrate defining a second device area; etching said unprotected portion of the bonded substrate to expose a surface of the second semiconductor layer; regrowing a semiconductor material on said exposed surface of the second semiconductor layer, said semiconductor material having a crystallographic orientation that is the same as the second crystallographic orientation; planarizingthe bonded substrate containing the semiconductor material so that an upper surface of the first semiconductor layer is substantially planar with an upper surface of the semiconductor material; and forming at least one first semiconductor device in said first device region, while forming at least one first
  • the first semiconductor device may be aPFET and the first crystallographic orientation may be (110) or (111), while the second semiconductor device may be anNFET and the second crystallographic orientation may be (100) or (111 ). It is also possible in the present invention, that the first semiconductor device is a NFET and that the second semiconductor device is a PFET.
  • the method further includes forming isolation regions between the first device region and the second device region.
  • the semiconductor material comprises an upper layer of strained Si and a lower layer of relaxed
  • SiGe alloy or a SiC alloy.
  • the structure of the present invention comprises: a bonded substrate comprising a first device region having a first crystallographic orientation and a second device region having a second crystallographic orientation, said first crystallographic orientation is different from said second crystallographic orientation; an isolation region separating said first device region from said second device region; and at least one first semiconductor device located in said first device region and at least one second semiconductor device located in said second device region.
  • the first semiconductor device may be aPFET and the first crystallographic orientation may be (110) or (111), while the second semiconductor device may be anNFET and the second crystallographic orientation may be
  • the first semiconductor device is an NFET and the second semiconductor device is a PFET.
  • the configuration of the semiconductor devices will be dependent on the crystal orientation of the bonded substrate.
  • FIGS. 2A-2F are pictorial representations (through cross sectional views) illustrating the basic processing steps utilized in the present invention in forming integratetCMOS devices on different crystallographic orientation planes of a bonded substrate.
  • FIGS. 3A-3D are pictorial representations of various wafers that may be bonded together and used in the method described in FIGS.2A-2E.
  • FIGS. 4A-4J are pictorial representations (through cross sectional views) illustrating the basic processing steps used in forming a high performance semiconductor device containing two NFETs formed on a (100) crystallographic surface, and aPFET, which is located between the NFETs, formed on a (110) crystallographic surface.
  • FIGS. 5A-5G are pictorial representations (through cross sectional views) illustrating alternative processing steps used in forming a high performance semiconductor device containing two NFETs formed on a (100) crystallographic surface, and aPFET, which is located between the NFETs, formed on a (110) crystallographic surface.
  • FIG. 2A illustrate a bonded substrate 10, i.e., hybrid substrate, which maybe employed in the present invention.
  • bonded substrate 10 includes a surface dielectric layer 18, a first semiconductor layer 16, an insulating layer 14, and a second semiconductor layer 12.
  • the bonded substrate 10 may further include an optional third semiconductor layer (not shown) that is located beneath the second semiconductor layer 12.
  • another insulating layer separates the second semiconductor layer 12 from the optional third semiconductor layer.
  • the surface dielectric layer 18 of the bonded substrate 10 is an oxide, nitride.oxynitride or other insulating layer that is either present in one of the initial wafers before bonding, or formed atop the first semiconductor layer 16 after wafer bonding by either a thermal process (i.e., oxidation, nitridation or oxynitridation) or by deposition. Notwithstanding the origin of the surface dielectric layer 18, the surface dielectric layer 18 has a thickness of from about 3 to about 500 nm, with a thickness of from about 5 to about 20 n being more highly preferred.
  • the first semiconductor layer 16 is comprised of anysemiconducting material including, for example, Si, SiC, SiGe, SiGeC, Ge alloys, GaAs, InAs, InP as well as other III/V or II/VI compound semiconductors.
  • First semiconductor layer 16 may also comprise anSOI layer of a preformed SOI substrate or a layered semiconductor such as, for example, Si/SiGe.
  • the first semiconductor layer 16 is also characterized as having a first crystallographic orientation, which is preferably (110). Although a (110) crystal orientation is preferred, the first semiconductor layer 16 may have a (111), or a (100) crystal orientation.
  • the thickness of the first semiconductor layer 16 may vary depending on the initial starting wafers used to form the bonded substrate 10. Typically, however, the first semiconductor layer 16 has a thickness of from about 5 to about 500 nm, with a thickness of from about 5 to about 100 nm being more highly preferred.
  • the insulating layer 14 which is located between the first semiconductor layer 16 and the second semiconductor layer 12 has a variable thickness depending upon the initial wafers used to create the bonded substrate 10. Typically, however, the insulating layer 14 has a thickness of from about 1 to about 5 nm, with a thickness of from about 5 to about 100 nm being more highly preferred.
  • the insulating layer 14 is an oxide or other like insulator material that is formed on one or both of the wafers prior to bonding.
  • the second semiconductor layer 12 is comprised of anysemiconductingmaterial which may be the same or different from that of the first semiconductor layer 16.
  • second semiconductor layer 12 may include, for example, Si,SiC, SiGe, SiGeC, Ge alloys, GaAs, InAs, InP as well as other IH/V or II/NI compound semiconductors.
  • Second semiconductor layer 12 may also comprise an SOI layer of a preformed SOI substrate or a layered semiconductor such as, for example, Si/SiGe.
  • the second semiconductor layer 12 is also characterized as having a second crystallographic orientation, which is different from the first crystallographic orientation. Since the first semiconductor layer 16 is preferably a (110) surface, the crystallographic orientation of the second semiconductor layer 12 is preferably (100). Although a (100) crystal orientation is preferred, the second semiconductor layer 12 may have a (111), or a (110) crystal structure.
  • the thickness of the second semiconductor layer 12 may vary depending on the initial starting wafers used to form the bonded substrate 10. Typically, however, the second semiconductor layer 12 has a thickness of from about 5n to about 200 ⁇ , with a thickness of from about 5 to about 100 nm being more highly preferred.
  • the optional third semiconductor layer may comprise the same or differentsemiconductingmaterial as that of the second semiconductor layer 12. The crystal orientation of the optional third semiconductor layer is typically, but not always, the same as the second semiconductor layer.
  • the optional third semiconductor layer is generally thicker than the second semiconductor layer 12. When the optional third layer is present, an insulating layer separates the optional third semiconductor layer from the second semiconductor layer.
  • the bonded substrate 10 illustrated in FIG. 2A is comprised of two semiconductor wafers that are bonded together.
