WO2005037446A3 - Applying imprinting material to substrates employing electromagnetic fields - Google Patents

Applying imprinting material to substrates employing electromagnetic fields Download PDF

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Publication number
WO2005037446A3
WO2005037446A3 PCT/US2004/034465 US2004034465W WO2005037446A3 WO 2005037446 A3 WO2005037446 A3 WO 2005037446A3 US 2004034465 W US2004034465 W US 2004034465W WO 2005037446 A3 WO2005037446 A3 WO 2005037446A3
Authority
WO
WIPO (PCT)
Prior art keywords
imprinting material
electromagnetic fields
employing electromagnetic
applying
substrates employing
Prior art date
Application number
PCT/US2004/034465
Other languages
French (fr)
Other versions
WO2005037446A2 (en
Inventor
Anshuman Cherala
Sidlgata V Sreenivasan
Norman E Schumaker
Original Assignee
Molecular Imprints Inc
Univ Texas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc, Univ Texas filed Critical Molecular Imprints Inc
Publication of WO2005037446A2 publication Critical patent/WO2005037446A2/en
Publication of WO2005037446A3 publication Critical patent/WO2005037446A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

The present invention comprises a method for applying a liquid, such as imprinting material, to a substrate that features use of an electromagnetic field to rapidly spread the liquid over a desired portion of the substrate, while confining the same to the desired region.
PCT/US2004/034465 2003-10-16 2004-10-18 Applying imprinting material to substrates employing electromagnetic fields WO2005037446A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/687,562 2003-10-16
US10/687,562 US7261830B2 (en) 2003-10-16 2003-10-16 Applying imprinting material to substrates employing electromagnetic fields

Publications (2)

Publication Number Publication Date
WO2005037446A2 WO2005037446A2 (en) 2005-04-28
WO2005037446A3 true WO2005037446A3 (en) 2005-07-28

Family

ID=34465546

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/034465 WO2005037446A2 (en) 2003-10-16 2004-10-18 Applying imprinting material to substrates employing electromagnetic fields

Country Status (4)

Country Link
US (1) US7261830B2 (en)
MY (1) MY137912A (en)
TW (1) TWI253434B (en)
WO (1) WO2005037446A2 (en)

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EP2270592B1 (en) * 2000-07-17 2015-09-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US7360851B1 (en) 2006-02-15 2008-04-22 Kla-Tencor Technologies Corporation Automated pattern recognition of imprint technology
CN102438841A (en) * 2009-03-23 2012-05-02 因特瓦克公司 A process for optimization of island to trench ratio in patterned media

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US20030215577A1 (en) * 2002-05-16 2003-11-20 Willson Carlton Grant Method and system for fabricating nanoscale patterns in light curable compositions using an electric field

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Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3757846A (en) * 1958-11-28 1973-09-11 H Herman Method and apparatus for effecting electromagnetic displacement of fluids
US4512386A (en) * 1982-11-12 1985-04-23 Swiss Aluminium Ltd. Adjustable mold for electromagnetic casting
US4982796A (en) * 1988-10-18 1991-01-08 Arch Development Corp. Electromagnetic confinement for vertical casting or containing molten metal
US20010026714A1 (en) * 2000-03-31 2001-10-04 Tsutomu Uezono Image forming apparatus and image forming method
US20030215577A1 (en) * 2002-05-16 2003-11-20 Willson Carlton Grant Method and system for fabricating nanoscale patterns in light curable compositions using an electric field

Also Published As

Publication number Publication date
WO2005037446A2 (en) 2005-04-28
US20050082253A1 (en) 2005-04-21
TW200519034A (en) 2005-06-16
MY137912A (en) 2009-03-31
US7261830B2 (en) 2007-08-28
TWI253434B (en) 2006-04-21

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