WO2006014455A3 - Microwave plasma nozzle with enhanced plume stability and heating efficiency - Google Patents
Microwave plasma nozzle with enhanced plume stability and heating efficiency Download PDFInfo
- Publication number
- WO2006014455A3 WO2006014455A3 PCT/US2005/023886 US2005023886W WO2006014455A3 WO 2006014455 A3 WO2006014455 A3 WO 2006014455A3 US 2005023886 W US2005023886 W US 2005023886W WO 2006014455 A3 WO2006014455 A3 WO 2006014455A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- microwave plasma
- gas flow
- plasma nozzle
- flow tube
- microwave
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
Abstract
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2005270006A AU2005270006B2 (en) | 2004-07-07 | 2005-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
CA2572391A CA2572391C (en) | 2004-07-07 | 2005-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
US11/631,723 US8035057B2 (en) | 2004-07-07 | 2005-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
EP05769522.3A EP1787500B1 (en) | 2004-07-07 | 2005-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
KR1020087023257A KR100946434B1 (en) | 2004-07-07 | 2005-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency, plasma generating system and method thereof |
JP2007520452A JP5060951B2 (en) | 2004-07-07 | 2005-07-07 | Plasma generation system |
CN200580022852XA CN101002508B (en) | 2004-07-07 | 2005-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/885,237 | 2004-07-07 | ||
US10/885,237 US7164095B2 (en) | 2004-07-07 | 2004-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006014455A2 WO2006014455A2 (en) | 2006-02-09 |
WO2006014455A3 true WO2006014455A3 (en) | 2007-01-18 |
Family
ID=35116039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/023886 WO2006014455A2 (en) | 2004-07-07 | 2005-07-07 | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
Country Status (9)
Country | Link |
---|---|
US (2) | US7164095B2 (en) |
EP (1) | EP1787500B1 (en) |
JP (1) | JP5060951B2 (en) |
KR (2) | KR100906836B1 (en) |
CN (1) | CN101002508B (en) |
AU (1) | AU2005270006B2 (en) |
CA (1) | CA2572391C (en) |
RU (1) | RU2355137C2 (en) |
WO (1) | WO2006014455A2 (en) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7164095B2 (en) * | 2004-07-07 | 2007-01-16 | Noritsu Koki Co., Ltd. | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
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US20080093358A1 (en) * | 2004-09-01 | 2008-04-24 | Amarante Technologies, Inc. | Portable Microwave Plasma Discharge Unit |
US20060052883A1 (en) * | 2004-09-08 | 2006-03-09 | Lee Sang H | System and method for optimizing data acquisition of plasma using a feedback control module |
KR100689037B1 (en) * | 2005-08-24 | 2007-03-08 | 삼성전자주식회사 | micrewave resonance plasma generating apparatus and plasma processing system having the same |
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JP4680091B2 (en) * | 2006-02-23 | 2011-05-11 | 株式会社サイアン | Plasma generator and work processing apparatus |
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JP4699235B2 (en) * | 2006-02-20 | 2011-06-08 | 株式会社サイアン | Plasma generating apparatus and work processing apparatus using the same |
JP2007227201A (en) * | 2006-02-24 | 2007-09-06 | Noritsu Koki Co Ltd | Plasma generating device and workpiece treatment device |
TW200816881A (en) | 2006-08-30 | 2008-04-01 | Noritsu Koki Co Ltd | Plasma generation apparatus and workpiece processing apparatus using the same |
WO2008032856A2 (en) * | 2006-09-13 | 2008-03-20 | Noritsu Koki Co., Ltd. | Plasma generator and work processing apparatus provided with the same |