  • the two wafers used in fabricating the bonded substrate 10 may include two SOI wafers (See, FIG. 3 A), wherein one of the wafers, designated as 1, includes the first semiconductor layer 16 and the other wafer, designated as 2 includes the second semiconductor 12; an SOI wafer (designated as 2) and a bulk semiconductor wafer
  • a bulk wafer which includes an ion implant region 11, such as a Kb implant region, which can be used to split a portion of at least one of the wafers during bonding (See FIG. 3D).
  • an ion implant region 11 such as a Kb implant region
  • Bonding is achieved by first bringing the two wafers into intimate contact with other; optionally applying an external force to the contacted wafers; and then heating the two contacted wafers under conditions that are capable of bonding the two wafers together.
  • the heating step may be performed in the presence or absence of an external force.
  • the heating step is typically performed in an inert ambient at a temperature of from about 200° to about 1050°C for a time period of from about 2 to about 20 hours. More preferably, the bonding is performed at a temperature of from about 200° to about 400°C for a time period of from about 2 to about 20 hours.
  • inert ambient is used in the present invention to denote an atmosphere in which an inert gas, such as He, Ar, N 2 , Xe, Kr or a mixture thereof, is employed.
  • a preferred ambient used during the bonding process is N.
  • some material layers of at least one of the SOI wafers may be removed after bonding utilizing aplanarization process such as chemical mechanical polishing(CMP) or grinding and etching.
  • CMP chemical mechanical polishing
  • the planarizatio rocess stops when surface dielectric layer 18 is reached.
  • the ion implant region forms a porous region during bonding which causes a portion of the wafer above the ion implant region to break off leaving a bonded wafer such as is shown, for example, in FIG. 1 A.
  • the implant region is typically comprised of H ions which are implanted into the surface of the wafer utilizing ion implantation conditions that are well known to those skilled in the art.
  • the surface dielectric layer 18 may be formed atop the bonded wafers by a thermal process, such as oxidation, or by a conventional deposition process such as chemical vapor deposition (CVD), plasma-enhanced CVD, atomic layer deposition, chemical solution deposition as well as other like deposition processes.
  • CVD chemical vapor deposition
  • atomic layer deposition atomic layer deposition
  • chemical solution deposition chemical solution deposition as well as other like deposition processes.
  • Mask 20 is then formed on a predetermined portion of the bonded substrate 10 of FIG. 2 A so as to protect a portion of the bonded substrate 10, while leaving another portion of the bonded substrate 10 unprotected.
  • the protected portion of the bonded substrate 10 defines a first device region 22 of the structure, whereas the unprotected portion of the bonded substrate 10 defines a second device area 24.
  • mask 20 is formed on a predetermined portion of the surface dielectric layer 18 by applying aphotoresist mask to the entire surface of the bonded substrate 10. After application of the photoresist mask, the mask is patterned by lithography, which includes the steps of exposing thephotoresist to a pattern of radiation and developing the pattern utilizing a resist developer.
  • the resultant structure including the mask 20 formed on a predetermined portion of the bonded substrate 10 is shown, for example, in FIG. 2B.
  • mask 20 is a nitride oroxynitride layer that is formed and patterned utilizing lithography and etching.
  • the nitride oroxynitride mask 20 may be removed after defining the region for the second semiconductor device.
  • the structure is subjected to one or more etching steps so as to expose a surface of the second semiconductor layer 12.
  • the one or more etching steps used at this point of the present invention removes the unprotected portions of the surface dielectric layer 18, as well as underlying portions of the first semiconductor layer 16, and a portion of the insulating layer 14 which separated the first semiconductor layer 16 from the second semiconductor layer 12.
  • the etching may be performed utilizing a single etching process or multiple etching steps may be employed.
  • the etching used at this point of the present invention may include a dry etching process such as reactive-ion etching, ion beam etching, plasma etching or laser etching, a wet etching process wherein a chemicaletchant is employed or any combination thereof.
  • reactive-ion etching(RIE) is used in selectively removing the unprotected portions of the surface dielectric layer 18, the first semiconductor layer 16 and the insulating layer 14 in the second semiconductor device region 24.
  • RIE reactive-ion etching
  • the sidewallsof the protected first device region 22, i.e., the surface dielectric layer 18, the first semiconductor layer 16, the insulating layer 14 and the second semiconductor layer 12, are exposed after this etching step. As shown, the exposed sidewallsof layers 18, 16 and 14 are aligned with an outer most edge of mask 20.
  • the mask 20 is then removed from the structure shown in FIG. 2C utilizing a conventional resist stripping process and then a liner or spacer 25 is formed on the exposed sidewalls.
  • the liner or spacer 25 is formed by deposition and etching.
  • the liner or spacer 25 is comprised of an insulating material such as, for example, an oxide.
  • semiconductor material 26 is formed on the exposed second semiconductor layer 12.
  • semiconductor material 26 has a crystallographic orientation that is the same as the crystallographic orientation of the second semiconductor layer 12. The resultant structure is shown, for example, in FIG. 2D.
  • the semiconductor material 26 may comprise any Si-containing semiconductor, such as Si, strained Si, SiGe, SiC, SiGeC or combinations thereof, which is capable of being formed utilizing a selectiveepitaxial growth method.
  • semiconductor material 26 is comprised of Si.
  • the semiconductor material is a strained Si layer that is located atop a relaxed SiGe alloy layer.
  • semiconductor material 26 may be referred to as aregrown semiconductor material.
  • a planarization process such as chemical mechanical polislmgCMP) or grinding such that the upper surface of the semiconductor material 26 is substantially planar with the upper surface of the first semiconductor layer 16.
  • an isolation region 27, such as a shallow trench isolation region, is typically formed so as to isolate the first semiconductor device region 22 from the second semiconductor device region 24.
  • the isolation region 27 is formed utilizing processing steps that are well known to those skilled in the art including, for example, trench definition and etching; optionally lining the trench with a diffusion barrier; and filling the trench with a trench dielectric such as an oxide. After the trench fill, the structure may beplanarizedand an optional densificationprocess step may be performed to density the trench dielectric.
  • the resultant substantially planar structure containing isolation region 27 is show, for example, in FIG. 2E.
  • the structure of FIG. 2E includes an exposed first semiconductor layer 16 of a first crystal orientation and an unexposedregrown semiconductor material 26 that has the same crystal orientation as that of the second semiconductor layer 12.
  • FIG. 2F shows the integrated structure that is formed after a first semiconductor device 30 is formed on a portion of the first semiconductor layer 16 and a second semiconductor device 32 is formed on the regrown semiconductor material 26.
  • the present invention contemplates forming a plurality of each type of device in the specific device region.
  • the first semiconductor device may be aPFET or a NFET
  • the second semiconductor device may be aNFET or PFET, with the proviso that the first semiconductor device is different from the second semiconductor device and that the specific device is fabricating on a crystal orientation that provides a high performance device.
