WO2005029178A3 - A system and method for the direct imaging of color filters - Google Patents
A system and method for the direct imaging of color filters Download PDFInfo
- Publication number
- WO2005029178A3 WO2005029178A3 PCT/IL2004/000882 IL2004000882W WO2005029178A3 WO 2005029178 A3 WO2005029178 A3 WO 2005029178A3 IL 2004000882 W IL2004000882 W IL 2004000882W WO 2005029178 A3 WO2005029178 A3 WO 2005029178A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser
- direct imaging
- color filters
- stripes
- expose
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006526809A JP2007506136A (en) | 2003-09-22 | 2004-09-22 | Color filter direct drawing system and direct drawing method |
IL173669A IL173669A0 (en) | 2003-09-22 | 2006-02-12 | A system and method for the direct imaging of color filters |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US50388703P | 2003-09-22 | 2003-09-22 | |
US60/503,887 | 2003-09-22 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2005029178A2 WO2005029178A2 (en) | 2005-03-31 |
WO2005029178A8 WO2005029178A8 (en) | 2006-04-13 |
WO2005029178A3 true WO2005029178A3 (en) | 2006-09-14 |
Family
ID=34375412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IL2004/000882 WO2005029178A2 (en) | 2003-09-22 | 2004-09-22 | A system and method for the direct imaging of color filters |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2007506136A (en) |
KR (1) | KR20060097711A (en) |
TW (1) | TWI249083B (en) |
WO (1) | WO2005029178A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013061363A (en) * | 2010-01-22 | 2013-04-04 | Panasonic Corp | Drawing device |
TWI400549B (en) | 2010-06-01 | 2013-07-01 | Prime View Int Co Ltd | Method for manufacturing color electrophoretic display device |
CN102645809B (en) * | 2011-02-22 | 2015-05-13 | 元太科技工业股份有限公司 | Manufacturing method of color electrophoretic display device |
US10149390B2 (en) | 2012-08-27 | 2018-12-04 | Mycronic AB | Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs |
WO2014140047A2 (en) * | 2013-03-12 | 2014-09-18 | Micronic Mydata AB | Method and device for writing photomasks with reduced mura errors |
TWI639064B (en) * | 2014-04-01 | 2018-10-21 | 日商尼康股份有限公司 | Substrate processing device and element manufacturing method |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5853924A (en) * | 1994-12-26 | 1998-12-29 | Alps Electric Co., Ltd. | Method of manufacturing color filters |
WO1999045439A1 (en) * | 1998-03-02 | 1999-09-10 | Micronic Laser Systems Ab | Improved pattern generator |
US20020113218A1 (en) * | 1994-02-22 | 2002-08-22 | Masahiko Okumura | Method and apparatus for positioning substrate and the like |
US20020141024A1 (en) * | 2001-01-04 | 2002-10-03 | Wolfgang Retschke | Direct pattern writer |
US6552779B2 (en) * | 2000-05-25 | 2003-04-22 | Ball Semiconductor, Inc. | Flying image of a maskless exposure system |
US6560248B1 (en) * | 2000-06-08 | 2003-05-06 | Mania Barco Nv | System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3757430B2 (en) * | 1994-02-22 | 2006-03-22 | 株式会社ニコン | Substrate positioning apparatus and exposure apparatus |
JPH08236419A (en) * | 1995-02-24 | 1996-09-13 | Nikon Corp | Positioning method |
-
2004
- 2004-09-22 JP JP2006526809A patent/JP2007506136A/en active Pending
- 2004-09-22 KR KR1020067005430A patent/KR20060097711A/en not_active Application Discontinuation
- 2004-09-22 WO PCT/IL2004/000882 patent/WO2005029178A2/en active Application Filing
- 2004-10-06 TW TW093130239A patent/TWI249083B/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020113218A1 (en) * | 1994-02-22 | 2002-08-22 | Masahiko Okumura | Method and apparatus for positioning substrate and the like |
US5853924A (en) * | 1994-12-26 | 1998-12-29 | Alps Electric Co., Ltd. | Method of manufacturing color filters |
WO1999045439A1 (en) * | 1998-03-02 | 1999-09-10 | Micronic Laser Systems Ab | Improved pattern generator |
US6552779B2 (en) * | 2000-05-25 | 2003-04-22 | Ball Semiconductor, Inc. | Flying image of a maskless exposure system |
US6560248B1 (en) * | 2000-06-08 | 2003-05-06 | Mania Barco Nv | System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation |
US20020141024A1 (en) * | 2001-01-04 | 2002-10-03 | Wolfgang Retschke | Direct pattern writer |
Also Published As
Publication number | Publication date |
---|---|
WO2005029178A8 (en) | 2006-04-13 |
JP2007506136A (en) | 2007-03-15 |
WO2005029178A2 (en) | 2005-03-31 |
KR20060097711A (en) | 2006-09-14 |
TWI249083B (en) | 2006-02-11 |
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