WO2006042514A3 - Niedrigviskose, strahlungshärtbare formulierung zur herstellung von ohrpassstücken - Google Patents

Niedrigviskose, strahlungshärtbare formulierung zur herstellung von ohrpassstücken Download PDF

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Publication number
WO2006042514A3
WO2006042514A3 PCT/DE2005/001836 DE2005001836W WO2006042514A3 WO 2006042514 A3 WO2006042514 A3 WO 2006042514A3 DE 2005001836 W DE2005001836 W DE 2005001836W WO 2006042514 A3 WO2006042514 A3 WO 2006042514A3
Authority
WO
WIPO (PCT)
Prior art keywords
viscosity
monomeric
radiation
low
ear pieces
Prior art date
Application number
PCT/DE2005/001836
Other languages
English (en)
French (fr)
Other versions
WO2006042514A2 (de
Inventor
Martin Klare
Reiner Altmann
Michael Kutschinski
Thomas Veit
Original Assignee
Dreve Otoplastik Gmbh
Martin Klare
Reiner Altmann
Michael Kutschinski
Thomas Veit
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dreve Otoplastik Gmbh, Martin Klare, Reiner Altmann, Michael Kutschinski, Thomas Veit filed Critical Dreve Otoplastik Gmbh
Priority to AT05800250T priority Critical patent/ATE483756T1/de
Priority to EP05800250A priority patent/EP1802700B1/de
Priority to US11/664,904 priority patent/US7763669B2/en
Priority to DE502005010351T priority patent/DE502005010351D1/de
Publication of WO2006042514A2 publication Critical patent/WO2006042514A2/de
Publication of WO2006042514A3 publication Critical patent/WO2006042514A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/062—Copolymers with monomers not covered by C08L33/06
    • C08L33/066—Copolymers with monomers not covered by C08L33/06 containing -OH groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C08L75/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C08L75/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R25/00—Deaf-aid sets, i.e. electro-acoustic or electro-mechanical hearing aids; Electric tinnitus maskers providing an auditory perception
    • H04R25/65—Housing parts, e.g. shells, tips or moulds, or their manufacture
    • H04R25/658—Manufacture of housing parts
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R25/00—Deaf-aid sets, i.e. electro-acoustic or electro-mechanical hearing aids; Electric tinnitus maskers providing an auditory perception
    • H04R25/65—Housing parts, e.g. shells, tips or moulds, or their manufacture
    • H04R25/652—Ear tips; Ear moulds

Abstract

Die Erfindung betrifft eine biokompatible, niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von medizintechnischen Produkten, insbesondere Ohrpassstücken, Otoplastiken, Schalen oder Ohrstücken, mittels PNP bzw. Stereolithographieverfahren, enthaltend: a) 15-60 Gew.-% eines monomeren oder oligomeren Dimethacrylats auf Basis von Bisphenol A oder Bisphenol F; b) 0-50 Gew.-% eines oder mehrerer monomerer/oligomerer Urethan(meth)acrylate mit einer Funktionalität von n < 4 , einer Viskosität < 30 Pa s und einem Molekülgewicht < 3500; c) 2-25 Gew.-% eines monomeren aliphatischen oder cycloaliphatischen Dimethacrylats mit einer Viskosität < 3 Pa s; d) 2-35 Gew.-% eines Iminooxadiazondionderivates, charakterisiert durch 3 Methacrylat- und/oder Acrylatfunktionen; e) 0-15 Gew.-% eines oder mehrer monofunktioneller Methacrylate; f) 0,5-6 Gew.-% eines oder einer Kombination mehrerer Photoinitiatoren, deren Absorption im Wellenlängenbereich des eingesetzten Laserstrahles bzw. der Bestrahlungsquelle liegt; g) 0 -0,5 Gew.-% eines oder mehrerer anaerober Inhibitoren; h) 0-40 Gew.-% an Füllstoffen mit einer Partikelgrösse < 25 µm; i) 0-5 Gew.-% an Farbmitteln; j) 0-5 Gew.-% an üblichen Additiven wie UV-Stabilisatoren oder Verlaufsadditiven, wobei der Anteil der Komponenten a) bis j) zusammen 100 Gew.-% beträgt.
PCT/DE2005/001836 2004-10-18 2005-10-13 Niedrigviskose, strahlungshärtbare formulierung zur herstellung von ohrpassstücken WO2006042514A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AT05800250T ATE483756T1 (de) 2004-10-18 2005-10-13 Niedrigviskose, strahlungshärtbare formulierung zur herstellung von ohrpassstücken
EP05800250A EP1802700B1 (de) 2004-10-18 2005-10-13 Niedrigviskose, strahlungshärtbare formulierung zur herstellung von ohrpassstücken
US11/664,904 US7763669B2 (en) 2004-10-18 2005-10-13 Low-viscosity, radiation-curable formulation for producing adaptive earpieces
DE502005010351T DE502005010351D1 (de) 2004-10-18 2005-10-13 Niedrigviskose, strahlungshärtbare formulierung zur herstellung von ohrpassstücken