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DE102007042436B3 (en) * | 2007-09-06 | 2009-03-19 | Brandenburgische Technische Universität Cottbus | Method and device for charging, reloading or discharging of aerosol particles by ions, in particular into a diffusion-based bipolar equilibrium state |
GB0718721D0 (en) | 2007-09-25 | 2007-11-07 | Medical Device Innovations Ltd | Surgical resection apparatus |
GB2454461B (en) * | 2007-11-06 | 2012-11-14 | Creo Medical Ltd | A system to treat and/or kill bacteria and viral infections using microwave atmospheric plasma |
CN104174049B (en) | 2007-11-06 | 2017-03-01 | 克里奥医药有限公司 | Adjustable applicator component and plasma body sterilizing equipment |
US20100074810A1 (en) * | 2008-09-23 | 2010-03-25 | Sang Hun Lee | Plasma generating system having tunable plasma nozzle |
US20100074808A1 (en) * | 2008-09-23 | 2010-03-25 | Sang Hun Lee | Plasma generating system |
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US20100201272A1 (en) * | 2009-02-09 | 2010-08-12 | Sang Hun Lee | Plasma generating system having nozzle with electrical biasing |
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US20100254853A1 (en) * | 2009-04-06 | 2010-10-07 | Sang Hun Lee | Method of sterilization using plasma generated sterilant gas |
US8800483B2 (en) * | 2009-05-08 | 2014-08-12 | Peter F. Vandermeulen | Methods and systems for plasma deposition and treatment |
WO2011096956A1 (en) * | 2010-02-05 | 2011-08-11 | Micropyretics Heaters International, Inc. | Anti-smudging, better gripping, better shelf-life of products and surfaces |
US8723423B2 (en) | 2011-01-25 | 2014-05-13 | Advanced Energy Industries, Inc. | Electrostatic remote plasma source |
WO2012135872A1 (en) | 2011-03-30 | 2012-10-04 | Kolesnik Viktor Grigorjevich | Method for obtaining silicon and titanium by generating electromagnetic interactions between sio2 and fetio3 particles and magnetic waves |
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4611108A (en) * | 1982-09-16 | 1986-09-09 | Agence National De Valorisation De La Recherche (Anuar) | Plasma torches |
US4652723A (en) * | 1983-11-17 | 1987-03-24 | L'air Liquide, Societe Anonyme Pour L'etude Et Lexploitation Des Procedes Georges Claude | Method for heat treating with a microwave plasma torch |
EP0397468A2 (en) * | 1989-05-09 | 1990-11-14 | Varian Associates, Inc. | Spectroscopic plasma torch for microwave induced plasmas |
US20020020691A1 (en) * | 2000-05-25 | 2002-02-21 | Jewett Russell F. | Methods and apparatus for plasma processing |
US20020050323A1 (en) * | 2000-10-27 | 2002-05-02 | Michel Moisan | Device for the plasma treatment of gases |
US6388225B1 (en) * | 1998-04-02 | 2002-05-14 | Bluem Heinz-Juergen | Plasma torch with a microwave transmitter |
US20030000823A1 (en) * | 2001-06-15 | 2003-01-02 | Uhm Han Sup | Emission control for perfluorocompound gases by microwave plasma torch |
US6525481B1 (en) * | 1998-05-12 | 2003-02-25 | Masarykova Univerzita | Method of making a physically and chemically active environment by means of a plasma jet and the related plasma jet |
US6734385B1 (en) * | 1999-05-11 | 2004-05-11 | Dae Won Paptin Foam Co. Ltd. | Microwave plasma burner |
Family Cites Families (149)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3353060A (en) * | 1964-11-28 | 1967-11-14 | Hitachi Ltd | High-frequency discharge plasma generator with an auxiliary electrode |
US3562486A (en) * | 1969-05-29 | 1971-02-09 | Thermal Dynamics Corp | Electric arc torches |