  • NFETs are formed utilizing standardCMOS processing steps that are well known to those skilled in the art.
  • EachFET includes a gate dielectric, a gate conductor, an optional hard mask located atop the gate conductor, spacers located on sidewalls of at least the gate conductor, and source/drain diffusion regions.
  • the diffusion regions are labeled as 34 in FIG. 2F. Note that the PFET is formed over the semiconductor material that has a (110), or (111) orientation, whereas the NFET is formed over a semiconductor surface having a (100), or (111) orientation.
  • FIGS.2A-2F illustrate the basic concept of the present invention which includes providing a bonded substrate having two different crystallographic orientations, masking, etching, regrowth, planarization and device formation.
  • FIGS.4A-4J illustrate processing steps used in forming a high performance semiconductor device containing twoNFETs formed on a (100) crystallographic surface, and a PFET, which is located between the NFETs, formed on a (110) crystallographic surface.
  • FIG. 4A illustrates a bonded substrate 10 that may be used in this embodiment of the present invention.
  • the bonded substrate 10 includes a surface dielectric layer 18, a first semiconductor layer 16, an insulating layer 14 and a second semiconductor layer 12.
  • a third optional semiconductor layer may be located beneath the second semiconductor layer 12.
  • an insulating layer separates the second semiconductor layer from the optional third semiconductor layer.
  • FIG. 4B illustrates the structure after nitride mask 20 has been formed on the surface dielectric layer 18.
  • the nitride mask 20 is formed utilizing a conventional deposition process such as CVD.
  • nitride mask 20 After formation of nitride mask 20, the mask is patterned utilizing a patterned photoresist mask and etching, and then the pattern is transferred via another etching process from nitride mask 20 into the structure stopping atop an upper surface layer of the second semiconductor layer 12.
  • the etching used in the second etching removes portions of the surface dielectric layer 18, the first semiconductor layer 16, and the insulating layer 14.
  • a single or multiple etching process is performed in transferring the pattern into the bonded substrate 10.
  • FIG. 4C shows the resultant structure after pattern transfer.
  • spacers 25 are formed on the exposed sidewalls.
  • the spacers 25 are composed of an insulating material including, for example, an oxide.
  • the spacers 25 which are located on the sidewalls of the protected first device region are formed by deposition and etching.
  • semiconductor material 26 is formed on the exposed surface of the second semiconductor layer 12 providing the structure shown, for example, in FIG. 4E.
  • the structure illustrated in FIG. 4E is thenplanarizedto provide the substantially planer structure shown in FIG. 4F.
  • the planarization step removes the nitride mask 20 and the surface dielectric layer 18 that were not previously etched so as to provide a structure in which first semiconductor layer 16 is exposed andregrown semiconductor material 26 is exposed.
  • the exposed first semiconductor layer 16 is the region in which a first semiconductor device such as anNFET will be formed, whereas the exposed surface of semiconductor material 26 is the region in which a second semiconductor device, such as a PFET, will be formed.
  • a material stack 50 comprising a pad oxide 51 and a pad nitride 52 is then formed atop the substantially planar structure shown in FIG. 4F.
  • the pad oxide 51 of the material stack 50 is formed by either a thermal oxidation process or by deposition, while the pad nitride 52 is formed by a thermalnitridation process or deposition.
  • the pad nitride 52 is typically thicker than the underlying pad oxide 51.
  • FIG. 4H illustrates the structure that is formed after trench openings 29 have been formed into the structure shown in FIG. 4G.
  • the trench openings 29 are formed by lithography and etching.
  • FIG. 41 shows the structure that is formed after trench filling and planarization.
  • the structure shown in FIG. 41 includes three device regions; two of which are referred to as first device regions 22 in which a first semiconductor device 30 will be formed and the third is a second device region 24 in which a second semiconductor device 32 will be formed.
  • FIG. 4J shows the integrated structure that is formed after a first semiconductor device
  • the present invention contemplates forming a plurality of each type of device in the specific device region.
  • the first semiconductor device may be aPFET (or NFET)
  • the second semiconductor device may be aNFET (or PFET).
  • the PFETs and NFETs are formed utilizing standard CMOS processing steps that are well known to those skilled in the art.
  • Each FET includes a gate dielectric, a gate conductor, an optional hard mask located atop the gate conductor, spacers located on sidewallsof at least the gate conductor, source/drain diffusion regions.
  • the PFET is formed over a surface having a (110) or (ll l) orientation
  • the NFET is formed over a surface having a (100) or (111) orientation.
  • the NFETs are SOI-like devices
  • the PFET is a bulk-like semiconductor device. If a third semiconductor layer was present beneath the second semiconductor layer 12, all three devices would beSOI-like.
  • FIGS. 5A-5G illustrates alternative processing steps used in forming a high performance semiconductor device containing two NFETs formed on a (100) crystallographic surface, and a PFET, which is located between the NFETs, formed on a (110) crystallographic surface.
  • the alternative method begins with forming the bonded substrate shown in FIG. 5A.
  • the bonded substrate 10 includes at least a surface dielectric layer 18, a first semiconductor layer 16, an insulating layer 14 and a second semiconductor layer 12.
  • a third optional semiconductor layer may be located beneath the second semiconductor layer.
  • nitride mask 20 is formed on the bonded substrate 10 to provide the structure illustrated in FIG. 5B.
  • isolation regions 27 are formed utilizing the nitride mask 20 and surfacedielectricl 8 as a combined etch mask. Isolation regions 27 are formed by applying aphotoresist to the surface of the nitride mask 20, patterning the photoresist and transferring the pattern from the photoresist into the nitride mask 20 and then into the surface dielectric layer 18 to expose the first semiconductor layer 16. The exposed first semiconductor layer 16 is then etched stopping on an upper surface of the insulating layer 14.
  • FIG. 5C shows the structure after trench fill and planarization. In particular, isolation regions 27 are shown in FIG. 5C.
  • the material between the isolation regions is then removed providing the structure shown in FIG. 5D. Specifically, the material between the isolation regions is removed by forming a block mask to protect portions of the structure in which the first semiconductor devices will be formed and then etching the unprotected portions of the nitride mask 20, the surface dielectric layer 18 and the first semiconductor layer 16 stopping on the insulating layer
  • the exposed portion of the insulating layer 14 is then removed utilizing an etching process that selectively removes an insulator material, such as an oxide, providing the structure shown, for example, in FIG. 5E. Note that this etching step also reduces the height of isolation regions 27. This etching step stops atop an upper surface of the second semiconductor layer 12.