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004050868A DE102004050868A1 (de) 2004-10-18 2004-10-18 Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken
DE102004050868.2 2004-10-18

Publications (2)

Publication Number Publication Date
WO2006042514A2 WO2006042514A2 (de) 2006-04-27
WO2006042514A3 true WO2006042514A3 (de) 2006-09-14

Family

ID=36120655

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2005/001836 WO2006042514A2 (de) 2004-10-18 2005-10-13 Niedrigviskose, strahlungshärtbare formulierung zur herstellung von ohrpassstücken

Country Status (5)

Country Link
US (1) US7763669B2 (de)
EP (1) EP1802700B1 (de)
AT (1) ATE483756T1 (de)
DE (2) DE102004050868A1 (de)
WO (1) WO2006042514A2 (de)

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CA2589150C (en) 2004-11-29 2013-05-28 Dsm Ip Assets B.V. Method for reducing the amount of migrateables of polymer coatings
JP2009518479A (ja) 2005-12-09 2009-05-07 ディーエスエム アイピー アセッツ ビー．ブイ． 高分子電解質を含む親水性コーティング
US8828546B2 (en) 2006-09-13 2014-09-09 Dsm Ip Assets B.V. Coated medical device
JP2010503737A (ja) * 2006-09-13 2010-02-04 ディーエスエム アイピー アセッツ ビー．ブイ． 金属銀粒子を含む抗菌性の親水性コーティング
JP5101862B2 (ja) * 2006-10-31 2012-12-19 スリーエム イノベイティブ プロパティズ カンパニー シート形成性単量体組成物、熱伝導性シート及びその製法
JP5587611B2 (ja) 2007-02-28 2014-09-10 ディーエスエム アイピー アセッツ ビー．ブイ． 親水性コーティング
MX2009009145A (es) 2007-02-28 2009-09-03 Dsm Ip Assets Bv Recubrimiento hidrofilo.
DE102007017195A1 (de) * 2007-04-12 2008-10-16 Dreve Otoplastik Gmbh Biokompatible, strahlungshärtende Formulierung zur generativen Herstellung von medizintechnischen Produkten, insbesondere Ohrpassstücken und dentalen Formteilen, mittels Bildprojektionssystemen
DE102007041489A1 (de) 2007-08-31 2009-03-05 Deltamed Gmbh Flexibler medizintechnischer Formkörper sowie Verfahren zu dessen Herstellung
BRPI0816605A2 (pt) * 2007-10-10 2015-03-03 Ppg Ind Ohio Inc Composição de revestimento curável por radiação, revestimento curado por radiação e método para revestir um substrato
DE102008017106A1 (de) * 2008-04-02 2009-10-08 Dreve Prodimed Gmbh Verfahren und Formulierung zur generativen Herstellung von biokompatiblen, strahlungshärtenden medizintechnischen Produkten, insbesondere Ohrpassstücken, mit verringerter Verfärbung
DE102010008702B4 (de) * 2010-02-19 2012-09-27 Kim Kubiack Verfahren zur Herstellung einer Bohrschablone zum Einbringen von implantologischen Bohrungen
BR112012032202A2 (pt) 2010-06-16 2016-11-22 Dsm Ip Assets Bv formulação de revestimento para a preparação de um revestimento hidrofílico.
WO2012041519A2 (de) * 2010-10-01 2012-04-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Photovernetzende elastomere für rapid prototyping
KR101435139B1 (ko) * 2010-11-18 2014-09-02 주식회사 미뉴타텍 도광판 무늬형용 활성에너지선경화형 수지 조성물