US3911318A (en) | 1972-03-29 | 1975-10-07 | Fusion Systems Corp | Method and apparatus for generating electromagnetic radiation |
JPS5378170A (en) | 1976-12-22 | 1978-07-11 | Toshiba Corp | Continuous processor for gas plasma etching |
US4185213A (en) | 1977-08-31 | 1980-01-22 | Reynolds Metals Company | Gaseous electrode for MHD generator |
US4207286A (en) * | 1978-03-16 | 1980-06-10 | Biophysics Research & Consulting Corporation | Seeded gas plasma sterilization method |
FR2480552A1 (en) | 1980-04-10 | 1981-10-16 | Anvar | PLASMA GENERATOR |
JPS6046029A (en) | 1983-08-24 | 1985-03-12 | Hitachi Ltd | Equipment for manufacturing semiconductor |
DE3331216A1 (en) | 1983-08-30 | 1985-03-14 | Castolin Gmbh, 6239 Kriftel | DEVICE FOR THERMAL SPRAYING OF FOLDING WELDING MATERIALS |
FR2552964B1 (en) * | 1983-10-03 | 1985-11-29 | Air Liquide | HYPERFREQUENCY ENERGY PLASMA TORCH |
JPS60189198A (en) * | 1984-03-08 | 1985-09-26 | 株式会社日立製作所 | High frequency discharge generator |
US5028527A (en) * | 1988-02-22 | 1991-07-02 | Applied Bio Technology | Monoclonal antibodies against activated ras proteins with amino acid mutations at position 13 of the protein |
JPS6281274A (en) | 1985-10-02 | 1987-04-14 | Akira Kanekawa | Plasma jet torch |
JPH0645896B2 (en) | 1986-03-08 | 1994-06-15 | 株式会社日立製作所 | Low temperature plasma processing equipment |
JPH0660412B2 (en) | 1986-08-21 | 1994-08-10 | 東京瓦斯株式会社 | Thin film formation method |
US4976920A (en) * | 1987-07-14 | 1990-12-11 | Adir Jacob | Process for dry sterilization of medical devices and materials |
JPH01183432A (en) * | 1988-01-18 | 1989-07-21 | Sumitomo Electric Ind Ltd | Heating of quartz glass tube |
JPH0748480B2 (en) | 1988-08-15 | 1995-05-24 | 新技術事業団 | Atmospheric pressure plasma reaction method |
US5114770A (en) | 1989-06-28 | 1992-05-19 | Canon Kabushiki Kaisha | Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method |
JP2527150B2 (en) * | 1989-07-25 | 1996-08-21 | 豊信 吉田 | Microwave thermal plasma torch |
JPH0691634B2 (en) | 1989-08-10 | 1994-11-14 | 三洋電機株式会社 | Driving method for solid-state imaging device |
JP2781996B2 (en) | 1989-08-18 | 1998-07-30 | 株式会社日立製作所 | High temperature steam generator |
US5170098A (en) * | 1989-10-18 | 1992-12-08 | Matsushita Electric Industrial Co., Ltd. | Plasma processing method and apparatus for use in carrying out the same |
US5645796A (en) | 1990-08-31 | 1997-07-08 | Abtox, Inc. | Process for plasma sterilizing with pulsed antimicrobial agent treatment |
US5084239A (en) * | 1990-08-31 | 1992-01-28 | Abtox, Inc. | Plasma sterilizing process with pulsed antimicrobial agent treatment |
JPH05275191A (en) | 1992-03-24 | 1993-10-22 | Semiconductor Energy Lab Co Ltd | Atmospheric pressure discharge method |
JPH05146879A (en) | 1991-04-30 | 1993-06-15 | Toyo Denshi Kk | Nozzle device for plasma working machine |
JP3021117B2 (en) | 1991-09-20 | 2000-03-15 | 三菱重工業株式会社 | Electron cyclotron resonance plasma CDV system |
US5349154A (en) | 1991-10-16 | 1994-09-20 | Rockwell International Corporation | Diamond growth by microwave generated plasma flame |
JPH065384A (en) | 1992-06-17 | 1994-01-14 | Hitachi Ltd | Torch tube for generation of microwave plasma |
JPH0613329A (en) | 1992-06-25 | 1994-01-21 | Canon Inc | Semiconductor device and manufacture thereof |
JPH06244140A (en) | 1992-10-28 | 1994-09-02 | Nec Kyushu Ltd | Dry etching device |
DE4242633C2 (en) | 1992-12-17 | 1996-11-14 | Fraunhofer Ges Forschung | Process for carrying out stable low-pressure glow processes |