  • the remaining nitride mask 20 is then stripped from the structure and then semiconductor material 26 is regrown on the exposed surface of the second semiconductor material 12 providing the structure shown, for example, in FIG. 5F.
  • the regrown semiconductor material 26 includes an upper layer of strained Si 31.
  • Oxide is then stripped from the structure shown in FIG. 5F and strained Si 31 is formed on the exposed portions of the first semiconductor layer 16.
  • CMOS devices 30 and 32 are formed over the respective crystal orientation that provides a high performance device.
  • the resultant structure containingNFETs and PFETs formed atop strained Si layers is shown, for example, in FIG. 5G.

Abstract

An integrated semiconductor structure containing at least one device formed upon a first crystallographic surface that is optimal for that device, while another device is formed upon a second different crystallographic surface that is optimal for the other device is provided. The method of forming the integrated structure includes providing a bonded substrate including at least a first semiconductor layer of a first crystallographic orientation and a second semiconductor layer of a second different crystallographic orientation. A portion of the bonded substrate is protected to define a first device area, while another portion of the bonded substrate is unprotected. The unprotected portion of the bonded substrate is then etched to expose a surface of the second semiconductor layer and a semiconductor material isregrown on the exposed surface. Following planarization, a first semiconductor device is formed in the first device region and a second semiconductor device is formed on theregrown material.

Description

HIGH-PERFORMANCE CMOS SOI DEVICES ON HYBRID CRYSTAL-ORIENTED SUBSTRATES
DESCRIPTION
Field of the Invention
The present invention relates to semiconductor devices, and more particularly to integrated semiconductor devices, such as silicon-on-insulator(SO]y complementary metal oxide semiconductor (CMOS) devices, that are formed on a hybrid crystal oriented substrate. In particular, the present invention provides a means for integrating at least two types of semiconductor devices, such as NFETs and PFETs, onto a bonded substrate having different crystallographic orientations. The location of each device on the bonded substrate is dependent upon the performance of that device has on a particular crystal orientation. For example, the present invention forms NFETs on a (100) surface, while the PFETs are formed on a (110) surface. The (100) crystal surface provides NFETs with high performance, while the (110) crystal surface provides PFETs with high performance.
Background of the Invention
In present semiconductor technology, CMOS devices, such as NFETs or PFETs, are typically fabricated upon semiconductor wafers, such as Si, that have a single crystal orientation. In particular, most of today's semiconductor devices are built upon Si having a (100) crystal orientation. Electrons are known to have a high mobility for a (100) Si surface orientation, but holes are known to have high mobility for a (110) surface orientation. That is, hole mobility values on (100) Si are roughly 2x-4x lower than the corresponding electron hole mobility for this crystallographic orientation. To compensate for this discrepancy ,PFETs are typically designed with larger widths in order to balance pull-up currents against theNFET pull-down currents and achieve uniform circuit switching. NFETs having larger widths are undesirable since they take up a significant amount of chip area.
On the other hand, hole mobilities on (110) Si are 2x higher than on (100) Si; therefore, PFETs formed on a (110) surface will exhibit significantly higher drive currents thaiPFETs formed on a (100) surface. Unfortunately, electron mobilities on (110) Si surfaces are significantly degraded compared to (100) Si surfaces. The electron mobility degradation on a
(110) Si surface is shown, for example, in FIG. 1. In FIG. 1, the solid line represents electron mobility, while the dashed line represents hole mobility.
As can be deduced from the above discussion and FIG. 1, the (110) Si surface is optimal for PFET devices because of excellent hole mobility, yet such a crystal orientation is completely inappropriate forNFET devices. Instead, the (100) Si surface is optimal forNFET devices since that crystal orientation favors electron mobility. In view of the above, there is a need for providing integrated semiconductor devices that are formed upon a substrate having different crystal orientations that provide optimal performance for a specific device. That is, there is an overwhelming need to create a substrate which allows one type of device, such as, for example, aPFET, to be formed on a certain crystallographic surface, e.g., a (110) surface, while forming another type of device, such as, for example, anNFET, on another crystallographic surface, e.g., a (100) surface.
Summary of the Invention
One object of the present invention is to provide a method of integrating semiconductor devices such that different types of devices axe formed upon a specific crystal orientation of a bonded substrate that enhances the performance of the device. Another object of the present invention is to provide a method of integrating semiconductor devices such that the PFETs are located on a (110) crystallographic plane, while the NFETs are located on a (100) crystallographic plane of a bonded substrate.
A further object of the present invention is to provide a method of integrating silicon-on-insulator(SOI) technology with complementary metal oxide semiconductor(CMOS) technology using simple and easy processing steps.
A still further object of the present invention is to provide a method in which one
CMOS device will beSOI-like, while the other CMOS device will be bulk-like.
An even further object of the present invention is to provide a method in which both
CMOS devices being integrated areSOI-like. A yet even further object of the present invention is to provide a method to integrate strained-siliconNFETs on a (100) crystallographic surface plane with silicon or strained-silicon PFETs on a (110) crystallographic surface plane.
An additional object of the present invention is to provide a method of integrating different CMOS devices onto a bonded substrate having different crystallographic surface planes wherein isolation regions are formed between the different types ofCMOS devices. These and other objects and advantages are achieved by utilizing a method that includes the steps of wafer bonding, masking, etching andregrowth of a semiconductor layer. Specifically, the method of the present invention comprises the steps of: providing a bonded substrate comprising at least a first semiconductor layer of a first crystallographic orientation and a second semiconductor layer of a second crystallographic orientation separated by an insulating layer, said first crystallographic orientation is different from said second crystallographic orientation and said first semiconductor layer lies above said second semiconductor layer; protecting a portion of the bonded substrate to define a first device area, while leaving another portion of the bonded substrate unprotected, said unprotected portion of the bonded substrate defining a second device area; etching said unprotected portion of the bonded substrate to expose a surface of the second semiconductor layer; regrowing a semiconductor material on said exposed surface of the second semiconductor layer, said semiconductor material having a crystallographic orientation that is the same as the second crystallographic orientation; planarizingthe bonded substrate containing the semiconductor material so that an upper surface of the first semiconductor layer is substantially planar with an upper surface of the semiconductor material; and forming at least one first semiconductor device in said first device region, while forming at least one second semiconductor device on said semiconductor material in said second device area.
In accordance with the present invention, the first semiconductor device may be aPFET and the first crystallographic orientation may be (110) or (111), while the second semiconductor device may be anNFET and the second crystallographic orientation may be (100) or (111 ). It is also possible in the present invention, that the first semiconductor device is a NFET and that the second semiconductor device is a PFET. In one embodiment of the present invention, the method further includes forming isolation regions between the first device region and the second device region. In yet another embodiment of the present invention, the semiconductor material comprises an upper layer of strained Si and a lower layer of relaxed
SiGe alloy or a SiC alloy.