DE102011115062A1 (de) * 2011-10-07 2013-04-11 Dreve Prodimed Gmbh Rohling zur abtragenden Herstellung von Ohrpassstücken
TWI446609B (zh) 2011-11-15 2014-07-21 Ind Tech Res Inst 染料敏化太陽能電池
US10357435B2 (en) * 2012-12-18 2019-07-23 Dentca, Inc. Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base
US9456963B2 (en) 2012-12-18 2016-10-04 Dentca, Inc. Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base
US20160324730A1 (en) * 2012-12-18 2016-11-10 Dentca, Inc. Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base
KR101800370B1 (ko) * 2013-04-18 2017-11-22 덴카, 인크. 광경화성 수지 조성물 및 인공 치아 및 의치상 제조를 위한 3차원 인쇄에 이를 이용하는 방법
CN104570603B (zh) * 2013-10-22 2019-06-28 青岛中科新材料有限公司 一种紫外光固化3d打印用光敏树脂的制备方法及应用
DK3288405T3 (da) * 2015-05-01 2021-07-26 Cosmo Spa Lounge & Supply Inc Dba Illumino Kemisk minimeret system til tidsreduceret påsætning af øjenvippeforlængelser
JP7117291B2 (ja) 2016-08-25 2022-08-12 スリーエム イノベイティブ プロパティズ カンパニー 付加製造プロセスのための着色硬化性組成物、３次元複合材物品及びその使用
CN110799168B (zh) * 2017-06-20 2023-06-23 3M创新有限公司 用于增材制造方法的可辐射固化组合物
WO2019092140A1 (de) * 2017-11-09 2019-05-16 Covestro Deutschland Ag Verfahren zur herstellung eines gegenstandes und verwendung eines radikalisch vernetzbaren harzes in einem additiven fertigungsverfahren
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EP0425441A2 (de) * 1989-10-27 1991-05-02 Ciba-Geigy Ag Photoempfindliches Gemisch
EP0831372A1 (de) * 1996-09-23 1998-03-25 Siemens Aktiengesellschaft Photopolymere
DE19848886A1 (de) * 1998-10-23 2000-05-04 Heraeus Kulzer Gmbh & Co Kg Lichtpolymerisierbares Einkomponenten-Dentalmaterial
WO2005001570A1 (de) * 2003-06-23 2005-01-06 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare formulierung , insbesondere für die stereolithographische herstellung von ohrstücken

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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0425441A2 (de) * 1989-10-27 1991-05-02 Ciba-Geigy Ag Photoempfindliches Gemisch
EP0831372A1 (de) * 1996-09-23 1998-03-25 Siemens Aktiengesellschaft Photopolymere
DE19848886A1 (de) * 1998-10-23 2000-05-04 Heraeus Kulzer Gmbh & Co Kg Lichtpolymerisierbares Einkomponenten-Dentalmaterial
WO2005001570A1 (de) * 2003-06-23 2005-01-06 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare formulierung , insbesondere für die stereolithographische herstellung von ohrstücken

Also Published As

Publication number Publication date
DE102004050868A1 (de) 2006-04-20
EP1802700B1 (de) 2010-10-06
DE502005010351D1 (de) 2010-11-18
WO2006042514A2 (de) 2006-04-27
ATE483756T1 (de) 2010-10-15
US7763669B2 (en) 2010-07-27
US20080287564A1 (en) 2008-11-20
EP1802700A2 (de) 2007-07-04

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