US5389153A (en) * | 1993-02-19 | 1995-02-14 | Texas Instruments Incorporated | Plasma processing system using surface wave plasma generating apparatus and method |
JP2540276B2 (en) | 1993-03-12 | 1996-10-02 | 株式会社山東鉄工所 | Sterilizer inside the container |
US5938854A (en) * | 1993-05-28 | 1999-08-17 | The University Of Tennessee Research Corporation | Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
JPH07135196A (en) | 1993-06-29 | 1995-05-23 | Nec Kyushu Ltd | Semiconductor substrate ashing device |
JPH0740056A (en) | 1993-07-28 | 1995-02-10 | Komatsu Ltd | Plasma torch |
JPH07153593A (en) | 1993-12-01 | 1995-06-16 | Daido Steel Co Ltd | Microwave plasma treating device |
JPH07258828A (en) | 1994-03-24 | 1995-10-09 | Matsushita Electric Works Ltd | Film formation |
US5565118A (en) | 1994-04-04 | 1996-10-15 | Asquith; Joseph G. | Self starting plasma plume igniter for aircraft jet engine |
US5679167A (en) | 1994-08-18 | 1997-10-21 | Sulzer Metco Ag | Plasma gun apparatus for forming dense, uniform coatings on large substrates |
US5503676A (en) * | 1994-09-19 | 1996-04-02 | Lam Research Corporation | Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber |
JPH08236293A (en) * | 1994-10-26 | 1996-09-13 | Matsushita Electric Ind Co Ltd | Microwave plasma torch and plasma generating method |
TW285746B (en) * | 1994-10-26 | 1996-09-11 | Matsushita Electric Ind Co Ltd | |
EP0727504A3 (en) | 1995-02-14 | 1996-10-23 | Gen Electric | Plasma coating process for improved bonding of coatings on substrates |
US5573682A (en) * | 1995-04-20 | 1996-11-12 | Plasma Processes | Plasma spray nozzle with low overspray and collimated flow |
US5689949A (en) | 1995-06-05 | 1997-11-25 | Simmonds Precision Engine Systems, Inc. | Ignition methods and apparatus using microwave energy |
US5741460A (en) * | 1995-06-07 | 1998-04-21 | Adir Jacob | Process for dry sterilization of medical devices and materials |
US5793013A (en) | 1995-06-07 | 1998-08-11 | Physical Sciences, Inc. | Microwave-driven plasma spraying apparatus and method for spraying |
US5750072A (en) * | 1995-08-14 | 1998-05-12 | Sangster; Bruce | Sterilization by magnetic field stimulation of a mist or vapor |
US5825485A (en) * | 1995-11-03 | 1998-10-20 | Cohn; Daniel R. | Compact trace element sensor which utilizes microwave generated plasma and which is portable by an individual |
US5977715A (en) * | 1995-12-14 | 1999-11-02 | The Boeing Company | Handheld atmospheric pressure glow discharge plasma source |
JPH09169595A (en) | 1995-12-19 | 1997-06-30 | Daihen Corp | Formation of thin film |
US6017825A (en) * | 1996-03-29 | 2000-01-25 | Lam Research Corporation | Etch rate loading improvement |
US6030579A (en) * | 1996-04-04 | 2000-02-29 | Johnson & Johnson Medical, Inc. | Method of sterilization using pretreatment with hydrogen peroxide |
US5928527A (en) | 1996-04-15 | 1999-07-27 | The Boeing Company | Surface modification using an atmospheric pressure glow discharge plasma source |
US5972302A (en) | 1996-08-27 | 1999-10-26 | Emr Microwave Technology Corporation | Method for the microwave induced oxidation of pyritic ores without the production of sulphur dioxide |
US5994663A (en) | 1996-10-08 | 1999-11-30 | Hypertherm, Inc. | Plasma arc torch and method using blow forward contact starting system |
US6309979B1 (en) * | 1996-12-18 | 2001-10-30 | Lam Research Corporation | Methods for reducing plasma-induced charging damage |
US5869401A (en) * | 1996-12-20 | 1999-02-09 | Lam Research Corporation | Plasma-enhanced flash process |
GB9703159D0 (en) * | 1997-02-15 | 1997-04-02 | Helica Instr Limited | Medical apparatus |