Another aspect of the present invention relates to an integrated semiconductor structure containing at least two types of devices, wherein at least one of the devices is formed upon a first crystallographic surface that is optimal for that device, while the other device is formed upon a second crystallographic surface, which is different from the first, that is optimal for the other device. Specifically, the structure of the present invention comprises: a bonded substrate comprising a first device region having a first crystallographic orientation and a second device region having a second crystallographic orientation, said first crystallographic orientation is different from said second crystallographic orientation; an isolation region separating said first device region from said second device region; and at least one first semiconductor device located in said first device region and at least one second semiconductor device located in said second device region. In accordance with the present invention, the first semiconductor device may be aPFET and the first crystallographic orientation may be (110) or (111), while the second semiconductor device may be anNFET and the second crystallographic orientation may be
(100) or (111). It is also possible in the present invention that the first semiconductor device is an NFET and the second semiconductor device is a PFET. The configuration of the semiconductor devices will be dependent on the crystal orientation of the bonded substrate.
Brief Description of the Drawings
FIG. 1. is a plot of μe f at Vgs= IV vs. crystallographic orientation for a Si substrate. FIGS. 2A-2F are pictorial representations (through cross sectional views) illustrating the basic processing steps utilized in the present invention in forming integratetCMOS devices on different crystallographic orientation planes of a bonded substrate.
FIGS. 3A-3D are pictorial representations of various wafers that may be bonded together and used in the method described in FIGS.2A-2E.
FIGS. 4A-4J are pictorial representations (through cross sectional views) illustrating the basic processing steps used in forming a high performance semiconductor device containing two NFETs formed on a (100) crystallographic surface, and aPFET, which is located between the NFETs, formed on a (110) crystallographic surface. FIGS. 5A-5G are pictorial representations (through cross sectional views) illustrating alternative processing steps used in forming a high performance semiconductor device containing two NFETs formed on a (100) crystallographic surface, and aPFET, which is located between the NFETs, formed on a (110) crystallographic surface.
Detailed Description of the Invention
The present invention, which provides a method of forming different semiconductor devices, such as NFETs and PFETs, onto a bonded substrate having different crystallographic surfaces, will now be described in greater detail by referring to the following discussion as well as the drawings that accompany the present application. In the accompanying drawings, like and correspondence elements are referred to by like reference numerals.
FIG. 2A illustrate a bonded substrate 10, i.e., hybrid substrate, which maybe employed in the present invention. As shown, bonded substrate 10 includes a surface dielectric layer 18, a first semiconductor layer 16, an insulating layer 14, and a second semiconductor layer 12. The bonded substrate 10 may further include an optional third semiconductor layer (not shown) that is located beneath the second semiconductor layer 12. In the optional bonded substrate, another insulating layer separates the second semiconductor layer 12 from the optional third semiconductor layer.
The surface dielectric layer 18 of the bonded substrate 10 is an oxide, nitride.oxynitride or other insulating layer that is either present in one of the initial wafers before bonding, or formed atop the first semiconductor layer 16 after wafer bonding by either a thermal process (i.e., oxidation, nitridation or oxynitridation) or by deposition. Notwithstanding the origin of the surface dielectric layer 18, the surface dielectric layer 18 has a thickness of from about 3 to about 500 nm, with a thickness of from about 5 to about 20 n being more highly preferred.
The first semiconductor layer 16 is comprised of anysemiconducting material including, for example, Si, SiC, SiGe, SiGeC, Ge alloys, GaAs, InAs, InP as well as other III/V or II/VI compound semiconductors. First semiconductor layer 16 may also comprise anSOI layer of a preformed SOI substrate or a layered semiconductor such as, for example, Si/SiGe. The first semiconductor layer 16 is also characterized as having a first crystallographic orientation, which is preferably (110). Although a (110) crystal orientation is preferred, the first semiconductor layer 16 may have a (111), or a (100) crystal orientation.
The thickness of the first semiconductor layer 16 may vary depending on the initial starting wafers used to form the bonded substrate 10. Typically, however, the first semiconductor layer 16 has a thickness of from about 5 to about 500 nm, with a thickness of from about 5 to about 100 nm being more highly preferred.
The insulating layer 14 which is located between the first semiconductor layer 16 and the second semiconductor layer 12 has a variable thickness depending upon the initial wafers used to create the bonded substrate 10. Typically, however, the insulating layer 14 has a thickness of from about 1 to about 5 nm, with a thickness of from about 5 to about 100 nm being more highly preferred. The insulating layer 14 is an oxide or other like insulator material that is formed on one or both of the wafers prior to bonding. The second semiconductor layer 12 is comprised of anysemiconductingmaterial which may be the same or different from that of the first semiconductor layer 16. Thus, second semiconductor layer 12 may include, for example, Si,SiC, SiGe, SiGeC, Ge alloys, GaAs, InAs, InP as well as other IH/V or II/NI compound semiconductors. Second semiconductor layer 12 may also comprise an SOI layer of a preformed SOI substrate or a layered semiconductor such as, for example, Si/SiGe. The second semiconductor layer 12 is also characterized as having a second crystallographic orientation, which is different from the first crystallographic orientation. Since the first semiconductor layer 16 is preferably a (110) surface, the crystallographic orientation of the second semiconductor layer 12 is preferably (100). Although a (100) crystal orientation is preferred, the second semiconductor layer 12 may have a (111), or a (110) crystal structure.
The thickness of the second semiconductor layer 12 may vary depending on the initial starting wafers used to form the bonded substrate 10. Typically, however, the second semiconductor layer 12 has a thickness of from about 5n to about 200 μ , with a thickness of from about 5 to about 100 nm being more highly preferred. When an optional third semiconductor layer is present, the optional third semiconductor layer may comprise the same or differentsemiconductingmaterial as that of the second semiconductor layer 12. The crystal orientation of the optional third semiconductor layer is typically, but not always, the same as the second semiconductor layer. The optional third semiconductor layer is generally thicker than the second semiconductor layer 12. When the optional third layer is present, an insulating layer separates the optional third semiconductor layer from the second semiconductor layer.
The bonded substrate 10 illustrated in FIG. 2A is comprised of two semiconductor wafers that are bonded together. The two wafers used in fabricating the bonded substrate 10 may include two SOI wafers (See, FIG. 3 A), wherein one of the wafers, designated as 1, includes the first semiconductor layer 16 and the other wafer, designated as 2 includes the second semiconductor 12; an SOI wafer (designated as 2) and a bulk semiconductor wafer
(designated as 1; see, FIG. 3B); two bulk semiconductor wafers (designated as 1 and 2, respectively; see FIG. 3C) which both contain an insulating layer 14 thereon; or atiSOI wafer
(designated as 2) and a bulk wafer (designated as 1) which includes an ion implant region 11, such as a Kb implant region, which can be used to split a portion of at least one of the wafers during bonding (See FIG. 3D).