US6125859A (en) | 1997-03-05 | 2000-10-03 | Applied Materials, Inc. | Method for improved cleaning of substrate processing systems |
US6039834A (en) | 1997-03-05 | 2000-03-21 | Applied Materials, Inc. | Apparatus and methods for upgraded substrate processing system with microwave plasma source |
US5980768A (en) * | 1997-03-07 | 1999-11-09 | Lam Research Corp. | Methods and apparatus for removing photoresist mask defects in a plasma reactor |
US6209551B1 (en) * | 1997-06-11 | 2001-04-03 | Lam Research Corporation | Methods and compositions for post-etch layer stack treatment in semiconductor fabrication |
JP3175640B2 (en) | 1997-06-17 | 2001-06-11 | 横河電機株式会社 | Microwave induction plasma igniter |
US6221792B1 (en) * | 1997-06-24 | 2001-04-24 | Lam Research Corporation | Metal and metal silicide nitridization in a high density, low pressure plasma reactor |
US6150628A (en) | 1997-06-26 | 2000-11-21 | Applied Science And Technology, Inc. | Toroidal low-field reactive gas source |
US6200651B1 (en) * | 1997-06-30 | 2001-03-13 | Lam Research Corporation | Method of chemical vapor deposition in a vacuum plasma processor responsive to a pulsed microwave source |
JPH1121496A (en) | 1997-06-30 | 1999-01-26 | Nippon Shokubai Co Ltd | Material for forming protective membrane and temporarily protecting treatment of base material |
US6080270A (en) | 1997-07-14 | 2000-06-27 | Lam Research Corporation | Compact microwave downstream plasma system |
JPH1186779A (en) * | 1997-09-11 | 1999-03-30 | Yokogawa Analytical Syst Kk | Time-of-flight mass spectrometer using high-frequency inductively coupled plasma |
US6016766A (en) * | 1997-12-29 | 2000-01-25 | Lam Research Corporation | Microwave plasma processor |
US6165910A (en) * | 1997-12-29 | 2000-12-26 | Lam Research Corporation | Self-aligned contacts for semiconductor device |
JPH11224795A (en) | 1998-02-10 | 1999-08-17 | Shin Seiki:Kk | Method and apparatus for generating plasma, plasma-applied surface treatment method and gas treatment method |
US6157867A (en) | 1998-02-27 | 2000-12-05 | Taiwan Semiconductor Manufacturing Company | Method and system for on-line monitoring plasma chamber condition by comparing intensity of certain wavelength |
US5990446A (en) * | 1998-03-27 | 1999-11-23 | University Of Kentucky Research Founadtion | Method of arc welding using dual serial opposed torches |
US6027616A (en) * | 1998-05-01 | 2000-02-22 | Mse Technology Applications, Inc. | Extraction of contaminants from a gas |
US6727148B1 (en) * | 1998-06-30 | 2004-04-27 | Lam Research Corporation | ULSI MOS with high dielectric constant gate insulator |
US6235640B1 (en) * | 1998-09-01 | 2001-05-22 | Lam Research Corporation | Techniques for forming contact holes through to a silicon layer of a substrate |
JP2000133494A (en) * | 1998-10-23 | 2000-05-12 | Mitsubishi Heavy Ind Ltd | Microwave plasma generation device and method |
JP2000150484A (en) | 1998-11-11 | 2000-05-30 | Chemitoronics Co Ltd | Plasma etching device and etching method |
US6417013B1 (en) | 1999-01-29 | 2002-07-09 | Plasma-Therm, Inc. | Morphed processing of semiconductor devices |
US6228330B1 (en) * | 1999-06-08 | 2001-05-08 | The Regents Of The University Of California | Atmospheric-pressure plasma decontamination/sterilization chamber |
JP2000353689A (en) | 1999-06-10 | 2000-12-19 | Nec Yamagata Ltd | Dry etching system and dry etching method |
DE29911974U1 (en) | 1999-07-09 | 2000-11-23 | Agrodyn Hochspannungstechnik G | Plasma nozzle |
JP4455794B2 (en) | 1999-07-20 | 2010-04-21 | 東京エレクトロン株式会社 | System for controlling a plasma generator |
KR100712325B1 (en) | 1999-07-20 | 2007-05-02 | 동경 엘렉트론 주식회사 | Electron density measurement and control system using plasma -induced changes in the frequency of a microwave oscillator |
US6573731B1 (en) * | 1999-07-20 | 2003-06-03 | Tokyo Electron Limited | Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator |
JP3271618B2 (en) | 1999-07-29 | 2002-04-02 | 日本電気株式会社 | Semiconductor manufacturing apparatus and foreign matter inspection / removal method during dry etching |
JP2001054556A (en) | 1999-08-18 | 2001-02-27 | Shikoku Kakoki Co Ltd | Atmospheric pressure low-temperature plasma sterilization method |
US6410451B2 (en) * | 1999-09-27 | 2002-06-25 | Lam Research Corporation | Techniques for improving etching in a plasma processing chamber |
DE29921694U1 (en) | 1999-12-09 | 2001-04-19 | Agrodyn Hochspannungstechnik G | Plasma nozzle |
US6363882B1 (en) * | 1999-12-30 | 2002-04-02 | Lam Research Corporation | Lower electrode design for higher uniformity |
JP2001203097A (en) | 2000-01-17 | 2001-07-27 | Canon Inc | Apparatus and method of plasma density measurement and plasma processing apparatus and method by using it |
JP2001281284A (en) | 2000-03-30 | 2001-10-10 | Makoto Hirano | Nondestructive measuring instrument for complex dielectric constant |
US6337277B1 (en) * | 2000-06-28 | 2002-01-08 | Lam Research Corporation | Clean chemistry low-k organic polymer etch |
JP2002124398A (en) | 2000-10-17 | 2002-04-26 | Matsushita Electric Ind Co Ltd | Plasma processing method and device |
US6441554B1 (en) * | 2000-11-28 | 2002-08-27 | Se Plasma Inc. | Apparatus for generating low temperature plasma at atmospheric pressure |
US6936842B2 (en) | 2001-06-27 | 2005-08-30 | Applied Materials, Inc. | Method and apparatus for process monitoring |
JP4009087B2 (en) | 2001-07-06 | 2007-11-14 | アプライド マテリアルズ インコーポレイテッド | Magnetic generator in semiconductor manufacturing apparatus, semiconductor manufacturing apparatus, and magnetic field intensity control method |
JP4653348B2 (en) | 2001-07-18 | 2011-03-16 | 新日本製鐵株式会社 | Plasma torch for heating molten steel |
JP2003059917A (en) | 2001-08-10 | 2003-02-28 | Mitsubishi Heavy Ind Ltd | Mocvd system |
US20040262268A1 (en) * | 2001-08-28 | 2004-12-30 | Jeng-Ming Wu | Plasma burner with microwave stimulation |
US6616759B2 (en) | 2001-09-06 | 2003-09-09 | Hitachi, Ltd. | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor |
JP4077704B2 (en) | 2001-09-27 | 2008-04-23 | 積水化学工業株式会社 | Plasma processing equipment |
JP4044397B2 (en) | 2001-10-15 | 2008-02-06 | 積水化学工業株式会社 | Plasma surface treatment equipment |
JP2003133302A (en) | 2001-10-26 | 2003-05-09 | Applied Materials Inc | Adaptor holder, adaptor, gas inlet nozzle, and plasma treatment apparatus |
JP2003135571A (en) | 2001-11-07 | 2003-05-13 | Toshiba Corp | Plasma sterilization apparatus |
JP3843818B2 (en) * | 2001-11-29 | 2006-11-08 | 三菱電機株式会社 | Gas cracker |
JP3822096B2 (en) | 2001-11-30 | 2006-09-13 | 株式会社東芝 | Discharge detection device |
JP2003171785A (en) | 2001-12-04 | 2003-06-20 | Osg Corp | Method of removing hard surface film |
DE10164120A1 (en) | 2001-12-24 | 2003-07-03 | Pierre Flecher | Method for sterilization plastic bottles using microwave plasma comprises introduction of the bottles into a vacuum container made of metal and production of plasma by means of a plasma head |
JP2003213414A (en) | 2002-01-17 | 2003-07-30 | Toray Ind Inc | Method and apparatus for film deposition, and method for manufacturing color filter |