Bonding is achieved by first bringing the two wafers into intimate contact with other; optionally applying an external force to the contacted wafers; and then heating the two contacted wafers under conditions that are capable of bonding the two wafers together. The heating step may be performed in the presence or absence of an external force. The heating step is typically performed in an inert ambient at a temperature of from about 200° to about 1050°C for a time period of from about 2 to about 20 hours. More preferably, the bonding is performed at a temperature of from about 200° to about 400°C for a time period of from about 2 to about 20 hours. The term "inert ambient" is used in the present invention to denote an atmosphere in which an inert gas, such as He, Ar, N2, Xe, Kr or a mixture thereof, is employed. A preferred ambient used during the bonding process is N.
In the embodiment where two SOI wafers are employed, some material layers of at least one of the SOI wafers may be removed after bonding utilizing aplanarization process such as chemical mechanical polishing(CMP) or grinding and etching. The planarizatio rocess stops when surface dielectric layer 18 is reached.
In the embodiment in which one of the wafers includes an ion implant region, the ion implant region forms a porous region during bonding which causes a portion of the wafer above the ion implant region to break off leaving a bonded wafer such as is shown, for example, in FIG. 1 A. The implant region is typically comprised of H ions which are implanted into the surface of the wafer utilizing ion implantation conditions that are well known to those skilled in the art.
In the embodiment where the wafers to be bonded do not include a dielectric layer therein, the surface dielectric layer 18 may be formed atop the bonded wafers by a thermal process, such as oxidation, or by a conventional deposition process such as chemical vapor deposition (CVD), plasma-enhanced CVD, atomic layer deposition, chemical solution deposition as well as other like deposition processes. Mask 20 is then formed on a predetermined portion of the bonded substrate 10 of FIG. 2 A so as to protect a portion of the bonded substrate 10, while leaving another portion of the bonded substrate 10 unprotected. The protected portion of the bonded substrate 10 defines a first device region 22 of the structure, whereas the unprotected portion of the bonded substrate 10 defines a second device area 24. In one embodiment, mask 20 is formed on a predetermined portion of the surface dielectric layer 18 by applying aphotoresist mask to the entire surface of the bonded substrate 10. After application of the photoresist mask, the mask is patterned by lithography, which includes the steps of exposing thephotoresist to a pattern of radiation and developing the pattern utilizing a resist developer. The resultant structure including the mask 20 formed on a predetermined portion of the bonded substrate 10 is shown, for example, in FIG. 2B.
In another embodiment mask 20 is a nitride oroxynitride layer that is formed and patterned utilizing lithography and etching. The nitride oroxynitride mask 20 may be removed after defining the region for the second semiconductor device. After providing the mask 20 to the bonded substrate 10, the structure is subjected to one or more etching steps so as to expose a surface of the second semiconductor layer 12. Specifically, the one or more etching steps used at this point of the present invention removes the unprotected portions of the surface dielectric layer 18, as well as underlying portions of the first semiconductor layer 16, and a portion of the insulating layer 14 which separated the first semiconductor layer 16 from the second semiconductor layer 12. The etching may be performed utilizing a single etching process or multiple etching steps may be employed. The etching used at this point of the present invention may include a dry etching process such as reactive-ion etching, ion beam etching, plasma etching or laser etching, a wet etching process wherein a chemicaletchant is employed or any combination thereof. In a preferred embodiment of the present invention, reactive-ion etching(RIE) is used in selectively removing the unprotected portions of the surface dielectric layer 18, the first semiconductor layer 16 and the insulating layer 14 in the second semiconductor device region 24. The resultant structure after the etching process has been performed is shown, for example, in FIG. 2C. Note that the sidewallsof the protected first device region 22, i.e., the surface dielectric layer 18, the first semiconductor layer 16, the insulating layer 14 and the second semiconductor layer 12, are exposed after this etching step. As shown, the exposed sidewallsof layers 18, 16 and 14 are aligned with an outer most edge of mask 20.
The mask 20 is then removed from the structure shown in FIG. 2C utilizing a conventional resist stripping process and then a liner or spacer 25 is formed on the exposed sidewalls. The liner or spacer 25 is formed by deposition and etching. The liner or spacer 25 is comprised of an insulating material such as, for example, an oxide.
After forming the liner or spacer 25, a semiconductor material 26 is formed on the exposed second semiconductor layer 12. In accordance with the present invention, semiconductor material 26 has a crystallographic orientation that is the same as the crystallographic orientation of the second semiconductor layer 12. The resultant structure is shown, for example, in FIG. 2D.
The semiconductor material 26 may comprise any Si-containing semiconductor, such as Si, strained Si, SiGe, SiC, SiGeC or combinations thereof, which is capable of being formed utilizing a selectiveepitaxial growth method. In some preferred embodiments, semiconductor material 26 is comprised of Si. In other preferred embodiments, the semiconductor material is a strained Si layer that is located atop a relaxed SiGe alloy layer. In the present invention, semiconductor material 26 may be referred to as aregrown semiconductor material. Next, the structure shown in FIG. 2D is subjected to a planarization process such as chemical mechanical polislmgCMP) or grinding such that the upper surface of the semiconductor material 26 is substantially planar with the upper surface of the first semiconductor layer 16. Note that previously protected portion of surface dielectric layer 18 is removed during this planarization process. After providing the substantially planar surfaces, an isolation region 27, such as a shallow trench isolation region, is typically formed so as to isolate the first semiconductor device region 22 from the second semiconductor device region 24. The isolation region 27 is formed utilizing processing steps that are well known to those skilled in the art including, for example, trench definition and etching; optionally lining the trench with a diffusion barrier; and filling the trench with a trench dielectric such as an oxide. After the trench fill, the structure may beplanarizedand an optional densificationprocess step may be performed to density the trench dielectric.