JP2003210556A (en) | 2002-01-18 | 2003-07-29 | Toshiba Corp | Pipe sterilizer with plasma |
JP2003236338A (en) * | 2002-02-15 | 2003-08-26 | Mitsubishi Electric Corp | Method and device for treating gas containing organic halide |
JP3908062B2 (en) * | 2002-03-13 | 2007-04-25 | 新日鉄エンジニアリング株式会社 | Plasma torch structure |
JP3977114B2 (en) | 2002-03-25 | 2007-09-19 | 株式会社ルネサステクノロジ | Plasma processing equipment |
US20060057016A1 (en) | 2002-05-08 | 2006-03-16 | Devendra Kumar | Plasma-assisted sintering |
US6673200B1 (en) | 2002-05-30 | 2004-01-06 | Lsi Logic Corporation | Method of reducing process plasma damage using optical spectroscopy |
JP3691812B2 (en) | 2002-07-12 | 2005-09-07 | 株式会社エー・イー・ティー・ジャパン | Method for measuring complex permittivity using a resonator and apparatus for carrying out said method |
US6830650B2 (en) | 2002-07-12 | 2004-12-14 | Advanced Energy Industries, Inc. | Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
TWI236701B (en) | 2002-07-24 | 2005-07-21 | Tokyo Electron Ltd | Plasma treatment apparatus and its control method |
US20040016402A1 (en) | 2002-07-26 | 2004-01-29 | Walther Steven R. | Methods and apparatus for monitoring plasma parameters in plasma doping systems |
GB0218946D0 (en) | 2002-08-14 | 2002-09-25 | Thermo Electron Corp | Diluting a sample |
US6792742B2 (en) * | 2002-09-09 | 2004-09-21 | Phoenix Closures, Inc. | Method for storing and/or transporting items |
JP4432351B2 (en) | 2003-04-16 | 2010-03-17 | 東洋製罐株式会社 | Microwave plasma processing method |
US6769288B2 (en) | 2002-11-01 | 2004-08-03 | Peak Sensor Systems Llc | Method and assembly for detecting a leak in a plasma system |
JP3839395B2 (en) * | 2002-11-22 | 2006-11-01 | 株式会社エーイーティー | Microwave plasma generator |
CN1207944C (en) * | 2002-11-22 | 2005-06-22 | 中国科学院金属研究所 | High power microwave plasma torch |
US7183514B2 (en) * | 2003-01-30 | 2007-02-27 | Axcelis Technologies, Inc. | Helix coupled remote plasma source |
JP2004237321A (en) | 2003-02-06 | 2004-08-26 | Komatsu Sanki Kk | Plasma processing device |
JP2004285187A (en) | 2003-03-20 | 2004-10-14 | Rikogaku Shinkokai | Partial oxidation process of hydrocarbon and micro-reactor apparatus |
JP2005095744A (en) | 2003-09-24 | 2005-04-14 | Matsushita Electric Works Ltd | Surface treatment method of insulating member, and surface treatment apparatus for insulating member |
JP3793816B2 (en) | 2003-10-03 | 2006-07-05 | 国立大学法人東北大学 | Plasma control method and plasma control apparatus |
JP2005235464A (en) | 2004-02-17 | 2005-09-02 | Toshio Goto | Plasma generator |
WO2005096681A1 (en) | 2004-03-31 | 2005-10-13 | Gbc Scientific Equipment Pty Ltd | Plasma torch spectrometer |
CN2704179Y (en) | 2004-05-14 | 2005-06-08 | 徐仁本 | Safety protective cover for microwave oven |
KR20060000194A (en) | 2004-06-28 | 2006-01-06 | 정민수 | The pre-resolver for improving the performance of java virtual machine |
US7164095B2 (en) | 2004-07-07 | 2007-01-16 | Noritsu Koki Co., Ltd. | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
US20060021980A1 (en) | 2004-07-30 | 2006-02-02 | Lee Sang H | System and method for controlling a power distribution within a microwave cavity |
US7806077B2 (en) | 2004-07-30 | 2010-10-05 | Amarante Technologies, Inc. | Plasma nozzle array for providing uniform scalable microwave plasma generation |
US20080093358A1 (en) | 2004-09-01 | 2008-04-24 | Amarante Technologies, Inc. | Portable Microwave Plasma Discharge Unit |
US7338575B2 (en) | 2004-09-10 | 2008-03-04 | Axcelis Technologies, Inc. | Hydrocarbon dielectric heat transfer fluids for microwave plasma generators |