The resultant substantially planar structure containing isolation region 27 is show, for example, in FIG. 2E. As shown, the structure of FIG. 2E includes an exposed first semiconductor layer 16 of a first crystal orientation and an unexposedregrown semiconductor material 26 that has the same crystal orientation as that of the second semiconductor layer 12. FIG. 2F shows the integrated structure that is formed after a first semiconductor device 30 is formed on a portion of the first semiconductor layer 16 and a second semiconductor device 32 is formed on the regrown semiconductor material 26. Despite showing the presence of only one semiconductor device in each device region, the present invention contemplates forming a plurality of each type of device in the specific device region. In accordance with the present invention, the first semiconductor device may be aPFET or a NFET, whereas the second semiconductor device may be aNFET or PFET, with the proviso that the first semiconductor device is different from the second semiconductor device and that the specific device is fabricating on a crystal orientation that provides a high performance device. ThePFETs and
NFETs are formed utilizing standardCMOS processing steps that are well known to those skilled in the art. EachFET includes a gate dielectric, a gate conductor, an optional hard mask located atop the gate conductor, spacers located on sidewalls of at least the gate conductor, and source/drain diffusion regions. The diffusion regions are labeled as 34 in FIG. 2F. Note that the PFET is formed over the semiconductor material that has a (110), or (111) orientation, whereas the NFET is formed over a semiconductor surface having a (100), or (111) orientation.
The above description and FIGS.2A-2F illustrate the basic concept of the present invention which includes providing a bonded substrate having two different crystallographic orientations, masking, etching, regrowth, planarization and device formation. The following description with references to FIGS.4A-4J illustrate processing steps used in forming a high performance semiconductor device containing twoNFETs formed on a (100) crystallographic surface, and a PFET, which is located between the NFETs, formed on a (110) crystallographic surface.
FIG. 4A illustrates a bonded substrate 10 that may be used in this embodiment of the present invention. The bonded substrate 10 includes a surface dielectric layer 18, a first semiconductor layer 16, an insulating layer 14 and a second semiconductor layer 12. A third optional semiconductor layer may be located beneath the second semiconductor layer 12. In such an embodiment, an insulating layer separates the second semiconductor layer from the optional third semiconductor layer.
FIG. 4B illustrates the structure after nitride mask 20 has been formed on the surface dielectric layer 18. The nitride mask 20 is formed utilizing a conventional deposition process such as CVD.
After formation of nitride mask 20, the mask is patterned utilizing a patterned photoresist mask and etching, and then the pattern is transferred via another etching process from nitride mask 20 into the structure stopping atop an upper surface layer of the second semiconductor layer 12. The etching used in the second etching removes portions of the surface dielectric layer 18, the first semiconductor layer 16, and the insulating layer 14. A single or multiple etching process is performed in transferring the pattern into the bonded substrate 10. FIG. 4C shows the resultant structure after pattern transfer. Next, and as shown in FIG. 4D, spacers 25 are formed on the exposed sidewalls. The spacers 25 are composed of an insulating material including, for example, an oxide. The spacers 25 which are located on the sidewalls of the protected first device region are formed by deposition and etching.
After formation of the spacers 25, semiconductor material 26 is formed on the exposed surface of the second semiconductor layer 12 providing the structure shown, for example, in FIG. 4E. The structure illustrated in FIG. 4E is thenplanarizedto provide the substantially planer structure shown in FIG. 4F. Note that the planarization step removes the nitride mask 20 and the surface dielectric layer 18 that were not previously etched so as to provide a structure in which first semiconductor layer 16 is exposed andregrown semiconductor material 26 is exposed. The exposed first semiconductor layer 16 is the region in which a first semiconductor device such as anNFET will be formed, whereas the exposed surface of semiconductor material 26 is the region in which a second semiconductor device, such as a PFET, will be formed.
Next, and as shown in FIG. 4G, a material stack 50 comprising a pad oxide 51 and a pad nitride 52 is then formed atop the substantially planar structure shown in FIG. 4F. The pad oxide 51 of the material stack 50 is formed by either a thermal oxidation process or by deposition, while the pad nitride 52 is formed by a thermalnitridation process or deposition. The pad nitride 52 is typically thicker than the underlying pad oxide 51.
The material stack 50 is used in defining the trench openings for isolation regions 27. FIG. 4H illustrates the structure that is formed after trench openings 29 have been formed into the structure shown in FIG. 4G. The trench openings 29 are formed by lithography and etching.
After defining the trench openings 29, the trench openings 29 are filled with a trench dielectric such as an oxide andplanarizedto the first semiconductor layer 16 and the regrown semiconductor material 26. FIG. 41 shows the structure that is formed after trench filling and planarization. The structure shown in FIG. 41 includes three device regions; two of which are referred to as first device regions 22 in which a first semiconductor device 30 will be formed and the third is a second device region 24 in which a second semiconductor device 32 will be formed.
FIG. 4J shows the integrated structure that is formed after a first semiconductor device
30 is formed on a portion of the first semiconductor layer 16 and a second semiconductor device 32 is formed on the regrown semiconductor material 26. Despite showing the presence of only one semiconductor device in each device region, the present invention contemplates forming a plurality of each type of device in the specific device region. In accordance with the present invention, the first semiconductor device may be aPFET (or NFET), whereas the second semiconductor device may be aNFET (or PFET). The PFETs and NFETs are formed utilizing standard CMOS processing steps that are well known to those skilled in the art. Each FET includes a gate dielectric, a gate conductor, an optional hard mask located atop the gate conductor, spacers located on sidewallsof at least the gate conductor, source/drain diffusion regions. Note that the PFET is formed over a surface having a (110) or (ll l) orientation, whereas the NFET is formed over a surface having a (100) or (111) orientation. In the structure shown in FIG. 4J, the NFETs are SOI-like devices, whereas the PFET is a bulk-like semiconductor device. If a third semiconductor layer was present beneath the second semiconductor layer 12, all three devices would beSOI-like.
FIGS. 5A-5G illustrates alternative processing steps used in forming a high performance semiconductor device containing two NFETs formed on a (100) crystallographic surface, and a PFET, which is located between the NFETs, formed on a (110) crystallographic surface. The alternative method begins with forming the bonded substrate shown in FIG. 5A. The bonded substrate 10 includes at least a surface dielectric layer 18, a first semiconductor layer 16, an insulating layer 14 and a second semiconductor layer 12. A third optional semiconductor layer may be located beneath the second semiconductor layer.
Next, nitride mask 20 is formed on the bonded substrate 10 to provide the structure illustrated in FIG. 5B. After forming the nitride mask 20 on the bonded substrate 10, isolation regions 27 are formed utilizing the nitride mask 20 and surfacedielectricl 8 as a combined etch mask. Isolation regions 27 are formed by applying aphotoresist to the surface of the nitride mask 20, patterning the photoresist and transferring the pattern from the photoresist into the nitride mask 20 and then into the surface dielectric layer 18 to expose the first semiconductor layer 16. The exposed first semiconductor layer 16 is then etched stopping on an upper surface of the insulating layer 14. The trenches formed by the etching step are then filled with a trench dielectric andplanarizedto an upper surface of the nitride mask 20. FIG. 5C shows the structure after trench fill and planarization. In particular, isolation regions 27 are shown in FIG. 5C.