JP2006128075A (en) | 2004-10-01 | 2006-05-18 | Seiko Epson Corp | High-frequency heating device, semiconductor manufacturing device, and light source device |
TWI279260B (en) | 2004-10-12 | 2007-04-21 | Applied Materials Inc | Endpoint detector and particle monitor |
JP4620015B2 (en) | 2006-08-30 | 2011-01-26 | 株式会社サイアン | Plasma generating apparatus and work processing apparatus using the same |
US20100201272A1 (en) | 2009-02-09 | 2010-08-12 | Sang Hun Lee | Plasma generating system having nozzle with electrical biasing |
-
2004
- 2004-07-07 US US10/885,237 patent/US7164095B2/en active Active
-
2005
- 2005-07-07 CA CA2572391A patent/CA2572391C/en not_active Expired - Fee Related
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- 2005-07-07 EP EP05769522.3A patent/EP1787500B1/en not_active Not-in-force
- 2005-07-07 US US11/631,723 patent/US8035057B2/en active Active
- 2005-07-07 KR KR1020087023257A patent/KR100946434B1/en active IP Right Grant
- 2005-07-07 WO PCT/US2005/023886 patent/WO2006014455A2/en active Application Filing
- 2005-07-07 CN CN200580022852XA patent/CN101002508B/en not_active Expired - Fee Related
- 2005-07-07 JP JP2007520452A patent/JP5060951B2/en not_active Expired - Fee Related
- 2005-07-07 AU AU2005270006A patent/AU2005270006B2/en not_active Ceased
- 2005-07-07 RU RU2007104587/06A patent/RU2355137C2/en not_active IP Right Cessation
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4611108A (en) * | 1982-09-16 | 1986-09-09 | Agence National De Valorisation De La Recherche (Anuar) | Plasma torches |
US4652723A (en) * | 1983-11-17 | 1987-03-24 | L'air Liquide, Societe Anonyme Pour L'etude Et Lexploitation Des Procedes Georges Claude | Method for heat treating with a microwave plasma torch |
EP0397468A2 (en) * | 1989-05-09 | 1990-11-14 | Varian Associates, Inc. | Spectroscopic plasma torch for microwave induced plasmas |
US6388225B1 (en) * | 1998-04-02 | 2002-05-14 | Bluem Heinz-Juergen | Plasma torch with a microwave transmitter |
US6525481B1 (en) * | 1998-05-12 | 2003-02-25 | Masarykova Univerzita | Method of making a physically and chemically active environment by means of a plasma jet and the related plasma jet |
US6734385B1 (en) * | 1999-05-11 | 2004-05-11 | Dae Won Paptin Foam Co. Ltd. | Microwave plasma burner |
US20020020691A1 (en) * | 2000-05-25 | 2002-02-21 | Jewett Russell F. | Methods and apparatus for plasma processing |
US20020050323A1 (en) * | 2000-10-27 | 2002-05-02 | Michel Moisan | Device for the plasma treatment of gases |
US20030000823A1 (en) * | 2001-06-15 | 2003-01-02 | Uhm Han Sup | Emission control for perfluorocompound gases by microwave plasma torch |
Also Published As
Publication number | Publication date |
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RU2007104587A (en) | 2008-08-20 |
CA2572391A1 (en) | 2006-02-09 |
US20080017616A1 (en) | 2008-01-24 |
US8035057B2 (en) | 2011-10-11 |
RU2355137C2 (en) | 2009-05-10 |
AU2005270006A1 (en) | 2006-02-09 |
EP1787500A2 (en) | 2007-05-23 |
CA2572391C (en) | 2012-01-24 |
JP5060951B2 (en) | 2012-10-31 |
EP1787500B1 (en) | 2015-09-09 |
US20060006153A1 (en) | 2006-01-12 |
KR100946434B1 (en) | 2010-03-10 |
JP2008506235A (en) | 2008-02-28 |
AU2005270006B2 (en) | 2009-01-08 |
KR20080092988A (en) | 2008-10-16 |
KR100906836B1 (en) | 2009-07-08 |
CN101002508A (en) | 2007-07-18 |
US7164095B2 (en) | 2007-01-16 |
CN101002508B (en) | 2010-11-10 |
WO2006014455A2 (en) | 2006-02-09 |
KR20070026675A (en) | 2007-03-08 |
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