The material between the isolation regions is then removed providing the structure shown in FIG. 5D. Specifically, the material between the isolation regions is removed by forming a block mask to protect portions of the structure in which the first semiconductor devices will be formed and then etching the unprotected portions of the nitride mask 20, the surface dielectric layer 18 and the first semiconductor layer 16 stopping on the insulating layer
14.
The exposed portion of the insulating layer 14 is then removed utilizing an etching process that selectively removes an insulator material, such as an oxide, providing the structure shown, for example, in FIG. 5E. Note that this etching step also reduces the height of isolation regions 27. This etching step stops atop an upper surface of the second semiconductor layer 12. The remaining nitride mask 20 is then stripped from the structure and then semiconductor material 26 is regrown on the exposed surface of the second semiconductor material 12 providing the structure shown, for example, in FIG. 5F. In this particular embodiment, the regrown semiconductor material 26 includes an upper layer of strained Si 31.
Oxide is then stripped from the structure shown in FIG. 5F and strained Si 31 is formed on the exposed portions of the first semiconductor layer 16. After forming the strained Si layers, CMOS devices 30 and 32 are formed over the respective crystal orientation that provides a high performance device. The resultant structure containingNFETs and PFETs formed atop strained Si layers is shown, for example, in FIG. 5G.
While the present invention has been particularly shown and described with respect to preferred embodiments thereof, it will be understood by those skilled in the art that the foregoing and other changes in forms and details may be made without departing from the spirit and scope of the present invention. It is therefore intended that the present invention not be limited to the exact forms and details described and illustrated, but fall within the scope of the appended claims.

Claims

CLAIMSWhat is claimed is:
1. A method of forming CMOS devices on a hybrid crystal oriented substrate comprising: proΛάding a bonded substrate comprising at least a first semiconductor layer of a first crystallographic orientation and a second semiconductor layer of a second crystallographic orientation separated by an insulating layer, said first crystallographic orientation is different from said second crystallographic orientation and said first semiconductor layer lies above said second semiconductor layer; protecting a portion of the bonded substrate to define a first device area, while leaving another portion of the bonded substrate unprotected, said unprotected portion of the bonded substrate defining a second device area; etching said unprotected portion of the bonded substrate to expose a surface of the second semiconductor layer; regrowing a semiconductor material on said exposed surface of the second semiconductor layer, said semiconductor material having a crystallographic orientation that is the same as the second crystallographic orientation; planarizingthe bonded substrate containing the semiconductor material so that an upper surface of the first semiconductor layer is substantially planar with an upper surface of the semiconductor material; and forming at least one first semiconductor device in said first device region, while forming at least one second semiconductor device on said semiconductor material in said second device area.
2. The method of Claim 1 wherein said bonded substrate further comprising a surface dielectric layer located on said first semiconductor material.
3. The method of Claim 1 wherein said bonded substrate is formed from two silicon-on-insulator(SOI) wafers, a SOI wafer and a bulk semiconductor wafer, two bulk semiconductor wafers, or a SOI wafer and a bulk semiconductor wafer which contains an ion implant region which forms voids after heating.
4. The method of Claim 1 wherein said bonded substrate is formed by bringing two wafers into intimate contact with each other and heating the contacted wafers in an inert ambient.
5. The method of Claim 4 wherein said heating is performed at a temperature of from about 200°C to about 1050°C for a time period of from about 2 to about 20 hours.
6. The method of Claim 1 wherein said protecting comprises the use of a patterned mask.
7. The method of Claim 6 wherein said patterned mask is a patternedphotoresist, a patterned nitride or a patterned oxynitiϊde.
8. The method of Claim 1 wherein said semiconductor material is formed utilizing a selective epitaxial growth method.
9. The method of Claim 1 wherein said semiconductor material is a Si-contøining semiconductor selected from the group consisting of Si, strained Si, SiGe, SiC, SiGeC and combinations thereof.
10. The method of Claim 1 wherein saidplanarizingcomprises chemical mechanical polishing or grinding.
11. The method of Claim 1 wherein between said etching andregrowing steps a liner or spacer is formed on exposed sidewalls.
12. The method of Claim 1 further comprising forming isolation regions after etching, but prior to forming the at least one semiconductor devices.
13. The method of Claim 1 wherein said semiconductor devices areNFETs or PFETs.
14. The method of Claim 1 wherein said first semiconductor layer has a (110) crystal orientation and said second semiconductor layer and the semiconductor material both have a
(100) crystal orientation.
15. The method of Claim 14 wherein first semiconductor device is aPFET and the second semiconductor device is anNFET.
16. The method of Claim 1 wherein said semiconductor devices are formed upon a layer of strained Si.
17. The method of Claim 1 wherein said semiconductor material comprises a strained Si layer located atop a relaxed SiGe alloy layer.
18. An integrated semiconductor structure comprising: a bonded substrate comprising a first device region having a first crystallographic orientation and a second device region having a second crystallographic orientation, said first crystallographic orientation is different from said second crystallographic orientation; an isolation region separating said first device region from said second device region; and at least one first semiconductor device located in said first device region and at least one second semiconductor device located in said second device region.
19. The integrated semiconductor structure of Claim 18 wherein the first crystal orientation is (110) and the second crystal orientation is (100).
20. The integrated semiconductor structure of Claim 19 wherein said at least one first semiconductor device is aPFET and the at least one second semiconductor device is aNFET.
21. The integrated semiconductor structure of Claim 18 wherein the second device region includes a regrown semiconductor material.
22. The integrated semiconductor structure of Claim 21 wherein saidregrown semiconductor material is a Si-containing semiconductor selected from the group consisting of Si, strained Si, SiGe, SiC, SiGeC and combinations thereof.
23. The integrated semiconductor structure of Claim 18 wherein said first and second semiconductor device regions both include strained Si.
24. The integrated semiconductor structure of Claim 22 wherein saidregrown semiconductor material comprises a strained Si layer located atop a relaxedSiGe alloy or SiC alloy.
25. The integrated semiconductor structure of Claim 18 wherein said isolation region is located above a sidewall spacer.
26. An integrated semiconductor structure comprising at least two types of devices, wherein at least one of the devices is located upon a first crystallographic surface that is optimal for that device, while the other device is located upon a second crystallographic surface, which is different from the first crystallographic surface, that is optimal for said other device.
PCT/EP2004/050946 2003-06-17 2004-05-27 High-performance cmos soi device on hybrid crystal-oriented substrates WO2004114400A1 (en)

Priority Applications (3)

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